• Journal of the Korean Society of Manufacturing Technology Engineers
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• v.18 no.6
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• pp.697-701
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• 2009

A simple method for the fabrication of porous nano-master for the anti-reflection effect on the transparent substrates is presented. In the conventional fabrication methods for antireflective surface, coating method using materials with low refractive index has usually been used. However, it is required to have a high cost and long processing time for mass production. In this paper, we developed a porous nano-master with anti-reflective surface for the molding stamper of the injection mold, hot embossing and UV imprinting by using the aluminum anodizing process. Through two-step anodizing and etching processes, a porous nano-master with anti-reflective surface was fabricated at the large area. Pattern size Pore diameter and inter-pore distance are about 130nm and 200nm, respectively. In order to replicate anti-reflective structure, hot embossing process was performed by varying the processing parameters such as temperature, pressure and embossing time etc. Finally, antireflective surface can be successfully obtained after etching process to remove selectively silicon layer of AAO master.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.10 no.4
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• pp.76-81
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• 2011

UV imprinting process can manufacture high-functional optical components with low cost. If hard polymers can be used as transparent molds at this process, the cost will be much lower. However, there are limited researches to predict the machinability and the burr of hard polymers. Therefore, a new method to predict them by analyzing load-depth curves which can be obtained by the instrumented indentation test was developed in this study. The load-depth curve contains elastic deformation and plastic deformation simultaneously. The ratio of the plastic deformation over the sum of the two deformation is proportional to the ductility of materials which is one of the parameters of the machinability and the burr. The instrumented indentation tests were performed on the transparent molds of the hard polymers and the values of ratio were calculated. The machinability and the burr of three kinds of hard polymers were predicted by the ratio, and the prediction was in agreement with the experimental results from the machined surfaces of the three kinds of hard polymers.

• Korean Journal of Materials Research
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• v.16 no.4
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• pp.225-230
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• 2006

Nanoimprint lithography (NIL) is a novel method of fabricating nanometer scale patterns. It is a simple process with low cost, high throughput and resolution. NIL creates patterns by mechanical deformation of an imprint resist and physical contact process. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting process. Stiction between the resist and the stamp is resulted from this physical contact process. Stiction issue is more important in the stamps including narrow pattern size and wide area. Therefore, the antistiction layer coating is very effective to prevent this problem and ensure successful NIL. In this paper, an antistiction layer was deposited and characterized by PECVD (plasma enhanced chemical vapor deposition) method for metal stamps. Deposition rates of an antistiction layer on Si and Ni substrates were in proportion to deposited time and 3.4 nm/min and 2.5 nm/min, respectively. A 50 nm thick antistiction layer showed 90% relative transmittance at 365 nm wavelength. Contact angle result showed good hydrophobicity over 105 degree. $CF_2$ and $CF_3$ peaks were founded in ATR-FTIR analysis. The thicknesses and the contact angle of a 50 nm thick antistiction film were slightly changed during chemical resistance test using acetone and sulfuric acid. To evaluate the deposited antistiction layer, a 50 nm thick film was coated on a stainless steel stamp made by wet etching process. A PMMA substrate was successfully imprinting without pattern degradations by the stainless steel stamp with an antistiction layer. The test result shows that antistiction layer coating is very effective for NIL.

• Membrane Journal
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• v.31 no.3
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• pp.219-227
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• 2021

Molecularly imprinted membrane (MIM) is a porous polymer membrane incorporating with the molecular recognizing sites. In this study, the supporting P(AN-co-MA) asymmetric membrane was prepared by nonsolvent induced phase separation (NIPS) method. And then, MIM with lysozyme template sites was prepared using the surface imprinting method on the P(AN-co-MA) asymmetric membrane introducing a photoactive iniferter and then photo-grafting. The P(AN-co-MA) asymmetric membrane was modified with 3-chloropropyltrimethoxysilane and dithiocarbamate as a photoactive iniferter. To prepare a lysozyme imprinted membrane, the modified P(AN-co-MA) membrane was copolymerized with acrylamide as a functional momomer, N,N'-methylene bisacrylamide as a crosslinker and lysozyme as a template in the UV irradiation environment. The lysozyme imprinted MIM was analyzed by using SEM, FT-IR and EDS measurements. Its results confirm that all the P(AN-co-MA) membranes have an asymmetric structure and the iniferter group is successfully introduced on the membrane surface. The process parameters were adjusted to obtain MIM having the excellent lysozyme adsorption. The maximum lysozyme adsorption capacity reaches at 2.7 mg/g, which is 13 times higher than that of the non imprinted membrane (NIM). The permselective membrane filtration experiments of ovalbumin to lysozyme show that the P(AN-co-MA) MIM preferentially bounds a greater amount of lysozyme.

• Korean Chemical Engineering Research
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• v.45 no.2
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• pp.149-154
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• 2007

Nanoimprint lithography (NIL) is useful technique because of its low cost and high throughput capability for the fabrication of sub-micrometer patterns which has potential applications in micro-optics, magnetic memory devices, bio sensors, and photonic crystals. Usually, a chemical surface treatment of the stamp is needed to ensure a clean release after imprinting and to protect the expensive original master against contamination. Meanwhile, adhesion promoter between resin and substrate is also important in the nanoscale pattern. In this work, we have investigated the effect of surface treatment using silane coupling agent as release layer and adhesion promoter for UV-Nanoimprint lithography. Uniform SAM (self-assembled monolayer) could be fabricated by vapor deposition method. Vapor phase process eliminates the use of organic solvents and greatly simplifies the handling of the sample. It was also proven that 3-acryloxypropyl methyl dichlorosilane (APMDS) could strongly improve the adhesion force between resin and substrate compared with common planarization layer such as DUV-30J or oxygen plasma treatment.