• 제목/요약/키워드: Ti substrate

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Ar 이온 밀링으로 손상된 단결정 SrTiO$_3$ 기판의 산소 열처리 효과 (Oxygen Annealing Effect of SrTiO$_3$ Single Crystal Substrate Damaged by Ar$^+$ Ion Milling)

  • 최희석;황윤석;김진태;이동훈;이순걸;박용기;박종철
    • 한국초전도학회:학술대회논문집
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    • 한국초전도학회 1999년도 High Temperature Superconductivity Vol.IX
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    • pp.87-90
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    • 1999
  • We have studied the annealing effects of 570 (SrTiO$_3$) single crystal substrate and the I-V properties of step-edge junctions after Ar ion milling. YBa$_2Cu_3O_7$ (YBCO) thin films are fabricated on the substrates by using pulsed laser deposition (PLD) and photolithography. The surface of Ar ion milled substrate was characterized with atomic force microscope (AFM) and scanning electron microscope (SEM) images. After the substrate was damaged by milling, the critical current density of YBCO thin films deposited on the substrate was lowered. The annealing of the damaged substrate at about 1000 $^{\circ}C$ recovered the critical current density to that before the milling. Futhermore the annealing helped junction formation due to high quality film and increased the yield rate for the fabrication of high quality step-edge junction.

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원통형 스퍼터링 장치로 제작한 Ti 및 Al 박막구조 (Structure of Ti and Al Films Prepared by Cylindrical Sputtering System)

  • 오창섭;한창석
    • 한국재료학회지
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    • 제24권7호
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    • pp.344-350
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    • 2014
  • Metal films (i.e., Ti, Al and SUH310S) were prepared in a magnetron sputtering apparatus, and their cross-sectional structures were investigated using scanning electron microscopy. The apparatus used consisted of a cylindrical metal target which was electrically grounded, and two anode rings attached to the top and to the bottom of the target. A wire was placed along the center-line of the cylindrical target to provide a substrate. When the electrical potential of the substrate was varied, the metal-film formation rate depended on both the discharge voltage and the electrical potential of the substrate. As we made the magnetic field stronger, the plasma which appeared near the target collected on the plasma wall surface and thereby decreased the bias current. The bias current on the conducting wire was different from that for cation collection. The bias current decreased because the collection of cations decreased when we increased the magnetic-coil current. When the substrate was electrically isolated, the films deposited showed a slightly coarse columnar structure with thin voids between adjacent columns. In contrast, in the case of the grounded substrate, the deposited film did not show any clear columns but instead, showed a densely-packed granular structure. No peeling region was observed between the film and substrate, indicating good adhesion.

유기금속화학기상증착법에 의해 증착된 구리 핵의 기판과 전처리의 의존성 ((Substrate and pretreatment dependence of Cu nucleation by metal-organic chemical vapor deposition))

  • Kwak, Sung-Kwan;Lee, Myoung-Jae;Kim, Dong-Sik;Kang, Chang-Soo;Chung, Kwan-Soo
    • 대한전자공학회논문지TE
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    • 제39권1호
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    • pp.22-30
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    • 2002
  • Si, SiO/sup 2/, TiN, W/sup 2/N 기판 위에 (hfac)Cu(VTMS) 유기금속 전구체로 증착된 구리 핵을 조사하였다. 증착온도가 증가함에 따라, 기판 종류에 상관없이 180。C에서 구리 핵이 클러스터링으로 성장하는 메커니즘을 관찰하였다. 또한, HF용액으로 세척한 TiN 과 SiO/sup 2/가 공존하는 기판에서 구리 핵의 선택성이 향상됨을 관찰하였다. TiN을 H/sup 2/O/sup 2/로 세척한 후 Dimethyldichlorosilane 처리했을 때 표면이 passivation됨을 확인하였다.

고출력 이산화탄소 레이저에 의한 TiC/Al 표면합금의 특성 (The properties of TiC/Al surface alloy using a high power $CO_2$-laser)

  • 송순달
    • 한국결정성장학회지
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    • 제11권4호
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    • pp.133-137
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    • 2001
  • 고출력 이산화탄소 레이저빔에 의한 TiC/Al 표면합금의 특성을 연구하였다. 이 과정을 분석하기 위해 기본금속[Al]과 TiC 분말입자 사이의 물리적 특성을 측정하였다. 표면층의 크기와 모양, 광학적 흡수율 그리고 분말효율을 TiC/Al 행력에서 레이저출력의 함수로 측정하였다. TiC 분말을 사용한 경우와 사용하지 않은 경우의 기본금속내의 흡수율은 레이저 출력이 증하가면 감소하였다. 레이저출력이 2kW에서 4.5kW 범위로 증가되면 분말효율은 4%에서 12%까지 증가하였다. 그러나 TiC 분말입자는 용융된 알루미늄에는 용해되지 않는다. 이 결과 분말입자가 증가되면 쉽게 표면층을 투과하여 금속행렬속에 2개의 위상상태로 생성된다.

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Cp-Ti 표면의 Hydroxyapatite+TiO2 복합 Sol 코팅에 관한 연구 (Hydroxyapatite+TiO2 Composite Sol Coating on Cp-Ti)

  • 김윤종;김택남;이성호
    • 한국재료학회지
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    • 제15권7호
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    • pp.444-447
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    • 2005
  • In this study, $Hydroxyapatite+TiO_2(HAp+TiO_2)$ composite sol coatings on Cp-Ti substrates were deposited by using a sol-gel derived precursor. Prior to hydroxyapatite coating, the samples were micropolished and divided into three sets. The first set was coated with hydroxyapatite (HAp) directly on Cp-Ti. The second set was first coated with intermediate titania layer and then coated with HAp. The third set samples were coated with $HAp+TiO_2$ (50:50) composite sol. Each samples were predried at $200^{\circ}C$, and heat treated at $600^{\circ}C$. The formation of hydroxyapatite has been confirmed by XRD analyses and the substrate material was found to be oxidized with negligible amount of CaO in the coating. The NaOH treated samples showed the presence of rutile crystal. The SEM studies revealed surface morphologies of each samples. $HAp+TiO_2$ composite sol coating layer was found to be smooth. The bonding strength of each samples were calculated using pull out tests. The bonding strength of the $HAp+TiO_2$ composite sol coating on substrate was 29.35MPa.

TiO2 함량에 따르는 무전해 Ni-P-TiO2 복합도금층 특성 연구 (Characterization of the Morphology and Corrosion Resistance in Electroless Ni-P-TiO2 Composite Coating Prepared by TiO2 Contents)

  • 변영민;김호영;이재웅;황환일
    • 한국표면공학회지
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    • 제52권4호
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    • pp.187-193
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    • 2019
  • Electroless Ni-P coatings are widely used in the chemical, mechanical, and electronic industries because of their excellent wear and abrasion resistance. In this study, the effect of $TiO_2$ particles of composite coating was investigated. To improve the corrosion resistance, electroless $Ni-P-TiO_2$composite coating was studied by varying the $TiO_2$ content. The morphology and phase structure of $Ni-P-TiO_2$ composite coatings were analyzed by scanning electron microscopy(SEM), X-ray diffractometry(XRD) and X-ray photoelectron spectroscopy(XPS). The result showed that $Ni-P-TiO_2$composite coating is composed of Ni, P, Ti and O. It exhibits an amorphous structure, high hardness and good corrosion resistance to the substrate. $Ni-P-TiO_2$ composite coatings have higher open circuit potential than that of the substrate, which obtained at $TiO_2$ content of 5.0 g/L optimal integrated properties.

화학증착법에 의한 PbTiO3박막의 조성분석 및 전기적성질에 관한 연구 (Study on the Composition Analysis and Electrical Properties of Chemical Vapor Deposited PbTiO3 Thin Film)

  • 이혜용;윤순길;김호기
    • 한국세라믹학회지
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    • 제26권5호
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    • pp.670-676
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    • 1989
  • The PbTiO3 is well known materials having remarkable ferroelectric, piezoelectric, and pyroelectric properties. PbTiO3 thin films with a perovskite structure were successfully fabricated on titanium substrate by chemical vapor deposition. These films were characterized according to composition, crystal structure, and electrical properties. Semi-quantitative compositional analysis of the deposited films was made by Auger Electron Spectroscopy(AES). The PbTiO3 film deposited on titanium substrate at the deposition temperature 75$0^{\circ}C$, the Ti(C2H5O)4 fraction 0.15, and O2 partial pressure 0.06atm, has a columnar structure and grows with(001) preferred orientation, and has stoichiometric composition. A clear dielectric transition and offset in the dc conductivity near the transition temperature(48$0^{\circ}C$) were observed in the deposited lead titanate film.

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스퍼터링 증착에 의한 $PbTiO_3$ 박막제조시 증착변수의 영향 (Effects of Deposition Parameters on Sputter Deposition of Lead Titanate Thin Films)

  • 김상섭;강영민;백성기
    • 한국세라믹학회지
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    • 제30권7호
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    • pp.578-588
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    • 1993
  • Highly c-axis oriented ferroelectric PbTiO3 thin films were deposited on MgO single crystal substrates by RF magnetron sputtering. We have studied the effects of substrate temperature, RF input power, gas comosition, gas pressure and deposition rate on the chemical and structural characteristics of PbTiO3 thin films. The epitaxy relationship of c-axis oriented films was found to be PbTiO3{100}//MgO(100) and their microstructures were highly mosaic. It was found that the most important parameter to achieve epitaxial PbTiO3 films was the substrate temperature. The activation energy for the epitaxy formation was about 0.92eV. Lower gas pressure and RF input power were favorable for the formation of epitaxial c-axis orientation. It was also found that the optimum oxygen content in Ar gas was 10% to obtain the stoichiometric PbTiO3 composition.

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TiO2 광전극 두께와 두 기판 간격에 따른 DSSC의 효율 특성 (DSSCs Efficiency by Thickness of TiO2 Photoelectrode and Thickness Differences Between Two Substrates)

  • 박한석;권성열;양욱
    • 한국전기전자재료학회논문지
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    • 제25권7호
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    • pp.537-542
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    • 2012
  • DSSCs efficiency by thickness of $TiO_2$ photoelectrode and thickness differences between two substrates studied. DSSCs is made of the doctor blade method and photoelectrode annealing temperature elevated in a different ways. In addition, cells efficiencies of according to the different thickness between $TiO_2$ photoelectrode substrate and Pt counter electrode was measured. Efficiency of DSSCs made with $TiO_2$ photoelectrode of 18 ${\mu}m$ thickness and the gap difference between the substrate 28 ${\mu}m$ shows a highest 4.805% efficiency.

TiN 박막의 탄소성 유한요소해석 (Elastic-Plastic Finite Element Analysis of TiN Thin Film)

  • 김정실;김석삼
    • 한국윤활학회:학술대회논문집
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    • 한국윤활학회 2001년도 제34회 추계학술대회 개최
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    • pp.331-340
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    • 2001
  • Elastic-Plasitc Finite element analysis is peformed about the TiN coated medium. The normal contact is simulated by a rigid asperity pressing the surface of an elastic-plastic half-surface. The case of a surface film stiffer than the substrate is considered, and general solutions for the subsurface stress and deformation fields are presented for several coating thickness. Additionally, the critical normal loads for deformation in the substrate and coating fracture are calculated when the yield of TiN film follows the Maximum Principal Stress Theory and Von Mises Theory. The results can be subsumed in failure maps for TiN thin film on steel.

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