• 대한화학회지
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• 제49권3호
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• pp.292-299
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• 2005

• 폴리머
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• 제29권4호
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• pp.418-421
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• 2005

본 연구에서는 나노/마이크로 소자 및 MEMS 제작에 활용가능하고 또한 수십 마이크로미터 크기의 3차원 곡면을 가진 형상을 제작하기 유리한 이광자 광중합을 이용한 다중조사 복셀 매트릭스 스캐닝법(multi-exposure voxel matrix scanning method)에 의한 나노 복화공정을 개발하였다. 이 공정을 통하여는 높이에 따라 14가지의 색을 가진 등고선으로 표현된 3차원 자유곡면 형상을 적층방식이 아닌 단일 층으로 3차원으로 제작할 수 있다. 여기서 수광각도가 1.25인 집광렌즈를 사용하여 레이저의 조사시간에 따라 1.2 um에서 6.4 um까지 변하는 복셀의 높이 차이를 이용하여 3차원 곡면 제작이 가능하다. 본 연구의 유용성을 검토하기 위하여 몇 가지 3차원 곡면형상을 초미세 입체 패터닝 공정에서 사용하는 일반적인 적층방식을 사용하지 않고 단층으로 제작하여 시간을 단축하였다.

• 대한기계학회논문집A
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• 제28권7호
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• pp.999-1005
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• 2004

A new stamp fabrication technique for the soft lithography has been developed in the range of several microns by means of a nano-replication printing (nRP) process. In the nRP process, a figure or a pattern can be replicated directly from a two-tone bitmap figure with nano-scale details. A photopolymerizable resin was polymerized by the two-photon absorption which was induced by a femtosecond laser. After the polymerization of master patterns, a gold metal layer (about 30 ㎚ thickness) was deposited on the fabricated master patterns for the purpose of preventing a join between the patterns and the PDMS, then the master patterns were transferred in order to fabricate a stamp by using the PDMS (poly-dimethylsiloxane). In the transferring process, a few of gold particles, which were isolated from the master patterns, remained on the PDMS stamp. A gold selective etchant, the potassium iodine (KI) was employed to remove the needless gold particles without any damage to the PDMS stamp. Through this work, the effectiveness of the nRP process with the PDMS molding was evaluated to make the PDMS stamp with the resolution of around 200 ㎚.

• 한국정밀공학회지
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• 제21권6호
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• pp.160-166
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• 2004

In this study, a new algorithm, named as Contour Offset Algorithm(COA) is developed to fabricate precise features or patterns in the range of several micrometers by nano replication printing(nRP) process. In the nRP process, a femto-second laser is scanned on a photosensitive monomer resin in order to induce polymerization of the liquid monomer according to a voxel matrix which is transformed from the bitmap format file. After polymerization, a droplet of ethanol is dropped to remove the unnecessary remaining liquid resin and then only the polymerized figures with nano-scaled precision are remaining on the glass plate. To obtain more precise replicated features, the contour lines in voxel matrix should be modified considering a voxel size. In this study, the efficiency of the proposed method is shown through two examples in view of accuracy.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2003년도 추계학술대회 논문요약집
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• pp.41-41
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• 2003

• 한국광학회:학술대회논문집
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• 한국광학회 2004년도 하계학술발표회
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• pp.188-189
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• 2004

• 한국정밀공학회지
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• 제22권10호
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• pp.17-25
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• 2005

• 한국정밀공학회지
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• 제26권8호
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• pp.119-125
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• 2009

Fabrication of a three-dimensional (3D) metallic mold for multi-production of a microstructure was studied to settle the problem of long processing time in 3D microfabrication. To date, complicated 3D microstructures including 3D photonic crystals, 3D microlens array, 3D filter for microfludics, and something else were created successfully using the two-photon polymerization (TPP) which was considered as paving the way to fabricate a real 3D shape in nano/microscale. However, for those fabrications, much processing time and efforts were inevitably required. To solve this issue, a simple and effective way was proposed in this paper; 3D master patterns were prepared using TPP, and then counter-shaped Ni molds were fabricated by electroforming process. By using these molds, 3D microstructures can be reproduced with short-processing time and low-effort comparing to the conventional approach, TPP We report some parameters to fabricate a metallic mold precisely.

• 한국정밀공학회지
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• 제23권3호
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• pp.156-162
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• 2006

Direct fabrication of nano patterns has been studied employing a nano-stereolithography (NSL) process. The needs of nano patterning techniques have been intensively increased for diverse applications for nano/micro-devices; micro-fluidic channels, micro-molds. and other novel micro-objects. For fabrication of high-aspect-ratio (HAR) patterns, a thick spin coating of SU-8 process is generally used in the conventional photolithography, however, additional processes such as pre- and post-baking processes and expansive precise photomasks are inevitably required. In this work, direct fabrication of HAR patterns with a high spatial resolution is tried employing two-photon polymerization in the NSL process. The precision and aspect ratio of patterns can be controlled using process parameters of laser power, exposure time, and numerical aperture of objective lens. It is also feasible to control the aspect ratio of patterns by truncation amounts of patterns, and a layer-by-layer piling up technique is attempted to achieve HAR patterns. Through the fabrication of several patterns using the NSL process, the possibility of effective patterning technique fer various N/MEMS applications has been demonstrated.

• 한국정밀공학회지
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• 제24권12호
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• pp.136-142
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• 2007

Precise fabrication of three-dimensional (3D) self-standing microstructures on thin glass plates via two-photon induced polymerization (TPP) has been an important issue for innovative 3D nanodevices and microdevices. However, there are still issues remaining to be solved, such as building 3D microstructures on opaque materials via TPP and being able to implant them as functional parts onto practical systems. To settle these issues simply and effectively, we propose a contact print lithography (CPL) method using an ultraviolet (UV)-curable polymer layer. We report some of the possibilities and potential of CPL by presenting our results for transplanting 3D microstructures onto large-area substrates and also our examination of some of the effects of the process parameters on successful transplantation.