• 제목/요약/키워드: Thermal-structure Stability

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n-InGaAs MOSFETs을 위한 Pd 중간층을 이용한 Ni-InGaAs의 열 안정성 개선 (Improvement of Thermal Stability of Ni-InGaAs Using Pd Interlayer for n-InGaAs MOSFETs)

  • 이맹;신건호;이정찬;오정우;이희덕
    • 한국전기전자재료학회논문지
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    • 제31권3호
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    • pp.141-145
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    • 2018
  • Ni-InGaAs shows promise as a self-aligned S/D (source/drain) alloy for n-InGaAs MOSFETs (metal-oxide-semiconductor field-effect transistors). However, limited thermal stability and instability of the microstructural morphology of Ni-InGaAs could limit the device performance. The in situ deposition of a Pd interlayer beneath the Ni layer was proposed as a strategy to improve the thermal stability of Ni-InGaAs. The Ni-InGaAs alloy layer prepared with the Pd interlayer showed better surface roughness and thermal stability after furnace annealing at $570^{\circ}C$ for 30 min, while the Ni-InGaAs without the Pd interlayer showed degradation above $500^{\circ}C$. The Pd/Ni/TiN structure offers a promising route to thermally immune Ni-InGaAs with applications in future n-InGaAs MOSFET technologies.

에폭시 수지의 전자선 및 열경화 특성에 관한 연구 (A Comparative Study on Electron-Beam and Thermal Curing Properties of Epoxy Resins)

  • 이재락;허건영;박수진
    • 폴리머
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    • 제26권1호
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    • pp.80-87
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    • 2002
  • 전자선 및 열경화 방법을 사용한 에폭시 수지의 경화거동과 열안정성 효과를 알아보기 위하여 비교 연구를 수행하였다. 본 연구에서는, benzylquinoxalinium hexafluoroantimonate(BQH)가 에폭시 수지의 잠재성 양이온 촉매로서 사용되었다. 열중량분석(TGA)에 의하면, Coats-Redfern 방법에 기초한 분해활성화 에너지는 열경화 방법의 경우가 더 높게 나타났다. 이것은 열로 경화되어진 에폭시 수지의 높은 가교 밀도로 인해 열확산 속도가 느려졌기 때문으로 사료된다. 그러나, 전자선 방법으로 경화되어진 에폭시 수지에서는 안정한 짧은 고리구조, 적분열분해온도, 그리고 높은 충격강도를 위한 최종적인 연성 특성을 향상시키는 수산화기의 증가가 근적외선 분광기(NIRS) 측정으로 관찰되었다.

Study on Productivity and Genotype Structure by Several Enzyme Loci of Silkworm(Bombyx mori L.) Parthenoclones Obtained by Thermal and Combined(Low-High Temperature) Method

  • Vasileva, Jolanda Bogdanova;Staykova, Teodora Atanasova;Tzenov, Panomir Ivanov
    • International Journal of Industrial Entomology and Biomaterials
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    • 제18권2호
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    • pp.131-134
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    • 2009
  • The purpose of this study was to establish whether there are differences in the productivity of the same silkworm(Bombyx mori L.) parthenoclones, obtained by two different methods-thermal and combined, as well as to study their genotype structure by several enzyme loci. It was established that all individuals of parthenoclones Joana, Joana(${\downarrow}{\uparrow}$), Pohi and Pohi(${\downarrow}{\uparrow}$), are homozygous by the studied esterase and phosphoglucomutase loci, which substantiated the clones' genetic stability. By comparative analysis of some biological and technological properties, it was found that parthenoclone Pohi(${\downarrow}{\uparrow}$) obtained by low-high temperature activation is characterized by higher values of these properties as compared to parthenoclone Pohi obtained by thermal parthenogenesis. Comparing the two methods of inducing ameiotic parthenogenetic development, we would recommend that parthenoclone Joana is sustained by thermal parthenogenesis, and parthenoclone Pohi-by the combined method (low-high temperature).

길이진동을 이용하는 PZT계 세라믹 공진자의 온도안정성에 관한 연구 (A Study on Temperature Stability of PZT Piezoelectric Ceramic Resonators using Length Extensional Vibration)

  • 한성훈;임대관;이개명
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1999년도 추계학술대회 논문집 학회본부 C
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    • pp.885-887
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    • 1999
  • The piezoelectric ceramic resonator using length extensional vibration rather than contour extensional vibration in terms of the size is suitable for personal portable communication. In this paper, $Pb(Zr_{x}Ti_{l-x})O_{3}$ + r[wt%]$Cr_{2}O_{3}$ ceramics, x=0.56, 0.53, 0.50 (ie, Zr/Ti ratios = 56 /44, 53/47, 50/50) r=0, 0.3[wt %], were fabricated. Temperature stability of length extensional vibration mode of those specimens was investigated. Both crystal structure with rhombohedral phase in the case of no addition of $Cr_{2}O_{3}$ and crystal structure with morphotrophic phase boundary in case of additions of 0.3[wt %]$Cr_{2}O_{3}$ had the vest temperature stability and improved temperature stability through thermal aging.

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Blends of Silicone Rubber and Liquid Crystalline Polymer

  • Shivakumar E.;Das C. K.;Pandey K. N.;Alam S.;N.Mathur G.
    • Macromolecular Research
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    • 제13권2호
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    • pp.81-87
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    • 2005
  • Blends of silicone rubber (VMQ) and liquid crystalline polymer (LCP) were prepared by the melt mixing technique. Mechanical, XRD, thermal and dynamic mechanical investigations are reported for the pure silicone rubber and blends. The mechanical properties, viz. the tensile strength, tear strength and elongation at break, of the silicone rubber decreased with the addition of LCP. The SEM study on the tensile fractured surface of the blends revealed that they had a two phase structure, and that the failure was mainly due to fiber pull out, which suggests that the VMQ and LCP are incompatible in all of the proportions examined in this study. However, the FTIR study shows that there was a partial interaction between the VMQ and LCP, but which may not be sufficient to grip the fibrils under the applied load. In the XRD analysis, it was observed that the crystalline structure of the silicone rubber deteriorated in the presence of LCP. The DMA study suggested that the storage modulus of the silicone rubber was improved with the addition of LCP, due to the high modulus of the LCP phase. The thermal stability of the silicone rubber was greatly reduced by the addition of LCP, due to the latter having a thermal stability lower than that of silicone rubber.

고온에서의 알칼리 활성화 내화성 결합재의 강도 및 공극구조 평가 (Estimation of Strength and Pore Structure of Alkali-Activated Fire Protection Materials at High Temperature)

  • 송훈;김영호;김완기;소형석
    • 한국디지털건축인테리어학회논문집
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    • 제12권4호
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    • pp.59-66
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    • 2012
  • This study is interested in identifying the effectiveness of alkali-activated fire protection material compounds including the alkali-activator such as potassium hydroxide, sodium silicate and fly ash as the fire resistant finishing materials. Also, this paper is concerned with change in compressive strength and pore structure of the alkali-activated fire protection material at high temperatures. The testing methods of fire protection materials in high temperature properties are make use of TG-DSC and mercury intrusion porosimetry measurements. This study results show that compressive strength is rapidly degraded depending on a rise of heating temperature. Porosity showed a tendency to increase irrespective of specimen types. This is due to both the outbreak of collapse of gel comprising the cement and a micro crack by heating. However, alkali-activated fire protection material composed of potassium hydroxide, sodium silicate and fly ash has the thermal stability of the slight decrease of compressive strength and porosity at high temperature. These thermal stability is caused by the ceramic binding capacity induced by alkali activation reaction by the reason of the thermal analysis result not showing the decomposition of calcium hydrate.

Effect of Vacuum Annealing on Thin Film Nickel Silicide for Nano Scale CMOSFETs

  • Zhang, Ying-Ying;Oh, Soon-Young;Kim, Yong-Jin;Lee, Won-Jae;Zhong, Zhun;Jung, Soon-Yen;Li, Shi-Guang;Kim, Yeong-Cheol;Wang, Jin-Suk;Lee, Hi-Deok
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 하계학술대회 논문집 Vol.7
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    • pp.10-11
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    • 2006
  • In this study, the Ni/Co/TiN (6/2/25 nm) structure was deposited for thermal stability estimation. Vacuum (30 mTorrs) annealing was carried out to compare with furnace annealing in nitrogen ambient. The proposed Ni/Co/TiN structure exhibited low temperature silicidation and wide range of rapid thermal process (RTP) windows. The sheet resistance was too high to measure after furnace annealing at $600^{\circ}C$ due to the thin thickness (15 nm) of the nickel silicide. However, the sheet resistance maintained stable characteristics up to $600^{\circ}C$ for 30 min after vacuum annealing. Therefore, the low resistance of thin film nickel silicide was obtained by vacuum annealing at $600^{\circ}C$.

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$Ta_2O_{5}$ 커패시터 박막의 유전 특성과 열 안정성에 관한 연구 (The Study on Dielectric Property and Thermal Stability of $Ta_2O_{5}$ Thin-films)

  • 김인성;이동윤;송재성;윤무수;박정후
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제51권5호
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    • pp.185-190
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    • 2002
  • Capacitor material utilized in the downsizing passive devices and dynamic random access memory(DRAM) requires the physical and electrical properties at given area such as capacitor thickness reduction, relative dielectric constant increase, low leakage current and thermal stability. Common capacitor materials, $SiO_2$, $Si_3N_4$, $SiO_2$/$Si_3N_4$,TaN and et al., used until recently have reached their physical limits in their application to several hundred angstrom scale capacitor. $Ta_2O_{5}$ is known to be a good alternative to the existing materials for the capacitor application because of its high dielectric constant (25 ~35), low leakage current and high breakdown strength. Despite the numerous investigations of $Ta_2O_{5}$ material, there have little been established the clear understanding of the annealing effect on capacitance characteristic and conduction mechanism, design and fabrication for $Ta_2O_{5}$ film capacitor. This study presents the structure-property relationship of reactive-sputtered $Ta_2O_{5}$ MIM capacitor structure processed by annealing in a vacuum. X-ray diffraction patterns skewed the existence of amorphous phase in as-deposited condition and the formation of preferentially oriented-$Ta_2O_{5}$ in 670, $700^{\circ}C$ annealing. On 670, $700^{\circ}C$ annealing under the vacuum, the leakage current decrease and the enhanced temperature-capacitance characteristic stability. and the leakage current behavior is stable irrespective of applied electric field. The results states that keeping $Ta_2O_{5}$ annealed at vacuum gives rise to improvement of electrical characteristics in the capacitor by reducing oxygen-vacancy and the broken bond between Ta and O.

Changes in the Modulation Amplitude and the Particle Sizes of Co/Pd Multilayers During Stress Release and Interdiffusion

  • Kim, Jai-Young;Evetts, Jan-E
    • Journal of Magnetics
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    • 제3권1호
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    • pp.21-30
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    • 1998
  • An artificially modulated magnetic Co/Pd multilayer is one of the promising candidates for high density magneto-optic (MO) recording media, due to large Kerr rotation angle in the wavelength of a blue laser beam. however, since multilayer structure, as well as amorphous structure, is a non-equilibrium state in terms of free energy and MO recording is a kind of thermal recording which is conducted aound Curie temperature (Tc) of the recording media, when the multilayer is used for the MO recording media, changes in the multilayer structure are occurred as the amorphous structure do. Therefore, the assessment of the structural stability in the Co/Pd multilayer is crucially important both for basic research and applications. As the parameter of the structural stability in this research, modulation amplitude and particle size of the Co/Pd multilayer are measured in terms of Ar sputtering pressure and heat treatment temperature. From the results of the research, we find out that the magnetic exchange energy in the structural changes of a magnetic multilayer structure and suggest the operating temperature range for MO recording in the Co/Pd multilayer for the basic research and applications, respectively.

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The thermal cycling stability of V-Ti based alloy

  • Park, Jeoung-Gun;Kim, Dong-Myung;Jang, Kuk-Jin;Han, Jai-Sung;Lee, Jai-Young
    • 한국수소및신에너지학회논문집
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    • 제9권3호
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    • pp.111-118
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    • 1998
  • The intrinsic degradation behavior of $(V_{0.53}Ti_{0.47})_{0.925}Fe_{0.075}$ alloy with BCC structure and the two plateau regions (the low and high plateau region) has been investigate during the temperature-induced hydrogen absorption-desorption cycling (thermal cycling). After 400 thermal cycles between room temperature and $600^{\circ}C$ under 10atm $H_2$, the total reversible hydrogen absorption capacity decreased by about 40%. From thermal desorption analysis it was found that the degradation behavior at each plateau region was different. In addition, XRD analysis showed that the crystal structure of the sample in de-hydrided state was changed from BCC to BCT after degradation, and that of the sample in hydrided state it was maintained as FCC although peaks were broadened after degradation. From the result of static isothermal hydrogenation treatment it were found that crystal structure change from BCC to BCT was caused by the thermal energy. TEM analysis showed that the peak broadening was due to the formation of an amorphous phase in FCC matrix.

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