Development of Continuous UV Nano Imprinting Process Using Pattern Roll Stamper

패턴 롤 스템퍼를 이용한 연속 UV 나노 임프린팅 공정기술 개발

  • 차주원 (연세대학교 대학원 기계공학과) ;
  • 안수호 (연세대학교 대학원 기계공학과) ;
  • 한정원 (연세대학교 대학원 기계공학과) ;
  • 배형대 (연세대학교 대학원 기계공학과) ;
  • 명호 (연세대학교 대학원 기계공학과) ;
  • 강신일 (연세대학교 기계공학부)
  • Published : 2006.05.11

Abstract

It has been issued to fabricate nano-scale patterns with large-scale in the field of digital display. Also, large-scale fabrication technology of nano pattern is very important not only for the field of digital display but also for the most of applications of the nano-scale patterns in the view of the productivity. Among the fabrication technologies, UV nano imprinting process is suitable for replicating polymeric nano-scale patterns. However, in case of conventional UV nano imprinting process using flat mold, it is not easy to replicate large areal nano patterns. Because there are several problems such as releasing, uniformity of the replica, mold fabrication and so on. In this study, to overcome the limitation of the conventional UV nano imprinting process, we proposed a continuous UV nano imprinting process using a pattern roll stamper. A pattern roll stamper that has nano-scale patterns was fabricated by attaching thin metal stamper to a roll base. A continuous UV nano imprinting system was designed and constructed. As practical examples of the process, various nano patterns with pattern size of 500, 150 and 50nm were fabricated. Finally, geometrical properties of imprinted nano patterns were measured and analyzed.

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