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Development of Contour Offset Algorithm(COA) in nRP Process for Fabricating Nano-precision Features  

임태우 (한국과학기술원 기계공학과 대학원)
박상후 (한국과학기술원 기계공학과 대학)
양동열 (한국과학기술원 기계공학)
이신욱 (한국과학기술원 물리학과 대학)
공홍진 (한국과학기술원 물리학과)
Publication Information
Journal of the Korean Society for Precision Engineering / v.21, no.6, 2004 , pp. 160-166 More about this Journal
Abstract
In this study, a new algorithm, named as Contour Offset Algorithm(COA) is developed to fabricate precise features or patterns in the range of several micrometers by nano replication printing(nRP) process. In the nRP process, a femto-second laser is scanned on a photosensitive monomer resin in order to induce polymerization of the liquid monomer according to a voxel matrix which is transformed from the bitmap format file. After polymerization, a droplet of ethanol is dropped to remove the unnecessary remaining liquid resin and then only the polymerized figures with nano-scaled precision are remaining on the glass plate. To obtain more precise replicated features, the contour lines in voxel matrix should be modified considering a voxel size. In this study, the efficiency of the proposed method is shown through two examples in view of accuracy.
Keywords
Femto-second Laser; Two-photon Polymerization; Nano Replication Printing Process; Contour Offset Algorithm;
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