• Journal of Power Electronics
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• v.6 no.3
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• pp.195-204
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• 2006

This paper presents a new compensating system, consisting of series and shunt active filters, for mitigating voltage and current disturbances. The shunt filter is used to compensate for unbalanced and distorted load currents. The series filter comprises two inverters, used to suppress voltage disturbances and handle source currents independently. This configuration is devised to reduce the overall cost of active compensators by using low-frequency high-current switches for the latter inverter. The filters are controlled separately using a novel control strategy. Since voltages at the point of common coupling contain interharmonics, conventional methods cannot be used for extracting voltage references. Therefore, voltage references are obtained from generated sinusoidal waveforms by a phase-locked loop. Current references are detected based on rotating frame vector mapping. Simulation results are presented to verify the system.

• Proceedings of the KIPE Conference
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• 2007.07a
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• pp.305-308
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• 2007

본 논문에서는 전력품질 향상용 전력전자기기의 제어에 중요한 정보인 전원의 위상각을 검출하는 기존의 방법들에 대해서 먼저 알아보고, 그 중 불평형한 전원단 전압조건에서도 정확한 위상각을 검출할 수 있는 전차원 상태관측기를 이용한 정상분 전압 추출 PLL(Phase Locked Loop) 방법을 제안한다. 제안된 PLL 방법은 기존의 전역 통과 필터(APF, All Pass Filter)를 이용한 정상분 전압추출기 대신 전차원 상태관측기를 사용함으로써 불평형사고 발생 시 과도상태 응답특성을 개선하였다. 기존의 정상분 전압 추출 PLL 방법과 본 논문에서 제안된 PLL 방법의 성능을 비교하기 위해, 전원단 전압에 불평형 사고 발생시 위상각을 검출하는 모의실험과 실험을 하였고, 이를 통해 기존의 전역 통과 필터를 이용한 정상분 전압 추출 PLL 방법보다 제안된 전차원 상태관측기를 이용한 정상분 전압 추출 PLL 방법의 과도상태 응답특성이 개선됨을 입증하였다.

• Proceedings of the KIPE Conference
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• 2001.07a
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• pp.97-100
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• 2001

본 연구에서는 3상이 불평형된 전원 조건하에서 비선형 부하전류를 유효성분, 기본파 무효성분 그리고 왜 형성분으로 분해한 후, 능동전력필터를 제어할 수 있는 새로운 평균전력 알고리즘을 제시하였다. 제안된 방법의 타당성을 입증하기 위해, $15\%$ 불평형된 3상 전원 전압하에서 실험을 수행하였으며, 종전의 평균전력 알고리즘에 비하여 새로운 평균전력 알고리즘의 유용성을 입증할 수 있었다.

• Transactions of the Society of Information Storage Systems
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• v.6 no.2
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• pp.57-62
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• 2010

This paper measured and analyzed the source of total power loss of an ODD of a notebook computer. It shows that the biggest power loss is the windage loss due to the friction between rotating disk and surrounding air. It measured the power loss by the tilting motion of a rotating disc which is originated from the unbalanced mass of the rotating disc or the squareness between case-rotor and shaft. The power loss of rotating disc due to tilting motion was also calculated by using FLUENT, and it was correlated with the measured one. This paper shows that the one of the effective methods to reduce the power loss of an ODD is to reduce the tilting motion of a rotating disc.

• Proceedings of the KIEE Conference
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• 1993.07b
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• pp.695-697
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• 1993

In this paper, a novel concept for a static three-phase to three-phase power converter for an AC drive with an unity power factor and reduced harmonics on the utility line is presented. The power circuit consists of two back-to-back connected six-pulse bridges having only a $5{\mu}F$ ceramic capacitor in the DC link. By controlling the active power balance between two bridges, the DC link voltage can be maintained within 20V deviation from the nominal value with the small ceramic capacitor regardless of the load variation even in the unbalanced source condition.

• Journal of the Korean Vacuum Society
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• v.20 no.5
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• pp.333-338
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• 2011

In this work, we have fabricated the amorphous carbon (a-C:H) thin film by using unbalanced magnetron sputtering method with the magnetron source of inside/outside electromagnetic coils as the protective coating materials. We have investigated the tribological properties of amorphous carbon films prepared with various electromagnetic coil currents for the change of the plasma density, such as hardness, friction coefficient, adhesion, and surface roughness. Raman and HRTEM were used to study the microstructure of carbon films. In the result, the hardness and adhesion properties of a-C:H films were improved with increasing electromagnetic coil current due to the increase of the plasma density to the substrate. Thus, these results can be explained by the increase of $sp^2$ bonding and cluster number in the amorphous carbon film, related to the improved bombardment around substrate and the increased substrate temperature.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.29 no.10
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• pp.665-670
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• 2016

Prevailing dissemination of machine tools and cutting technology have caused drastic developments of high speed dry machining with work materials of high hardness, and demands on the high-hardness-materials with high efficiency have become increasingly important in terms of productivity, cost reduction, as well as environment-friendly issue. Addition of Si to TiAlN has been known to form nano-composite coating with higher hardness of over 30 GPa and oxidation temperature over $1,000^{\circ}C$. However, it is not easy to add Si to TiAlN by using conventional PVD technologies. Therefore, Ti-Al-Si-N have been prepared by hybrid process of PVD with multiple target sources or PVD combined with PECVD of Si source gas. In this study, a single composite target of Ti-Al-Si was prepared by powder metallurgy of MA (mechanical alloying) and SPS (spark plasma sintering). Properties of he resulting alloying targets were examined. They revealed a microstructure with micro-sized grain of about $1{\sim}5{\mu}m$, and all the elements were distributed homogeneously in the alloying target. Hardness of the Ti-Al-Si-N target was about 1,127 Hv. Thin films of Ti-Al-Si-N were prepared by unbalanced magnetron sputtering method by using the home-made Ti-Al-Si alloying target. Composition of the resulting thin film of Ti-Al-Si-N was almost the same with that of the target. The thin film of Ti-Al-Si-N showed a hardness of 35 GPa and friction coefficient of 0.66.

• Journal of the Korean Ceramic Society
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• v.49 no.6
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• pp.620-624
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• 2012

The role of moisture remaining inside the deposition chamber during the formation of the cubic boron nitride (c-BN) phase in BN film was investigated. BN films were deposited by an unbalanced magnetron sputtering (UBM) method. Single-crystal (001) Si wafers were used as substrates. A hexagonal boron nitride (h-BN) target was used as a sputter target which was connected to a 13.56 MHz radiofrequency electric power source at 400 W. The substrate was biased at -60 V using a 200 kHz high-frequency power supply. The deposition pressure was 0.27 Pa with a flow of Ar 18 sccm - $N_2$ 2 sccm mixed gas. The inside of the deposition chamber was maintained at a moisture level of 65% during the initial stage. The effects of the evacuation time, duration time of heating the substrate holder at $250^{\circ}C$ as well as the plasma treatment on the inside chamber wall on the formation of c-BN were studied. The effects of heating as well as the plasma treatment very effectively eliminated the moisture adsorbed on the chamber wall. A pre-deposition condition for the stable and repeatable deposition of c-BN is suggested.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2001.11a
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• pp.35-35
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• 2001

agnesium Oxide (MgO) with a NaCI structure is well known to exhibit high secondary electron emission, excellent high temperature chemical stability, high thermal conductance and electrical insulating properties. For these reason MgO films have been widely used for a buffer layer of high $T_c$ superconducting and a protective layer for AC-plasma display panels to improve discharge characteristics and panel lifetime. Up to now MgO films have been synthesized by lE-beam evaporation, Molecular Beam Epitaxy (MBE) and Metalorganic Chemical Vapor Deposition (MOCVD), however there have been some limitations such as low film density and micro-cracks in films. Therefore magnetron sputtering process were emerged as predominant method to synthesis high density MgO films. In previous works, we designed and manufactured unbalanced magnetron source with high power density for the deposition of high quality MgO films. The magnetron discharges were sustained at the pressure of O.lmtorr with power density of $110W/\textrm{cm}^2$ and the maximum deposition rate was measured at $2.8\mu\textrm{m}/min$ for Cu films. In this study, the syntheses of MgO films were carried out by unbalanced magnetron sputtering with various $O_2$ partial pressure and specially target power densities, duty cycles and frequency using pulsed DC power supply. And also we investigated the plasma states with various $O_2$ partial pressure and pulsed DC conditions by Optical Emission Spectroscopy (OES). In order to confirm the relationships between plasma states and film properties such as microstructure and secondary electron emission coefficient were analyzed by X-Ray Diffraction(XRD), Transmission Electron Microscopy(TEM) and ${\gamma}-Focused$ Ion Beam (${\gamma}-FIB$).

• Journal of the Korea Academia-Industrial cooperation Society
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• v.18 no.11
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• pp.817-825
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• 2017

The AC-common bus microgrid system can overcome several weaknesses of the DC microgrid system by interconnecting the DC/AC inverters used for renewable energy with an AC network. Nevertheless, the unbalanced loads inherent in the electric power systems of island and small communities can deteriorate the performance of the AC microgrid system. This is because of the limited voltage regulation capability and mixed power flow in the voltage source inverter. In order to overcome the unbalanced load condition, this paper proposes a voltage and current control algorithm for the 4-leg inverter based on the single phase d-q control method, as well as the modeling of the voltage controller using Matlab/Simulink S/W. From the S/W simulation and experiment of the 250KW proto-type inverter, it is confirmed that the proposed algorithm is a useful tool for the design and operation of the AC microgrid system.