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http://dx.doi.org/10.6111/JKCGCT.2019.29.3.123

Development of harmful ultraviolet blocking transparent flexible device using TiO2-x thin film process  

Kim, Geug Tae (Department of Advanced Materials and Chemical Engineering, Hannam University)
Publication Information
Journal of the Korean Crystal Growth and Crystal Technology / v.29, no.3, 2019 , pp. 123-131 More about this Journal
Abstract
In this study, the development of transparent UV blocking material using $TiO_{2-x}$ oxide thin film process was developed. A process technology is related to a process technology for making a sample with ultraviolet-shielding property of visible light transmittance of 78 % or more (total light transmittance at 550 nm) and of a UV cut-off characteristic of more than 95 % at 315 nm in ultraviolet wavelength band. In this study, it is possible to establish a flexible device process condition of high performance ultraviolet (UV) shielding thin film, to design mixed type of transparent flexible device with heterogeneous characteristics and to formulate composite deposition technology, according to various market demands. Establishment of actual roll-to-roll continuous process and equipment and process technology will affect related industries greatly.
Keywords
$TiO_{2-x}$; UV blocking material; Plasma process;
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