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Electrical and Chemical Stability of Mo Gate Electrode for PMOS (PMOS에 적합한 Mo 전극의 전기적 화학적 안정성)

  • 노영진;이충근;홍신남
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.41 no.4
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    • pp.23-28
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    • 2004
  • In this paper, the properties of Mo as PMOS gate electrodes were studied. The work-function of Mo extracted from C-V characteristic curves was appropriate for PMOS. To identify the electrical and chemical stability of Mo metal gate, the changes of work-function and EOT(Effective Oxide Thickness) values were investigated after 600, 700, 800 and 90$0^{\circ}C$ RTA(Rapid Thermal Annealing). Also it was found that Mo metal gate was stable up to 90$0^{\circ}C$ with underlying SiO$_2$through X-ray diffraction measurement. Sheet resistances of Mo metal gate obtained from 4-point probe were less than 10$\Omega$/$\square$ that was much lower than those of polysilicon.

Synthesis and Characteristics of New Quaternary Superhard Ti-Mo-Si-N Coatings (새로운 고경도 Ti-Mo-Si-N 코팅막의 합성 및 기계적 특성)

  • Jeon, Jin-Woo;Hong, Seung-Gyun;Kim, Kwang-Ho
    • Journal of the Korean institute of surface engineering
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    • v.39 no.6
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    • pp.245-249
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    • 2006
  • In this study, ternary Ti-Mo-N and new quaternary Ti-Mo-Si-N coatings were synthesized on steel substrates(AISI D2) and Si wafers by a hybrid coating system of arc ion plating (AIP) using Ti target and d.c. magnetron sputtering technique using Mo and Si targets in $N_2/Ar$ gaseous mixture. Ternary Ti-Mo-N coatings were substitutional solid-solution of (Ti, Mo)N and showed maximum hardness of approximately 30 GPa at the Mo content of ${\sim}10$. %. The Ti-Mo-Si-N coating with the Si content of 8.8 at. % was a composite consisting of fine (Ti, Mo)N crystallites and amorphous $Si_3N_4$ phase. The hardness of the Ti-Mo-Si(8.8 at. %)-N coatings exhibited largely increased hardness value of ${\sim}48$ GPa due to the microstructural evolution to the fine composite microstructure and the refinement of (Ti, Mo)N crystallites. The average friction coefficient of the Ti-Mo-Si-N coatings largely decreased with increase of Si content. The microstructures of Ti-Mo-Si-N coatings were investigated with instrumental analyses of XRD, XPS, and HRTEM in this work.

Studies on the Molybdenum Complexes with Tetradentate Schiff Base Ligand (I). N,N'-bis (Salicylaldehyde)-ethylene Diimine (네자리 Schiff Base 리간드의 몰리브덴착물에 관한 연구 (제1보))

  • Jo, Gi Hyeong
    • Journal of the Korean Chemical Society
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    • v.18 no.4
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    • pp.267-271
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    • 1974
  • The tetradentate schiff base, N,N'-bis(salicylaldehyde)-ethylene diimine has been reacted with a series of Mo(IV), Mo(V), Mo(IV), and Mo(III) oxidation states to form new Complexes; $[MoO_2(C_{16}H_{14}O_2N_2)], (MoO(C_{16}H_{14}O_2N_2)]_2O, (Mo(SCN)(C_{16}H_{14}O_2N_2)]_2O, and (Mo(H_2O)(C_{16}H_{14}O_2N_2)]_2O.$ These complexes have hexa coordinated configurations and the mole ratio of these ions to the ligand was 1:1. These complexes have been identified by visible spectra, infrared specra, T.G.A., D.T.A., and elemental analysis.

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Investigation of Physicochemical Properties of Mo Carbide Utilizing Electron Spectroscopy

  • Jeong, Eunkang;Park, Juyun;Kang, Yong-Cheol
    • Journal of Integrative Natural Science
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    • v.13 no.3
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    • pp.87-91
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    • 2020
  • Molybdenum carbide (MoCx) thin films (TFs) were deposited by reactive radio frequency (rf) magnetron co-sputtering in high vacuum chamber. We compared the properties of MoCx thin films as the rf power changed on C target. The result of alpha step measurement showed that the thickness of the MoCx TFs varied from163.3 to 194.86 nm as C power was increased from 160 to 200 W. The crystallinity of MoCx such as b-Mo2C, Mo2C, and diamond like carbon (DLC) structures were observed by XRD. The oxidation states of Mo and C were determined using high resolution XPS spectra of Mo 3d and C 1s were deconvoluted. Molybdenum was consisted of Mo, Mo4+, and Mo6+ species. And C was deconvoluted to C-Mo, C, C-O, and C=O species.

MoN-Cu Thin Films Deposited by Magnetron Sputtering with Single Alloying Target (단일 합금타겟을 이용한 마크네트론 스퍼터링 공정으로 증착된 MoN-Cu 박막)

  • Lee, Han-Chan;Moon, Kyoung-Il;Shin, Paik-Kyun
    • Journal of the Korean institute of surface engineering
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    • v.49 no.4
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    • pp.368-375
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    • 2016
  • MoN-Cu thin films were prepared to achieve appropriate properties of high hardness and low friction coefficient, which could be applied to automobile engine parts for reducing energy consumption as well as solving wear problems. Composite thin films of MoN-Cu have been deposited by various processes using multiple targets such as Mo and Cu. However, those deposition with multiple targets revealed demerits such as difficulties in exact control of composition and homogeneous deposition. This study is aiming for suggesting an appropriate process to solve those problems. A single alloying target of Mo-Cu (10 at%) was prepared by powder metallurgy methods of mechanical alloying (MA) and spar plasma sintering (SPS). Thin film of MoN-Cu was then deposited by magnetron sputtering using the single alloying target of Mo-Cu (10 at%). Properties of the resulting MoN-Cu thin film were examined and compared to those of MoN-Cu thin films prepared with double targets of Mo and Cu.

A Polarographic Study of Mo-thiocyanate (V) Complex (Mo-Thiocyanate (V) 錯物의 電極還元 反應에 關한 硏究)

  • Sang-O Oh;Yu-Chul Park
    • Journal of the Korean Chemical Society
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    • v.14 no.2
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    • pp.141-145
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    • 1970
  • The reduction of Mo-thiocyanate (V) complex on dropping mercury electrode has been studied at ionic strength 0.6 with pH less than 2.3. D-C polarogram obtained from acidic solutions are reversible, diffusion controlled current. The electrode reaction of Mo-thiocyanate(V) may be represented as follows. $MoO(SCN)_3\;+\;2H^+\;+\;2e\;{\to}\;Mo(SCN)_2{^+}\;+\;H_2O\;+\;SCN^-$From this reaction, the half wave potential assumed to be $E_{1/2}\;=\;E_0'\;-\;0.059\;pH\;-\;0.03\;log{\;frac{[Mo(SCN)_2{^+}][SCN^-]}{[MoO(SCN)_3]}}$Considering the dissociation of this complex, however, it was estimated that the electrode reaction may be written by. $MoO^{+3}\;+\;3SCN^-\;+\;2H^+\;+\;2e\;{\to}\;Mo(SCN)_2{^+}\;+\;SCN^-\;+\;H_2O$.

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Mechanical properties of $Al_2O_3/Mo/MnO_2$ composite ($Al_2O_3/Mo/MnO_2$ 복합재료의 기계적 특성)

  • Park, Hyun;Kim, Kyung-Nam
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.16 no.4
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    • pp.172-179
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    • 2006
  • When $Al_2O_3-MoO_3$ mixture is reduced, $MoO_3$ is only reduced to Mo at $900^{\circ}C$. But a compound between $Al_2O_3$ and Mo is not formed up to $1300^{\circ}C$. In the case of $Al_2O_3-MoO_3-MnO_2$ mixture, an intermediate compound $Mn_2Mo_3O_8$ is firstly formed at $900^{\circ}C$ and changes to $MnAl_2O_4$ at $1100^{\circ}C{\sim}1300^{\circ}C$. $Al_2O_3/Mo/MnO_2$ composite are manufactured by a selective reduction process in which Mo is only reduced in the powder mixture of $Al_2O_3,\;MoO_3\;and\;MnO_2$ oxide. For $Al_2O_3/Mo$ composite, the average grain size was not changed with increasing Mo content because of inhibition of grain growth of $Al_2O_3$ matrix in the presence of Mo particles. Fracture strength increased with increasing Mo content due to phenomenon of grain growth inhibition of $Al_2O_3$ matrix. Hardness decreased because of a lower hardness value of Mo, whereas fracture toughness increased. For $Al_2O_3,\;Mo\;and\;MnO_2$ composite, grain growth was facilitated by MnOB and it showed a lower fracture strength because of grain growth effect with increasing Mo and $MnO_2$ content. Hardness decreased because of the grain growth of matrix and coalesced Mo particles to be located in grain boundary, whereas fracture toughness increased.

Effect of MoSe2 on Contact Resistance of ZnO/Mo Junction in Cu(In,Ga)Se2 Thin Film Solar Module (MoSe2가 Cu(In,Ga)Se2 박막 태양전지 모듈의 ZnO/Mo 접합의 접촉 저항에 미치는 영향)

  • Cho, Sung Wook;Kim, A Hyun;Lee, Gyeong A;Jeon, Chan Wook
    • Current Photovoltaic Research
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    • v.8 no.3
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    • pp.102-106
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    • 2020
  • In this paper, the effect of MoSe2 on the contact resistance (RC) of the transparent conducting oxide (TCO) and Mo junction in the scribed P2 region of the Cu(In,Ga)Se2 (CIGS) solar module was analyzed. The CIGS/Mo junction becomes ohmic-contact by MoSe2, so the formation of the MoSe2 layer is essential. However, the CIGS solar module has a TCO/MoSe2/Mo junction in the P2 region due to structural differences from the cell. The contact resistance (RC) of the P2 region was calculated using the transmission line method, and MoSe2 was confirmed to increase RC of the TCO/Mo junction. B doped ZnO (BZO) was used as TCO, and when BZO/MoSe2 junction was formed, conduction band offset (CBO) of 0.6 eV was generated due to the difference in their electron affinities. It is expected that this CBO acts as a carrier transport barrier that disturbs the flow of current, resulting in increased RC. In order to reduce the RC caused by CBO, MoSe2 must be made thin in a CIGS solar module.

Hydrothermal Pressure Effect over Preparation of MoS2: Catalyst Characterization and Direct Methanation (수열 압력 제조 조건이 MoS2 촉매 특성과 직접 메탄화 반응에 미치는 영향)

  • PARK, JEONGHWAN;KIM, SEONGSOO;KIM, JINGUL
    • Transactions of the Korean hydrogen and new energy society
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    • v.29 no.2
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    • pp.170-180
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    • 2018
  • After $MoS_2$ catalyst was prepared at 1, 30, and 70 atm, the hydrothermal pressure effect over preparation of $MoS_2$ was investigated in terms of catalyst characterization and direct methanation. Multifaceted characterization techniques such as XRD, BET, SEM, TPR, EDS, and XPS were used to analyze and investigate the effect of high pressure over the preparation of surface and bulk $MoS_2$ catalyst. Result from XRD, SEM, and BET demonstrated that $MoS_2$ was more dispersed as preparation pressure was increased, which resulted finer $MoS_2$ crystal size and higher surface area. EDS result confirmed that bulk composition was $MoS_2$ and XPS result showed that S/Mo mole ratio of surface was about 1.3. TPR showed that $MoS_2$ prepared at 30 atm possessed higher active surface sites than $MoS_2$ prepared at 1 atm and these sites could contribute to higher CO yield during methanation. Direct methanation was used to evaluate the CO conversion of the both catalysts prepared at 1 atm and 30 atm and reaction condition was at feed mole ratio of $H_2/CO=1$, GHSV=4800, 30 atm, temperature($^{\circ}C$) of 300, 350, 400, and 450. $MoS_2$ prepared at 30 atm showed more stable and higher CO conversion than $MoS_2$ prepared at 1 atm. Faster deactivation was occurred over $MoS_2$ prepared at 1 atm, which indicated that preparation pressure of $MoS_2$ catalyst was the dominant factor to improve the yield of direct methanation.

Recovery of Mo by liquid-liquid extraction from synthetic leaching solution of spent Inconel 713C super alloy and preparation of Mo compounds (폐 인코넬계(Inconel 713C)내열합금 모의 침출액으로부터 액-액 추출법에 의한 Mo의 회수 및 Mo 화합물 제조)

  • Ahn, Jong-Gwan;Kim, Da-young;In, Yong-Hyeon
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.19 no.8
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    • pp.403-409
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    • 2018
  • Inconel 713C which of a commercial Ni super alloy have the composition of 70 % Ni, 12 % Cr, 6 % Al and 4 % Mo. Mo is very expensive and have some economic value to recover in the alloy. In this study, liquid-liquid exraction(solvent extraction and stripping) has been performed to separate Mo from the synthetic leaching solution of spent Inconel 713C alloy and prepare to Mo powder by dying, evaporation and heat treatment. The experiments were conducted by using synthetic leaching solution which was prepared $NaMoO_4$ $2H_2O$ by dissolved in distilled water. Alamine336 and Cyanex272 dissolved in kerosene were used as extractants. The extraction percentage of Mo by Alamine336 is 99 % in the condition of the range of pH 1 to 4 and 1 % of concentration of Alamine336. The stripping solutions are used by HCl, $H_2SO_4$ and $HNO_3$ solutions and the concentrations were controlled by distilled water. The concentrations of HCl, $H_2SO_4$ and $HNO_3$ as stripping solutions are increased, the stripping percentages of Mo are increased and the stripping percentage of Mo by $HNO_3$ is higher than other stripping solutions. After liquid-liquid extraction and heat treatment, $MoO_3$ powder which of the purity of 97.5 % was prepared.