Etch characteristics of ZnO thin films using an inductively coupled plasma
($BCl_3/Ar/Cl_2$ 유도결합 플라즈마를 이용한 ZnO 박막의 식각특성 연구)
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- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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- 2009.06a
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- pp.135-136
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- 2009