• 제목/요약/키워드: TiC V/F

검색결과 121건 처리시간 0.024초

A study on Electronic Properties of Passive Film Formed on Ti

  • Kim, DongYung;Kwon, HyukSang
    • Corrosion Science and Technology
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    • 제2권5호
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    • pp.212-218
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    • 2003
  • Electronic properties of passive films formed on Ti at film formation potentials $(E_f)V_{SCE}$ in pH 8.5 buffer solution and in an artificial seawater were examined through the photocurrent measurement and Mott-Schottky analysis. The passive films formed on Ti in pH 8.5 buffer solution exhibited a n-type semiconductor with a band gap energys $(E_g);E_g^{n=2}=3.4$ eV for nondirect electron transition, and $E_g^{n=0.5}=3.7$ eV for direct electron transition. These band gap values were almost same as those for the passive films formed in artificial seawater, indicating that chloride ion ($Cl^-$ in solution did not affect the electronic structure of the passive film on Ti. $E_g$ for passive films formed on Ti were found to be greater than those ($E_g^{n=0.5}=3.1$ eV, $E_g^{n=2}=3.4$) for a thermal oxide film formed on Ti in air at $400^{\circ}C$. The disorder energy of passive film, determined from the absorption tail of photocurrent spectrum, was much greater than that for the thermal oxide film farmed on Ti in air at $400^{\circ}C$. The greater $E_g$ and the higher disorder energy for the passive film compared with those for the thermal oxide fIlm suggest that the passive film on Ti exhibited more disorded structure than the thermal oxide film. The donor density (about $2.4{\times}10^{20}cm^{-3}$) for the passive film formed in artificial seawater was greater than that (about $20{\times}10^{20}cm^{-3}$) formed in pH 8.5 buffer solution, indicating that $Cl^-$ increased the donor density for the passive film on Ti.

LaNiO3의 (100)배향성이 Pb(Zr,Ti)O3 박막의 결정성장과 강유전성에 미치는 영향 (Effects of (100) Orientation of LaNiO3 on the Growth and Ferroelectric Properties of Pb(Zr,Ti)O3 Thin Films)

  • 박민석;서병준;유영배;문병기;손세모;정수태
    • 한국전기전자재료학회논문지
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    • 제18권4호
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    • pp.338-343
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    • 2005
  • Pb(Zr,Ti)O₃[PZT] thin films were prepared on a highly (100) oriented LaNiO₃[LNO] and a randomly oriented LNO by sol-gel process. The PZT thin films on a highly (100) oriented LNO show a high (100) crystal orientation (F=100 %), those on a randomly oriented LNO show a random crystal orientation (F=60 %). All the PZT layer have a flat and dense microstructure with large columnar grains and their grain size are 25 nm. In the ferroelectric curves at electric field of 40 kV/cm, a highly (100) oriented PZT/LNO samples show coercive field, E/sub c/=10 kV/cm and remanent polarization, P/sub r/=14.5 μC/㎠, while a randomly oriented PZT/LNO sample show E/sub c/=10 kV/cm and P/sub r/=5.4 μC/㎠.

NaF 전해용액을 이용한 양극산화에 의한 타이타늄 표면의 나노튜브구조의 형성에 관한 연구 (Investigation on Formation of Nanotube Titanium Oxide Film by Anodizing on Titanium in NaF Electrolytes)

  • 임현필;박남순;박상원
    • 구강회복응용과학지
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    • 제25권2호
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    • pp.183-190
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    • 2009
  • 본 연구의 목적은 NaF와 $H_3PO_4$를 사용하여 양극산화과정을 통해 나노튜브 제작 조건을 찾는 것이다. 절삭된 직경 15 mm, 두께 1.5 mm의 티타늄 디스크를 양극에, 백금을 음극에 연결하고 전극간의 거리는 10 mm가 되도록 하였다. $H_3PO_4$와 NaF 용액을 전해질로 하여 양극산화를 시행하였는데 전압, 전해질 농도, 산화시간을 달리하여 티타늄 디스크에 나노튜브를 형성하였다. 양극산화 후 24시간 동안 증류수로 세척한 후 24시간 동안 $40^{\circ}C$ 오븐에서 건조하고 시편의 표면구조 형상을 관찰 분석하였다. 실험 결과 0.5 wt % NaF에서 전압과 시간이 증가함에 따라 pore 형태의 초기 나노튜브 형성되었다. 1.0 wt % NaF에서 20 V, 20 분과 25 분에서 나노튜브가 생성되었고, 30 V에서 튜브의 형태가 커지면서 터지는 양상을 보였다. 2.0 wt % NaF에서 전압과 시간에 상관없이 적절한 나노튜브형태가 형성되지 않았다. $1M\;H_3PO_4$, 1.0 wt % NaF 전해용액, 20 V, 20분 양극산화 조건에서 티타늄 디스크 상에 가장 잘 정렬된 형태의 나노튜브 구조가 형성되었다. 양호한 형태의 나노튜브 형성을 위해서는 전해질의 종류에 따라 적절한 농도, 전압, 시간의 형성조건이 필요할 것으로 사료된다.

방사선치료 선량 측정에 사용되는 열형광체에 따른 최대 형광 강도 특성 (Characteristics of the Maximum Glow Intensity According to the Thermoluminescent Phosphors used in the Absorbed Dose Measurement of the Radiation Therapy)

  • 강수만;임인철;박철우;이미현;이재승
    • 한국방사선학회논문지
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    • 제8권4호
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    • pp.181-187
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    • 2014
  • 본 연구는 방사선 치료 영역의 선량 측정을 위하여 상용화된 열형광선량계의 가열 온도에 따른 형광 곡선의 특성을 분석하였다. 본 연구에 사용된 열형광선량계는 LiF:Mg${\cdot}$Ti, LiF:Mg${\cdot}$Cu${\cdot}$P, $CaF_2$:Dy, $CaF_2$:Mn(Thermo Fisher Scientific Inc., USA)이었다. 선원과 고체 팬텀 표면(RW3 slab, IBA Dosimetry, Germany)간 거리를 100cm로 하여 기준점 깊이에서 6MV, 15MV X선과 6MeV, 12MeV 전자선을 각각 100MU 조사하였다. 방사선 조사 후 열형광 판독기(Hashaw 3500, Thermo Fisher Scientific Inc., USA)를 사용하여 $50^{\circ}C$에서 $260^{\circ}C$까지 $15^{\circ}C/sec$의 가온율로 가열하여 형광 곡선을 분석하였다. 트랩 준위에 포획된 전자가 정공과 결합하면서 빛을 방출하는 형광 피크(glow peak)는 2개 또는 3개의 피크가 나타났으며 방사선 조사 후 TLD의 온도를 일정하게 증가시켰을 때 최대 형광 피크를 나타내는 형광 온도의 경우 각각의 에너지에 따라 $LiF:Mg{\cdot}Ti$ 선량계는 $185.5{\pm}1.3^{\circ}C$, $LiF:Mg{\cdot}Ti$ 선량계는 $135.0{\pm}5.1^{\circ}C$, $CaF_2$:Dy 선량계는 $144.0{\pm}1.6^{\circ}C$, $CaF_2$:Mn 선량계는 $294.3{\pm}3.8^{\circ}C$ 근처에서 최대 형광 피크를 각각 나타났다. 방사선 조사 후 포획 전자의 형광 방출 확률은 가열 온도에 의존하게 되므로 방사선 치료 영역의 선량 측정에서 방사선 조사 후 열형광선량계에 일정한 가온율을 적용함으로써 고유한 물리적 특성에 따른 측정 정확도를 향상시킬 수 있을 것으로 판단되었다.

고주파 마그네트론 스퍼터링에 의한 $SrTiO_3$ 캐패시터 박막의 온도 의존성 (Temperature Dependence of the $SrTiO_3$ Capacitor Thin Films Deposited by RF Magnetron Sputtering)

  • 오금곤;이우선;김남오;김재민;이병성;김상용
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제48권6호
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    • pp.429-435
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    • 1999
  • The $SrTiO_3$ thin films were prepared on Ag/TiN-coated and p-type bare Si(100) substrates by r.f. magnetron sputtering deposition technique. The electrical properties of the deposited films were investigated, which controlling deposition parameters such as substrate temperature and film thickness. The electrical properties ofthe $SrTiO_3$ films were measured using the capacitance-voltage(C-V) technique. The thickness dependence of the electrical properties of the $SrTiO_3$ films was analyzed of the connection with the films in series. The substrate affected the crystal structure and texture characteristics of the $SrTiO_3$ films. The resistivity of the film, sandwiched between Al and Ag films was measured, as a function of the temperature.

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Formation of Ti3SiC2 Interphase of SiC Fiber by Electrophoretic Deposition Method

  • Lee, Hyeon-Geun;Kim, Daejong;Jeong, Yeon Su;Park, Ji Yeon;Kim, Weon-Ju
    • 한국세라믹학회지
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    • 제53권1호
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    • pp.87-92
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    • 2016
  • Due to its stability at high temperature and its layered structure, $Ti_3SiC_2$ MAX phase was considered to the interphase of $SiC_f/SiC$ composite. In this study, $Ti_3SiC_2$ MAX phase powder was deposited on SiC fiber via the electrophoretic deposition (EPD) method. The Zeta potential of the $Ti_3SiC_2$ suspension with and without polyethyleneimine as a dispersant was measured to determine the conditions of the EPD experiments. Using a suspension with 0.03 wt.% ball milled $Ti_3SiC_2$ powder and 0.3 wt.% PEI, $Ti_3SiC_2$ MAX phase was successfully coated on SiC fiber with an EPD voltage of 10 V for 2 h. Most of the coated $Ti_3SiC_2$ powders are composed of spherical particles. Part of the $Ti_3SiC_2$ powders that are platelet shaped are oriented parallel to the SiC fiber surface. From these results we expect that $Ti_3SiC_2$ can be applied to the interphase of $SiC_f/SiC$ composites.

Li4Ti5O11 전극을 이용한 비대칭 하이브리드 슈퍼커패시터 전기적 모듈 특성 (The Electric Characteristics of Asymmetric Hybrid Supercapacitor Modules with Li4Ti5O11 Electrode)

  • 맹주철;윤중락
    • 전기학회논문지
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    • 제66권2호
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    • pp.357-362
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    • 2017
  • Among the lithium metal oxides for asymmetric hybrid supercapacitor, $Li_4Ti_5O_{12}(LTO)$ is an emerging electrode material as zero-stain material in volume change during the with the charging and discharging processes. The pulverized LTO powder was observed to show the enhanced capacity from 120 mAh/g to 156 mAh/g at C-rate (10, 100 C). Hybrid supercapacitor module(48V, 416F) was fabricated using an asymmetric hybrid capacitor with a capacitance of 7500F. As a result of the measurement of C-rate characteristics, the module shows that the discharge time is drastically reduced at more than 50C, and the ESR and voltage drop characteristics are increased. The energy density and power density were reduced under high C-rate conditions. When designing asymmetric hybrid supercapacitor module, the C-rate and ESR should be considered As a result of measuring the 5 kw UPS, it was discharged at the current of 116A~170A during the discharge in the voltage range of 48V~30V, and the compensation time at discharge was measured to be about 33.2s. Experimental results show that it can be applied to applications related to stabilization of power quality by applying hybrid supercapacitor module.

하소온도와 소결조제가 $(Zn_{0.8}Mg_{0.2})TiO_3$계의 소결거동과 마이크로파 유전특성에 미치는 영향 (Effect of Calcination Temperature and Sintering Additives on the Sintering Behaviors and Microwave Dielectric Properties of $(Zn_{0.8}Mg_{0.2})TiO_3$)

  • 심우성;방재철
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 춘계학술대회 논문집 센서 박막재료 반도체 세라믹
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    • pp.282-286
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    • 2003
  • We investigated the effects of calcination temperature and sintering additives on the sintering behaviors and microwave dielectric properties of $(Zn_{0.8}Mg_{0.2})TiO_3$. Highly densified samples were obtained at the sintering temperatures below $1000^{\circ}C$ with additions of 0.45 wt.% $Bi_2O_3$ and 0.55 wt.% $V_2O_5$. From the examination of the existing phases and microstructures before and after sintering of $(Zn_{0.8}Mg_{0.2})TiO_3$ system calcined at the various temperatures ranging from $800^{\circ}C$ to $1000^{\circ}C$, it was found that high $Q{\times}f_o$ values were obtained when unreacted or second phases in calcined body were reduced. When calcined at $1000^{\circ}C$ and sintered at $900^{\circ}C$, it consists of hexagonal as a main phase with uniform microstructure and exhibits $Q{\times}f_o$ value of 42,000 GHz and dielectric constant of 22.

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Effects of Sputtering Pressure on the Properties of BaTiO3 Films for High Energy Density Capacitors

  • Park, Sangshik
    • 한국재료학회지
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    • 제24권4호
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    • pp.207-213
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    • 2014
  • Flexible $BaTiO_3$ films as dielectric materials for high energy density capacitors were deposited on polyethylene terephthalate (PET) substrates by r.f. magnetron sputtering. The growth behavior, microstructure and electrical properties of the flexible $BaTiO_3$ films were dependent on the sputtering pressure during sputtering. The RMS roughness and crystallite size of the $BaTiO_3$ increased with increasing sputtering pressure. All $BaTiO_3$ films had an amorphous structure, regardless of the sputtering pressures, due to the low PET substrate temperature. The composition of films showed an atomic ratio (Ba:Ti:O) of 0.9:1.1:3. The electrical properties of the $BaTiO_3$ films were affected by the microstructure and roughness. The $BaTiO_3$ films prepared at 100 mTorr exhibited a dielectric constant of ~80 at 1 kHz and a leakage current of $10^{-8}A$ at 400 kV/cm. Also, films showed polarization of $8{\mu}C/cm^2$ at 100 kV/cm and remnant polarization ($P_r$) of $2{\mu}C/cm^2$. This suggests that sputter deposited flexible $BaTiO_3$ films are a promising dielectric that can be used in high energy density capacitors owing to their high dielectric constant, low leakage current and stable preparation by sputtering.

Formation of Ti-0 Biomedical Film on Ti6A14V Alloy by DC Glow Plasma Oxidizing

  • Zheng, C.L.;Cui, F.Z.;Xu, Z.
    • Journal of Korean Vacuum Science & Technology
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    • 제6권1호
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    • pp.16-21
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    • 2002
  • Ti-0 film is a kind of biocompatible surface materials. In this paper, a new method, glow discharge plasma oxidizing, has been used in synthesizing Ti-O gradient films on Ti6A14V substrates. The effects of ion bombardment and process parameters on the structures of titanium oxide layers have been investigated. The results demonstrate that DC glow plasma oxidizing is more efficient in preparation of dense, hard, and high adhesive Ti-O biomedical films on titanium and its alloys. Samples treated by this method show higher hardness values than by others. Especially, in the condition of hollow cathode discharge, the ion bombardment enhances ionization of oxygen, promotes the oxygen permeation and facilitates the formation of the oxide of low valence states of titanium.

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