• 제목/요약/키워드: Tin bath

검색결과 41건 처리시간 0.026초

수지접합 수복물용 합금의 피착면처리에 따른 결합력에 관한 실험적 연구 (AN EXPERIMENTAL STUDY ON THE BOND STRENGTH OF ETCHED CAST RESTORATION USING DIFFERENT METAL SURFACE TREATMENTS)

  • 이근우
    • 대한치과보철학회지
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    • 제29권1호
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    • pp.13-22
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    • 1991
  • This study investigated the effects of surface treatment on the tensile bond strength of resinbonded prosthesis. The Rexillium III specimens were treated with $50{\mu}m\;Al_2O_3$ blasting. Type IV gold alloy specimens were treated with $400^{\circ}C$ heating and tin plating method. All specimens were bonded with MBAS composite resin cement and followed by immersion test into the $37^{\circ}C$ water bath for 7 days. The specimens were debonded in tension with an Instron machine and observed with SEM. The modes of failure were recorded also. The following conclusions were obtained : 1. The tensile bond strength decreased in following order. $50{\mu}m\;Al_2O_3$ basted Resillium III group, Type IV gold alloy group treated with $400^{\circ}C$ heat and tin plating type IV gold alloy group, and statistical significant differences were observed(p<0.05). 2. The tensile bond strength decreased in all groups after 7 days immersion test, but statistical significant differences were observed in Rexillium III specimens only. 3. The sharp and irregular surface were observed in Rexillium III, but $400^{\circ}C$ heat treated and tin plated groups had round and broad surface in SEM. 4. The models of bond failure were cohesive-adhesive failure mainly.

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유지형태와 접착제 종류에 따른 수지 접착형 수복물과 법랑질간의 전단결합강도 및 파절양상에 관한 연구 (A STUDY ON THE SHEAR BOND STRENGTH BETWEEN RESIN-BONDED RETAINERS AND ENAMEL ACCORDING TO THE ADHESIVE RESINS AND RETENTION TYPES)

  • 조미숙;양재호
    • 대한치과보철학회지
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    • 제33권4호
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    • pp.662-684
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    • 1995
  • The purpose of this study was to evaluate the shear bond strength between various resin-bonded retainers and enamel according to the adhesive resins and retention types and observe the bond filure modes with scanning electron microscope(SEM). For this purpose, the followin eight sub-groups were tested in shear bond strength : 1) electrochemically etched group(Verabond) using Panavia EX and Superbond C&B 2) tin-plated group(PG-S) using Panavia EX and Superbond C&B 3) salt-treated group(Verabond) using Panavia EX and Superbond C&B 4) meshtreated group(Verabond) using Panavia EX and Superbond C&B. Thermocycling test was conducted on the condition of 15 second dwell time each in $5^{\circ}C$ and $55^{\circ}C$bath. Shear bond strength was measured by Instron Universal Testing Machine(medel 1125). The obtained results were as follows : 1. After thermocycling, the shear bond strengths of tin-plated group and electrochemically etched group were significantly greater than those of salt-treated group and mesh-treated group. And the shear bond strength of Panavia EX was greater than that of Superbond C&B with salt-treated group and tin-plated group(p<0.05). 2. Before thermocycling, electrochemically etched group using Superbond C&B produced the greatest shear bond strength(p<0.01). 3. The shear bond strength of electrochemically etched group using Superbond C&B was significantly decreased after thermocycling(p<0.01). 4. In observation of bond failure modes before thermocycling, Panavia EX highly exhibited enamel fracture. Tin-plated group using Superbond C&B adhesive failure between metal and resin and electrochemically etched group using Superbond C&B exhibited adhesive failure between enamel and rdsin. 5. In observation of failure modes after thermocycling, Panavia EX exhibited cohesive failure and Superbond C&B exhibited adhesive failure between resin and metal.

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구리기둥범프 용 전해도금 층 제어 (Thickness Control of Electroplating Layer for Copper Pillar Tin Bump)

  • 문대호;홍상진;박종대;황재룡;소대화
    • 한국정보통신학회:학술대회논문집
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    • 한국해양정보통신학회 2011년도 추계학술대회
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    • pp.903-906
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    • 2011
  • 고밀도집적을 위한 구리기둥주석범프(CPTB)의 제작공정에 흔히 전기도금과 무전해도금이 적용된다. CPTB는 약 $100{\mu}m$ 정도의 피치를 갖도록 먼저 구리도금 층을 전착시킨 다음, 구리의 산화 억제를 위하여 구리기둥 주위에 주석을 입혀 제작한다. 이 과정에서 구리도금 층 두께를 균일하게 형성하는 일은 매우 민감하고 어렵지만 중요한 일이다. 이를 위하여 구리도금 전극 사이에 전류분포 제어를 위한 절연 막(절연게이트)을 형성하여 도금 층의 두께분포를 조절하는 실험을 하였다. 원통형 도금 조에서 중심부를 열어 전류를 흘려주고, 그 외 부분은 가장자리 끝까지 막고 전류를 차단하여 두께분포 변화를 확인하였다.

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Pt-ZnO 상대전극을 가지는 염료감응형 태양전지의 광전변환 특성 분석 (Enhanced catalytic activity of Pt counter electrodes employing ZnO nanorods for dye-sensitized solar cells)

  • 이정관;천종훈;양현석;김재홍
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2011년도 춘계학술대회 초록집
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    • pp.118.2-118.2
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    • 2011
  • In order to increase the energy conversion efficiency of dye-sensitized solar cells (DSSCs), we employed a counter electrode that was platinum coated using a doctor blade technique on synthesized ZnO nanostructures on fluorinedoped tin oxide (FTO). The ZnO nanostructures possessing high electrochemical activity and large surface area of the counter electrode were grown by a chemical bath deposition (CBD) method at various times, 2, 4, and 8 h. The efficiency of DSSC with the Pt-ZnO counter electrode was improved 7.01% (grown for 2 h), 7.63% (grown for 4 h), and 6.13% (grown for 8 h), respectively. Compared with a standard DSSC without ZnO nanostructures, whose efficiency was 6.27%, the energy conversion efficiency increased approximately 22% for the DSSC with the Pt-ZnO (grown for 4 h) electrode. It indicates that the Pt coated on the ZnO nanostructure improves the electrocatalytic activity of the counter electrode.

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반송제어모드를 이용한 인라인 식각/세정장치의 ITO 전극형성기술 (ITO Patterning of an In-line Wet Etch/Cleaning System by using a Reverse Moving Control System)

  • 홍성재;임승혁;한형석;권상직;조의식
    • 제어로봇시스템학회논문지
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    • 제14권4호
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    • pp.327-331
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    • 2008
  • An in-line wet etch/cleaning system was established for the research and development in wet etch process as a formation of electrode such as metal or transparent conductive oxide layer. A reverse moving system was equipped in the in-line wet etch/cleaning system for the alternating motion of glass substrate in a wet etch bath of the system. Therefore, it was possible for the glass substrate to be moved back and forth and it was possible to reduce the size of the system by using the reversing moving system. For the effect of the alternating motion of substrate on the etch rate in the in-line wet etch bath, indium tin oxide(ITO) patterns were obtained through wet etch process in the in-line system in which the substrate was moved back and forth. From the CD(critical dimension) skews resulted from the ADI CD and ACI CD of the ITO patterns, it was concluded that the alternating motion of glass substrate are possible to be applied to the mass production of wet etch process.

Effect of H2S Concentration and Sulfurization Temperature on the Properties of Cu2ZnSnS4 Thin Films

  • Arepalli, Vinaya Kumar;Kim, Eui-Tae
    • 한국재료학회지
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    • 제25권12호
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    • pp.708-712
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    • 2015
  • This study reports the effects of $H_2S$ gas concentration on the properties of $Cu_2ZnSnS_4(CZTS)$ thin films. Specifically, sulfurization process with low $H_2S$ concentrations of 0.05% and 0.1%, along with 5% $H_2S$ gas, was studied. CZTS films were directly synthesized on Mo/Si substrates by chemical bath deposition method using copper sulfate, zinc sulfate heptahydrate, tin chloride dihydrate, and sodium thiosulfate pentahydrate. Smooth CZTS films were grown on substrates at optimized chemical bath deposition condition. The CZTS films sulfurized at low $H_2S$ concentrations of 0.05 % and 0.1% showed very rough and porous film morphology, whereas the film sulfurized at 5% $H_2S$ yielded a very smooth and dense film morphology. The CZTS films were fully crystallized in kesterite crystal form when they were sulfurized at $500^{\circ}C$ for 1 h. The kesterite CZTS film showed a reasonably good room-temperature photoluminescence spectrum that peaked in a range of 1.4 eV to 1.5 eV, consistent with the optimal bandgap for CZTS solar cell applications.

저온 및 고전류밀도 조건에서 전기도금된 구리 박막 간의 열-압착 직접 접합 (Thermal Compression of Copper-to-Copper Direct Bonding by Copper films Electrodeposited at Low Temperature and High Current Density)

  • 이채린;이진현;박기문;유봉영
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2018년도 춘계학술대회 논문집
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    • pp.102-102
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    • 2018
  • Electronic industry had required the finer size and the higher performance of the device. Therefore, 3-D die stacking technology such as TSV (through silicon via) and micro-bump had been used. Moreover, by the development of the 3-D die stacking technology, 3-D structure such as chip to chip (c2c) and chip to wafer (c2w) had become practicable. These technologies led to the appearance of HBM (high bandwidth memory). HBM was type of the memory, which is composed of several stacked layers of the memory chips. Each memory chips were connected by TSV and micro-bump. Thus, HBM had lower RC delay and higher performance of data processing than the conventional memory. Moreover, due to the development of the IT industry such as, AI (artificial intelligence), IOT (internet of things), and VR (virtual reality), the lower pitch size and the higher density were required to micro-electronics. Particularly, to obtain the fine pitch, some of the method such as copper pillar, nickel diffusion barrier, and tin-silver or tin-silver-copper based bump had been utillized. TCB (thermal compression bonding) and reflow process (thermal aging) were conventional method to bond between tin-silver or tin-silver-copper caps in the temperature range of 200 to 300 degrees. However, because of tin overflow which caused by higher operating temperature than melting point of Tin ($232^{\circ}C$), there would be the danger of bump bridge failure in fine-pitch bonding. Furthermore, regulating the phase of IMC (intermetallic compound) which was located between nickel diffusion barrier and bump, had a lot of problems. For example, an excess of kirkendall void which provides site of brittle fracture occurs at IMC layer after reflow process. The essential solution to reduce the difficulty of bump bonding process is copper to copper direct bonding below $300^{\circ}C$. In this study, in order to improve the problem of bump bonding process, copper to copper direct bonding was performed below $300^{\circ}C$. The driving force of bonding was the self-annealing properties of electrodeposited Cu with high defect density. The self-annealing property originated in high defect density and non-equilibrium grain boundaries at the triple junction. The electrodeposited Cu at high current density and low bath temperature was fabricated by electroplating on copper deposited silicon wafer. The copper-copper bonding experiments was conducted using thermal pressing machine. The condition of investigation such as thermal parameter and pressure parameter were varied to acquire proper bonded specimens. The bonded interface was characterized by SEM (scanning electron microscope) and OM (optical microscope). The density of grain boundary and defects were examined by TEM (transmission electron microscopy).

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Electrodeposition of SnS Thin film Solar Cells in the Presence of Sodium Citrate

  • Kihal, Rafiaa;Rahal, Hassiba;Affoune, Abed Mohamed;Ghers, Mokhtar
    • Journal of Electrochemical Science and Technology
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    • 제8권3호
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    • pp.206-214
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    • 2017
  • SnS films have been prepared by electrodeposition technique onto Cu and ITO substrates using acidic solutions containing tin chloride and sodium thiosulfate with sodium citrate as an additive. The effects of sodium citrate on the electrochemical behavior of electrolyte bath containing tin chloride and sodium thiosulfate were investigated by cyclic voltammetry and chronoamperometry techniques. Deposited films were characterized by XRD, FTIR, SEM, optical, photoelectrochemical, and electrical measurements. XRD data showed that deposited SnS with sodium citrate on both substrates were polycrystalline with orthorhombic structures and preferential orientations along (111) directions. However, SnS films with sodium citrate on Cu substrate exhibited a good crystalline structure if compared with that deposited on ITO substrates. FTIR results confirmed the presence of SnS films at peaks 1384 and $560cm^{-1}$. SEM images revealed that SnS with sodium citrate on Cu substrate are well covered with a smooth and uniform surface morphology than deposited on ITO substrate. The direct band gap of the films is about 1.3 eV. p-type semiconductor conduction of SnS was confirmed by photoelectrochemical and Hall Effect measurements. Electrical properties of SnS films showed a low electrical resistivity of $30{\Omega}cm$, carrier concentration of $2.6{\times}10^{15}cm^{-3}$ and mobility of $80cm^2V^{-1}s^{-1}$.

전기로 및 봉입형 응고점 셀 내의 온도구배가 미치는 표준백금저항온도계 온도측정의 불확도 요소 평가 (Evaluation of Uncertainty Sources in Temperature Measurement Using Platinum Resistance Thermometer Caused by Temperature Gradient in Furnace and Sealed-type Freezing Point Cells)

  • 강기훈;감기술;김용규;송창호
    • 센서학회지
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    • 제13권6호
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    • pp.411-416
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    • 2004
  • In the international temperature scale of 1990 (ITS-90), standard platinum resistance thermometer (SPRT) is a defining standard thermometer used in the temperature range from 13.8033 K to $961^{\circ}C$. Uncertainty of SPRT is about several mK and uncertainty of defining fixed points of the ITS-90 which is used for calibrating SPRT is about several tenth of mK. Above $0^{\circ}C$. the defining fixed points are gallium melting point and indium, tin, zinc, aluminium and silver freezing points which are all realized using an electric furnace or a liquid bath. To realize freezing point of tin ($231.928^{\circ}C$) and zinc ($419.527^{\cir}C$), two 3-zone furnaces which have 3 electric heaters were manufactured. Temperature gradient of the constructed furnaces were tested. Uncertainty caused by temperature gradient of furnace and immersion effect of SPRT in the sealed-type freezing point cells were evaluated 0.038 mK for tin freezing point and 0.036 mK for zinc freezing point.

코치닐 추출물에 의한 견섬유 염색 (Dyeing of Silk Fabrics by Cochineal Extracts)

  • 한명희
    • 한국염색가공학회지
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    • 제12권2호
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    • pp.129-137
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    • 2000
  • Silk fabrics were dyed by Cochineal extracts after mordanted with various mordants and their properties of dyeing, fastness and change of surface color were investigated. Silk fabrics were mordanted with aluminum potassium sulfate, copper acetate, tin chloride, iron sulfate or chromium potassium sulfate at $60^\circ{C}$ for 30 minutes and subsequently dyed at $60^\circ{C}$ for 60 minutes unless mentioned otherwise. The dye-uptake of silk fabrics increased with the concentration of Cochineal extracts and mordants used. Maximum dye-uptake was obtained at pH 3.5-4, regardless of the type of mordants used. Surface color of silk fabrics changed from red purple to purple when mordanted with Al or Cu mordant, from purple to purple blue with Fe mordant and showed red purple with Sn or Cr mordant, respectively. It also changed according to pH of dyeing bath. Dyed silk fabrics showed poor light fastness but good dry-cleaning, perspiration and rubbing fastness.

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