• 제목/요약/키워드: Ti substrate

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FED용 $ZnGa_2O_4$ 형광체 타겟과 박막의 제작 및 특성분석 (Fabrication and characterization of $ZnGa_2O_4$ phosphor target and thin film for FED)

  • 김용천;홍범주;김경환;박용서;최형욱
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.2
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    • pp.1092-1095
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    • 2004
  • The $ZnGa_2O_4$ phosphor target is synthesized through solid-state reactions as calcine and sintering temperature in order to deposit $ZnGa_2O_4$ phosphor thin film by rf magnetron sputtering system. The $ZnGa_2O_4$ phosphor thin film is deposited on $Pt/Ti/SiO_2/Si$ substrate and prepared $ZnGa_2O_4$ Phosphor thin film is annealed by rapid thermal processor(RTP) at $750^{\circ}C$, 10 sec. The x-ray diffraction patterns of $ZnGa_2O_4$ phosphor target and thin film show the position of (311) main peak. The cathodolumincsccnce(CL) succtrums of $ZnGa_2O_4$ phosphor target show main peak of 360nm and broad bandwidth of about 180nm.

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프렉탈 처리에 의한 BST 박막의 특성에 관한 연구 (A Study on the Characteristics of BST Thin Films Using Fractal Process)

  • 기현철;장동환;홍경진;오수홍;김태성
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 영호남학술대회 논문집
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    • pp.34-38
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    • 2000
  • Recently, the ceramics of high permittivity are applied to DRAM and FRAM. In this study, (Ba, Sr)$TiO_3$ (BST) ceramics thin films were prepared by Sol-Gel method. BST solution was made and spin-coated on Pt/$SiO_2$/Si substrate at 4000 [rpm] for 10 seconds. Coated specimens were dried at $150[^{\circ}C]$ for 5 minutes. Coating process was repeated 3 times and then sintered at $750[^{\circ}C]$ for 30 minutes. Each specimen was analyzed structure and electrical characteristics by Fractal Process. Thickness of BST ceramics thin films are about $2000{\AA}$. Dielectric constant and loss of thin films was little decreased at 1[KHz] - 1[MHz]. Dielectric constant and loss to frequency were 250 and 0.02 in BST3. The property of leakage current as the realation between the current and the voltage was that change of the leakage current was stable when the applied voltage was 0~3[V].

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솔-젤법으로 제작한 BFO/PZT 박막의 용매에 따른 구조적, 전기적 특성 (Structural and Electrical Properties of Sol-gel Derived BFO/PZT Thin Films with Variation of Solvents)

  • 조창현;이주
    • 한국전기전자재료학회논문지
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    • 제24권11호
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    • pp.895-899
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    • 2011
  • Multiferroic BFO/PZT(5/95) multilayer films were fabricated by spin-coating method on the Pt/Ti/$SiO_2$/Si substrate alternately using BFO and PZT(9/95) alkoxide solutions. The structural and dielectric properties were investigated with variation of the solvent and the number of coatings. All films showed the typical XRD patterns of the perovskite polycrystalline structure without presence of the second phase such as $Bi_2Fe_4O_3$. BFO/PZT multilayer thin films showed the typical dielectric relaxation properties with increase an applied frequency. The average thickness of 6-coated BFO/PZT multilayer film was about 600 nm. The dielectric properties such as dielectric constant, dielectric loss and remnant polarization were superior to those of single composition BFO film, and those values for BFO/PZT multilayer film were 1199, 0.23% and 12 ${\mu}C/cm^2$.

스크린 프린팅법으로 제작한 BSCT 후막의 구조적 특성과 유전적 특성 (Structural and dielectric properties of the BSCT thick films fabricated by the screen printing method)

  • 노현지;이성갑;이창공;남성필;이영희
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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    • pp.167-167
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    • 2008
  • The barium strontium calcium titanate powders were prepared by sol-gel method. Ferroelectric $(Ba_{0.54}Sr_{0.36}Ca_{0.1})TiO_3$(BSCT) thick films were fabricated by the screen-printing method on alumina substrate. And we investigated the structural and dielectric properties of BSCT thick films with the variation of sintering temperature. As a result of thermal analysis, BSCT polycrystalline perovskite phase was formed at around $660^{\circ}C$. The results of X-ray diffraction analysis were showed a cubic perovskite structure without presence of the second phase in all BSCT thick films. The average grain size and the thickness of the specimen sintered at $1450^{\circ}C$ were about 1.6 mm and 45 mm, respectively. The relative dielectric constant increased and the dielectric loss decreased with increasing the sintering temperature, the values of the BSCT thick films sintered at $1450^{\circ}C$ were 5641 and 0.4% at 1kHz, respectively.

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두 개의 챔버를 갖는 마이크로 버블펌프의 개발 (Development of having double-chamber in micro-bubble pump)

  • 최종필;박대섭;반준호;김병희;장인배;김헌영
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2003년도 춘계학술대회 논문집
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    • pp.1186-1190
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    • 2003
  • In this paper, a valveless bubble-actuated fluid micropump was has been developed and its performance was tested. The valveless micropump consists of the lower plate, the middle plate, the upper plate and a resistive heater. The lower plate includes the nozzle-diffuser elements and the double-chamber. Nozzle-diffuser elements and a double-chamber are fabricated on the silicon wafer by the DRIE(Deep Reactive Ion Etching) process. The lower plate also has inlet/outlet channels for fluid flow. The middle plate is made of glass and plays the role of the diaphragm. The chamber in the upper plate is filled with deionized water, and which contacts with the resistive heater. The resistive heater is patterned on a silicon substrate by Ti/Pt sputtering. Three plates and the resister heater are laminated by the aligner and bonded in the anodic bonder. Since the bubble is evaporated and condensed periodically in the chamber, the fluid flows from inlet to outlet with respect to the diffusion effect. In order to avoid backflow, the double chamber system is introduced. Analytical and experimental results show the validity of the developed double-chamber micropump.

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금속기판재에 따른 박막형 태양전지의 열변형량 예측에 관한 연구 (Study on the prediction about thermal deformation of thin film solar cell according to metal substrates)

  • 구승현;이흥렬;임태홍
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2007년도 추계학술대회 논문집
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    • pp.285-288
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    • 2007
  • 박막형 태양전지 및 플렉서블 태양전지 기판으로 사용되는 금속기판의 우수성은 잘 알려져 있다. 그러나 상용 금속기판이 직면하고 있는 문제점을 보완하기 위해서 전주법으로 제조된 2원합금 금속포일을 개발하였으며, 박막형 및 플렉서블 태양전지의 기판재로 적용가능성을 확인하였다. 일반적으로 태양전지를 제조할 때 열 공정이 수행되며, 이때 기판재와 cell을 구성하는 반도체의 열팽창 계수 차이에 의한 열변형으로 결함이 발생될 수 있고, 태양전지 효율 및 수명을 저하시키는 원인이 될 수 있다. 이러한 원인이 될 수 있는 구성 재료간의 열팽창계수 차이에 의한 cell 의 변형량을 추정하기 위해 유한요소해석 방법을 사용하였다. 유한요소해석을 수행하기 위해 ALGOR 라는 해석 tool 을 사용하였다. 유한요소해석 수행에 사용된 상용 금속인 Mo, Ti, Al, SUS 포일과 전주법으로 제조된 2원합금 금속포일의 열팽창 계수는 실험을 통한 측정치이며, cell을 구성하는 반도체의 열팽창 계수와 열특성은 참고 문헌에 있는 자료들이다. 이 값들을 기반으로 cell 의 구성을 단순화시킨 가상의 태양전지가 제조 공정 온도에서 상온으로 냉각될 때의 열변형량을 계산하였다.

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$YMnO_3$ 강유전 박막의 열처리 분위기가 결정화거동과 전기적 특성에 미치는 영향 (Effects of Annealing Atmosphere on Crystallization and Electrical Properties in $YMnO_3$ Ferroelectric Thin Films)

  • 윤귀영;김정석;천채일
    • 한국세라믹학회지
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    • 제37권2호
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    • pp.168-173
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    • 2000
  • YMnO3 thin films were prepared on Pt/Ti/SiO2/Si substrate by chemical solution deposition method. The films were crystallized by heat-treatment at 85$0^{\circ}C$ for 1 hour. Effects of an annealing atmosphere(O2, Ar, vacuum) on the crystallization behavior and electridcal properties were investigated. YMnO3 thin films annealed under Ar atmosphere showed a superior crystallinity and a very strong c-aix preferred-orientation which was a polar axis. Leakage current density of the films decreased with lowering oxygen partial pressure of the annealing atmosphere. C-V and P-E ferroelectric hysteresis were observed only in the thin film heat-treated under Ar atmosphere.In order to prepare YMnO3 thin films having both low leakage current and ferroelectricity, the annealing atmsphere should be kept under a proper oxygen partial pressure which was about 1 Pa in this work. Leakage current density at 1 volt, dielectric constant($\varepsilon$r), remanent polarization(Pr), and coercive field(Ec) were 1.7$\times$10-8 A/$\textrm{cm}^2$, 25, 1.08$\mu$C/$\textrm{cm}^2$, and 100 kV/cm, respectively.

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솔-젤법으로 제조한 PZT 박막의 Nb 첨가에 따른 유전 및 전기적 특성 (Dielectric and Electric Properties of Nb Doped PZT Thin Films by Sol-gel Technique)

  • 김창욱;김병호
    • 한국세라믹학회지
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    • 제33권10호
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    • pp.1101-1108
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    • 1996
  • No-doped PZT thin films have been fabricated on Pt/Ti/SiO2/Si substrate using Sol-Gel technique. A fast annealing metho (three times of intermediate and final annealing) was used for the preparation of multi-coated 1800$\AA$ thick Nb-doped PZT thin films. As Nb doping percent was increased leakage current was lowered approximately 2 order but dielectic properties were degraded due to the appearance of pyrochlore phase and domain pinning. Futhermore the increase of the final annealing temperature up to 74$0^{\circ}C$lowered the pyrochlore phase content resulting in enhancing the dielectric properties of the Nb doped films. The 3%-Nb doped PZT thin films with 5% excess Pb showed a capacitance density of 24.04 fF/${\mu}{\textrm}{m}$2 a dielectric loss of 0.13 a switchable polarization of 15.84 $\mu$C/cm2 and a coercive field of 32.7 kV/cm respectively. The leakage current density of the film was as low as 1.47$\times$10-7 A/cm2 at the applied voltage of 1.5 V.

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초고집적회로의 커패시터용 PZT박막의 입열 조건에 따른 유전특성 -1- 비정질 PZT를 사용한 PZT 박막의 누설전류 개선에 관한 연구 (Dielectric properties with heat-input condition of PZT thin films for ULSI's capacitor -1- A study on the improvement of leakage current of PZT thin films using a amorphous PZT layer)

  • 마재평;백수현;황유상
    • 전자공학회논문지A
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    • 제32A권12호
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    • pp.101-107
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    • 1995
  • To improve the leakage current, we developed two step sputtering method where PZT thin film in first deposited at room temperature followed by 600.deg. C deposition. The method used an amorphous PZT layer deposited at room temperature to keep a stable interface during sputtering at high temperature. PZT thin films were deposited on Pt/Ti/SiO$_{2}$/Si substrate at room temperature and 600.deg. C sequentially. The effect of the layer deposited at room temperature was investigated with regard to I-V characteristics and P-E hysteresis loop. In the case of the sample with the layer deposited at room temperature, both leakage current and dielectric constant were decreased. The thicker the layer deposited at room temperature was, the lower dielectric constant was. However, leakage current was indepenent of the variation of the thickness ratio. The sample with 200$\AA$ of the layer deposited at room temperature showed the most promising results in both dielectric constant and leakage current.

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Preparation and Field-Induced Electrical Properties of Perovskite Relaxor Ferroelectrics

  • Fan, Huiqing;Peng, Biaolin;Zhang, Qi
    • Transactions on Electrical and Electronic Materials
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    • 제16권1호
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    • pp.1-4
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    • 2015
  • (111)-oriented and random oriented $Pb_{0.8}Ba_{0.2}ZrO_3$ (PBZ) perovskite relaxor ferroelectric thin films were fabricated on Pt(111)/$TiO_x$/$SiO_2$/Si substrate by sol-gel method. Nano-scaled antiferroelectric and ferroelectric two-phase coexisted in both (111)-oriented and random oriented PBZ thin film. High dielectric tunability (${\eta}=75%$, E = 560 kV/cm) and figure-of-merit (FOM ~ 236) at room temperature was obtained in (111)-oriented thin film. Meanwhile, giant electrocaloric effect (ECE) (${\Delta}T=45.3K$ and ${\Delta}S=46.9JK^{-1}kg^{-1}$ at $598kVcm^{-1}$) at room temperature (290 K), rather than at its Curie temperature (408 K), was observed in random oriented $Pb_{0.8}Ba_{0.2}ZrO_3$ (PBZ) thin film, which makes it a promising material for the application to cooling systems near room temperature. The giant ECE as well as high dielectric tunability are attributed to the coexistence of AFE and FE phases and field-induced nano-scaled AFE to FE phase transition.