• Tribology and Lubricants
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• v.26 no.5
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• pp.297-302
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• 2010

This study is focused on the resin layer formation of UV imprinting process by changing imprinting pressure and period. The mold shape is made for the process of window open over the pattern transfer area and the imprinting period is assigned as the time just before the UV light curing. The residual layer is measured by changing the imprinting period and pressure magnitude, and the measured data of residual layer provides useful information for the design of the process conditions of imprinting processes.

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2006.05a
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• pp.105-108
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• 2006

It has been issued to fabricate nano-scale patterns with large-scale in the field of digital display. Also, large-scale fabrication technology of nano pattern is very important not only for the field of digital display but also for the most of applications of the nano-scale patterns in the view of the productivity. Among the fabrication technologies, UV nano imprinting process is suitable for replicating polymeric nano-scale patterns. However, in case of conventional UV nano imprinting process using flat mold, it is not easy to replicate large areal nano patterns. Because there are several problems such as releasing, uniformity of the replica, mold fabrication and so on. In this study, to overcome the limitation of the conventional UV nano imprinting process, we proposed a continuous UV nano imprinting process using a pattern roll stamper. A pattern roll stamper that has nano-scale patterns was fabricated by attaching thin metal stamper to a roll base. A continuous UV nano imprinting system was designed and constructed. As practical examples of the process, various nano patterns with pattern size of 500, 150 and 50nm were fabricated. Finally, geometrical properties of imprinted nano patterns were measured and analyzed.

• Journal of the Korean Society for Precision Engineering
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• v.19 no.6
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• pp.176-183
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• 2002

Plasma Display Panel(PDP) is a type of flat panel display utilizing the light emission produced by gas discharge. Barrier Ribs of PDP separating each sub-pixel prevents optical and electrical crosstalks from adjacent sub-pixels. The mold for forming the barrier ribs has been newly researched to overcome the disadvantages of conventional manufacturing processes such as screen printing, sand-blasting and photosensitive glass methods. The mold for PDP barrier ribs have stripes of micro grooves transferring glass-material wall. In this paper , Stripes of grooves of which width 48$\mu$m, depth 124$\mu$m , pitch 274$\mu$m was acquired by machining of single crystal silicon with dicing saw blade. Maximum roughness of the bottom of the grooves was 59.6 nm Ra in grooving Si. Barrier ribs were farmed with silicone rubber mold, which is transferred from grooved Si forming hard mold. Silicone rubber mold has the elasticity, which enable to accommodate the waviness of lower glass plate of PDP. The methods assisted by the microwave and UV was adopted for reducing the forming time of glass paste.

• Journal of the Microelectronics and Packaging Society
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• v.12 no.4 s.37
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• pp.275-280
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• 2005

We propose a new approach to greatly simplify the fabrication of conventional nanoimprint lithography (NIL) by combined nanoimprint and photolithography (CNP). We introduce a hybrid mask mold (HMM) made from UV transparent material with a UV-blocking Cr metal layer placed on top of the mold protrusions. We used a negative tone photo resist (PR) with higher selectivity to substrate the CNP process instead of the UV curable monomer and thermal plastic polymer that has been commonly used in NIL. Self-assembled monolayer (SAM) on HMM plays a reliable role for pattern transfer when the HMM is separated from the transfer layer. Hydrophilic $SiO_2$ thin film was deposited on all parts of the HMM, which improved the formation of SAM. This $SiO_2$ film made a sub-10nm formation without any pattern damage. In the CNP technique with HMM, the 'residual layer' of the PR was chemically removed by the conventional developing process. Thus, it was possible to simplify the process by eliminating the dry etching process, which was essential in the conventional NIL method.

• Polymer(Korea)
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• v.35 no.2
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• pp.141-145
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• 2011

The electron beam (EB) induced curing of a typical resin designed for the hard coating layer of in-mold decoration foils was investigated. The samples were irradiated with different doses of EB and the curing reaction was monitored by Fourier transform infrared (FTIR) spectroscopy. The change in coating properties such as surface hardness and anti-abrasion property was studied as a function of increasing dose. The effect of the addition of nano-particles on the improvement of coating properties was also examined. It was expected that the experimental results could be used for the commercial exploitation of the EB curing system comparable to the ultraviolet (UV) curing system.

• Design & Manufacturing
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• v.9 no.2
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• pp.20-24
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• 2015

Recently, the light guide plate (LGP), a component of the BLU, becomes thinner and larger than ever. In industrial field, specialized injection molding technique is applied to mold the ultra-thin LGP such as a ultra-high speed injection molding. Usually very high melt temperature is used for low viscosity. High injection speed and melt temperature lead to yellowing of LGP. In the present paper a series of injection molding experiment was performed under various injection molding conditions. Yellow index, CIE xy, spectral transmittance of sample were measured using the UV-Visible spectrophotometer. Systematic decrease of spectral transmittance in UV-B range was found as the melt temperature was higher. Yellow index and CIE xy were became higher near the gate location in LGP. From the result of analysis of variance, the main factor to affect for yellow index was mold temperature and that for spectral transmittance(at 315 nm) was melt temperature.

• Journal of Technologic Dentistry
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• v.42 no.3
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• pp.208-212
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• 2020

Purpose: This study aimed to analyze the shrinkage and expansion strain of ultraviolet (UV)-cured resin according to the wavelength of the light source and compare the shrinkage and expansion. Methods: We prepared the mold with according to the ISO 4049 specimen. The size of the circle in the mold was prepared with a height of 6.02 mm and a diameter of 4 mm. UV-curable resin for three-dimensional (3D) printing was injected into the circular mold. The control group was irradiated with a wavelength of 400~405 nm using UV-curing equipment (400 group), and the experimental group was irradiated with a wavelength of 460~465 nm (460 group). Both groups were produced ten specimens. The produced specimen was first measured with a digital micrometer. After the first measurement, the specimen was immersed in a constant temperature water bath for 15 days, after which the second measurement was performed, and the third measurement was taken after 30 days. The measured values were analyzed using the independent sample t-test (α=0.05). Results: In the non-immersion water tank, the contraction was 0.9% in the 400 group and 1.3% in the 460 group. In the constant temperature bath, the expansion was high at -0.4% in the 400 group for 15 days, and the smallest expansion was -0.03% for the 400 group for 30 days. There were significant differences between the two groups (p<0.05). Conclusion: The 400 group had a lower UV resin specimen strain than the 460 group. Therefore, it is recommended to use the wavelength required by the UV-curing resin.

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.917-920
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• 2006

In an attempt to reduce processing cost and to improve resolution of PDPs, micro mold transfer processing route for barrier ribs of plasma display panel was developed. In this study, the parameters that may cause defects during the process were identified, which include the shrinkage during UV curing process, stress due to evaporation of organic components, and sintering shrinkage. Considering such parameters, UV curable paste was developed and barrier ribs of PDPs were successfully processed via the process. In addition, the process was successfully applied for the processing of barrier ribs with embedded counter electrodes.

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2005.05a
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• pp.51-54
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• 2005

Light Guide Plate (LGP) of LCD-BLU(Back Light Unit) is manufactured by forming optical pattern with $5\~100um$ in diameter on the LGP by means of sand blasting or etching method. However, in order to improve the luminance of LCD-LGP, the design of optical pattern has introduced UV inclined-exposure process in this study. This micro-optical pattern, which has asymmetric elliptical column shaped pattern, can change low viewing-angle to high viewing-angle, as well as it contribute to diffusion of light. As a result, this type of micro-optical pattern can introduce the highly luminance. The PR structure obtained in the stage of lithography has asymmetric elliptical column shape and it is processed into a micro-optical pattern. Optical design with this kind of micro-optical pattern, mold fabrication by electroplating and LGP molding with injection molding are under way.

• Transactions of Materials Processing
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• v.16 no.1 s.91
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• pp.42-47
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• 2007

LCD-BLU is one of kernel parts of LCD and it consists of several optical sheets: LGP, light source and mold frame. The LGP of LCD-BLU is usually manufactured by etching process and forming numerous dots with $50\sim300{\mu}m$ diameter on the surface. But the surface of the etched dots of LGP is very rough due to the characteristics of the etching process during the mold fabrication, so that its light loss is high along with the dispersion of light into the surface. Accordingly, there is a limit in raising the luminance of LCD-BLU. In order to overcome the limit of current etched dot patterned LGP, optical pattern with continuous microlens was designed using optical simulation CAE. Also, a mold with continuous micro-lens was fabricated by UV-LiGA reflow process and applied to 7 inch size of navigator LCD-BLU in the present study.