• 대한화학회지
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• 제65권5호
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• pp.401-405
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• 2021

• 대한용접접합학회:학술대회논문집
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• 대한용접접합학회 2002년도 Proceedings of the International Welding/Joining Conference-Korea
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• pp.450-455
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• 2002

Cu-cored Sn-Ag solder balls were fabricated by coating pure Sn and Ag on Cu balls. The melting behavior and the solderability of the BGA joint with the Ni/Au coated Cu pad were investigated and were compared with those of the commercial Sn-Ag and Sn-Ag-Cu balls. DSC analyses clarified the melting of Cu-cored solders to start at a rather low temperature, the eutectic temperature of Sn-Ag-Cu. It was ascribed to the diffusion of Cu and Ag into Sn plating during the heating process. After reflow soldering the microstructures of the solder and of the interfacial layer between the solder and the Cu pad were analyzed with SEM and EPMA. By EDX analysis, formation of a eutectic microstructure composing of $\beta$-Sn, Ag$_3$Sn, ad Cu$_{6}$Sn$_{5}$ phases was confirmed in the solder, and the η'-(Au, Co, Cu, Ni)$_{6}$Sn$_{5}$ reaction layer was found to form at the interface between the solder and the Cu pad. By conducting shear tests, it was found that the BGA joint using Cu-cored solder ball could prevent the degradation of joint strength during aging at 423K because of the slower growth me of η'-(Au, Co, Cu, Ni)$_{6}$Sn$_{5}$ reaction layer formed at the solder, pad interface. Furthermore, Cu-cored multi-component Sn-Ag-Bi balls were fabricated by sequentially coating the binary Sn-Ag and Sn-Bi solders on Cu balls. The reflow property of these solder balls was investigated. Melting of these solder balls was clarified to start at the almost same temperature as that of Sn-2Ag-0.75Cu-3Bi solder. A microstructure composing of (Sn), Ag$_3$Sn, Bi and Cu$_{6}$Sn$_{5}$ phases was found to form in the solder ball, and a reaction layer containing primarily η'-(Au, Co, Cu, Ni)$_{6}$Sn$_{5}$ was found at the interface with Ni/Au coated Cu pad after reflow soldering. By conducting shear test, it was found that the BGA joints using this Cu-core solder balls hardly degraded their joint shear strength during aging at 423K due to the slower growth rate of the η'-(Au, Cu, Ni)$_{6}$Sn$_{5}$ reaction layer at the solder/pad interface.he solder/pad interface.

• 한국재료학회지
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• 제12권5호
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• pp.347-352
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• 2002

A transparent dielectric of the $PbO-B_2O_3-SiO_2-A1_2O_3$ system which was a low melting glass has been used for PDP (Plasma Display Panel), but it has a problem which is a reaction to be occurred between a transparent dielectric layer and electrodes (Ag, ITO) after firing. This research was conducted for ion migration of $Ag^+\$ and $Sn^ {2+}$ during firing three different frits of low melting glass. The result showed that yellowing phenomena occurred through a chemical reaction between $Ag^+\$and $Sn^ {2+}$ at 550~58$0^{\circ}C$ for 20~60 min. In addition, it was confirmed that the migration of $Sn^{2+}$ from ITO electrode made a strong effect on the yellowing phenomena.

• 대한금속재료학회지
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• 제46권7호
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• pp.443-448
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• 2008

Contact materials are used in many electrical devices. Ag-Cd alloy has been widely used in electrical part, because Ag-Cd alloy has a good wear resistance and stable contact resistance. But nowadays Ag-Cd alloy isn't being used because of environmental challenges. Currently new research is being done on ($Ag-SnO_2$ and $Ag-SnO_2-In_2O_3$) as an alternative solution to fix any remainly environmental challenges. However $In_2O_3$ is more expensive and Ag-Sn alloy has low wear resistance. According to our research data Zn has a similar physical and chemical property. In this work, so we changed and optimized the Zn oxide to over 4 and added Sn oxide ratio 0.5, 1.0, 1.5wt%. Conclusions from the data recorded from the experiment of $Ag-ZnO-SnO_2$ are as follows.

• 대한용접접합학회:학술대회논문집
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• 대한용접접합학회 2006년도 춘계 학술대회 개요집
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• pp.218-220
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• 2006

Sn-3.0Ag-0.5Cu solder is widely used as micro-joining materials of flip chip package(FCP) because of the fact that it causes less dissolution and has good thermal fatigue property. However, compared with ternary electroplating in the manufacturing process, binary electroplating is still used in industrial field because of easy to make plating solution and composition control. The objective of this research is to fabricate Sn-3.0Ag-0.5Cu solder bumping having accurate composition. The ternary Sn-3.0Ag-0.5Cu solder bumping could be made on a Cu pad by sequent binary electroplating of Sn-Cu and Sn-Ag. Composition of the solder was estimated by EDS and ICP-OES. The thickness of the bump was measured using SEM and the microstructure of intermetallic-compounds(IMCs) was observed by SEM and EDS. From the results, contents of Ag and CU found to be at $2.7{\pm}0.3wt%\;and\;0.4{\pm}0.1wt%$, respectively.

• 마이크로전자및패키징학회지
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• 제10권3호
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• pp.29-35
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• 2003

SnAg, SnAgCu, SnCu 무연솔더합금을 주조 상태에서 냉간압연한 후 열적으로 안정화한 시편 (TS)과, 실제 솔더 범프와 유사한 미세구조의 수냉에 급속 냉각(WQ)된 시편 두가지를 $100^{\circ}C$에서 크리프 실험을 행하였다. 급속냉각한 시편의 냉각속도는 140-150 K/sec로 primary $\beta-Sn$ 크기가 TS 시편보다 5∼10배 정도 작았으며, 기지내 primary $\beta-Sn$이 차지하는 분율은 증가하였다. 반면에 공정상 내의 $Ag_3Sn$상의 크기는 더 작아졌다. 크리프 실험 결과 WQ 시편의 최소크리프 변형율 속도($\{beta}_{min}$)가 TS 보다 약 $10^2$배 정도 작았으며. 더 큰 파괴시간을 보였다. TS-SnAg의 크리프파괴는 $Ag_3Sn$ 또는 $Cu_6Sn_5$에서의 공공의 핵생성, power-law 크리프에 의한 공공의 성장, 그리고 크리프 공공의 상호 연결로 일어났으며, WQ-SnAgCu는 시편이 두께가 얇아 네킹에 의해 파괴가 일어났다.

• 한국신재생에너지학회:학술대회논문집
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• 한국신재생에너지학회 2011년도 춘계학술대회 초록집
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• pp.113.2-113.2
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• 2011

Sn-Ag계 합금은 대표적인 무연 솔더 조성으로 전자제품의 실장 및 접합에 적용되어 왔으며, 태양전지 분야에서도 모듈의 전극과 bus바로 사용되는 등 다양한 분야에서 사용되고 있다. 그러나 최근 Ag 가격의 급격한 상승과 솔더 접합부의 신뢰성을 보다 향상시키고자 Ag의 함량을 줄이고 다원계 합금 조성의 무연 솔더 연구가 활발히 진행되고 있다. 본 실험에서는 기존의 연구 결과를 바탕으로 Sn-1.0Ag-0.5Cu-0.4In 4원계 무연솔더 조성에 Bi를 첨가하여 최적의 융점과 용융구간을 가지는 5원계 Sn-Ag-Cu-In-Bi 계 솔더 합금을 설계하였다. 이 설계된 합금은 기존의 유연 솔더인 Sn-Pb와 대표적인 무연 솔더인 Sn-3.5Ag와 각각의 특성을 비교 분석하였다. 젖음성을 평가하기 위하여 wetting balance tester를 이용하여 실험을 행하였고 Differential Scanning Calorimetry(DSC)를 분석하여 젖음 정도와 조성 분석 및 고상점과 액상점 등의 녹음 거동을 확인하였다. 또한 각각의 조성별 전단응력에 따른 파괴 거동을 분석하였다.

• 마이크로전자및패키징학회지
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• 제10권3호
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• pp.19-27
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• 2003

플립칩 전자패키지에서 칩과 기판(PCB)를 연결할 때, 통상적으로 칩쪽은 금속패드/UBM 처리를 기판 쪽은 표면처리를 한 후 솔더로 연결하는데, 이 때 사용되는 UBM이나 표면처리에 따라, 칩/솔더, PCB/솔더에 생성되는 금속간 화합물의 종류와 두께 및 솔더의 조성이 변하게 되어 궁극적으로 솔더 접합부의 기계적 신뢰성에 영향을 주게 된다. 본 연구에서는 Cu와 Au/Ni의 두가지 금속 패드가 무연솔더의 저주기 피로특성에 어떠한 영향을 미치는 지에 대해 고찰해 보았다. 저주기 피로 실험은 Cu나 Au/Ni이 표면처리 된 기판에 무연솔더 (Sn-3.5Ag, Sn-3.5Ag-1.5Cu, Sn-3.5Ag-XBi(X=2.5, 7.5), Sn-0.7Cu)를 리플로하여 총변위를 변화시키면서 상온에서 시행하였다. 기판의 표면처리에 관계없이 Sn-3.5Ag, Sn-3.5Ag-XCu(X-0.75, 1.5), Sn-0.7Cu 합금이 Sn-3.5Ag-7.5Bi 합금보다 피로저항성이 현격히 좋았으며, Au/Ni 표면처리한 솔더 접합부가 Cu 처리한 경우보다 피로저항성이 뛰어난 것으로 나타났다. 파괴 후 단면을 조사한 결과 계면에 형성된 금속간 화합물 내에 미세균열이 발견되었는데, Cu 표면처리를 사용한 경우 더 많은 미세균열이 생성된 것을 볼 수 있었다. Sn-3.5Ag, Sn-3.5Ag-Cu(X=0.75, 1.5), Sn-0.7Cu 합금의 경우 금속간 화합물 내에 생기는 미세 균열이 거시 균열로 성장하지 않고 파단은 항상 솔더 내부로 일어난 반면. Bi를 함유한 솔더의 경우, 기판의 표면처리에 상관없이 금속간 화합물/솔더 계면으로 균열이 생성 진전되어 다른 솔더합금에 비해 열악한 피로저항성을 나타내는 것으로 보인다. 이것은 Bi의 금속간화 합물/솔더 입계 편석이나 Bi 합금이 다른 합금에 비해 높은 경도값을 가지는 것에 인한 것으로 보여 진다.

• 한국생산제조학회지
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• 제20권2호
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• pp.193-201
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• 2011

Recently, mechanical reliabilities including a drop test have been a hot issue. In this paper, solder balls with new components which are Sn-3.0Ag-0.5Cu and Sn-1.0Ag-0.5Cu-0.05N are introduced, and board level drop test for them are conducted under JEDEC standard in which the board with 15 flip chips is dropped as 1,500g acceleration during 0.5ms. The drop simulations are studied by using a implicit method in the ANSYS LS-DYNA, and modal analysis is made. Through both analyses, the solder balls with new components are evaluated under the drop. It is found that the maximum stress of each chip is occurred between the solder ball and the PCB, and the highest value among the maximum stresses in the chips is occurred on the chip nearest to fixed holes on the board in the drop tests and simulations.

• 한국전기전자재료학회논문지
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• 제30권2호
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• pp.81-85
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• 2017

$SnO_2/Ag/Nb_2O_5/SiO_2/SnO_2$ multilayer films were prepared on glass substrate by sequential using RF/DC magnetron sputtering at room temperature. The influence of top $SnO_2$ layer thickness on optical and electrical properties of the multilayer films was investigated. Experimentally measured results exhibit transmittances over 84.3 ~ 85.8% at 550 nm wavelength. As the top $SnO_2$ layer thickness increased from 40 to 55 nm, the sheet resistance (Rs) increased from 5.81 to $6.94{\Omega}/sq$. The Haacke's figure of merit (FOM) calculated for the samples with various $SnO_2$ layer thicknesses was a maximum at 45 nm ($35.3{\times}10^{-3}{\Omega}^{-1}$).