• Title/Summary/Keyword: Stamp Replication

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Fabrication of Plasmon Subwavelength Nanostructures for Nanoimprinting

  • Cho, Eun-Byurl;Yeo, Jong-Souk
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.247-247
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    • 2012
  • Plasmon subwavelength nanostructures enable the structurally modulated color due to the resonance conditions for the specific wavelength range of light with the nanoscale hole arrays on a metal layer. While the unique properties offered from a single layer of metal may open up the potential applications of integrated devices to displays and sensors, fabrication requirements in nanoscale, typically on the order of or smaller than the wavelength of light in a corresponding medium can limit the cost-effective implementation of the plasmonic nanostructures. Simpler nanoscale replication technologies based on the soft lithography or roll-to-roll nanoimprinting can introduce economically feasible manufacturing process for these devices. Such replication requires an optimal design of a master template to produce a stamp that can be applied for a roll-to-roll nanoimprinting. In this paper, a master mold with subwavelength nanostructures is fabricated and optimized using focused ion beam for the applications to nanoimprinting process. Au thin film layer is deposited by sputtering on a glass that serves as a dielectric substrate. Focused ion beam milling (FIB, JEOL JIB-4601F) is used to fabricate surface plasmon subwavelength nanostructures made of periodic hole arrays. The light spectrum of the fabricated nanostructures is characterized by using UV-Vis-NIR spectrophotometer (Agilent, Cary 5000) and the surface morphology is measured by using atomic force microscope (AFM, Park System XE-100) and scanning electron microscope (SEM, JEOL JSM-7100F). Relationship between the parameters of the hole arrays and the corresponding spectral characteristics and their potential applications are also discussed.

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Fabrication Process of a Nano-precision Polydimethylsiloxane Replica using Vacuum Pressure-Difference Technique (진공 압력차이법에 의한 나노 정밀도를 가지는 폴리디메틸실록산 형상복제)

  • 박상후;임태우;양동열;공홍진;이광섭
    • Polymer(Korea)
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    • v.28 no.4
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    • pp.305-313
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    • 2004
  • A vacuum pressure-difference technique for making a nano-precision replica is investigated for various applications. Master patterns for replication were fabricated using a nano-replication printing (nRP) process. In the nRP process, any picture and pattern can be replicated from a bitmap figure file in the range of several micrometers with resolution of 200nm. A liquid-state monomer is solidified by two-photon absorption (TPA) induced by a femto-second laser according to a voxel matrix scanning. After polymerization, the remaining monomers were removed simply by using ethanol droplets. And then, a gold metal layer of about 30nm thickness was deposited on the fabricated master patterns prior to polydimethylsiloxane molding for preventing bonding between the master and the polydimethylsiloxane mold. A few gold particles attached on the polydimethylsiloxane stamp during detaching process were removed by a gold selecting etchant. After fabricating the polydimethylsiloxane mold, a nano-precision polydimethylsiloxane replica was reproduced. More precise replica was produced by the vacuum pressure-difference technique that is proposed in this paper. Through this study, direct patterning on a glass plate, replicating a polydimethylsiloxane mold, and reproducing polydimethylsiloxane replica are demonstrated with a vacuum pressure-difference technique for various micro/nano-applications.

Nano Molding Technology for Optical Storage Media with Large-area Nano-pattern (대면적 광 정보저장매체의 나노성형에 대한 기술 개발)

  • Shin Hong-Gue;Ban Jun-Ho;Cho Ki-Chul;Kim Heon-Yong;Kim Byeong-Hee
    • Journal of the Korean Society for Precision Engineering
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    • v.23 no.4 s.181
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    • pp.162-167
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    • 2006
  • Hot embossing lithography(HEL) has the production advantage of comparatively few process step, simple operation, a relatively low cost for embossing tools(Si), and high replication accuracy for small features. In this paper, we considered the nano-molding characteristic according to molding parameters(temperature, pressure, times, etc) and induced a optimal molding condition using HEL. High precision nano-patter master with various shapes were designed and manufactured using the DRIE(Deep Reactive ion Etching), LPCVD(Low Pressure Chemical Vapor Deposition) and thermal oxidation process, and we investigated the molding characteristic of DVD and Blu-ray nickel stamp. We induced flow behaviors of polymer, rheology by shapes and sizes of the pattern through various molding experiments. Finally, with achieving nano-structure molding with high aspect ratio, we will secure a basic technology about the molding of large-area nano-pattern media.

Replication of label-free biosensor with nano grating structures (나노 그래이팅 구조를 갖는 비표지식 바이오센서 성형에 관한 연구)

  • Cho, E.H.;Kim, B.W.;Choi, S.W.;Kim, K.H.;Sung, G.Y.;Kang, S.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2009.05a
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    • pp.290-293
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    • 2009
  • This paper presents the development of a disposable label-free biosensor for bio molecular interaction analysis. Label-free biosensors have advantages of high performance in sensitivity and short detection time. Among various label-free systems, we introduced biosensor with nano grating structures based on white light source and spectrometer. And to develop high efficiency label-free biosensor, we suggest replicating processes satisfying required specification. We also report a system set-up to evaluate the characteristics of phenomenon shown in this biosensor system.

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Fabrication of Nanopatterned PDMS Elastic Stamp Mold Using Surface Treatment of Nanotemplate (나노템플레이트 표면처리를 통한 나노패턴이 형성된 PDMS 탄성 스탬프 몰드 제작)

  • Park, Yong Min;Seo, Sang Hyun;Seo, Young Ho;Kim, Byeong Hee
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.24 no.1
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    • pp.38-42
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    • 2015
  • Polydimethylsiloxane (PDMS) is a widely used material for replicating micro-structures because of its transparency, deformability, and easy fabrication. At the nanoscale, however, it is hard to fill a nanohole template with uncured PDMS. This paper introduces several simple methods by changing the surface energy of a nanohole template and PDMS elastomer for replicating 100nm-scale structures. In the case of template, pristine anodic aluminum oxide (AAO), hydrophobically treated AAO, and hydrophillically treated AAO are used. For the surface energy change of the PDMS elastomer, a hydrophilic additive and dilution solvent are added in the PDMS prepolymer. During the molding process, a simple casting method is used for all combinations of the treated template and modified PDMS. The nanostructured PDMS surface was investigated with a scanning electron microscope after the molding process for verification.

Injection molding using porous nano-scale patterned master with Pettier devices (펠티어 소자를 이용한 다공성 나노패턴의 사출에 대한 연구)

  • Hong, N.P.;Kwon, J.T.;Shin, H.G.;Seo, Y.H.;Kim, B.H.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2008.05a
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    • pp.513-516
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    • 2008
  • We have replicated nanopillar arrays using injection molding process of active heating and cooling method by several peltier devices. The injection melding has a high accuracy ed good reproducibility that are essential for mass production at low cost. Conventional molding processes widely use the water-based mold heating and air cooling methods. However, in case of replication for nano-patterned structures, it caused several defects such as air-flow mark, non-fill, sticking and tearing. In this study, periodic nano-scale patterns are replicated by using injection molding with Peltier devices. Porous nano-scale patterns, which have pore diameter range from 120nm to 150nm, were fabricated by using anodizing process. Periodic nano-pore structures ( $20mm\;{\times}\;20mm$) were used as a mold stamp of injection molding. Finally, PMMA with nanopillar arrays was obtained by injection molding process. By using the Peltier devices, the temperature of locally adiabatic molds can be dramatically controlled and the quality of the molded patterns can be slightly improved.

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Optimizing the Plasma Deposition Process Parameters of Antistiction Layers Using a DOE (Design of Experiment) (실험 계획법을 이용한 점착방지막용 플라즈마 증착 공정변수의 최적화 연구)

  • Cha Nam-Goo;Park Chang-Hwa;Cho Min-Soo;Park Jin-Goo;Jeong Jun-Ho;Lee Eung-Sug
    • Korean Journal of Materials Research
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    • v.15 no.11
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    • pp.705-710
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    • 2005
  • NIL (nanoimprint lithography) technique has demonstrated a high potential for wafer size definition of nanometer as well as micrometer size patterns. During the replication process by NIL, the stiction between the stamp and the polymer is one of major problems. This stiction problem is moi·e important in small sized patterns. An antistiction layer prevents this stiction ana insures a clean demolding process. In this paper, we were using a TCP (transfer coupled plasma) equipment and $C_4F_8$ as a precursor to make a Teflon-like antistiction layer. This antistiction layer was deposited on a 6 inch silicon wafer to have nanometer scale thicknesses. The thickness of deposited antistiction layer was measured by ellipsometry. To optimize the process factor such as table height (TH), substrate temperature (ST), working pressure (WP) and plasma power (PP), we were using a design of experimental (DOE) method. The table of full factorial arrays was set by the 4 factors and 2 levels. Using this table, experiments were organized to achieve 2 responses such as deposition rate and non-uniformity. It was investigated that the main effects and interaction effects between parameters. Deposition rate was in proportion to table height, working pressure and plasma power. Non-uniformity was in proportion to substrate temperature and working pressure. Using a response optimization, we were able to get the optimized deposition condition at desired deposition rate and an experimental deposition rate showed similar results.