• Title/Summary/Keyword: Thermal imprinting

Search Result 32, Processing Time 0.049 seconds

Fabrication of Printed Microfluidics Channel by using Thermal Roll-Imprinting

  • Yu, Jong-Su;Jo, Jeong-Dai;Yoon, Seong-Man;Kim, Hee-Yeoun;Kim, Dong-Soo
    • 한국정보디스플레이학회:학술대회논문집
    • /
    • 2009.10a
    • /
    • pp.1472-1475
    • /
    • 2009
  • The microfluidics channel were fabricated using thermal roll-imprinting process on plastic substrates. As rollimprinting surface is heated directly at $100^{\circ}C$ and printing process proceed 380/400 kgf pressure, we fabricated microfluidic patterns separated line of $40.04{\mu}m$, serpentine line of $113.89{\mu}m$ and depth of imprint pattern is $15.35{\mu}m$, it means to get fine pattern has more than 70% imprint rate in designed mask.

  • PDF

Fabrication of Ag Grid Patterned PET Substrates by Thermal Roll-Imprinting for Flexible Organic Solar Cells (가열롤 임프린팅 방법을 이용한 유연 유기태양전지용 Ag 그리드 패턴 PET 기판 제작)

  • Cho, Jung Min;Jo, Jeongdai;Kim, Taeil;Kim, Dong Soo
    • Journal of the Korean Society for Precision Engineering
    • /
    • v.31 no.11
    • /
    • pp.993-998
    • /
    • 2014
  • Silver (Ag) grid patterned PET substrates were manufactured by thermal roll-imprinting methods. We coated highly conductive layer (HCL) as a supply electrode on the Ag grid patterned PET in the three kinds of conditions. One was no-HCL without conductive PEDOT:PSS on the Ag grid patterned PET substrate, another was thin-HCL coated with ~50 nm thickness of conductive PEDOT:PSS on the Ag grid PET, and the other was thick-HCL coated with ~95 nm thickness of conductive PEDOT:PSS. These three HCLs in order showed 73.8%, 71.9%, and 64.7% each in transmittance, while indicating $3.84{\Omega}/{\Box}$, $3.29{\Omega}/{\Box}$, and $2.65{\Omega}/{\Box}$ each in sheet resistance. Fabrication of organic solar cells (OSCs) with HCL Ag grid patterned PET substrates showed high power conversion efficiency (PCE) on the thin-HCL device. The thick-HCL device decreased efficiency due to low open circuit voltage ($V_{OC}$). And the Ag grid pattern device without HCL had the lowest energy efficiency caused by quite low short current density ($J_{SC}$).

Development of Roll-to- Flat Thermal Imprinting Equipment and Experimental Study of Large Area Pattern Replication on Polymer Substrate

  • Lee, Moon-G.;Lan, Shuhuai;Lee, Soo-Hun;Lee, Hye-Jin;Ni, Jun;Sung, Yeon-Wook
    • Journal of the Korean Society of Manufacturing Technology Engineers
    • /
    • v.18 no.3
    • /
    • pp.307-314
    • /
    • 2009
  • Large area micro pattern replication has promising application potential in many areas. Rolling imprint process has been demonstrated as one of the most competitive processes for such micro pattern replication, because it has advantages in low cost, high throughput and high efficiency. In this paper, we developed a prototype of roll-to-flat(R2F) thermal imprint system for large area micro pattern replication process, which is one of the key processes in the fabrication of flexible displays. Experimental tests were conducted to evaluate the feasibility of system and the parameters' effect on the process, such as flat mold temperature, loading pressure and rolling speed. 100mm $\times$ 100mm stainless steel flat mold and commercially available polycarbonate sheets were used for the tests. The experimental results showed that the developed R2F system is suitable for fabrication of various micro devices with micro pattern over large area.

  • PDF

Polymeric Materials for Molecular Recognition

  • Ki, Chang-Do;Lee, Kang-Won;Chang, Ji-Young
    • Proceedings of the Polymer Society of Korea Conference
    • /
    • 2006.10a
    • /
    • pp.172-172
    • /
    • 2006
  • Molecular imprinting constitutes a valuable method of preparing polymeric materials with specific binding properties. The most conspicuous merit of molecular imprinting is that structurally three-dimensional recognition sites can be introduced into a polymer matrix with ease and low cost when compared with the complicated process of biological system for antigen and antibody. We used a thermally reversible bond for the preparation of the monomer-template complex, which allowed us to remove the template easily by means of a simple thermal reaction and to simultaneously introduce various functional groups into the cavity. This method is especially propitious for developing artificial receptors for molecules lacking strongly interactive groups.

  • PDF

Alumina Templates on Silicon Wafers with Hexagonally or Tetragonally Ordered Nanopore Arrays via Soft Lithography

  • Park, Man-Shik;Yu, Gui-Duk;Shin, Kyu-Soon
    • Bulletin of the Korean Chemical Society
    • /
    • v.33 no.1
    • /
    • pp.83-89
    • /
    • 2012
  • Due to the potential importance and usefulness, usage of highly ordered nanoporous anodized aluminum oxide can be broadened in industry, when highly ordered anodized aluminum oxide can be placed on a substrate with controlled thickness. Here we report a facile route to highly ordered nanoporous alumina with the thickness of hundreds-of-nanometer on a silicon wafer substrate. Hexagonally or tetragonally ordered nanoporous alumina could be prepared by way of thermal imprinting, dry etching, and anodization. Adoption of reusable polymer soft molds enabled the control of the thickness of the highly ordered porous alumina. It also increased reproducibility of imprinting process and reduced the expense for mold production and pattern generation. As nanoporous alumina templates are mechanically and thermally stable, we expect that the simple and costeffective fabrication through our method would be highly applicable in electronics industry.

Effects of Pressurization Conditions on the Pattern Transfer in the Thermal Nanoimprint Lithography (열 나노임프린트 공정에서 가압조건이 패턴전사에 미치는 영향)

  • Lee, Woo Young;Lee, Ki Yeon;Kim, Kug Weon
    • Journal of the Semiconductor & Display Technology
    • /
    • v.12 no.4
    • /
    • pp.15-20
    • /
    • 2013
  • Nanoimprint lithography (NIL) is the next generation photolithography process in which the photoresist is dispensed onto the substrate in its liquid form and then imprinted and cured into a desired pattern instead of using traditional optical system. There have been considerable attentions on NIL due to its potential abilities that enable cost-effective and high-throughput nanofabrication to the display device and semiconductor industry. In this paper, a pressure vessel type imprinting system was used to imprint patterns with two type pressure values (25 bar, 30 bar) and two type pressure keeping times (5 min, 10 min). The height of transferred pattern and the thickness of residual layer were measured and effects of pressurization conditions - pressure and pressure keeping time - on the pattern transfer in thermal NIL were investigated.

Experimental and Numerical Study on the Viscoelastic Property of Polycarbonate near Glass Transition Temperature for Micro Thermal Imprint Process (열방식 마이크로 임프린트 공정을 위한 고분자 재료의 수치적 모델링)

  • Lan, Shuhuai;Lee, Hey-Jin;Lee, Hyoung-Wook;Song, Jung-Han;Lee, Soo-Hun;Ni, Jun;Lee, Moon-G.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
    • /
    • 2009.05a
    • /
    • pp.70-73
    • /
    • 2009
  • The aim of this research is to obtain a numerical material model for an amorphous glassy polymer, polycarbonate (PC), which can be used in finite element analysis (FEA) of the micro thermal imprint process near the glass transition temperature. An understanding of the deformation behavior of the PC specimens was acquired by performing tensile stress relaxation tests. The viscoelastic material model based on generalized Maxwell model was introduced for the material near Tg to establish the FE model based on the commercial FEA code ABAQUS/Standard with a suitable set of parameters obtained for this material model from the test data. Further validation of the model and parameters was performed by comparing the analysis of FE model results to the experimental data.

  • PDF