• Journal of Electrical Engineering and Technology
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• 제6권2호
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• pp.275-279
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• 2011

Sterilization of Escherichia coli (E. coli) is examined using a unique pulsed ultra-violet (UV) elliptical reactor based on Nd:YAG laser resonator, UV radiation from a pulsed xenon flashlamp. The light from the discharge has a broadband emission spectrum extending from the UV to the infrared region with a rich UV contained. Sterilization method by using the UV light is fast, environment-friendly and it does not cause secondary pollution. A Nd:YAG laser resonator having elliptical shape has advantage of concentrating the radiation of the UV light at two foci as the quart sleeve filled with E. coli. The primary objective of this research is to determine the important parameters such as pulse per second (pps), the applied voltage for sterilizing E. coli by using an UV elliptical reactor. From the experiment result, the sterilization effect of UV elliptical reactor is better than that of UV cylindrical reactor, and it can be 99.9% of sterilization at 800V regardless of the pps within 10 minutes.

• 한국정밀공학회지
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• 제24권2호
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• pp.134-139
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• 2007

Usually nanosecond pulsed laser processing of metal is mainly affected by the thermal ablation. Many studies of the theoretical analysis and modeling to predict the laser ablation of metal are suggested on the basis of the photothermal mechanism at higher laser fluence. In this paper, we investigate the etching depth and laser fluence of laser ablation of copper foils and propose the simplified SSB Model(Srinivasan-Smrtic-Babu model) to study the photothermal effect of nanosecond pulsed laser ablation. The experimental results show that the photothermal ablation of the 355nm DPSS $NdYVO_{4}$ laser is useful to process the copper thin foils.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2010년도 춘계학술대회 논문집
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• pp.299-300
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• 2010

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제49권2호
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• pp.103-106
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• 2000

ZnO is a wide-bandgap II-IV semiconductor and has a variety of potnetial applications. ZnO exhibits good piezoelectric, photoelectric and optical properties, and is a good candidate for an electroluminescence device. ZnO films have been deposited on (001) sapphire by PLD technique. Nd:YAG pulsed laser was operated at a wavelength of $\lambda=355nm$. The ZnO films were deposited at oxygen pressures from base to 500 mTorr. The substrate temperatures was increased from $200^{\circ}C\; to\;700^{\circ}C$ films showed strong UV emission by increasing the partial oxygen pressure. We have investigated the relationship between partial oxygen pressure and the intensity of UV emission.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1999년도 추계학술대회 논문집 학회본부 C
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• pp.888-890
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• 1999

ZnO thin films on (001) sapphire substrates have been deposited by pulsed laser deposition using a Nd:YAG laser with the wavelength of 355 nm at an oxygen pressure of 350 mTorr. In order to investigate the effect of the substrate temperature on the properties of ZnO thin films, the experiment has been performed at various substrate temperatures in the range of $200^{\circ}C$ to $700^{\circ}C$. According to XRD, (002) textured ZnO films of high crystalline quality have been obtained by pulsed laser deposition technique. However, the intensity of UV emission is mostly depending on the stoichiometry of ZnO films.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1999년도 추계학술대회 논문집
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• pp.95-98
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• 1999

ZnO thin films on (001) sapphire substrates have been deposited by pulsed laser deposition technique using a Nd:YAG laser with the wavelength of 355 nm. In order to investigate the effect of the deposition conditions on the properties of ZnO thin films at an oxygen pressure of 350 mTorr, the experiment has been Performed at various substrate temperatures in the range of 20$0^{\circ}C$ to $700^{\circ}C$. According to XRD, (002) textured ZnO films of high crystalline quality have been obtained and the intensity of UV emission was the highest at 40$0^{\circ}C$ substrate temperature.

• 한국정밀공학회지
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• 제27권10호
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• pp.29-33
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• 2010

UV laser micromachining of metallic materials has been used in microelectronic and other industries. This paper shows on experimental investigation of micromachining of copper using a 355nm UV laser with 50ns pulse duration. A finite element model with high strain rate effect is especially suggested to investigate the phenomena which are only dominated by mechanically pressure impact in disregard of thermally heat transfer. In order to consider the strain rate effect, Cowper-Symonds model was used. To analyze the dynamic deformation during a very short processing time, which is nearly about several tens nanoseconds, a commercial Finite Element Analysis (FEA) code, LS-DYNA 3D, was employed for the computational simulation of the UV laser micro machining behavior for thin copper material. From these computational results, depth of the dent (from one to six pulsed) were observed and compared with previous experimental results. This will help us to understand interaction between UV laser beam and material.

• 한국산학기술학회논문지
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• 제16권5호
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• pp.2979-2984
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• 2015

본 연구에서는 발포제를 이용하여 형성된 기공을 확대하는 방식의 공정으로써, 선택적 하이브리드 구조의 폴리머 필름의 제작을 위한 새로운 발포기술을 제시하였다. 기존의 발포제만을 이용한 폐쇄형 기공보다 큰 기공을 형성하기 위해서 PP에 발포제와 구리분말(Copper powder)을 혼합하여 만든 필름 내부에 355nm파장의 UV 펄스레이저를 이용하여 LAMO(Laser Aided Micro pore Opening) 공정 방식을 통한 기공의 크기를 확장하는 실험을 진행하였다. 그 결과 발포공정만 수행된 기공의 크기보다 추가적인 LAMO 공정을 통해 형성된 기공의 크기가 훨씬 더 크게 관찰되었다. 본 실험의 결과를 통해 LAMO 공정에 의한 기공의 특성과의 상관관계를 파악할 수 있었으며, 기존의 UV laser를 이용하여 원하는 부위에 선택적으로 폐쇄형 기공을 형성하는 것 이상으로 기공의 크기를 제어하는 방안을 제시하고자 한다.

• 마이크로전자및패키징학회지
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• 제28권4호
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• pp.51-55
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• 2021

본 논문은 보통 병원에서 간호사가 수작업으로 진행하는 약물주입 과정을 대신할 수 있는 의료용 미세 유량 제어 장치를 소개한다. 이는 아두이노로 구현되었으며 환자의 지속적인 관리에 도움이 되고자 한다. 기본적으로 연동펌프를 통해 약물이 주입되며 RGB color sensor를 통해 배출액의 색상을 값으로 받아들이고 이 값을 바탕으로 수액백에 달린 연동펌프의 모터 속도를 조절하는 알고리즘을 아두이노 코딩을 통해 구현한다. 전체적인 시스템은 배터리를 통해 작동되며 연구실에서 355nm UV pulsed laser를 통해 제작한 LIG strain sensor의 추가를 통해 수액백으로부터 주입되는 약물의 양을 측정한다. 이렇게 제작된 미세 유량 제어 장치는 모든 과정을 수작업으로 진행해오던 병원에 곧장 사용 가능하며 간호사의 편의를 제공하고자 한다. 이 장치를 통해 한층 향상된 의료서비스를 제공할 수 있다.

• 한국전기전자재료학회논문지
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• 제14권3호
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• pp.246-250
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• 2001

ZnO thin films for light emission device have been deposited on sapphire and silicon substrates by pulsed laser deposition technique(PLD). A Nd:YAG laser was used with the wavelength of355 nm. In order to investigate the emission properties of ZnO thin films, Pl measurements with an Ar ion laser a light source using an excitation wavelength of 351 nm and a power of 100 mW are used. All spectra were taken at room temperature by using a grating spectrometer and a photomultiplier detector. ZnO exhibited Pl bands centers around 390, 510 and 640 nm, labeled near ultra-violet(UV), green and orange bands. Structural properties of ZnO thin films are analyzed with X-ray diffraction(XRD).