• Applied Science and Convergence Technology
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• v.23 no.1
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• pp.54-59
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• 2014

The roll-to-roll (R2R) fabrication method to make micro-scale pillar arrays for biomimetic functionalization of surfaces is presented. Inspired by the micro-structure of plants in nature, a surface with a synthetic micro-scale pillar array is fabricated via maskless photolithography. After the surface is SAM (self-assembled monolayer) coated with trichlorosilane in a vacuum desiccator, it displays a hydrophobic property even in R2R replicas of original substrate, whose properties are further characterized using various pitches and diameters. In order to perform a comparison between the original micro-pattern and its replicas, surface morphology was analyzed using scanning electron microscopy and wetting characteristics were measured via a contact angle measurement tool with a $10{\mu}L$ water droplet. Efficient roll-to-roll imprinting for a biomimetic functionalized surface has the potential for use in many fields ranging from water repelling and self-cleaning to microfluidic chips.

• Journal of Surface Science and Engineering
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• v.54 no.6
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• pp.365-370
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• 2021

In this research, we proceeded with research on plasma resistance of the cleaning process of APS(Atmospheric Plasma Spray)-Y₂O₃ coated parts used for semiconductor and display plasma process equipment. CF₄, O₂, and Ar mixed gas were used for the plasma environment, and respective alconox, surfactant, and piranha solution was used for the cleaning process. After APS-Y₂O₃ was exposed to CF₄ plasma, the surface changed from Y₂O₃ to YF₃ and a large amount of carbon was deposited. For this reason, the plasma corrosion resistance was lowered and contamination particles were generated. We performed a cleaning process to remove the defect-inducing surface YF₃ layer and carbon layer. Among three cleaning solutions, the piranha cleaning process had the highest detergency and the alconox cleaning process had the lowest detergency. Such results could be confirmed through the etching amount, morphology, composition, and accumulated contamination particle analysis results. Piranha cleaning process showed the highest detergency, but due to the very large thickness reduction, the base metal was exposed and a large number of contaminated particles were generated. In contrast, the surfactant cleaning process exhibit excellent properties in terms of surface detergency, etching amount, and accumulated contamination particle analysis.

• Vacuum Magazine
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• v.4 no.1
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• pp.16-23
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• 2017

Recently, KSTAR, Korea's superconducting fusion energy research and development device, has succeeded in driving the high performance plasma for 70 seconds for the first time in the world. Continuous plasma operation technology is an essential factor for commercialization of fusion energy power generation. Therefore, this achievement is expected to play a major role in the research of fusion technology required for future fusion power plants. In order to operate the KSTAR, the discharge process in which the neutral gas is turned into the plasma should be preceded in the start-up (breakdown) phase of tokamak operation. This process essentially involves the vacuum environment in the tokamak device. KSTAR has successfully operated a vacuum pumping system to achieve the target level of the vacuum environment through a high temperature baking operation, a discharge cleaning process and boronization.

• Proceedings of the Korean Vacuum Society Conference
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• 1993.07a
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• pp.39-39
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• 1993

A finite element analysis and Monte Carlo method have been applied to calculate the ppressure pprofiles around the ppohang Light Source (ppLS) electron storage ring with the aim of ppredicting the pperformance of the vacuum system designed for the ppLS vacuum system. After ppropperly choosing the design pparameters, the ppressure distribution are calculated as a function of the integrated stored beam current [AmppHrs]. The effect of changes of the vacuum pparameters, such as installed ppumpping sppeeds and synchrotron radiation induced gas desorpption rates on the ppressure pprofile, is also studied. The results indicate that the use of lumpped non-evapporable getter ppumpps together with spputter ion ppumpps for ppumpping the ppLS down to the required ppressure is ppossible in the ppresence of synchrotron induced gas loads, after resonable beam cleaning time.

• Clean Technology
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• v.17 no.4
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• pp.306-313
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• 2011

Flux or solder is used in soldering process for manufacturing electronic parts such as printed circuit boards (PCB). After soldering process, residual flux and solder paste on the parts should be removed since their residuals could cause performance degradation or failure of parts due to their corrosion and electric leakage. Ozone depletion substances such as 1,1,1- trichloroethane (TCE) and HCFC-141b have widely been using for removal of residual flux and solder paste after soldering process In manufacturing of electronic parts until now. In this study, non-aqueous cleaning agents without flash point were developed and applied to industrial field for replacement of cleaning agents with ozone depletion. In order to develop non-aqueous cleaning agents without ethers, esters, fluoride- type solvents. And their physical properties and cleaning abilities were evaluated, and they were applied to industrial fields for cleaning of flux and solder on the PCB. And vacuum distillation apparatus were operated to determine their operating conditions and recycling yields for recycling of used cleaning agents formulated in this study. As a result of physical properties measurement of our formulated cleaning agents, they were expected to have good wetting and penetrating power since their surface tensions were relatively low as 18.0~20.4 dyne/$cm^2$ and their wetting indices are relatively large. And some cleaning agents holding fluoride-type solvents as their components did not have any flash point and they seemed to be safe in their handling and storage. The cleaning experimental results showed that some cleaning agents were better in their cleaning of flux and solder paste than 1,1,1-TCE and HCFC-141b. And industrial application results of the formulated cleaning agents for cleaning PCB indicated that they can be applicable to industry due to their good cleaning capability in comparison with HCFC-141b. The recycling experiments of the used formulated cleaning agents through a vacuum distillation apparatus also showed that their 91.9~97.5% could be recycled with its proper operating conditions.

• Journal of the Korean Vacuum Society
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• v.6 no.1
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• pp.9-19
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• 1997

The reaction mechanisms of dry cleaning with UV-excited chlorine radical for Zn, Fe and Ti trace contaminants on the Si wafer have been studied by SEM, AFM and XPS analyses in this work. The patterned Zn, Fe and Ti films were deposited on the Si wafer surface by thermal evaporation and changes in the surface morphology after dry cleaning with $Cl_2$and UV/$Cl_2$at $200^{\circ}C$ were studied by optical microscopy and SEM. In addition, changes in the surface roughness of Si wafer with the cleaning was observed by AFM. The chemical bonding states of the Zn, Fe and Ti deposited silicon surface were observed with in-line XPS analysis. Zn and Fe were easily cleaned in the form of volatile zinc-chloride and iron-chloride as verified by the surface morphology changes. Ti which forms involatile oxides was not easily removed at room temperature but was slightly removed by UV/$Cl_2$at elevated temperature of $200^{\circ}C$. It was also found that the surface roughness of the Si wafer increased after $Cl_2$and UV/$Cl_2$cleaning. Therefore, the metallic contaminants on the Si wafer can be easily removed at lower temperature without surface damage by a continuous process using wet cleaning followed by UV/$Cl_2$dry cleaning.

• 한국신재생에너지학회:학술대회논문집
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• 2010.06a
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• pp.162.1-162.1
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• 2010

Cavitation phenomenon has long been a difficult problem that regarded as negative event to fluid machines or industrial facilities. In the latest, however, some engineers became to understand the power of cavitation and use it to cleaning wall after developing cavitation nozzle. In this paper, we introduce new concept for power-generation system using cavitation jet flow maid by nozzle and impulse turbine in vacuum condition. The vacuum needed to make cavitation is generated naturally by Torricelli's vacuum, 10.23m effective head drop without additional power. We analyzed water's boiling and the steam's mean free path according to vacuum purity levels for nozzles and turbine blades. The nozzles make water accelerate in the neck and boil in expansion section of the nozzles. The shape of the impulse turbine is designed for absorption of the molecule's kinetic energy of the steam.

• Journal of Welding and Joining
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• v.17 no.4
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• pp.32-38
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• 1999

PAL(Pohang Accelerator Laboratory) designed and manufactured a 5m-long straight vacuum chamber to adopt U7 undulator that is the first insertion device. Top and bottom plates of the vacuum chamber were made of Al alloy A5083-H321, and welded together by the GTAW welding. The leak rate is less than 1×{TEX}$10^{-10}${/TEX} torr·ℓ/s with negligible welding deformation. The pressure has been maintained below {TEX}$10^{-10}${/TEX} torr after installation. This paper reports the welding process and the method applied to achieve ultimate vacuum performance and t satisfy integrity of welds.

• Journal of Surface Science and Engineering
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• v.48 no.4
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• pp.179-184
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• 2015

Quadrupole Mass Spectrometers (QMS) is a very useful tool in vacuum process diagnosis. Tungsten filament based ion sources are vulnerable to contamination from process gas monitoring. Common symptoms of quadrupole mass spectrometer malfunction is appearance of unwanted contaminant mass peaks or no detection of any ion peaks. We disassembled used quadrupole mass spectrometer and found out black insulating deposits on inside of ion source parts. Five steps of cleaning procedure were applied and almost full restoration of functions were confirmed in two types of closed ion source quadrupole mass spectrometer. By using a numerical modeling (CFD-ACE+) technique, the electric potential profile of ion source with/without insulating deposit was calculated and showed the possibility of quadrupole mass spectrometer malfunction by the deterioration of designed potential profile inside the ion source.

• Journal of the Semiconductor & Display Technology
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• v.18 no.3
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• pp.144-149
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• 2019

This paper describes the results of a study on the unmanned maintenance robot that simultaneously performs the cleaning and inspection of the photovoltaic panels. The robot has a special adsorptive device, an infrared sensor, a vacuum level sensor and a camera. The robot uses two SSC (Sliding Suction Cup) adsorptive devices to move up and down the slope. First, the forces generated when the robot moves up the slope are mechanically analyzed, and the required design and control of the adsorption system are suggested. The robot was designed and manufactured to operate stably by using the presented results. Next, the normal force between the panel and the wheel was measured to confirm that the robot was manufactured and operated as intended, and the robot motion was tested on the inclined panel. It has been proven that robots are well designed and built to clean and inspect sloped panels.