• Title/Summary/Keyword: Transparent Layer

Search Result 683, Processing Time 0.027 seconds

Improvement of Efficiency of Cu(Inx,Ga1-x)Se2 Thin Film Solar Cell by Enhanced Transparent Conductive Oxide Films (투명 전도막 개선을 통한 Cu(Inx,Ga1-x)Se2 박막태양전지 효율 향상에 관한 연구)

  • Kim, Kilim;Son, Kyeongtae;Kim, Minyoung;Shin, Junchul;Jo, Sunghee;Lim, Donggun
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.27 no.4
    • /
    • pp.203-208
    • /
    • 2014
  • In this study, Sputtering method was used to grow Al-dopes ZnO films on a CIGS absorber layer, in order to examine the effect of TCO on properties of CIGS solar cell devices. Structural, electrical and optical properties were investigated by varied thickness of Al-dopes ZnO films. Also, relation to the application as a window layer in CIGS thin film solar cell were studied. It was found that the electrical and structural properties of ZnO:Al film improved with increasing its thickness. However, the optical properties degraded. Jsc of the fabricated CIGS based solar cells was significantly influenced by the variation of the ZnO:Al window layer thickness. Because ZnO:Al window layer is one of the Rs factors in CIGS solar cell. Rs has the biggest influence on efficiency characteristic. In order to obtain high efficiency of CIGS solar cell, ZnO:Al window layer should be fabricated with electrically and optically optimized.

Antistatic Behavior of UV-curable Multilayer Coating Containing Organic and Inorganic Conducting Materials (유·무기 전도성 물질을 함유한 UV 경화형 다층 코팅의 대전방지 특성)

  • Kim, Hwa-Suk;Kim, Hyun-Kyoung;Kim, Yang-Bae;Hong, Jin-Who
    • Journal of Adhesion and Interface
    • /
    • v.3 no.3
    • /
    • pp.22-29
    • /
    • 2002
  • UV curable coating system described here consists of double layers, namely under layer and top laser coatings. The former consists of organic-inorganic conductive materials and the latter consists of multifunctional acrylates. Transparent double layer coatings were prepared on the transparent substrates i.e. PMMA, PC, PET etc. by the wet and wet coating procedure. Their surface resistances and film properties were measured as a function of the top layer thickness and relative humidity. As the thickness of the top layer was less than $10{\mu}m$, the surface resistance in the range of $10^8{\sim}10^{10}{\Omega}/cm^2$ was obtained. The surface properties of the two-layer coating were remarkably improved compared with the single layer coating. The effects of migration of conducting materials on the film properties of multilayer coating were investigated by using contact angle and Fourier transform infrared/attenuated total reflection(FT-IR/ATR). It was found that the migration of dopant(dodecyl benzenesulfonic acid, DBSA) molecules were occurred from film-substrate interface to film-air interface in the organic conductive coating system but not in the inorganic one.

  • PDF

Characterization of ZnO Thin Films Grown by Pulsed Laser Deposition for Channel Layer of Transparent TFTs (펄스 레이저 증착법으로 성장된 투명 TFTs 채널층을 위한 ZnO 박막 분석)

  • Lee, Won-Yong;Kim, Ji-Hong;Roh, Ji-Hyoung;Cho, Dae-Hyung;Moon, Byung-Moo;Koo, Sang-Mo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2008.11a
    • /
    • pp.77-78
    • /
    • 2008
  • ZnO thin films were deposited on glass substrates by pulsed laser deposition (PLD) at various oxygen pressures. We observed structural, electrical and optical properties of ZnO films. Structural properties were analysed by XRD and FE-SEM. Electrical properties for applications of transparent thin film transistors (TTFTs) were measured by hall measurement using van der pauw methods at room temperature. In order to apply in transparent devices, we measured transmittance, and optical bandgap energy was calculated by Tauc's equation. The results showed that ZnO films deposited at 200mTorr oxygen pressure were applicable to channel layers of transparent TFTs. It had high hall mobilities ($52.92cm^2$/V-s) and suitable transmittance at visible wavelength region (above 80%).

  • PDF

Transparent Conducting Multilayer Electrode (GTO/Ag/GTO) Prepared by Radio-Frequency Sputtering for Organic Photovoltaic's Cells

  • Pandey, Rina;Kim, Jung Hyuk;Hwang, Do Kyung;Choi, Won Kook
    • Journal of Sensor Science and Technology
    • /
    • v.24 no.4
    • /
    • pp.219-223
    • /
    • 2015
  • Indium free consisting of three alternating layers GTO/Ag/GTO has been fabricated by radio-frequency (RF) sputtering for the applications as transparent conducting electrodes and the structural, electrical and optical properties of the gallium tin oxide (GTO) films were carefully studied. The gallium tin oxide thin films deposited at room temperature are found to have an amorphous structure. Hall Effect measurements show a strong influence on the conductivity type where it changed from n-type to p-type at $700^{\circ}C$. GTO/Ag/GTO multilayer structured electrode with a few nm of Ag layer embedded is fabricated and show the optical transmittance of 86.48% in the visible range (${\lambda}$ = 380~770 nm) and quite low electrical resistivity of ${\sim}10^{-5}{\Omega}cm$. The resultant power conversion efficiency of 2.60% of the multilayer based OPV (GAG) is lower than that of the reference commercial ITO. GTO/Ag/GTO multilayer is a promising transparent conducting electrode material due to its low resistivity, high transmittance, low temperature deposition and low cost components.

Transparent Phosphorus Doped ZnO Ohmic Contact to GaN Based LED

  • Lim, Jae-Hong;Park, Seong-Ju
    • Korean Journal of Materials Research
    • /
    • v.19 no.8
    • /
    • pp.417-420
    • /
    • 2009
  • This study develops a highly transparent ohmic contact using phosphorus doped ZnO with current spreading for p-GaN to increase the optical output power of nitride-based light-emitting diodes (LEDs). The phosphorus doped ZnO transparent ohmic contact layer was prepared by radio frequency magnetron sputtering with post-deposition annealing. The transmittance of the phosphorus doped ZnO exceeds 90% in the region of 440 nm to 500 nm. The specific contact resistance of the phosphorus doped ZnO on p-GaN was determined to be $7.82{\times}10^{-3}{\Omega}{\cdot}cm^2$ after annealing at $700^{\circ}C$. GaN LED chips with dimensions of $300\times300{\mu}m$ fabricated with the phosphorus doped ZnO transparent ohmic contact were developed and produced a 2.7 V increase in forward voltage under a nominal forward current of 20 mA compared to GaN LED with Ni/Au Ohmic contact. However, the output power increased by 25% at the injection current of 20 mA compared to GaN LED with the Ni/Au contact scheme.

Au-Ag Core Shell Nanowire Network for Highly Stretchable and Transparent Supercapacitor Applications (금-은 코어쉘 나노 와이어 제조 및 투명, 유연 슈퍼캐패시터 전극으로의 활용에 관한 연구)

  • Lee, Ha-Beom;Gwon, Jin-Hyeong;Jo, Hyeon-Min;Eom, Hyeon-Jin;Go, Seung-Hwan
    • Proceedings of the Korean Institute of Surface Engineering Conference
    • /
    • 2016.11a
    • /
    • pp.183.1-183.1
    • /
    • 2016
  • Due to the latest research trend toward wearable energy devices, transparent and stretchable supercapacitors which can sustain their performance even under physical deformation have steadily attracted huge attention. Despite the Ag NW is the most promising candidate for fabrication of transparent and stretchable electronics, the electrochemical instability interrupts its application to development of the energy device. Here, we introduce a transparent and highly stretchable supercapacitor made by Au-Ag core shell NW network percolation electrode. The Au-Ag core shell NW synthesized by a simple solution process not only shows excellent electrical conductivity but also greatly enhanced chemical and electrochemical stability compare to pristine Ag NW. These outstanding properties of the Au-Ag core shell NW are attributed both to the core Ag NW and the Au protecting sheath layer. The proposed Au-Ag core shell NW based supercapacitor exhibits optical transmittance with outstanding mechanical stability withstanding 60% strain without any decrease of the performance. The supercapacitors connected in series are charged and discharged stable in 30% strain turning on a red LED. These notable results demonstrate the potential of the Au-Ag core shell NW as a strong candidate for development of wearable energy devices.

  • PDF

A Study on the Electrode formation of an Organic EL Devices using the RF Plasma (RF 플라즈마를 이용한 유기 EL 소자의 전극형성에 관한 연구)

  • 이은학
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.17 no.2
    • /
    • pp.228-235
    • /
    • 2004
  • In this thesis, it is designed efficient electrode formation on the organic luminescent device. ITO electrode is treated with $O_2$plasma. In order to inject hole efficiently, there is proposed the shape of anode that inserted plasma polymerized films as buffer layer between anode and organic layer using thiophene monomer. It is realized efficiently electron injection to aluminum due to introduce the quantum well in cathode. In the case of device inserted the buffer layer by using the plasma poiymerization after $O_2$plasma processing for ITO transparent electrode, since it forms the stable interface and reduce the moving speed of hole, the recombination of hole and electronic ate made in the omitting layer. Compared with the devices without buffer layer, the turn-on voltage was lowered by 1.0(V) doc to the introduction of buffer layer Since the quantum well structure is formed in front of cathode to optimize the tunneling effect, there is improved the power efficiency more than two times.

($TruNano^{TM}$ processing of dielectric layers and barrier-rib on soda-lime glass substrate for PDP panel

  • Lee, Michael M.S.;Kim, Nam-Hoon;Cheon, Chae-Il;Cho, Guang-Sup;Kim, Jeong-Seog
    • 한국정보디스플레이학회:학술대회논문집
    • /
    • 2006.08a
    • /
    • pp.125-125
    • /
    • 2006
  • We present a low temperature thermal process for the transparent dielectric layer, barrier rib, and white back dielectric layer on the soda-lime glass substrate of the PDP by the $TruNano^{TM}$ processor in combination with a compositional modification to the conventional dielectric pastes. By this method the firing temperature can be lowered by more than $100^{\circ}C$.

  • PDF

Effect of the Cu Bottom Layer on the Properties of Ga Doped ZnO Thin Films

  • Kim, Dae-Il
    • Transactions on Electrical and Electronic Materials
    • /
    • v.13 no.4
    • /
    • pp.185-187
    • /
    • 2012
  • Ga doped ZnO (GZO)/copper (Cu) bi-layered film was deposited on glass substrate by RF and DC magnetron sputtering and then the effect of the Cu bottom layer on the optical, electrical and structural properties of GZO films were considered. As-deposited 100 nm thick GZO films had an optical transmittance of 82% in the visible wavelength region and a sheet resistance of 4139 ${\Omega}/{\Box}$, while the GZO/Cu film had optical and electrical properties that were influenced by the Cu bottom layer. GZO films with 5 nm thick Cu film show the lower sheet resistance of 268 ${\Omega}/{\Box}$ and an optical transmittance of 65% due to increased optical absorption by the Cu metallic bottom layer. Based on the figure of merit, it can be concluded that the thin Cu bottom layer effectively increases the performance of GZO films as a transparent and conducting electrode without intentional substrate heating or a post deposition annealing process.