• 한국결정성장학회지
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• 제18권2호
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• pp.72-75
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• 2008

Zinc oxide (ZnO) thin films were prepared by a sol-gel method. The structural and electrical properties were investigated by varying drying and annealing temperatures. The thin films were coated (250 nm) by spin-coating method on glass substrates. The optimum drying temperature of ZnO thin films was 300$^{\circ}C$ where the resistivity was the lowest and the preferred c-axis orientation was the highest. The annealing was carried out in air and inert atmospheric conditions. The degree of the preferred c-axis orientation was estimated. The highest preferred c-axis orientation was recorded at 600$^{\circ}C$. The preferred c-axis orientation and grain growth resulted in the mobility enhancement of the ZnO thin films, and the lowest resistivity was 0.62${\Omega}{\cdot}cm$ at 600$^{\circ}C$.

• Journal of Korean Vacuum Science & Technology
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• 제6권1호
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• pp.36-39
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• 2002

Molybdena powder was heated at both 660$^{\circ}C$ and 700$^{\circ}C$ for half-hour in an evaporation-deposition device. The molybdena thin films deposited on the surfaces of alumina ceramics displayed two kinds of fractal aggregates, i.e., the stackings of ribbon-like crystals and ramified palm-like structures. It is revealed from the experimental results that the microstructures of these fractal aggregates depended strongly on their growth conditions. The dynamics of fractal growth of molybdena thin film is discussed.

• 한국전기전자재료학회논문지
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• 제36권1호
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• pp.74-80
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• 2023

Gallium oxide (Ga₂O₃) thin films were grown on c-, a-, m-, r-plane sapphire substrates using a mist chemical vapor deposition system. Various growth temperature range of 400~600℃ was applied for Ga₂O₃ thin film deposition. Then, several structural properties were characterized such as film thickness, crystal phase, lattice orientation, surface roughness, and optical bandgap. Under the certain growth temperature of 500℃, all grown Ga₂O₃ featured rhombohedral crystal structures and well-aligned preferred orientation to sapphire substrate. The films grown on c-and r-plane sapphire substrates, showed low surface roughness and large optical bandgap compared to those on a-and m-plane substrates. Therefore, various sapphire orientation can be potentially applicable for future Ga₂O₃-based electronics applications.

• 마이크로전자및패키징학회지
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• 제31권2호
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• pp.85-91
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• 2024

본 연구에서는 MOCVD 장비를 사용하여 c-plane sapphire 기판 위에 𝛽-Ga₂O₃ 박막을 성장시키는 방법을 조사하였다. 우리는 𝛽-Ga₂O₃ 박막의 결정성을 높이기 위한 최적의 성장 조건을 확인하였으며, 박막의 결정성에 있어 O₂와 Ga 전구체 간의 비율이 결정 성장에 미치는 영향을 확인하였다. 성장 온도의 범위는 600~1100℃ 였으며 O₂/TMGa의 비율이 800 ~ 6000일 때 결정성을 분석하였다. 결과적으로 1100℃에서 전구체 간의 몰비가 2400일 때 가장 높은 결정성의 박막을 얻을 수 있었다. 박막의 표면을 주사 전자 현미경으로 관찰하였으며, 박막의 XRD ω-스캔 시 FWHM은 (${\bar{2}}01$), (${\bar{4}}02$) 회절 피크에서 각각 1.17°, 1.43°로 나타났다. 이렇게 얻어낸 박막의 경우, 가시광선 영역에서 80% 이상의 높은 투과율을 보였으며, 박막의 밴드갭 에너지는 4.78 ~ 4.88 eV였다.

• 한국표면공학회지
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• 제55권2호
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• pp.96-101
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• 2022

The effects of the growth temperature on the structural, optical, and morphological properties of BaWO₄:Sm³⁺ phosphor thin films were investigated. The BaWO₄:Sm³⁺ thin films were grown on quartz substrates at several growth temperatures by radio-frequency magnetron sputtering. All the thin films crystallized in a tetragonal structure with a main BaWO₄ (112) diffraction peak. The 830 nm-thick BaWO₄:Sm³⁺ thin films grown at 300 ℃ exhibited numerous polygon-shaped particles. The excitation spectra of BaWO₄:Sm³⁺ thin films consisted of a broad excitation band in the 200-270 nm with a maximum at 236 nm due to the O^2--Sm³⁺ charge transfer and two small bands peaked at 402 and 463 nm, respectively. Under 236 nm excitation, the BaWO₄:Sm³⁺ thin films showed an intense red emission peak at 641 nm due to the ⁴G_5/2→⁶H_9/2 transition of Sm³⁺, indicating that the Sm³⁺ ions occupied sites of non-inversion symmetry in the BaWO₄ host lattice. The highest emission intensity was observed for the thin film grown at 300 ℃, with a 51.8% transmittance and 5.09 eV bandgap. The average optical transmittance in the wavelength range of 500-1100 nm was increased from 53.2% at 200 ℃ to 60.8% after growing at 400 ℃. These results suggest that 300 ℃ is the optimum temperature for growing redemitting BaWO₄:Sm³⁺ thin films.

• 한국전기전자재료학회논문지
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• 제17권3호
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• pp.329-332
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• 2004

ZnO thin films were grown with different plume-substrate angles by pulsed laser deposition (PLD) to control the amount of ablated species arriving on a substrate per laser shot. The angles between plume propagation direction and substrate plane (P-S angle) were 0$^{\circ}$, 45$^{\circ}$ and 90$^{\circ}$. The growth time was changed in order to adjust film thickness. From the XRD pattern exhibiting a dominant (002) and a minor (101) XRD peak of ZnO, all films were found to be well oriented along c-axis. From the AFM image, it was found that the grain size of ZnO thin film was increased, as P-S angle decreased. UV intensity investigated by PL (Photoluminescence) increased as P-S angle decreased.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 춘계학술대회 논문집
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• pp.94-97
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• 2005

Bismuth high Tc superconducting thin films are fabricated via a co-deposition process by an ion beam sputtering with an ultra low growth rate, and sticking processing of the respective elements are evaluated. The sticking processing of bismuth element in bismuth high Tc superconducting thin film formation was observed to show a unique temperature dependence; it was almost a constant value of 0.49 below about $730^{\circ}C$ and decreased linearly over about $730^{\circ}C$. This temperature dependence can be elucidated from the evaporation and sublimation rates of bismuth oxide, $Bi_2O_3$, from the film surface. It is considered that the liquid phase of the bismuth oxide plays an important role in the bismuth phase formation in the co-deposition process.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 추계학술대회 논문집
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• pp.340-341
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• 2007

Thin film of ZnO was deposited on various substrate by Nd:YAG Pulsed Laser Deposition(PLD) with a wavelength of 355nm. Further more, Thin filme of ZnO conducted by various temperature conditions. The surface morphology of the ZnO thin film was investigated by X-Ray Diffraction(XRD) and Atomic Force Microscopy(AFM). Effects of various substrates and Temperature conditions were analyzed. The best properties were obtained on $600^{\circ}C$ with post-deposition annealing at $600^{\circ}C$ in flowing $O_2$ atmosphere for several hours.

• 한국표면공학회지
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• 제47권6호
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• pp.287-292
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• 2014

The present study deals with a numerical analysis on the island growth of heteroepitaxial thin-films through local surface diffusivity enhancement. A non-linear governing equation for the surface waviness evolution in lattice-mismatched material systems is developed for the case of spatially-varying surface diffusivity. Results show that a flat film that is stable under constant diffusivity conditions evolves to form nanostructures upon externally-induced spatial diffusivity modulation. The periodicity of waviness can be controlled by changing the modulation parameters, which allows for generation of pattern arrays. The present study therefore points towards a post-deposition treatment technique that achieves controllability and order in the structure formation process for applications in nanoelectronics and thin-film devices.

• 한국생산제조학회지
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• 제25권4호
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• pp.266-270
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• 2016

We present a useful and practical manufacturing technique that enables the structural conversion of delicate as-grown nanostructures to more beneficial and robust thin-film frameworks through controlled mechanical rolling. Functional nanostructures such as carbon nanotubes grown through chemical vapor deposition in a vertically aligned and very loosely packed manner, and thus difficult to manipulate for subsequent uses, can be prepared in an array of thin blades by patterning the growth catalyst layer. They can then be toppled as dominos through precisely controlled mechanical rolling. The nanostructures formulated to horizontally aligned thin films are much more favorable for device applications typically based on thin-film configuration. The proposed technique may broaden the functionality and applicability of as-grown nanostructures by converting them into thin-film frameworks that are easier to handle and more durable and favorable for fabricating thin-film devices for electronics, sensors, and other applications.