• Title/Summary/Keyword: UV gel

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Preparation of Au fine particle dispersed $TiO_2$ film by sol-gel and photoreduction process

  • Hyun, Buh-Sng;Kim, Byeong-Il;Kang, Won-Ho
    • Proceedings of the Korea Association of Crystal Growth Conference
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    • 1998.09a
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    • pp.103-111
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    • 1998
  • Au fine particle dispersed TiO2 film was prepared on silica glass substrate by sol-gel dip and firing process. The films were fabricated from the system of titanium tetraisoproxie-EtOh-HCl_H2O-hydrogen tetrachloroaurate(III) tetrahydrate. The conditions for the formation of the clear solution and dissolving high concentration of Au compound were examined. And a photoreduction process was adopted to control the size of gold metal particles. Phase evolution of matrix TiO2 and variation of Au particle with UV irradiation were investigated by XRDA, SEM, TEM and UV-visible spectrophotometer. And the effect of CPCl(Cetylpyridinium chloride monohydrate) as a dispersion agent was evaluated.

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Identification of Mushroom Brown Blotch Causing Agent from Pseudomonas tolaasii Culture Broth (Pseudomonas tolaasii 배양액으로부터 독성물질의 동정)

  • Park, Chul-Jin;Oh, Sung-Ki;Chun, Uck-Han
    • Applied Biological Chemistry
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    • v.37 no.5
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    • pp.392-396
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    • 1994
  • The toxic substance causing blown blotching on the mushroom cap was extracted and purified from the culture broth of P.tolaasii. Purification and identification of the toxic compound was carried out with the silica gel chromatography, mass spectrum and NMR and appeared to be an aminobenzene in amylamine group. The purified toxic substance showed UV spectrum at 234nm and melting point at $76^{\circ}C$, respectively.

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Characterization of UV-damaged repair genes in cells

  • Choi, In-Soon
    • Journal of Life Science
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    • v.10 no.2
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    • pp.50-54
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    • 2000
  • The RAD4 gene of Saccharomyces cerevisiae is essential for the incision step of UV-induced excision repair. A yeast RAD4 gene has been previously isolated by functional complementation. In order to identify the RAD4 homologous gene from fungus Coprinus cinereus, we have constructed cosmid libraries from electrophoretically separated chromosomes of the C. cinereus. The 13 C. cinereus chromosomes were resolved by pulse-field gel electrophoresis, hybridized with S. cerevisiae RAD4 DNA, and then isolated homologous C. cinereus chromosome. Here, we report the cloning and characterization of fungus C. cinereus homolog of yeast RAD4 gene. Southern blot analysis confirmed that C. cinereus contains the sequence homologous DNA to RAD4 gene and this gene exists as a single copy in C. cinereus genome. When total RNA isolated from C. cinereus cells was hybridized with the 3.4 kb BglII DNA fragment of the S. cerevisiae RAD4 gene, a 2.5 kb of transcript was detected. The isolated gene encodes a protein of 810 amino acids.

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Complex Detection Between Transcription Regulator and Promoter DNA by UV Spectroscopic Method

  • Lee, Kyungmin;Gang, Jongback
    • Journal of Integrative Natural Science
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    • v.5 no.3
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    • pp.163-167
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    • 2012
  • UV spectrophotometer was used to detect protein-DNA complex from DNA melting profile under constant temperature increase. Melting temperature (Tm) was $43^{\circ}C$ in copA duplex DNA alone. In the presence of Proteus mirabilis transcription regulator protein (PMTR) protein at 0.2 and 0.4 ${\mu}M$, Tm's were $45{\pm}0.5$ and $47.6{\pm}0.6^{\circ}C$, respectively. According to fluorescence polarization and gel shift assay. PMTR:copA complex was detected by the retarded migration on gel and the dissociation constant ($K_d$) was $(9.2{\pm}2.8){\times}10^{-9}M$.

SHRINKAGE OF VITREOUS BODY CAUSED BY HYDROXYL RADICAL

  • Park, Myoung-Joo;Shimada, Takashi;Matuo, Yoichirou;Akiyama, Yoko;Izumi, Yoshinobu;Nishijima, Shigehiro
    • Journal of Radiation Protection and Research
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    • v.33 no.4
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    • pp.143-150
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    • 2008
  • In this study, we examined the effect of hydroxyl radical generated by $\gamma$-ray and UV irradiation on shrinkage of vitreous body. Change in gel ratio of vitreous body and change in the properties of its components (collagen, sodium hyaluronate) were analyzed. By comparing these results, the amount of hydroxyl radical, which induces the considerable shrinkage of vitreous body, was evaluated from theoretical calculation based on experimental condition and some reported kinetic parameters. It was concluded that the integrated amount of hydroxyl radical required to liquefy half of the vitreous body (Vitreous body gel ratio = 50%) was estimated as $140\;{\mu}molg^{-1}$ from $\gamma$-ray irradiation experiment. Also, from UV irradiation experiment result, it was confirmed that the effect of hydroxyl radical is larger than that of other reactive species. The causes of shrinkage of vitreous body are supposed as follows, 1) decrease in viscosity by cleavage of glycoside bond in sodium hyaluronate, 2) leaching of collagen from vitreous body and 3) leaching of crosslinked products and scission products of collagen.

Crystal Structure and Superhydrophilic Property of $TiO_2$ Thin Film Coated on Si(100) Wafer (Si(100) 기판 위에 코팅된 $TiO_2$박막의 결정구조와 초친수 특성)

  • 김사라;조운조;박재관;이용철
    • Korean Journal of Crystallography
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    • v.12 no.3
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    • pp.177-181
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    • 2001
  • We have studied superhydrophilic properties of TiO₂thin films in relation with those crystal structures due to the heat treatments. Thin films were fabricated on Si (100) wafers using a conventional Sol-Gel method. Following drying and sintering processes, TiO₂film had an anatase phase with additional heat treatment at 500℃, an rutile phase at 1000℃, and a mixture of anatase and rutile phase at 750℃. All these films got hydrophilic even without any UV illumination. Especially the sample treated at 750℃ had a superhydrophilic contact angle of 5°. We suggested that the superhydrophilic films should have a mixture of anatase and rutile phase for the best performance. The hydrophilic TiO₂films were slowly degraded into the hydrophobic state in the dark room but quickly recovered back with les than 1 hour of UV illumination.

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The Improvement of Thermal Stability and Tensile Toughness by the Photocrosslinking of Poly(phenylene sulfide) containing Acetophenone (아세토페논을 함유한 Poly(phenylene sulfide)의 광가교에 의한 내열성과 인장인성 강화)

  • Jang, Yong-Joon;Jang, Jinho
    • Textile Coloration and Finishing
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    • v.24 no.4
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    • pp.281-287
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    • 2012
  • Poly(phenylene sulfide) films containing acetophenone as a photoinitiator were photocrosslinked under UV irradiation using a continuous UV irradiator. The gel fraction of the irradiated PPS in 1-Chloro naphthalene reached 94.7% with increasing UV energy and the photoinitiator concentration in the film upto $200J/cm^2$ and 12wt% respectively. Solid state $^1C$ NMR analysis suggested that the crosslinking occurred between the phenylene chains in PPS, indicating that the acetophenone may the phenylene hydrogens and subsequently adjacent polymer radicals could be recombined to form the crosslinked structure. The crosslinking improved the thermal behavior of PPS such as loss of $T_g$ and $T_c$, higher melting point and lower melting enthalphy as well as significantly higher peak pyrolysis temperature as much as $63.5^{\circ}C$. Surprisingly the tensile toughness of the most crosslinked PPS increased by 842%, resulting from the substantial enhancements in tensile modulus, strength and strain as much as 76%, 236% and 240% respectively. Also dynamic mechanical measurement indicated that the distance between crosslinks in the crosslinked PPS reached 85.3 g/mol corresponing to a crosslink density of 0.012 mol/g.

Preparation of Monodispersed $SiO_2/ZnO$ Composite Fine Powders by Sol-Gel Method (졸-겔법엔 의한 단분산 $SiO_2/ZnO$ 복합미립자의 졔조)

  • Lee, Chang-Woo;Shim, Won;Hahm, Yeong-Min;Hur, Yun-Haeng
    • Journal of environmental and Sanitary engineering
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    • v.13 no.3
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    • pp.58-65
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    • 1998
  • Monodispersed $SiO_2/ZnO$ composite fine powders were prepared by Sol-Gel processing and their surface electrical and UV absorbance properties were investigated. Pseudomorph ZnO fine powders were microcapsuled by $SiO_2/ZnO$ sol fabricated using TEOS[tetraethylorthosilicate, purity 98% and ethanol as a solvent with $NH_3$ catalyst. The effects of experimental parameters such as molar ratio of starting materials on the final particle size and shape of $SiO_2/ZnO$ composite fine powder were discussed. As a result, we could controlled the size of monodispersed $SiO_2/ZnO$ composite fine powders without agglomeration, as well as the good dispersibility in aquous solution. The prepared powders were observed to have the mean particle sizes of $0.26-0.78{\mu}m$ with standard deviations of $0.020-0.063{\mu}m$.

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Expression of Poly (ADP-ribose) Polymerase During Apoptosis Induced by Ultraviolet Radiation in HeLa $S_3$ Cells

  • Chang, Jeong-Hyun;Kwon, Heun-Young
    • Biomedical Science Letters
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    • v.12 no.4
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    • pp.349-354
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    • 2006
  • Induction of apoptosis allows the organism to get rid of abnormal cells and also of tumor cells. Understanding the mechanism involved in Ultraviolet radiation (UV) induced apoptosis may improve its therapeutic efficacy. In this study, we present expression of poly (ADP-ribose) polymerase (PARP) during apoptosis induced by UV in HeLa $S_3$ cells. Four different assays were performed in this study: morphological assessment of apoptotic cells and cell viability, DNA fragmentation analysis by agarose gel electrophoresis, quantitative assay of fragmented DNA, and expression of PARP by the western blot analysis. The percentages of apoptotic HeLa $S_3$ cells irradiated with $75J/m^2$ UV was increased continuously from 3 hrs incubation. DNA ladder pattern was appeared at 6 hrs. The amount of nucleosomal DNA fragments in cells treated UV increased from 3 to 12 hrs incubation and gradually decreased. The cleavage of PARP in HeLa $S_3$ cells irradiated with UV was induced, and the cleavage of PARP was more delayed in the cells pretreated with $5J/m^2$ UV and subsequently irradiated with $75J/m^2$ UV. than that in the cells only irradiated with $75J/m^2$ UV. Thus these data suggest that the cleavage of PARP relates with DNA fragmentation associated with apoptosis.

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UV-curing Behaviors and Mechanical Properties of UV-cured Polylactic Acid (PLA)

  • Lee, Seung-Woo;Park, Ji-Won;Park, Cho-Hee;Kim, Hyun-Joong;Eom, Young-Geun
    • Journal of the Korean Wood Science and Technology
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    • v.41 no.2
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    • pp.134-140
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    • 2013
  • UV curing was introduced via a chemical treatment by adding small amounts of a hexafunctional acrylic monomer and a photoinitiator to improve the mechanical properties of PLA. This study also employed a semi-interpenetrated structured polymer network through the process of UV-curing. The UV curing behaviors were investigated using FTIR-ATR spectroscopy and gel fraction determination. Also, the tensile strength was investigated with different hexafunctional acrylic monomer contents and UV doses. The results showed that the crosslinking of UV-induced chemically treated PLA started at a low content of hexafunctional acrylic monomer, resulting in a significant improvement of the mechanical properties compared to those of neat PLA due to crosslinking.