• Title/Summary/Keyword: Thin film growth

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Dependence of Magnetic and Magneto-Optic Properties on Deposition Angle in E-Beam EVaporated Co/Pt Multilayer Films (전자빔 증착 Co/Pt 다층박막에서 입사 선속의 방향에 따른 자기 및 자기광학적 성질 변화 연구)

  • 문기석;신성철
    • Journal of the Korean Magnetics Society
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    • v.4 no.4
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    • pp.313-318
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    • 1994
  • We have investigated the effects of deposition angle on magnetic and magneto-optic properties in Co/Pt multilayer thin films. which were prepared bye-beam evaporation on tilted substrates. with varying tilt angle from $0^{\circ}$ to $60^{\circ}$. The structure of the specimens was examined by x-ray diffractometer and scanning electron microscope. and the magnetic and magneto-optical properties were measured by VSM, torque magnetometer, and Kerr loop tracer. X-ray diffractometry revealed that all of the specimens had multilayer structure and growth orientation of column followed the tangent rule but the crystallograpic orientation, <111>, was slightly deviated from the substrate normal even though the deposition angle was increased up to $60^{\circ}$. A decrement of the magnetization and Kerr angle with the deposition angle was related with that of the film density due to increasing porosity. The perpendicular mag¬netic anisotropy was also decreased with increasing the deposition angle.

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Fabrication of anodic aluminum oxide nanotemplate using sputtered aluminum thin film (스퍼터 증착된 알루미늄 박막을 이용한 양극산화 알루미늄 나노템플레이트 제조)

  • Lee, Jae-Hyeong
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.14 no.4
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    • pp.923-928
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    • 2010
  • Anodic aluminum oxide (AAO) nanotemplates for nano electronic device applications have been attracting increasing interest because of ease of fabrication, low cost process, and possible fabrication in large area. The size and density of the nanostructured materials can be controlled by changing the pore diameter and the pole density of AAO nanotemplate. In this paper, nano porous alumina films AAO nanotemplate was fabricated by second anodization method using sputterd Al films. In addition, effects of electrolyte temperature and anodization voltate on the microstructure of porous alumina films were investigated. As the electrolyte temperature was increased from $8^{\circ}C$ to $20^{\circ}C$, the growth rate of nanoporous alumina films was increased from 86.2 nm/min to 179.5 nm/min. The AAO nanotemplate fabricated with optimal condition had the mean pore diameter of 70 nm and the pore depth of $1\;{\mu}m$.

Influence of Hydrogen on Al-doped ZnO Thin Films in the Process of Deposition and Annealing

  • Chen, Hao;Jin, Hu-Jie;Park, Choon-Bae;Hoang, Geun-C.
    • Transactions on Electrical and Electronic Materials
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    • v.10 no.3
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    • pp.93-96
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    • 2009
  • The Al-doped ZnO (AZO) films were deposited on a glass substrate by RF magnetron sputtering in pure Ar and $Ar+H_2$ gas ambient at temperature of $100^{\circ}C$ and annealed in hydrogen ambient at the temperature range from 100 to 300 $^{\circ}C$, respectively. It was found that either the addition of hydrogen to the sputtering gas or the annealing treatment effectively reduced the resistivity of the AZO films. When the AZO films were annealed at the temperature of 300 $^{\circ}C$ for lhr in a hydrogen atmosphere, the resistivity decreased from $2.60{\times}10^{-3}\;{\Omega}cm$ to $8.42{\times}l0^{-4}\;{\Omega}cm$ for the film deposited in pure Ar gas ambient. Under the same annealing conditions of temperature and hydrogen ambient, the resistivity of AZO films deposited in the $Ar+H_2$ gas mixture decreased from $8.22{\times}l0^{-4}\;{\Omega}cm$ to $4.25{\times}l0^{-4}\;{\Omega}cm$. The lowest resistivity of $4.25{\times}l0^{-4}\;{\Omega}cm$ was obtained by adding hydrogen gas to the deposition and annealing process. X-ray diffraction (XRD) pattern of all films showed preferable growth orientation of (002) plane. The average transmittance is above 85 % and in the range of 400-1000 nm for all films.

큰 알루미늄 덩어리 증착(large aluminum cluster deposition)에 관한 분자동력학 시뮬레이션

  • 강정원;최기석;문원하;변기량;최재훈;김태원;이강환;강유석;황호정
    • Proceedings of the Korean Vacuum Society Conference
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    • 2000.02a
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    • pp.168-168
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    • 2000
  • Yamada 등의 덩어리 증착에 관한 연구 이후 낮은 기판 온도에서 결정성이 뛰어난 금속박막성장(thin film growth)을 얻을 수 있는 방법으로 최근 덩어리 증착(cluster depositon) 방법에 관하여 많은 연구들이 진행되어 덩어리 충돌이 원자 충돌인 경우와 큰 차이를 보이는 결과를 얻었으며, 덩어리 증착시 기판 내부에 점결함(point defect)이 발생되지 않는다는 중요한 결과를 얻었다. 금속 덩어리를 사용한 금속박막성장은 높은 박막성장속도와 뛰어난 구조 재배열 효과를 얻을 수 있으며 기판의 격자 손상을 감소시키기 때문에 향후 나노미터 소자 개발에 응용성이 클 것으로 예상된다. 그러나 금속 덩어리와 금속 표면사이의 상호작용에서 발생되는 기본적인 역학(mechanism)은 분명하게 알려져 있지 않다. 지금까지 알루미늄 덩어리의 원자구조와 특성에 관한 연구는 수행되어졌지만 (4,5), 알루미늄 덩어리 증착에 관한 연구는 수행되지 않았다. 본 연구에서는 13~177개로 이루어진 큰 알루미늄 덩어리들의 증착에 관하여 Md(molecular dynamics) 방법을 사용하여 연구하였다. MD 시뮬레이션을 사용하여 덩어리 증착시 기판 표면과의 충돌 초기에 나타나는 덩어리 내부 원자들의 상관충돌효과(correlated collisions effect)에 의하여 덩어리 크기에 따른 증착현상과 여러 물리적 현상들을 관찰하였다. 덩어리 총 에너지가 증가할수록 기판의 최고 온도는 증가하며, 덩어리 크기가 클수록 상관충돌효과가 커지기 때문에 덩어리의 총 에너지에 다른 최고 증가 비율은 적어졌다. 시간에 따른 비정렬 원자수(disordered atom number) 비교를 통하여 덩어리가 클수록 구조 재배열이 더 잘 이루어진다는 것을 알 수 있었고, 원자당 에너지가 클수록 덩어리 원자들이 기판 내부로 더 깊이 들어갔고, 덩어리 크기가 클수록 상관충돌효과로 인하여 덩어리 원자들이 기판 내부로 더 깊이 들어가는 것을 알 수 있었고, 덩어리 크기가 클수록 상관충돌효과는 커지고 더욱 부드러운 증착이 이루어졌으며, 무엇보다도 덩어리 증착시 표면에서 구조 재배열이 잘 이루어지는 특징을 살펴볼 수 있었다. 이러한 알루미늄 덩어리를 생성하여 증착할 수 있을 경우, 뛰어난 재배열 효과를 이용하여 품질이 향상된 반도체 소자를 제조할 수 있을 것으로 사료된다.

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Fabrication and Evaluation Properties of Titanium Sintered-body for a Sputtering Target by Spark Plasma Sintering Process (방전플라즈마 소결 공정을 이용한 스퍼터링 타겟용 타이타늄 소결체 제조 및 특성 평가)

  • Lee, Seung-Min;Park, Hyun-Kuk;Youn, Hee-Jun;Yang, Jun-Mo;Woo, Kee-Do;Oh, Ik-Hyun
    • Korean Journal of Metals and Materials
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    • v.49 no.11
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    • pp.845-852
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    • 2011
  • The Spark Plasma Sintering(SPS) method offers a means of fabricating a sintered-body having high density without grain growth through short sintering time and a one-step process. A titanium compact having high density and purity was fabricated by the SPS process. It can be used to fabricate a Ti sputtering target with controlled parameters such as sintering temperature, heating rate, and pressure to establish the optimized processing conditions. The compact/target(?) has a diameter of ${\Phi}150{\times}6.35mm$. The density, purity, phase transformation, and microstructure of the Ti compact were analyzed by Archimedes, ICP, XRD and FE-SEM. A Ti thin-film fabricated on a $Si/SiO_2$ substrate by a sputtering device (SRN-100) was analyzed by XRD, TEM, and SIMS. Density and grain size were up to 99% and below $40{\mu}m$, respectively. The specific resistivity of the optimized Ti target was $8.63{\times}10^{-6}{\Omega}{\cdot}cm$.

The Effect of Plasma Gas Composition on the Nanostructures and Optical Properties of TiO2 Films Prepared by Helicon-PECVD

  • Li, D.;Dai, S.;Goullet, A.;Granier, A.
    • Nano
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    • v.13 no.10
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    • pp.1850124.1-1850124.12
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    • 2018
  • $TiO_2$ films were deposited from oxygen/titanium tetraisopropoxide (TTIP) plasmas at low temperature by Helicon-PECVD at floating potential ($V_f$) or substrate self-bias of -50 V. The influence of titanium precursor partial pressure on the morphology, nanostructure and optical properties was investigated. Low titanium partial pressure ([TTIP] < 0.013 Pa) was applied by controlling the TTIP flow rate which is introduced by its own vapor pressure, whereas higher titanium partial pressure was formed through increasing the flow rate by using a carrier gas (CG). Then the precursor partial pressures [TTIP+CG] = 0:027 Pa and 0.093 Pa were obtained. At $V_f$, all the films exhibit a columnar structure, but the degree of inhomogeneity is decreased with the precursor partial pressure. Phase transformation from anatase ([TTIP] < 0.013 Pa) to amorphous ([TTIP+CG] = 0:093 Pa) has been evidenced since the $O^+_2$ ion to neutral flux ratio in the plasma was decreased and more carbon contained in the film. However, in the case of -50 V, the related growth rate for different precursor partial pressures is slightly (~15%) decreased. The columnar morphology at [TTIP] < 0.013 Pa has been changed into a granular structure, but still homogeneous columns are observed for [TTIP+CG] = 0:027 Pa and 0.093 Pa. Rutile phase has been generated at [TTIP] < 0:013 Pa. Ellipsometry measurements were performed on the films deposited at -50 V; results show that the precursor addition from low to high levels leads to a decrease in refractive index.

Frictional Anisotropy of CVD Bi-Layer Graphene Correlated with Surface Corrugated Structures

  • Park, Seonha;Choi, Mingi;Kim, Seokjun;Kim, Songkil
    • Tribology and Lubricants
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    • v.38 no.6
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    • pp.235-240
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    • 2022
  • Atomically-thin 2D nanomaterials can be easily deformed and have surface corrugations which can influence the frictional characteristics of the 2D nanomaterials. Chemical vapor deposition (CVD) graphene can be grown in a wafer scale, which is suitable as a large-area surface coating film. The CVD growth involves cooling process to room temperature, and the thermal expansion coefficients mismatch between graphene and the metallic substrate induces a compressive strain in graphene, resulting in the surface corrugations such as wrinkles and atomic ripples. Such corrugations can induce the friction anisotropy of graphene, and therefore, accurate imaging of the surface corrugation is significant for better understanding about the friction anisotropy of CVD graphene. In this work, the combinatorial analysis using friction force microscopy (FFM) and transverse shear microscopy (TSM) was implemented to unveil the friction anisotropy of CVD bi-layer graphene. The periodic friction anisotropy of the wrinkles was measured following a sinusoidal curve depending on the angles between the wrinkles and the scanning tip, and the two domains were observed to have the different friction signals due to the different directions of the atomic ripples, which was confirmed by the high-resolution FFM and TSM imaging. In addition, we revealed that the atomic ripples can be easily suppressed by ironing the surface during AFM scans with an appropriate normal force. This work demonstrates that the friction anisotropy of CVD bilayer graphene is well-correlated with the corrugated structures and the local friction anisotropy induced by the atomic ripples can be controllably removed by simple AFM scans.

Evaluation of Antioxidant Potential and UV Protective Properties of Four Bacterial Pigments

  • Rupali Koshti;Ashish Jagtap;Domnic Noronha;Shivali Patkar;Jennifer Nazareth;Ruby Paulose;Avik Chakraborty;Pampi Chakraborty
    • Microbiology and Biotechnology Letters
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    • v.50 no.3
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    • pp.375-386
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    • 2022
  • In the present study, four distinctly colored bacterial isolates that show intense pigmentation upon brief ultraviolet (UV) light exposure are chosen. The strains are identified as Micrococcus luteus (Milky yellow), Cryseobacterium pallidum (Yellow), Cryseobacterium spp. (Golden yellow), and Kocuria turfanensis (Pink) based on their morphological and 16S rDNA analysis. Moderate salinity (1.25%), 25-37℃ temperature, and pH of 7.2 are found to be the most favorable conditions of growth and pigment production for all the selected isolates. The pigments are extracted using methanol: chloroform (1:1) and the purity of the pigments are confirmed by high-performance liquid chromatography (HPLC) and thin-layer chromatography (TLC). Further, Fourier transform infrared (FTIR) and UV-Visible spectroscopy indicate their resemblance with carotenoids and flexirubin family. The antioxidant activities of the pigments are estimated, and, all the pigments have shown significant antioxidant efficacy in 2,2'-azino-bis(3-ethylbenzothiazoline-6-sulfonic acid) (ABTS), 2,2-diphenyl-1-picryl-hydrazyl (DPPH), and ferric reducing antioxidant power (FRAP) assays. The UV protective property of the pigments is determined by cling-film assay, wherein, at least 25% of UV sensitive Escherichia coli survive with bio-pigments even after 90 seconds of UV exposure compared to control. The pigments also hold a good sun protective factor (SPF) value (1.5-4.9) which is calculated with the Mansur equation. Based on these results, it can be predicted that these bacterial pigments can be further developed into a promising antioxidant and UV-protectant for several biomedical applications.

UV-cured Polymer Solid Electrolyte Reinforced using a Ceramic-Polymer Composite Layer for Stable Solid-State Li Metal Batteries

  • Hye Min Choi;Su Jin Jun;Jinhong Lee;Myung-Hyun Ryu;Hyeyoung Shin;Kyu-Nam Jung
    • Journal of Electrochemical Science and Technology
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    • v.14 no.1
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    • pp.85-95
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    • 2023
  • In recent years, solid-state Li metal batteries (SSLBs) have attracted significant attention as the next-generation batteries with high energy and power densities. However, uncontrolled dendrite growth and the resulting pulverization of Li during repeated plating/stripping processes must be addressed for practical applications. Herein, we report a plastic-crystal-based polymer/ceramic composite solid electrolyte (PCCE) to resolve these issues. To fabricate the one-side ceramic-incorporated PCCE (CI-PCCE) film, a mixed precursor solution comprising plastic-crystal-based polymer (succinonitrile, SN) with garnet-structured ceramic (Li7La3Zr2O12, LLZO) particles was infused into a thin cellulose membrane, which was used as a mechanical framework, and subsequently solidified by using UV-irradiation. The CI-PCCE exhibited good flexibility and a high room-temperature ionic conductivity of over 10-3 S cm-1. The Li symmetric cell assembled with CI-PCCE provided enhanced durability against Li dendrite penetration through the solid electrolyte (SE) layer than those with LLZO-free PCCEs and exhibited long-term cycling stability (over 200 h) for Li plating/stripping. The enhanced Li+ transference number and lower interfacial resistance of CI-PCCE indicate that the ceramic-polymer composite layer in contact with the Li anode enabled the uniform distribution of Li+ flux at the interface between the Li metal and CI-PCCE, thereby promoting uniform Li plating/stripping. Consequently, the Li//LiFePO4 (LFP) full cell constructed with CI-PCCE demonstrated superior rate capability (~120 mAh g-1 at 2 C) and stable cycle performance (80% after 100 cycles) than those with ceramic-free PCCE.

Magnetic and Electric Transport Properties of MnTe Thin Film Grown by Molecular Beam Epitaxy (분자선 증착법에 의해 성장한 MnTe 박막의 자기적 및 전기수송 특성)

  • Kim, Woo-Chul;Bae, Sung-Whan;Kim, Sam-Jin;Kim, Chul-Sung;Kim, Kwang-Joo;Yoon, Jung-Bum;Jung, Myung-Hwa
    • Journal of the Korean Magnetics Society
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    • v.17 no.2
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    • pp.81-85
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    • 2007
  • MnTe layers of high crystalline quality were successfully grown on Si(100) : B and Si(111) substrates by molecular beam epitaxy (MBE). Under tellurium-rich condition and the substrate temperature around $400^{\circ}C$, a layer thickness of $700{\AA}$ could be easily obtained with the growth rate of $1.1 {\AA}/s$. We investigated the structural, magnetic and transport properties of MnTe layers by using x-ray diffraction (XRD), superconducting quantum interference device (SQUID) magnetometry, and physical properties measurement system (PPMS). Characterization of MnTe layers on Si(100) : B and Si(111) substrates by XRD revealed a hexagonal structure of polycrystals with lattice parameters, ${\alpha}=4.143{\pm}0.001{\AA}\;and\;c=6.707{\pm}0.001{\AA}$. Investigation of magnetic and transport properties of MnTe films showed anomalies unlike antiferromagnetic powder MnTe. The temperature dependence of the magnetization data taken in zero-field-tooling (ZFC) and field-cooling (FC) conditions indicates three magnetic transitions at around 21, 49, and 210 K as well as the great irreversibility between ZFC and FC magnetization in the films. These anomalies are attributable to a magnetic-elastic coupling in the films. Magnetization measurements indicate ferromagnetic behaviour with hysteresis loops at 5 and 300 K for MnTe polycrystalline film. The coercivity ($H_c$) values at 5 and 300 K are 55 and 44 Oe, respectively. In electro-transport measurements, the temperature dependence of resistivity revealed a noticeable semiconducting behaviours and showed conduction via Mott variable range hopping at low temperatures.