• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 춘계학술대회 논문집 유기절연재료 전자세라믹 방전플라즈마 연구회
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• pp.197-200
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• 2001

반응성 스퍼터링법으로 TaN film을 증착한 후 열처리온도에 따라 TaN 박막의 $R_s$(sheet resistance) 특성을 평가하고 미세구조 변화에 따른 전기적 특성 변화를 고찰하였다. TaN 박막을 열처리한 결과 $400^{\circ}C$에서 $600^{\circ}C$까지는 (110)의 회절피크만 보이다가 $700^{\circ}C$ 에서는 (200)의 회절 피크가 나타났고 특히 as-deposition 상태와 $300^{\circ}C$ 열처리시에는 Ta와 TaN 상이 혼재한 상태로 나타났으며 전기저항 변화는 as-deposition 상태가 $140{\Omega}/{\square}$로 가장 높았으며 열처리 온도가 증가함에 따라 저항은 점차적으로 감소하다가 $600^{\circ}C$와 $700^{\circ}C$에서는 전기저항이 다시 증가하였다. $500^{\circ}C$까지는 표면 형상이나 표면조도보다는 열처리 온도의 증가에 따른 TaN 박막의 결정구조 변화가 전기저항에 영향을 주는 주 요인으로 작용하고, $600^{\circ}C$와 $700^{\circ}C$ 열처리시에 결정립의 증가에도 불구하고 전기저항이 증가하는 것은 고온 열처리에 의한 표면조도가 증가하였기 때문이라고 생각된다.

• 한국세라믹학회지
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• 제33권4호
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• pp.405-410
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• 1996

The partial substitution of LiTaO3 with Al2O3 caused the variation of dielectric properties and a lower melting temperature yielding an easier growth of single crystal. The lattice constants and Raman band broadening were measured for the LiTaO3 solid solution in which the cations of Li+ and Ta5+ were partially substituted by Al3+ cation. The LiTaO3 type limit phases were obtained. ; Li1.15Al0.45Ta0.7O3 for cationic excess Li1.15Al0.45Ta0.7O3 for stoichiometry Li0.85Al0.05TaO3 for cationic deficit. The second phase was formed beyond the solubility limit. The limit phase (Li0.85Al0.05TaO3) in the region of cationic deficit showed the lowest Cuire temperature of 61$0^{\circ}C$ and melting point of 152$0^{\circ}C$ compared to the solid solutions in other regions (TMp=1$650^{\circ}C$, Tc=69$0^{\circ}C$ for LiTaO3)

• Corrosion Science and Technology
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• 제12권1호
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• pp.50-55
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• 2013

The purpose of this study was to investigate corrosion characteristics of Ti-xTa alloys with Ta contents. Ti-xTa alloys used as samples (x=30, 40%) were arc-melted under argon atmosphere of 99.9% purity. Ti-xTa alloys were homogenized for 12hr at $1000^{\circ}C$ and then water quenched. The surface characteristics of Ti-xTa alloys were investigated using optical microscopy (OM) and X-ray diffractometer (XRD). The anodic corrosion behaviors of the specimens were examined through potentiodynamic, potentiostatic and galvanostatic test in 0.9 % NaCl solution at $36.5{\pm}1^{\circ}C$. After corrosion test, the surface characteristics of Ti-xTa alloys were investigated using OM. The microstructure of Ti-Ta alloy showed the beta structure with Ta content. The corrosion resistance of Ti alloy was improved by increasing Ta content and the corrosion morphology of Ti-Ta alloy showed that the site attacked by chloride ion decreased from the active to passive region with Ta content. Potential of Ti-40Ta alloy increased as time increased, whereas, current density of Ti-40Ta alloy decreased as time increased compared to Ti-30 alloy.

• 한국주조공학회지
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• 제17권4호
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• pp.371-378
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• 1997

The study for direct synthesis of TaC carbide which was a reaction product of tantalum and carbon in the cast iron was performed. Cast iron which has hypo-eutectic composition was cast bonded in the metal mold with tantalum thin sheet of thickness of $100{\mu}m$. The contents of carbon and silicon of cast iron matrix was controlled to have constant carbon equivalent of 3.6. The chracteristics of microstructure and the formation mechanism of TaC carbide in the interfacial reaction layer in the cast iron/tantalum thin sheet heat treated isothermally at $950^{\circ}C$ for various time were examined. TaC carbide reaction layer was grown to the dendritic morphology in the cast iron/tantalum thin sheet interface by the isothermal heat treatment. The composition of TaC carbide was 48.5 at.% $Ti{\sim}48.6$ at.% C-2.8 at.% Fe. The hardness of reaction layer was MHV $1100{\sim}1200$. The thickness of reaction layer linearly increased with increasing the total content of carbon in the cast iron matrix and isothermal heat treating time. The growth constant for TaC reaction layer was proportional to the log[C] of the matrix. The formation mechanism of TaC reaction layer at the interface of cast iron/tantalum thin sheet was proved to be the interfacial reaction.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.144.2-144.2
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• 2016

Diamond-like carbon (DLC) coatings have been widely applied to the mechanical components, cutting tools due to properties of high hardness and wear resistance. Among them, hydrogenated amorphous carbon (a-C:H) coatings are well-known for their low friction properties, stable production of thin and thick film, they were reported to be easily worn away under high temperature. Non-hydrogenated tetrahedral amorphous carbon (ta-C) is an ideal for industrial applicability due to good thermal stability from high $sp^3$-bonding fraction ranging from 70 to 80 %. However, the large compressive stress of ta-C coating limits to apply thick ta-C coating. In this study, the thick ta-C coating was deposited onto Inconel alloy disk by the FCVA technique. The thickness of the ta-C coating was about $3.5{\mu}m$. The tribological behaviors of ta-C coated disks sliding against $Si_3N_4$ balls were examined under elevated temperature divided into 23, 100, 200 and $300^{\circ}C$. The range of temperature was setting up until peel off observed. The experimental results showed that the friction coefficient was decreased from 0.14 to 0.05 with increasing temperature up to $200^{\circ}C$. At $300^{\circ}C$, the friction coefficient was dramatically increased over 5,000 cycles and then delaminated. These phenomenon was summarized two kinds of reasons: (1) Thermal degradation and (2) graphitization of ta-C coating. At first, the reason of thermal degradation was demonstrated by wear rate calculation. The wear rate of ta-C coatings showed an increasing trend with elevated temperature. For investigation of relationship between hardness and graphitization, thick ta-C coatings(2, 3 and $5{\mu}m$) were additionally deposited. As the thickness of ta-C coating was increased, hardness decreased from 58 to 49 GPa, which means that graphitization was accelerated. Therefore, now we are trying to increase $sp^3$ fraction of ta-C coating and control the coating parameters for thermal stability of thick ta-C at high temperatures.

• 한국재료학회지
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• 제7권7호
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• pp.559-563
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• 1997

Ta을 2MeV의 에너지로 가속시켜 1x$10^{17}$atoms/$\textrm{cm}^2$의 농도로 TiC(001)면에 이온 주입시킨 후 비행시간형 직충돌이온산란 분광법(time-of-flight impact-collision ion scattering spectroscopy; TOF-ICISS)을 사용하여 TiC(001)면의 Ta표면 편석을 연구하였다. TOF-ICISS는 표면 수층 깊이까지 원자구조를 측정할 수 있는 수법으로, 이온주입된 시편을 1$600^{\circ}C$에서 300sec동안 진공 가열하여 Ta 원자를 편석시킨 후 스펙트럼의 입사각도 의존성을 구함으로써 Ta원자의 편석 위치 및 농도구배를 조사하였다. [110]및 [100]방위에서 Ta과 Ti의 focusing peak가 서로 같은 입사각도에서 나타나며 편석된 Ta원자는 TiC의 Ti-site에 위치한다. Ta원자는 표면 최외층에만 편석되는 것이 아니라 수층에 걸쳐 Ti-site에 자리하고 있으며, Ta 원자의 농도는 표면 최외층에서 내부 층으로 깊어질수록 작아진다. 이온주입시 생성된 표면층의 탄소 격자 결함은 시편 가열시 벌크에 자리하는 탄소가 확산되어 없어진다.다.

• 한국자기학회지
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• 제3권1호
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• pp.41-47
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• 1993

Co-Cr계 수직자기기록매체에서 비교적 낮은 기판온도에서 높은 보자력을 얻기위하여 제 3원소로서 Ta의 첨가효과에 대하여 연구하였다. Cr함량이 17-21 at.%로 다른 Co-Cr 계에 Ta함량을 3.2 at.%까지 첨가시켜서 여러조성의 Co-Cr-Ta 박막을 제조하고, 자기적 성질 및 미세구조를 조사하였다. Ta첨가로 인한 수직보자력의 향상효과는 Cr함량이 낮은 박막의 경우에 컸으며, 특히 기판온도가 $100^{\circ}C$인 경우 그 향상효과가 더욱 뚜렷하였다. Ta의 첨가로 인한 수직보자력 향상은 결정립 미세화나, c-축 배향성향상에 의한 것이기 보다는 비강자성원소의 편석이 심화됨에 기인하는 것으로 판단된다.

• 한국재료학회지
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• 제9권8호
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• pp.837-842
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• 1999

Ta/TaN 다층피막구조는 경도는 떨어지지만 연성이 큰 Ta 막과 취성을 가지며 경도가 높은 TaN 막을 교대로 반복하여 만든 다층구조로서 경도와 연성의 장점이 잘 조화되어 높은 인성을 나타낼 것으로 기대된다. 본 연구에서는 고속도강 기판위에 Ta/TaN 복합다층피막과 compositional gradient Ta-TaN 막을 각각 반응성 스퍼터링에 의하여 증착하고 열처리에 따른 경도 및 접착성을 조사하였다. $N_2$/Ar 유량비가 0.4일 때 결정성이 가장 우수한 TaN 막이 얻어지며, Ta/TaN 복합다층피막의 경도 및 스크래치 테스트 결과도 가장 우수하였다. 또한 Ta/TaN 복합다층피막 증착후의 어닐링 처리 시 어닐링 온도가 증가할수록 피막의 경도와 접착성이 악화되었으며, compositional modulation wavelength가 감소함에 따라 Ta/TaN 복합다층피막의 경도는 증가하지만 접착성은 wavelength에 대한 의존성이 약하게 나타났다. 그리고 compositional gradient Ta-TaN 막 증착후의 어닐링 처리 시 경도와 스크래치 테스트 값은 각각 20$0^{\circ}C$와 40$0^{\circ}C$에서 최대값을 나타내었다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2000년도 하계학술대회 논문집
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• pp.208-211
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• 2000

We prepared Co-Cr-Ta and Co-Cr-Ta/Ti thin film for perpendicular magnetic recording media by facing targets sputtering system (FTS system). Ti underlayer effects on crystallographic and magnetic characteristics of Co-Cr-Ta perpendicular magnetic recording media have been investigated. Crystallgraphic and magnetic characteristic of prepared thin films were evaluated by x-ray diffractometry(XRD), vibrating sample magnetometer(VSM) and kerr hysteresis loop measurement. The coercivity and anisotropy field increase by introduced Ti underlayer when substrate temperature is higher than 150$^{\circ}C$. The c-axis dispersion angle and grain size of Co-Cr-Ta/Ti thin film is decrease than Co-Cr-Ta when substrate temperature is higher than 100$^{\circ}C$. Consequently, the use of a Ti underlayer highly orientated can be improved crystallographic and magnetic characteristics of Co-Cr -Ta perpendicular media layer.

• 한국세라믹학회지
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• 제29권1호
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• pp.29-34
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• 1992

Phase transition, dielectric properties, and leakage current characteristics of Ta2O5 thin film fabricated by sol-gel process with tantalum penta-n-butoxide were studied as a function of annealing temperature in O2 atmoshpere. Although Ta2O5 thin film annealed at temperatures below 700$^{\circ}C$ for 1 hr was amorphous, it was crystallized to ${\beta}$-Ta2O5 of orthorhombic phase by annealing at temperatures higher than 750$^{\circ}C$. With increasing annealing temperature from 500$^{\circ}C$ to 900$^{\circ}C$, dielectric constant of sol-gel processed Ta2O5 thin film was changed from 17.6 to 15.3 due to the increase of SiO2 thickness at Ta2O5/Si interface. For Ta2O5 thin film annealed at 500$^{\circ}C$ to 800$^{\circ}C$ for 1 hr in O2 atmosphere, leakage current was remarkably reduced and breakdown strength was increased with higher annealing temperature. For Ta2O5 film annealed at 800$^{\circ}C$, breakdown did not occur even at electric field strength of 30${\times}$105V/cm and leakage current was maintained lower than 10-8A/$\textrm{cm}^2$.