• 한국생산제조학회지
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• 제18권6호
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• pp.697-701
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• 2009

A simple method for the fabrication of porous nano-master for the anti-reflection effect on the transparent substrates is presented. In the conventional fabrication methods for antireflective surface, coating method using materials with low refractive index has usually been used. However, it is required to have a high cost and long processing time for mass production. In this paper, we developed a porous nano-master with anti-reflective surface for the molding stamper of the injection mold, hot embossing and UV imprinting by using the aluminum anodizing process. Through two-step anodizing and etching processes, a porous nano-master with anti-reflective surface was fabricated at the large area. Pattern size Pore diameter and inter-pore distance are about 130nm and 200nm, respectively. In order to replicate anti-reflective structure, hot embossing process was performed by varying the processing parameters such as temperature, pressure and embossing time etc. Finally, antireflective surface can be successfully obtained after etching process to remove selectively silicon layer of AAO master.

• 한국기계가공학회지
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• 제10권4호
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• pp.76-81
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• 2011

UV imprinting process can manufacture high-functional optical components with low cost. If hard polymers can be used as transparent molds at this process, the cost will be much lower. However, there are limited researches to predict the machinability and the burr of hard polymers. Therefore, a new method to predict them by analyzing load-depth curves which can be obtained by the instrumented indentation test was developed in this study. The load-depth curve contains elastic deformation and plastic deformation simultaneously. The ratio of the plastic deformation over the sum of the two deformation is proportional to the ductility of materials which is one of the parameters of the machinability and the burr. The instrumented indentation tests were performed on the transparent molds of the hard polymers and the values of ratio were calculated. The machinability and the burr of three kinds of hard polymers were predicted by the ratio, and the prediction was in agreement with the experimental results from the machined surfaces of the three kinds of hard polymers.

• 한국재료학회지
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• 제16권4호
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• pp.225-230
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• 2006

Nanoimprint lithography (NIL) is a novel method of fabricating nanometer scale patterns. It is a simple process with low cost, high throughput and resolution. NIL creates patterns by mechanical deformation of an imprint resist and physical contact process. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting process. Stiction between the resist and the stamp is resulted from this physical contact process. Stiction issue is more important in the stamps including narrow pattern size and wide area. Therefore, the antistiction layer coating is very effective to prevent this problem and ensure successful NIL. In this paper, an antistiction layer was deposited and characterized by PECVD (plasma enhanced chemical vapor deposition) method for metal stamps. Deposition rates of an antistiction layer on Si and Ni substrates were in proportion to deposited time and 3.4 nm/min and 2.5 nm/min, respectively. A 50 nm thick antistiction layer showed 90% relative transmittance at 365 nm wavelength. Contact angle result showed good hydrophobicity over 105 degree. $CF_2$ and $CF_3$ peaks were founded in ATR-FTIR analysis. The thicknesses and the contact angle of a 50 nm thick antistiction film were slightly changed during chemical resistance test using acetone and sulfuric acid. To evaluate the deposited antistiction layer, a 50 nm thick film was coated on a stainless steel stamp made by wet etching process. A PMMA substrate was successfully imprinting without pattern degradations by the stainless steel stamp with an antistiction layer. The test result shows that antistiction layer coating is very effective for NIL.

• 멤브레인
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• 제31권3호
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• pp.219-227
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• 2021

분자각인막(MIM)은 특정 분자의 결합자리를 갖고 있는 다공성 고분자 막이다. 비용매유도 상분리(NIPS)법을 사용하여 분자각인막의 지지체로 사용될 P(AN-co-MA) 비대칭막을 제조하고, 여기에 표면 각인법을 적용하여 광활성 이니퍼터 도입과 photo-grafting을 통해 라이소자임 분자각인막을 제조하였다. P(AN-co-MA) 비대칭막을 3-chloropropyltrimethoxysilane과 광활성 이니퍼터 dithiocarbamate로 개질하고, acrylamide 단량체, N,N'-methylenebisacrylamide 가교제, 라이소자임 주형분자 혼합액을 UV 조사 환경에서 혼성중합 시켜 MIM을 제조하였다. 제조된 MIM의 FT-IR과 FE-SEM 및 EDS 분석을 실시한 결과 P(AN-co-MA) 막은 비대칭 단면 구조이었고 표면에 이니퍼터 그룹이 잘 결합되어 있어 MIM이 성공적으로 제조되었다. 제조공정의 변수 조절을 통해 라이소자임의 흡착량이 비각인막(NIM)에 비해 13배 큰 값인 2.7 mg/g을 갖는 P(AN-co-MA) 기반 MIM이 제조되었으며, 막여과 실험을 통해 라이소자임에 대한 오발부민의 투과선택도를 측정한 결과 MIM은 라이소자임의 선택적 결합력이 우수하였다.

• Korean Chemical Engineering Research
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• 제45권2호
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• pp.149-154
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• 2007

나노임프린트 공정기술은 나노구조물이 패턴된 스템프(혹은 몰드)를 이용하여 적절한 기판 위에 나노구조물을 복제하여 패턴을 전사하는 기술이다. 효과적인 나노임프린트 공정을 위해서는 몰드의 이형처리뿐 아니라 반대쪽의 기질과 레지스트 사이에 접착력 증가(adhesion promoter) 처리가 매우 중요한 역할을 한다. 본 연구에서는 자기조립 실란커플링제의 기상증착을 이용하여 나노임프린트 공정에서 사용되는 접착 증가막 및 표면처리 방법을 비교 분석 하였다. 이를 위해서 평탄화층(DUV-30J), 산소 플라즈마 처리, 실란커플링제 자기조립막이 비교되었다. 실란커플링제 자기조립막이 형성된 실리콘 표면은 전체적으로 나노 두께의 균일한 막이 형성되며 임프린트시 구조물들을 정밀하게 전사하였으며 3-acryloxypropyl methyl dichlorosilane(APMDS)을 이용한 자기조립막(SAMs) 처리가 평탄화층과 산소 플라즈마 처리보다 강한 접착력을 가지고 있어 나노임프린트 공정에 적합함을 알 수 있었다.