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Effects of Pressurization Conditions on the Pattern Transfer in the Thermal Nanoimprint Lithography  

Lee, Woo Young (School of Mechanical Engineering, Korea University of Technology and Education)
Lee, Ki Yeon (Department of Mechanical Engineering, Soonchunhyang University)
Kim, Kug Weon (Department of Mechanical Engineering, Soonchunhyang University)
Publication Information
Journal of the Semiconductor & Display Technology / v.12, no.4, 2013 , pp. 15-20 More about this Journal
Abstract
Nanoimprint lithography (NIL) is the next generation photolithography process in which the photoresist is dispensed onto the substrate in its liquid form and then imprinted and cured into a desired pattern instead of using traditional optical system. There have been considerable attentions on NIL due to its potential abilities that enable cost-effective and high-throughput nanofabrication to the display device and semiconductor industry. In this paper, a pressure vessel type imprinting system was used to imprint patterns with two type pressure values (25 bar, 30 bar) and two type pressure keeping times (5 min, 10 min). The height of transferred pattern and the thickness of residual layer were measured and effects of pressurization conditions - pressure and pressure keeping time - on the pattern transfer in thermal NIL were investigated.
Keywords
Pressurization conditions; Residual layer thickness; Thermal nanoimprint lithography; Transferred pattern;
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