• Title/Summary/Keyword: Tunneling mechanism

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Characterization of the Schottky Barrier Height of the Pt/HfO2/p-type Si MIS Capacitor by Internal Photoemission Spectroscopy (내부 광전자방출 분광법을 이용한 Pt/HfO2/p-Si Metal-Insulator-Semiconductor 커패시터의 쇼트키 배리어 분석)

  • Lee, Sang Yeon;Seo, Hyungtak
    • Korean Journal of Materials Research
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    • v.27 no.1
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    • pp.48-52
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    • 2017
  • In this study, we used I-V spectroscopy, photoconductivity (PC) yield and internal photoemission (IPE) yield using IPE spectroscopy to characterize the Schottky barrier heights (SBH) at insulator-semiconductor interfaces of Pt/$HfO_2$/p-type Si metal-insulator-semiconductor (MIS) capacitors. The leakage current characteristics of the MIS capacitor were analyzed according to the J-V and C-V curves. The leakage current behavior of the capacitors, which depends on the applied electric field, can be described using the Poole-Frenkel (P-F) emission, trap assisted tunneling (TAT), and direct tunneling (DT) models. The leakage current transport mechanism is controlled by the trap level energy depth of $HfO_2$. In order to further study the SBH and the electronic tunneling mechanism, the internal photoemission (IPE) yield was measured and analyzed. We obtained the SBH values of the Pt/$HfO_2$/p-type Si for use in Fowler plots in the square and cubic root IPE yield spectra curves. At the Pt/$HfO_2$/p-type Si interface, the SBH difference, which depends on the electrical potential, is related to (1) the work function (WF) difference and between the Pt and p-type Si and (2) the sub-gap defect state features (density and energy) in the given dielectric.

Direct observation of delocalized exciton state in Ta2 NiSe5: direct evidence of the excitonic insulator state

  • Lee, Jin-Won;Gang, Chang-Jong;Eom, Man-Jin;Kim, Jun-Seong;Min, Byeong-Il;Yeom, Han-Ung
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.125.1-125.1
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    • 2016
  • The excitonic insulator (EI), which is one of fundamental insulators, was theoretically proposed in 1967 but its material realization has not been established well. Only a few materials were proposed as EIs but their experimental evidences were indirect such as the renormalization of band dispersions or an anomaly in electrical resistivity. We conducted scanning tunneling microscopy / spectroscopy measurements and found out that $Ta_2$ $NiSe_5$, which was the most recently proposed as an EI, had a metal-insulator phase transition with the energy gap of 700 meV at 78 K. Moreover, the spatially delocalized excitonic energy level was observed within the energy gap, which could be the direct evidence of the EI ground state. Our theoretical model calculation with the order parameter of 150 meV reproduces the spectral function and the excitonic energy gap very well. In addition, experimental data shows that the band character is inverted at the valence and conduction band edges by the exciton formation, indicating that the mechanism of exciton condensation is similar to the Bardeen-Cooper-Schrieffer (BCS) mechanism of cooper pairs in superconductors.

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Analysis of Flat-Band-Voltage Dependent Breakdown Voltage for 10 nm Double Gate MOSFET

  • Jung, Hakkee;Dimitrijev, Sima
    • Journal of information and communication convergence engineering
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    • v.16 no.1
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    • pp.43-47
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    • 2018
  • The existing modeling of avalanche dominated breakdown in double gate MOSFETs (DGMOSFETs) is not relevant for 10 nm gate lengths, because the avalanche mechanism does not occur when the channel length approaches the carrier scattering length. This paper focuses on the punch through mechanism to analyze the breakdown characteristics in 10 nm DGMOSFETs. The analysis is based on an analytical model for the thermionic-emission and tunneling currents, which is based on two-dimensional distributions of the electric potential, obtained from the Poisson equation, and the Wentzel-Kramers-Brillouin (WKB) approximation for the tunneling probability. The analysis shows that corresponding flat-band-voltage for fixed threshold voltage has a significant impact on the breakdown voltage. To investigate ambiguousness of number of dopants in channel, we compared breakdown voltages of high doping and undoped DGMOSFET and show undoped DGMOSFET is more realistic due to simple flat-band-voltage shift. Given that the flat-band-voltage is a process dependent parameter, the new model can be used to quantify the impact of process-parameter fluctuations on the breakdown voltage.

Electrical properties of sputtered vanadium oxide thin films in Al/$VO_x$/Al device structure (Al/$VO_x$/Al 소자 구조에서 스퍼터된 바나듐 산화막의 전기적 특성)

  • 박재홍;최용남;최복길;최창규;김성진
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.460-463
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    • 2000
  • The current-voltage characteristics of the sandwich system at different annealing temperatures and different bias voltages have been studied. In order to prepare the Al/V$O_X$/Al sandwich devices structure, thin films of vanadium oxide(V$O_X$) was deposited by r.f. magnetron sputtering from $V_2$$O_5$ target in 10% gas mixture of argon and oxygen, and annealed during lhour at different temperatures in vacuum. Crystall structure, surface morphology, and thickness of films were characterized through XRD, SEM and I-V characteristics were measured by electrometer. The films prepared below 20$0^{\circ}C$ were amorphous, and those prepared above 300 $^{\circ}C$were polycrystalline. At low fields electron injected to conduction band of vanadium oxide and formed space charge, current was limited by trap. Conduction mechanism at mid fields due to Schottky emission, while at high fields it changed to Fowler-Nordheim tunneling effects.

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Study on the electrical properties in the ceramic of (Sr¡¤Ca)Ti${O}_{2}$ system ((Sr.Ca)Ti${O}_{3}$계 세라믹의 전기적 특성에 관한 연구)

  • 최운식;김용주;이준웅
    • The Transactions of the Korean Institute of Electrical Engineers
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    • v.44 no.12
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    • pp.1610-1616
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    • 1995
  • The (Sr$_{1-x}$ .Ca$_{x}$)TiO$_{3}$(0.05.leq.x.leq.0.2) ceramics were fabricated to form semiconducting ceramics by sintering at about 1350[.deg. C] in a reducing atmosphere (N$_{2}$ gas). After being fired in a reducing atmosphere, metal oxides, CuO, was painted on the both surface of the specimens to diffuse to the grain boundary. They were annealed at 1100[.deg. C] for 2 hours. The 2nd phase formed by thermal diffusing from the surface lead to a very high apparent dielectric constant. The results of the capacitance-valtage measurements indicated that the grain boundary was composed of the continuous insulating layers. The capacitance is almost unchanged below about 20[V], but decreased slowly over 20[V]. The conduction mechanism of the specimens observed in the temperature range of 25~125[.deg. C], and is divided into three regions having different mechanism as the current increased: the region I below 200[V/cm] shows the ohmic conduction. The region II between 200[V/cm] and 2000[V/cm] can be explained by the Poole-Frenkel emission theory, and the region III above 2000[V/cm] is dominated by the tunneling effect.ct.

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A study of mechanism and numerical analysis of PNT method (PNT공법에 대한 원리 및 수치해석적인 연구)

  • Chae, Sung-Eun;Seo, Dong-Hyun;Im, Gi-Woon;Chun, Sung-Yul;Kim, Sang-Hwan
    • Journal of Korean Tunnelling and Underground Space Association
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    • v.12 no.1
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    • pp.95-103
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    • 2010
  • In this paper, a new soft ground tunneling technique termed the PNT method(Pre-Nailed Tunneling Method) is studied. Mechanism of the method is investigated in terms of theoretical and numerical approaches. The pre-nailing effects are validated by performing two dimensional numerical analyses. It is identified that the method is successful in soft grounds, and greatly efficient in reducing the ground deformation by nailing the ground. To develop the design guidelines of the method, numerical parametric analyses on the installation range and angle were also carried out.

Effect of tunneling under a bridge on pile foundation behavior mechanism (교량 직하부에 시공되는 터널에 의한 말뚝기초의 거동변화)

  • Choi, Go-Ny;Woo, Seung-Je;Yoo, Chung-Sik
    • Journal of Korean Tunnelling and Underground Space Association
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    • v.13 no.1
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    • pp.51-69
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    • 2011
  • This paper presents the effect of tunneling on bridge pile foundation being operated using three-dimensional numerical modeling. Also the parametric study on the depth of tunnel of which the diameter was 10 m was carried out in order to evaluate the behaviors of pile foundation due to the tunnel excavation. This paper expresses the changes of vertical and horizontal displacement, movement of soil and stress of the pile. Based on the results obtained from the numerical analysis some insights into the changes of pile foundation behaviors due to variations of tunneling location were mentioned and discussed.

Investigation on Tunneling and Groundwater Interaction Using a 3D Stress-pore Pressure Coupled Analysis (응력-간극수압 3차원 연계해석을 통한 터널굴착과 지하수의 상호작용 고찰)

  • 유충식
    • Journal of the Korean Geotechnical Society
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    • v.20 no.3
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    • pp.33-46
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    • 2004
  • This paper presents the effect of groundwater on tunnel excavation. Fundamental issues in tunneling under high groundwater table are discussed and the effect of groundwater on tunnel excavation was examined using a 3D stress-pore pressure coupled finite-element analysis. Based on the results the interaction mechanism between the tunnelling and groundwater is identified for cases having different lining permeabilities. Examined items include pore pressures around lining and lining stresses. Face deformation behavior as well as ground surface movement patterns was also examined. Besides, the effect of grouting pattern was investigated. The results indicated that the effect of groundwater on tunnel excavation increases lining stresses as well as ground movements, and that the tunnel excavation and groundwater interaction can only be captured through a fully coupled analysis. Implementations of the findings from this study are discussed in great detail.

The Implementation of an IPv4 over IPv6 Tunnel of the DSTM for Next-Generation Internet Service (차세대 인터넷 서비스를 위한 DSTM의 IPv4 over IPv6 터널 구현)

  • Lee, Seung-Min;Min, Sang-Won;Kim, Yong-Jin
    • The Journal of The Korea Institute of Intelligent Transport Systems
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    • v.7 no.1
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    • pp.75-83
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    • 2008
  • In this paper, we propose an efficient algorithm that assigns single temporary IPv4 address and port number to improve efficiency of IPv4 address that is allocated in DSTM service. And, we have analyzed the elementary functions for DSTM and have designed the functional modules. Also, we have implemented the DTI interface for encapsulation and decapsulation of IPv6 packets. The performance analysis and comparison are investigated whether the appropriate interworking service is possible or not. Our observation results show that the performance of IPv4 over IPv6 tunneling is suitable to DSTM service due to the reduction of delay by eliminating checksum calculations in the header of IPv6 tunneling.

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Effect of the Temperature on Resistivity of Carbon Black-Polyethylene Composites Below and Above Percolation Threshold (Carbon Black-Polyethylene복합재료의 Percolation Threshold 전후 저항율에 미치는 온도의 영향)

  • Shin, Soon-Gi
    • Korean Journal of Materials Research
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    • v.19 no.12
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    • pp.644-648
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    • 2009
  • Temperature dependency of resistivity of the carbon black-polyethylene composites below and above percolation threshold is studied based on the electrical conduction mechanism. Temperature coefficient of resistance of the composites below percolation threshold changed from minus to plus, increasing volume fraction of carbon black; this trend decreased with increasing volume fraction of carbon black. The temperature dependence of resistivity of the composites below percolation threshold can be explained with a tunneling conduction model by incorporating the effect of thermal expansion of the composites into a tunneling gap. Temperature coefficient of resistance of the composites above percolation threshold was positive and its absolute value increased with increasing volume fraction of carbon black. By assuming that the electrical conduction through percolating paths is a thermally activated process and by incorporating the effect of thermal expansion into the volume fraction of carbon black, the temperature dependency of the resistivity above percolation threshold has been well explained without violating the universal law of conductivity. The apparent activation energy is estimated to be 0.14 eV.