• Title/Summary/Keyword: Sn/Cu 도금

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Improvement of Wear Resistance of Brasses by Electro-plating and Diffusion Treatment of Sn (주석의 도금.확산처리에 의한 황동계 합금의 내마모성 향상)

  • 안동환;김대룡;윤병하
    • Journal of the Korean institute of surface engineering
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    • v.16 no.3
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    • pp.98-107
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    • 1983
  • A study on the improvement of wear resistance of brasses by electroplating and diffusion treatment of tin was carried out. The optimum condition of the treatment obtained was as follows. Plating thickness of tin : 5 - 9 $\mu\textrm{m}$ Condition of diffusion treatment : atmosphere ; fused nitrate bath (KNO3 + NaNO3) temperature and time ; 1st step 320$^{\circ}C$, 60min. and 450$^{\circ}C$, 30min. During the diffusion treatment, internetallic compounds of Cu-Sn were formed and these compounds were identified as η, $\varepsilon$ and $\delta$ phase from the outer tin layer. It was considered that the improvement of wear resistance of brasses by the treatment is because of the formation of intemetallic compounds particalarly $\varepsilon$phase which is very hard, between soft tin layer brass.

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Fluxless Plasma Soldering with Different Thickness of UBM Layers on Si-Wafer (Si 웨이퍼의 UBM층 도금두께에 따른 무플럭스 플라즈마 솔더링)

  • 문준권;강경인;이재식;정재필;주운홍
    • Journal of the Korean institute of surface engineering
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    • v.36 no.5
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    • pp.373-378
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    • 2003
  • With increasing environmental concerns, application of lead-free solder and fluxless soldering process have been taken attention from the electronic packaging industry. Plasma treatment is one of the soldering methods for the fluxless soldering, and it can prevent environmental pollution cased by flux. On this study fluxless soldering process under $Ar-H_2$plasma using lead free solders such as Sn-3.5 wt%Ag, Sn-3.5 wt%Ag-0.7 wt%Cu and Sn-37%Pb for a reference was investigated. As the plasma reflow has higher soldering temperature than normal air reflow, the effects of UBM(Under Bump Metallization) thickness on the interfacial reaction and bonding strength can be critical. Experimental results showed in case of the thin UBM, Au(20 nm)/Cu(0.3 $\mu\textrm{m}$)/Ni(0.4 $\mu\textrm{m}$)/Al(0.4 $\mu\textrm{m}$), shear strength of the soldered joint was relatively low as 19-27㎫, and it's caused by the crack observed along the bonded interface. The crack was believed to be produced by the exhaustion of the thin UBM-layer due to the excessive reaction with solder under plasma. However, in case of thick UBM, Au(20 nm)/Cu(4 $\mu\textrm{m}$)/Ni(4 $\mu\textrm{m}$)/Al(0.4 $\mu\textrm{m}$), the bonded interface was sound without any crack and shear strength gives 32∼42㎫. Thus, by increasing UBM thickness in this study the shear strength can be improved to 50∼70%. Fluxed reflow soldering under hot air was also carried out for a reference, and the shear strength was 48∼52㎫. Consequently the fluxless soldering with plasma showed around 65∼80% as those of fluxed air reflow, and the possibility of the $Ar-H_2$ plasma reflow was evaluated.

Scientific Analysis of Gilt-Bronze Plaquettes with Buddhist Images(Panbul) from Anapji Pond, Gyeongju (안압지 금동판불의 과학적 분석)

  • Yu, Heisun;Park, Haksoo;Shin, Yongbi
    • Conservation Science in Museum
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    • v.8
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    • pp.49-69
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    • 2007
  • This is about the scientific analysis of the 10 items of the gilt-bronze Panbul excavated from Anapji, Gyeongju. First, the composition of the Panbul was confirmed, using X-ray fluorescence spectrometer (XRF), and the patinas covering the surface of the Panbul were analyzed, using X-ray diffractometer (XRD). And the micro structures and gilt layer of the Panbul were investigated, using microscope and scanning electron microscope with energy dispersive spectrometer (SEM/EDS), and in order to investigate the internal conditions of the Panbul, X-radiography was conducted. As the result, it is found out that the material of the Panbul excavated from Anapji was the bronze of copper (86~95%) and tin (4~12%), and coated with gold. And cuprite (Cu2O) was detected from red patina of the gilt-bronze Panbul, and chalcocite(Cu2S) also was detected from the black patina. As the result of the observation of the micro structure through microscope, it is estimated that it was manufactured, using the wax molding method, and, judging from the fact that the thickness of gilt layer was not even, and that the groove had been filled, it was presumed that the amalgam coating method had been used, but some questions still remain, because mercury was not detected. Lastly, through the X-radiography, it was observed that the tiny round spots existed, which was presumed to have been generated during the casting.

Effect of surface treatment on thermo-compression bonding properties of electrodes between printed circuit boards (표면처리에 따른 인쇄회로기판의 열압착 접합 특성 평가)

  • Lee, Jong-Gun;Lee, Jong-Bum;Choi, Jung-Hyun;Jung, Seong-Boo
    • Proceedings of the KWS Conference
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    • 2010.05a
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    • pp.81-81
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    • 2010
  • 전자 패키징은 미세화, 경량화, 저가화를 지향하고 신뢰성의 향상을 위해 발전해 왔다. 이러한 경향은 전자부품 자체의 성능 향상 뿐 아니라 전자부품을 장착, 고정할 수 있게 하는 인쇄회로 기판(PCB : Printed Circuit Board)의 성능에 많은 관심을 가지게 되었다. 전기적 신호의 손실을 줄이기 위해 전기, 전자 산업체에서는 가볍고 굴곡성이 우수한 연성인쇄회로기판(FPCB : Flexible PCB)과 가격이 싸고 신뢰성이 입증된 경성인쇄회로기판(RPCB : Rigid PCB)이 그 대상이다. 본 논문에서는 이 PCB중에서도 RPCB와 FPCB간의 열압착 방식으로 접합 시 전극간의 접합 양상을 보았다. 이 열압착 방식은 기존에 PCB를 접합하는데 사용하고 있는 connector를 이용한 체결법을 대체하는 기술로써 솔더를 중간층(interlayer)로 이용하여 열과 압력으로 접합하는 방식이다. 이 방식을 connector를 사용하는 방식에 비해 그 부피가 작고 I/O개수에 크게 영향 받지 않으며 자동화 공정이 쉬운 장점을 가지고 있다. 접합의 대상 중 RPCB의 경우는 무전해 니켈 금도금(ENIG : Electroless Nickle Immersion Gold)로 제작하였으며 FPCB의 경우는 ENIG와 유기보호피막(OSP : Organic solderability preservation) 처리하였다. 실험에 사용한 PCB는 $300\;{\mu}m$ pitch의 미세피치이며 솔더의 조성은 Sn-3.0Ag-0.5Cu (in wt%)과 Sn-3.0Ag (in wt%)를 사용하였다. 접합 온도와 접합 시간 그리고 접합 압력에 따라 최적의 접합 조건을 도출하였다. 접합 강도는 $90^{\circ}$ Peel Test를 통해서 측정하였으며 접합면 및 파괴면은 SEM과 EDS를 통하여 분석하였다.

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The Study on Micro Soldering Using Low-Residue Flux in $N_2$Atmosphere (질소 분위기에서 저잔사 플럭스를 사용한 마이크로 솔더링에 관한 연구)

  • 최명기;정재필;이창배;서창제;황선효
    • Journal of the Microelectronics and Packaging Society
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    • v.7 no.4
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    • pp.7-15
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    • 2000
  • The purpose of this work is to evaluate the solderahility and characteristics of solder joints. Bridge defect of solder joint was examined in natural atmosphere and $N_2$ condition. Consequently, wettability was excellent for each of Sn-Pb plated Cu specimen, Sn plated Cu specimen, and Cu polished in $N_2$ condition. The wetting time in $N_2$ condition was shorter than that of natural atmosphere condition, showing the decreasing values of about 0.2~0.45 seconds. The max. wetting force under the $N_2$ condition was more increasing that of natural atmosphere condition, showing the increasing values of about 1.8~2.8 N. With the result of wetting balance test, the wetting time ($t_2$) and wetting farce according to increasing amount of $N_2$ from 10 1/min to 30 1/min, the wetting time ($t_2$) was reduced about 0.25 second and wetting force was increased about 2.3 N. In non-cleaning flux, when $N_2$ gas is applied, it is compensated to decrease of wettability. In the case of using the $N_2$ gas, the wettability was improved. The reason for improving wettability is due to preventing the formation of dross. The generation rate of bridge in $N_2$ condition decreased than that of natural atmosphere, and when the specimen had a fine pitch, the rate of bridge defects was considerably decreased in $N_2$ condition, showing the decreasing rate of 25~75%.

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Cu Electroplating on the Si Wafer and Reliability Assessment of Low Alpha Solder Bump for 3-D Packaging (3차원 실장용 실리콘 웨이퍼 Cu 전해도금 및 로우알파솔더 범프의 신뢰성 평가)

  • Jung, Do Hyun;Lee, Joon Hyung;Jung, Jae Pil
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2012.11a
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    • pp.123-123
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    • 2012
  • 최근 연구되고 있는 TSV(Through Silicon Via) 기술은 Si 웨이퍼 상에 직접 전기적 연결 통로인 관통홀을 형성하는 방법으로 칩간 연결거리를 최소화 할 수 있으며, 부피의 감소, 연결부 단축에 따른 빠른 신호 전달을 가능하게 한다. 이러한 TSV 기술은 최근의 초경량화와 고집적화로 대표되는 전자제품의 요구를 만족시킬 수 있는 차세대 실장법으로 기대를 모으고 있다. 한편, 납땜 재료의 주 원료인 주석은 주로 반도체 소자의 제조, 반도체 칩과 기판의 접합 및 플립 칩 (Flip Chip) 제조시의 범프 형성 등 반도체용 배선재료에 널리 사용되고 있다. 최근에는 납의 유해성 때문에 대부분의 전자제품은 무연솔더를 이용하여 제조되고 있지만, 주석을 이용한 반도체 소자가 고밀도화, 고 용량화 및 미세피치(Fine Pitch)화 되고 있기 때문에, 반도체 칩의 근방에 배치된 주석으로부터 많은 알파 방사선이 방출되어 메모리 셀의 정보를 유실시키는 소프트 에러 (Soft Error)가 발생되는 위험이 많아지고 있다. 이로 인해, 반도체 소자 및 납땜 재료의 주 원료인 주석의 고순도화가 요구되고 있으며, 특히 알파 방사선의 방출이 낮은 로우알파솔더 (Low Alpha Solder)가 요구되고 있다. 이에 따라 본 연구는 4인치 실리콘 웨이퍼상에 직경 $60{\mu}m$, 깊이 $120{\mu}m$의 비아홀을 형성하고, 비아 홀 내에 기능 박막증착 및 전해도금을 이용하여 전도성 물질인 Cu를 충전한 후 직경 $80{\mu}m$의 로우알파 Sn-1.0Ag-0.5Cu 솔더를 접합 한 후, 접합부 신뢰성 평가를 수행을 위해 고속 전단시험을 실시하였다. 비아 홀 내 미세구조와 범프의 형상 및 전단시험 후 파괴모드의 분석은 FE-SEM (Field Emission Scanning Electron Microscope)을 이용하여 관찰하였다. 연구 결과 비아의 입구 막힘이나 보이드(Void)와 같은 결함 없이 Cu를 충전하였으며, 고속전단의 경우는 전단 속도가 증가할수록 취성파괴가 증가하는 경향을 보였다. 본 연구를 통하여 전해도금을 이용한 비아 홀 내 Cu의 고속 충전 및 로우알파 솔더 볼의 범프 형성이 가능하였으며, 이로 인한 전자제품의 소프트에러의 감소가 기대된다.

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Wettability and Intermetallic Compounds of Sn-Ag-Cu-based Solder Pastes with Addition of Nano-additives (나노 첨가제에 따른 Sn-Ag-Cu계 솔더페이스트의 젖음성 및 금속간화합물)

  • Seo, Seong Min;Sri Harini, Rajendran;Jung, Jae Pil
    • Journal of the Microelectronics and Packaging Society
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    • v.29 no.1
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    • pp.35-41
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    • 2022
  • In the era of Fifth-Generation (5G), technology requirements such as Artificial Intelligence (AI), Cloud computing, automatic vehicles, and smart manufacturing are increasing. For high efficiency of electronic devices, research on high-intensity circuits and packaging for miniaturized electronic components is important. A solder paste which consists of small solder powders is one of common solder for high density packaging, whereas an electroplated solder has limitation of uniformity of bump composition. Researches are underway to improve wettability through the addition of nanoparticles into a solder paste or the surface finish of a substrate, and to suppress the formation of IMC growth at the metal pad interface. This paper describes the principles of improving the wettability of solder paste and suppressing interfacial IMC growth by addition of nanoparticles.

Degradation Behavior of Eutectic and Pb-free Solder Plated Ribbon in Crystalline Silicon Photovoltaic Module (유무연 용융도금 리본에 따른 결정질 실리콘 태양전지 모듈 열화거동)

  • Kim, Ju-Hee;Kim, A Yong;Park, Nochang;Ha, Jeong Won;Lee, Sang Guon;Hong, Won Sik
    • Journal of Welding and Joining
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    • v.32 no.6
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    • pp.75-81
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    • 2014
  • Usage of heavy metal element (Pb, Hg and Cd etc.) in electronic devices have been restricted due to the environmental banning of the European Union, such as WEEE and RoHS. Therefore, it is needed to develop the Pb-free solder plated ribbon in photovoltaic (PV) module. This study described that degradation characteristics of PV module under damp heat (DH, $85^{\circ}C$ and 85% R.H.) condition test for 1,000 h. Solar cell ribbons were utilized to hot dipping plate with Pb-free solder alloys. Two types of Pb-free solder plated ribbons, Sn-3.0Ag-0.5Cu (SAC305) and Sn-48Bi-2Ag, and an electroless Sn-40Pb solder hot dipping plated ribbon as a reference sample were prepared to evaluate degradation characteristics. To detect the degradation of PV module with the eutectic and Pb-free solder plated ribbons, I-V curve, electro-luminescence (EL) and cross-sectional SEM analysis were carried out. DH test results show that the reason of maximum power (Pm) drop was mainly due to the decrease fill factor (FF). It was attributed to the crack or oxidation of interface between the cell and the ribbon. Among PV modules with the eutectic and Pb-free solder plated ribbon, the PV module with SAC305 ribbon relatively showed higher stability after DH test than the case of PV module with Sn-40Pb and Sn-48Bi-2Ag solder plated ribbons.

Performance evaluation for lithium-ion battery of the Cu-Sn alloy deposition (구리-주석 합금 도금층의 리튬이온 배터리 성능 평가)

  • Jeong, Min-Gyeong;Jang, Si-Seong;Kim, Dong-Hyeon;Bok, Gyeong-Sun;Lee, Seong-Jun;Lee, Gi-Baek;Choe, Jin-Seop
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2016.11a
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    • pp.192.2-192.2
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    • 2016
  • 최근 차세대 휴대용 전자기기나 전기자동차의 상용화 연구가 활발히 이루어짐에 따라 리튬이온 배터리가 주력 에너지 저장장치로써 활발히 개발되고 있다. 이러한 리튬이온 배터리의 음극 물질로써 주로 탄소재료가 많이 사용되어 왔지만 낮은 이론용량 (372 mAh/g)으로 인하여 좀더 높은 용량을 가지는 금속이나 합금 등이 주목을 받게 되었다. 그 중에서도 주석이 탄소재료에 비해 3배 정도 높은 이론 용량 (993 mAh/g)을 가지고 있어 많은 연구가 진행되고 있다. 하지만 주석의 경우 리튬이온 배터리의 충방전 과정 중에 급격한 부피 변화가 발생하여 음극이 손상되고 이에 따라 용량이 급격하게 감소하는 한계점이 있다. 이 한계를 극복하기 위한 많은 방법들 중 하나가 구리-주석 합금을 음극으로 사용하는 것이다. 구리는 비활성 금속으로 충방전 중의 부피 변화에 완충제 역할을 하고, 연성과 전기전도성이 있어서 배터리의 전기화학적 성능 또한 향상시켜 준다. 이에 따라, 본 연구에서는 주석이 풍부한 구리-주석 합금 도금을 통하여 구조적으로 튼튼한 리튬이온 배터리의 음극을 만들었고 그 성능을 확인하기 위하여 반쪽전지 실험을 통하여 500회 충방전 동안의 싸이클 특성 및 효율을 확인하였고 순환전압전류 실험 또한 진행하였다.

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Effects of Acid Treatment of Carbon on Electroless Copper Plating (피도금 탄소재의 산처리가 무전해 동도금에 미치는 영향)

  • Shin, Ari;Han, Jun Hyun
    • Journal of the Korean institute of surface engineering
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    • v.49 no.3
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    • pp.265-273
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    • 2016
  • The effects of surface modification by nitric acid on the pre-treatment of electroless copper plating were investigated. Copper was electroless-plated on the nitric acid treated graphite activated by a two-step pre-treatment process (sensitization + activation). The chemical state and relative quantities of the various surface species were determined by X-ray photoelectron spectroscopy (XPS) after nitric acid modification or pre-treatment. The acid treatment increased the surface roughness of the graphite due to deep and fine pores and introduced the oxygen-containing functional groups (-COOH and O-C=O) on the surface of graphite. In the pre-treatment step, the high roughness and many functional groups on the nitric acid treated graphite promoted the adsorption of Sn and Pd ions, leading to the uniform adsorption of catalyst ($Pd^0$) for Cu deposition. In the early stage of electroless plating, a lot of tiny copper particles were formed on the whole surface of acid treated graphite and then homogeneous copper film with low variation in thickness was formed after 30 min.