Deposition of $\alpha$ -Si:H thin films by PECVD method
(플라즈마 화학증착법을 이용한 $\alpha$ -Si:H박막의 제조)
-
- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
- /
- 1991.10a
- /
- pp.63-67
- /
- 1991
-