Study on the Composition Analysis and Electrical Properties of Chemical Vapor Deposited PbTiO3 Thin Film

화학증착법에 의한 PbTiO3박막의 조성분석 및 전기적성질에 관한 연구

  • 이혜용 (한국과학기술원 재료공학과) ;
  • 윤순길 (한국과학기술원 재료공학과) ;
  • 김호기 (한국과학기술원 재료공학과)
  • Published : 1989.05.01

Abstract

The PbTiO3 is well known materials having remarkable ferroelectric, piezoelectric, and pyroelectric properties. PbTiO3 thin films with a perovskite structure were successfully fabricated on titanium substrate by chemical vapor deposition. These films were characterized according to composition, crystal structure, and electrical properties. Semi-quantitative compositional analysis of the deposited films was made by Auger Electron Spectroscopy(AES). The PbTiO3 film deposited on titanium substrate at the deposition temperature 75$0^{\circ}C$, the Ti(C2H5O)4 fraction 0.15, and O2 partial pressure 0.06atm, has a columnar structure and grows with(001) preferred orientation, and has stoichiometric composition. A clear dielectric transition and offset in the dc conductivity near the transition temperature(48$0^{\circ}C$) were observed in the deposited lead titanate film.

Keywords

References

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