• Title/Summary/Keyword: Substrate thickness

Search Result 1,915, Processing Time 0.033 seconds

Development and Research of MMA Waterproof Coating and Waterproof System for Concrete Civil Structures (콘크리트 토목구조물 교면용 MMA 도막방수재 및 교면방수 시스템의 개발 연구)

  • Chul-Woo Lim;Sang-Ho Ji;Ki-Won An
    • Journal of the Korean Recycled Construction Resources Institute
    • /
    • v.12 no.2
    • /
    • pp.128-134
    • /
    • 2024
  • Asphalt-based waterproofing materials for bridge decks face issues such as softening or liquefaction of the material during the process of pouring hot asphalt concrete on top of the waterproofing layer. This leads to instability and reduced thickness of the waterproofing layer. To address these problems, new solutions beyond the existing materials, including the development and adoption of new materials, are required. Therefore, this study investigates the properties of MMA(Methyl Methacrylate) coating waterproofing material, which meets the basic physical properties for bridge deck waterproofing. We examined the overall quality standards in a system where the substrate concrete, waterproofing material, and paving layer are integrated. The study confirmed the applicability of MMA coating waterproofing material on bridge decks. The results indicate that a stable application of MMA coating waterproofing material for civil engineering structures' bridge decks can be achieved with a mix ratio of hard MMA resin : soft MMA resin : powder = 6 : 34 : 60. Additionally, when using emulsified asphalt with hardening characteristics for the adhesion between the dissimilar materials of MMA waterproofing and asphalt concrete, it is expected to meet the minimum quality standards of the Ministry of Land, Infrastructure, and Transport's 'Guidelines for Asphalt Concrete Pavement Construction (2021.07)'.

Structural and Electrical Properties of (La0.7Sr0.3)(Mn1-xFex)O3 Thin Films Prepared by Sol-Gel Method for Thermistor Devices (서미스터 소자로의 응용을 위한 솔-젤법으로 제작한 (La0.7Sr0.3)(Mn1-xFex)O3 박막의 구조적, 전기적 특성)

  • Ji-Su Yuk;Sam-Haeng Yi;Myung-Gyu Lee; Joo-Seok Park;Young-Gon Kim;Sung-Gap Lee
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.37 no.2
    • /
    • pp.164-168
    • /
    • 2024
  • (La0.7Sr0.3)(Mn1-xFex)O3 (LSMFO) (x = 0.03, 0.06, 0.09, 0.12) precursor solution are prepared by sol-gel method. LSMFO thin films are fabricated by the spin-coating method on Pt/Ti/SiO2/Si substrate, and the sintering temperature and time are 800℃ and 1 hr, respectively. The average thickness of the 6-times coated LSMFO films is about 181 to 190 nm and average grain size is about 18 to 20 nm. As the amount of Fe added in the LSMFO thin film increased, the resistivity decreased, and the TCR and B25/65-value increased. Electrical resistivity, TCR and B25/65-value of the (La0.7Sr0.3)(Mn0.88Fe0.12)O3 thin film are 0.0136 mΩ-cm, 0.358%/℃, and 328 K at room temperature, respectively. The resistivity properties of LSMFO thin films matched well with Mott's VRH model.

The study of growth and characterization of $AgInSe_2$ single crystal thin film by hot wall epitaxy (Hot Wall Epitaxy(HWE)에 의한 $AgInSe_2$단결정 박막 성장과 특성에 관한 연구)

  • 홍광준
    • Journal of the Korean Crystal Growth and Crystal Technology
    • /
    • v.9 no.2
    • /
    • pp.197-206
    • /
    • 1999
  • The stochiometric mixture of evaporating materials for the $AgInSe_2$single crystal thin films were prepared from horizontal furnace. Using extrapolation method of X-ray diffraction patterns for the $AgInSe_2$polycrystal, it was found tetragonal structure whose lattice constant $a_0$ and $C_0$ were 6.092 $\AA$ and 11.688 $\AA$, respectively. To obtain the single crystal thin films of AgInSe$_2$, the mixed crystal was deposited on thoroughly etched semi-insulator GaAs(100) substrate by HWE system. The source and substrate temperature were fixed to $610^{\circ}C$ and $450^{\circ}C$ respectively, and the thickness of the single thin films was obtained to 3.8 $\mu\textrm{m}$. The crystallization of single crystal thin films was investigated by the photoluminescence (PL) and double crystal X-ray dirrfaction (DCXD). The Hall effect was measured by the method of van der Pauw and carrier density and mobility dependence on temperature were studied. The carrier density and mobility of $AgInSe_2$single crystal thin films deduced from Hall data are $9.58{\times}10^{22} electron/m^3,\; 3.42{\times}10^{-2}m^2/V{\cdot}s$ at 293 K, respectively. From the photocurrent spectrum by illumination of perpendicular light on the c-axis of the $AgInSe_2$single crystal thin film, the spin orbit coupling $\Delta$So and the crystal field splitting $\Delta$Cr were obtained to 0.29 eV and 0.12 eV at 20 K respectively. From PL peaks measured at 20 K, 881.1 nm (1.4071 eV) and 882.4 nm (1.4051 eV) mean $E_x^U$ the upper polariton and $E_x^L$ the lower polariton of the free exciton $(E_x)$, also 884.1 nm (1.402 eV) express $I_2 peak of donor-bound exciton emission and 885.9 nm (1.3995 Ev) emerges $I_1$ peak of acceptor-bound exciton emission. In addition, the peak observed at 887.5 nm (1.3970 eV) was analyzed to be PL peak due to DAP.

  • PDF

Growth and Characterization of AgGa$Se_2$ Single Crystal Thin Films by Hot Wall Epitaxy (Hot Wall Epitaxy (HWE)법에 의한 AgGa$Se_2$ 단결정 박막 성장과 특성)

  • Hong, Gwang-Jun;Lee, Gwan-Gyo;Park, Jin-Seong
    • Korean Journal of Materials Research
    • /
    • v.11 no.5
    • /
    • pp.419-426
    • /
    • 2001
  • The stochiometric $AgGaSe_2$ polycrystalline mixture of evaporating materials for the $AgGaSe_2$ single crystal thin film was prepared from horizontal furnace. To obtain the single crystal thin films, $AgGaSe_2$ mixed crystal and semi-insulating GaAs(100) wafer were used as source material and substrate for the Hot Wall Epitaxy (HWE) system, respectively. The source and substrate temperature were fixed at$ 630^{\circ}C$ and $420^{\circ}C$, respectively. The thickness of grown single crystal thin films is 2.1$\mu\textrm{m}$. The single crystal thin films were investigated by photoluminescence and double crystal X-ray diffraction(DCXD) measurement. The carrier density and mobility of AgGaSe$_2$ single crystal thin films measured from Hall effect by van der Pauw method are $4.89\Times10^{17}$ cm$^{-3}$ , 129cm2/V.s at 293K, respectively. From the Photocurrent spectrum by illumination of perpendicular light on the c-axis of the AgGaSe$_2$ single crystal thin film, we have found that the values of spin orbit splitting $$\Delta$S_{o}$ and the crystal field splitting $\Delta$C$_{r}$, were 0.1762eV and 0.2474eV at 10K, respectively. From the photoluminescence measurement of AgGaSe$_2$ single crystal thin film, we observed free excision (EX) observable only in high quality crystal and neutral bound exciton ($D^{o}$ , X) having very strong peak intensity. And, the full width at half maximum and binding energy of neutral donor bound excition were 8mev and 14.1meV, respectively. By Haynes rule, an activation energy of impurity was 141 meV.ion energy of impurity was 141 meV.

  • PDF

The study of growth and characterization of CuGaTe$_2$single crystal thin films by hot wall epitaxy (Hot wall epitaxy(HWE) 방법에 의한 CuGaTe$_2$단결정 박막 성장과 특성에 관한 연구)

  • 홍광준;이관교;이상열;유상하;정준우;정경아;백형원;방진주;신영진
    • Journal of the Korean Crystal Growth and Crystal Technology
    • /
    • v.10 no.6
    • /
    • pp.425-433
    • /
    • 2000
  • The stochiometric mix of evaporating materials for the $CuGaTe_2$single crystal thin films was prepared from horizontal furnance. Using extrapolation method of X-ray diffraction patterns for the $CuGaTe_2$polycrystal, it was found tetragonal structure whose lattice constant $a_0 and c_0$ were 6.025 $\AA$ and 11.931 $\AA$, respectively. To obtain the single crystal thin films, $CuGaTe_2$mixed crystal was deposited on throughly etched semi-insulator GaAs(100) substrate by the Hot Wall Epitaxy (HWE) system. The source and substrate temperature were $670^{\circ}C$ and $410^{\circ}C$ respectively, and the thickness of the single crystal thin films is 2.1$\mu\textrm{m}$. The crystalline structure of single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). Hall effect on this sample was measured by the method of van der Pauw and studied on carrier density and mobility dependence on temperature. The carrier density and mobility of $CuGaTe_2$single crystal thin films deduced from Hall data are $8.72{\times}10{23}$$\textrm m^3$, $3.42{\times}10^{-2}$ $\textrm m^2$/V.s at 293K, respectively. From the photocurrent spectrum by illumination of perpendicular light on the c-axis of the $CuGaTe_2$single crystal thin film, we have found that the values of spin orbit coupling $\Delta$s.o and the crystal field splitting $\Delta$cr were 0.0791 eV and 0.2463 eV at 10 K, respectively. From the PL spectra at 10 K, the peaks corresponding to free bound excitons and D-A pair and a broad emission band due to SA is identified. The binding energy of the free excitons are determined to be 0.0470 eV and the dissipation energy of the donor-bound exciton and acceptor-bound exciton to be 0.0490 eV, 0.0558 eV, respectively.

  • PDF

Effects of NaCl Concentrations on Production and Yields of Fruiting Body of Oyster Mushrooms, Pleurotus spp. (NaCl의 농도가 느타리버섯 자실체 발생 및 수량에 미치는 영향)

  • Jhune, Chang-Sung;Sul, Hwa-Jin;Kong, Won-Sik;Yoo, Young-Bok;Cheong, Jong-Chun;Chun, Se-Chul
    • The Korean Journal of Mycology
    • /
    • v.34 no.1
    • /
    • pp.39-53
    • /
    • 2006
  • This studies investigated the effect of concentrations of sodium chloride (NaCl) on occurrence and growth of fruitbody in oyster mushrooms, Pleurotus spp. Our experiments divided into two parts. When the water contents in substrate were added with sodium chloride solution in cotton waste box cultivation as a first experiment, the growth of mushroom was damaged as the concentration was increased, even though there was a little difference according to the strains. The yield in 1.0% NaCl solution was decreased to 72% compared to non-treated plot while that in 3.0% solution was only 2% of the non-treated plot. Morphological characteristics of mushrooms cultivated in substrate with the different concentration of the solution showed different results. For example, the size and thickness of pilei were not influenced by NaCl concentration, but the length of stipes and individual weight were much influenced. In plastic box cultivation filled with cotton waste, watering treatment with the different concentrations of sodium chloride solution, the second experiment, did not show any difference according to the concentration until 1.0% solution but there was a little difference according to the strains. The productivity of fruitbody started to decrease at 2.0% of the solution and the yield and quality of mushroom in 3.0% solution treatment were generally low. After the second flush, days for mushroom sprouting were generally prolonged in proportion to the solution concentration. Taken altogether, the second experiment did not show a clear effect as the case of the first experiment.

Spectral Response of $TiO_{2}$/Se : Te Heterojunction for Color Sensor (컬러센서를 위한 $TiO_{2}$/Se : Te 이종접합의 스펙트럼 응답)

  • Woo, Jung-Ok;Park, Wug-Dong;Kim, Ki-Wan;Lee, Wu-Il
    • Journal of Sensor Science and Technology
    • /
    • v.2 no.1
    • /
    • pp.101-108
    • /
    • 1993
  • $TiO_{2}$/Se : Te heterojunction for color sensor has been fabricated by RF reactive sputtering and thermal evaporation methods onto glass substrate. The optimum deposition condition of $TiO_{2}$ films was such that RF power was 120 W, substrate temperature was $100^{\circ}C$, oxygen concentration was 50%, working pressure was 50 mTorr for the $TiO_{2}$ film thickness of $1000{\AA}$. In this case, the optical transmittance of $TiO_{2}$ film at 550 nm-wavelength was 85%, resistivity was $2{\times}10^9{\Omega}{\cdot}cm$, refractive index was 2.3, and optical bandgap was 3.58 eV. The composition ratio of 0 to Ti by AES analysis was 1.7. When $TiO_{2}$ films were annealed at $400^{\circ}C$ for 30 min. in $O_{2}$ ambient, the optical transmittance of $TiO_{2}$ films at the wavelength range of $300{\sim}580$ nm was improved from 0 to 25%. When Se : Te films were annealed at $190^{\circ}C$ for 1 min., photosensitivity under illumination of 1000 lux was 0.75. The optical bandgap of Se : Te films was 1.7 eV. The structures of Se : Te films were the hexagonal with (100) and (110) orientation. The spectral response of a-Se was improved by the addition of Te, especially in the long wavelength region. The $TiO_{2}$/Se : Te heterojunction showed wide spectral response, and more improved one than that of a-Si film in the blue light region.

  • PDF

Sputtering Yield and Secondary Electron Emission Coefficient(${\gamma}$) of the MgO, $MgAl_2O_4$ and $MgAl_2O_4/MgO$ Thin Film Grown on the Cu Substrate by Using the Focused Ion Beam (Cu 기판위에 성장한 MgO, $MgAl_2O_4$$MgAl_2O_4/MgO$ 박막의 집속이온빔을 이용한 스퍼터링수율 측정과 이차전자방출계수 측정)

  • Jung K.W.;Lee H.J.;Jung W.H.;Oh H.J.;Park C.W.;Choi E.H.;Seo Y.H.;Kang S.O.
    • Journal of the Korean Vacuum Society
    • /
    • v.15 no.4
    • /
    • pp.395-403
    • /
    • 2006
  • It is known that $MgAl_2O_4$ has higher resistance to moisture than MgO, in humid ambient MgO is chemically unstable. It reacts very easily with moisture in the air. In this study, the characteristic of $MgAl_2O_4$ and $MgAl_2O_4/MgO$ layers as dielectric protection layers for AC- PDP (Plasma Display Panel) have been investigated and analysed in comparison for conventional MgO layers. MgO and $MgAl_2O_4$ films both with a thickness of $1000\AA$ and $MgAl_2O_4/MgO$ film with a thickness of $200/800\AA$ were grown on the Cu substrates using the electron beam evaporation. $1000\AA$ thick aluminium layers were deposited on the protective layers in order to avoid the charging effect of $Ga^+$ ion beam while the focused ion beam(FIB) is being used. We obtained sputtering yieds for the MgO, $MgAl_2O_4$ and $MgAl_2O_4/MgO$ films using the FIB system. $MgAl_2O_4/MgO$ protective layers have been found th show $24{\sim}30%$ lower sputtering yield values from 0.244 up to 0.357 than MgO layers with the values from 0.364 up to 0.449 for irradiated $Ga^+$ ion beam with energies ranged from 10 kV to 14 kV. And $MgAl_2O_4$ layers have been found to show lowest sputtering yield values from 0.88 up to 0.109. Secondary electron emission coefficient(g) using the ${\gamma}$- FIB. $MgAl_2O_4/MgO$ and MgO have been found to have similar g values from 0.09 up to 0.12 for indicated $Ne^+$ ion with energies ranged from 50 V to 200 V. Observed images for the surfaces of MgO and $MgAl_2O_4/MgO$ protective layers, after discharge degradation process for 72 hours by SEM and AFM. It is found that $MgAl_2O_4/MgO$ protective layer has superior hardness and degradation resistance properties to MgO protective layer.

Effects of 1 keV $Ar^+$ ion irradiation on Au films on glass (1 keV $Ar^+$ 이온의 조사가 유리기판위의 금 박막의 미치는 영향)

  • Jang, H. G.;Kim, H. S.;Han, S.;Choi, W. K.;Koh, S. K.;Jung, H. J.
    • Journal of the Korean Vacuum Society
    • /
    • v.5 no.4
    • /
    • pp.371-376
    • /
    • 1996
  • Au films with a thickness around 1600 $\AA$ were deposited onto glass at room temperature by ion beam sputtering with a 5 cm cold-hollow ion gun at pressure $1\times 10^{-6}-1\times 10^{-5}$ Torr. Irradiation of the Au deposited samples was carried out at pressure of $7\times 10^{-6}$ Torr. For the sputter depositions, $Ar^+$ ion energy was 1 keV, and the current density at the substrate surface was 15 $\mu$A/$\textrm{cm}^2$. Effects of 1 keV $Ar^+$ ion dose($I_d$) between $1\times 10^{16}\; and\;2\times 10^{17}\;Ar^+\textrm{cm}^{-2}$on properties such as crystallinity, surface roughness and adhesion, etc. of the films have been investigated. The Au films sputtered by $Ar^+$ ion beam had only (111) plane and the X-ray intensity of the films decreased with increase of $I_d$. The thickness of Au films reduced with Id. $R_{ms}$ surface roughness of the films increased from 16 $\AA$ at as-deposited to 1118 $\AA$ at ion dose= $2\times 10^{17}\;Ar^+\textrm{cm}^{-2}$. Adhesion of Au film on sputtered at $I_d$= $2\times 10^{17}\;Ar^+\textrm{cm}^{-2}$ was 9 times greater than that of Au film with untreated, as determined by a scratch test.

  • PDF

Preparation and Gas Permeation Performance of Pd-Ag-Cu Hydrogen Separation Membrane Using α-Al2O3 Support (α-Al2O3 지지체를 이용한 Pd-Ag-Cu 수소 분리막의 제조 및 기체투과 성능)

  • Sung Woo Han;Min Chang Shin;Xuelong Zhuang;Jae Yeon Hwang;Min Young Ko;Si Eun Kim;Chang Hoon Jung;Jung Hoon Park
    • Membrane Journal
    • /
    • v.34 no.1
    • /
    • pp.50-57
    • /
    • 2024
  • In this experiment, Pd-Ag-Cu membrane was manufactured using electroless plating on an α-Al2O3 support. Pd, Ag and Cu were each coated on the surface of the support through electroless plating and heat treatment was performed for 18 h at 500℃ in H2 in the middle of electroless plating to form Pd alloy. The surface of the Pd-Ag-Cu membrane was observed through Scanning Electron Microscopy (SEM), and the thickness of the Pd membrane was measured to be 7.82 ㎛ and the thickness of the Pd-Ag-Cu membrane was measured to be 3.54 ㎛. Energy dispersive X-ray spectroscopy and X-ray diffraction analysis confirmed the formation of a Pd-Ag-Cu alloy with a composition of Pd-78wt%, Ag-8.81wt% and Cu-13.19wt%. The gas permeation experiment was conducted under the conditions of 350~450℃ and 1~4 bar in H2 single gas and H2/N2 mixed gas. The maximum H2 flux of the hydrogen separation membrane measured in H2 single gas is 74.16 ml/cm2·min at 450℃ and 4 bar for the Pd membrane and 113.64 ml/cm2·min at 450℃ and 4 bar for the Pd-Ag-Cu membrane. In the case of the separation factor measured in H2/N2 mixed gas, separation factors of 2437 and 11032 were measured at 450℃ and 4 bar.