• Title/Summary/Keyword: TFT

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A Thin Film Transistor LCD Module with Novel OverDriving Timing Controller

  • Yu, Hong-Tien;Huang, Juin-Ying;Tseng, Wen-Tse;Wen, Harchson
    • 한국정보디스플레이학회:학술대회논문집
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    • 2004.08a
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    • pp.1053-1056
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    • 2004
  • Chunghwa Picture Tubes, LTD. (CPT) has developed a Novel TFT-LCD Driving Techniquel. This new technique is developed in combination with other state-of-the-art image processing solutions such as image compression / decompression, motion detection, and noise reduction. By applying the Novel Driving Technique to the high resolution TFT-LCD, it was found that the response time can be effectively reduced with a lower overall system cost by smaller frame memory requirement, lower EMI by less memory band-width. Likewise, higher display quality can also be achieved in that the unexpected noises generated by over-drive can be eliminated. The Novel TFT-LCD Driving Technique has been successfully implemented to the 30 inch WXGA (1280${\times}$768) resolution TFT LCD commercial TV module. It was found that the quality of moving picture was better improved compared with that of the conventional fast response driving method.

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ASG(Amorphous Silicon TFT Gate driver circuit) Technology for Mobile TFT-LCD Panel

  • Jeon, Jin;Lee, Won-Kyu;Song, Jun-Ho;Kim, Hyung-Guel
    • 한국정보디스플레이학회:학술대회논문집
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    • 2004.08a
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    • pp.395-398
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    • 2004
  • We developed an a-Si TFT-LCD panel with integrated gate driver circuit using a standard 5-MASK process. To minimize the effect of the a-Si TFT current and LC's capacitance variation with temperature, we developed a new a-Si TFT circuit structure and minimized coupling capacitance by changing vertical architecture above gate driver circuit. Integration of gate driver circuit on glass substrate enables single chip and 3-side free panel structure in a-Si TFT-LCD of QVGA(240$^{\ast}$320) resolution. And using double ASG structure the dead space of TFT-LCD panel could be further decreased.

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Forming Low-Resistivity Electrodes of Thin Film Transistors with Selective Electroless Plating Process

  • Chiang, Shin-Chuan;Chuang, Bor-Chuan;Tsai, Chia-Hao;Chang, Shih-Chieh;Hsiao, Ming-Nan;Huang, Yuan-Pin;Huang, Chih-Ya
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.597-600
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    • 2006
  • The silver gate and source/drain electrodes for an a-Si thin film transistor were fabricated by the selective electroless plating (SELP) process. Relevant physical properties including taper angle, uniformity and resistivity are investigated. The Ag layer was about 150nm to 250nm thick, the resistivity less than $3{\times}10^{-6}$ Ohm-cm and the taper angle 45'-60' and the nonuniformity less than 10% on G2 substrates. The transfer characteristics with the Ag gate, and source/drain electrodes respectively possessed good field effect mobility similar to conventionally fabricated a-Si TFTs. This process provided low resistivity, low cost and ease of processing.

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Thin Film Transistor (TFT) Pixel Design for AMOLED

  • Han, Min-Koo;Lee, Jae-Hoon;Nam, Woo-Jin
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.413-418
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    • 2006
  • Highly stable thin-film transistor (TFT) pixel employing both low temperature polycrystalline silicon (LTPS) and amorphous silicon (a-Si) for active matrix organic light emitting diode (AMOLED) is discussed. ELA (excimer laser annealing) LTPS-TFT pixel should compensate $I_{OLED}$ variation caused by the non-uniformity of LTPS-TFT due to the fluctuation of excimer laser energy and amorphous silicon TFT pixel is desired to suppress the decrease of $I_{OLED}$ induced by the degradation of a-Si TFT. We discuss various compensation schemes of both LTPS and a-Si TFT employing the voltage and the current programming.

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The optimum simulation and real test of double prismatic Light-guide plate for a high brightness LCD backlight unit

  • Yoon, D.K.;Park, D.S.;Oh, Y.S.;Bae, K.W.;Kim, K.H.;Lim, Y.J.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07b
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    • pp.1503-1506
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    • 2005
  • This dissertation represents method concerning high performance prism LGP design in 17 inch TFT-LCD. By means of developing LGP with total size of 8mm that has prism on both upper side and bottom side, it is superior to previous printing way in gaining high brightness. It can realize actual material simulation on prism LGP production using 17inch injection process and about 20% luminance enhancement is achieved based on such method.

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Electrical properties of poly-Si TFT by crystallization method for embedded TFT memory application (임베다드 TFT 메모리 적용을 위한 결정화 방법에 따른 전기적 특성평가)

  • You, Hee-Wook;Cbo, Won-Ju
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.06a
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    • pp.356-356
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    • 2010
  • In this paper, Poly silicon thin-film transistors (poly-Si TFTs) with employed the SPC (Solid phase crystallization) and ELA (Excimer laser annealing) methods on glass panel substrate are fabricated to investigate the electrical poperies. Poly-Si TFTs have recess-channel structure with formated source/drain regions by LPCVD n+ poly Si in low $650^{\circ}C$ temperature. the ELA-TFT show higher on/off current ratio and subthreshold swing than a-Si and SPC TFT that therefore, these results showed that the ELA-TFT might be beneficial for practical embedded TFT memory device application.

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Dynamic Pixel Models for a-Si TFT-LCD and Their Implementation in SPICE

  • Wang, In-Soo;Lee, Gi-Chang;Kim, Tae-Hyun;Lee, Won-Jun;Shin, Jang-Kyoo
    • ETRI Journal
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    • v.34 no.4
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    • pp.633-636
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    • 2012
  • A dynamic analysis of an amorphous silicon (a-Si) thin film transistor liquid crystal display (TFT-LCD) pixel is presented using new a-Si TFT and liquid crystal (LC) capacitance models for a Simulation Program with Integrated Circuit Emphasis (SPICE) simulator. This dynamic analysis will be useful when predicting the performance of LCDs. The a-Si TFT model is developed to accurately estimate a-Si TFT characteristics of a bias-dependent gate to source and gate to drain capacitance. Moreover, the LC capacitance model is developed using a simplified diode circuit model. It is possible to accurately predict TFT-LCD characteristics such as flicker phenomena when implementing the proposed simulation model.

A Simulation Study on the Flicker Analysis for the Poly-Silicon TFT-LCD (다결정질 Si TFT-LCD에서의 Flicker에 대한 Simulation 연구)

  • 손명식;송민수;유건호;허지호;경희대학교물리학과;경희대학교물리학과
    • Proceedings of the IEEK Conference
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    • 2001.06b
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    • pp.225-228
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    • 2001
  • We simulated and analyzed the flicker phenomena in the poly-Si TFT-LCD using PSpice for the development of wide-area and high-quality LCD display We define the electric quantity of flicker in the TFT-LCD, which is the ratio of half frame frequency (30Hz) to DC (0 Hz) frequency. We compared two different types of TFTs, excimer laser annealed (ELA) poly-Si TFT and silicide mediated crystallization (SMC) poly-Si TFT, and found that the ELA and SMC TFTs show different flicker characteristics because of their mobility and leakage current. In addition, we showed that the gate voltage should be chosen carefully at the minimum flicker because of the larger leakage current of poly-Si Tn as compared with a-Si TFT

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Novel Dual-Gate Poly-Si TFT Employing L-Shaped Gate (L-모양 gate를 적용한 새로운 dual-gate poly-Si TFT)

  • Park, Sang-Geun;Lee, Hye-Jin;Shin, Hee-Sun;Lee, Won-Kyu;Han, Min-Koo
    • Proceedings of the KIEE Conference
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    • 2005.07c
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    • pp.2031-2033
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    • 2005
  • poly-Si TFT의 kink 전류를 억제하는 L-shaped dual-gate TFT 구조를 제안하고 이를 제작하였다. 제안된 소자는 채널의 그레인 방향을 일정하게 성장시키는 SLS나 CW laser 결정화 방법을 사용한다. L자 모양의 게이트 구조를 사용하여 서고 다른 전계효과 이동도를 갖는 두 개의 sub-TFT를 구현할 수 있으며, 이러한 sub-TFT간의 특성차이가 kink 전류를 억제시킨다. 직접 제작한 L-shaped dual-gate 구조의 소자가 poly-Si TFT의 kink 전류를 억제하고, 전류포화 영역에서 전류량을 고정시킴으로써 신뢰성이 향상됨을 확인하였다.

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Poly-Si TFT characteristic simulation by applying effective medium model (Effective Medium 모델 적용에 의한 poly-Si TFT 특성 Simulation)

  • 박재우;김태형;노원열;최종선
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.320-323
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    • 2000
  • In the resent years, the Thin Film Transistor Liquid Crystal Display(TFT-LCD) have trend toward larger panel sizes and higher spatial and/or gray-scale resolution. In this trend, Because of its low field effect mobility, a-Si TFT is change to poly-Si TFT. In this paper, both effective-medium model of poly-Si TFTs and empirical capacitance model are applied to Pixel Design Array Simulation Tool (PDAST) and the pixel characteristics of TFT-LCD array were simulated, which were compared with the results calculated by Aim-Spice.

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