• Title/Summary/Keyword: Silver plating

검색결과 83건 처리시간 0.026초

비시안 은도금욕의 가능성에 관한 연구 (A Study on the Feasibility of a Cyanide-Free Silver Plating Bath)

  • 이상화
    • 한국표면공학회지
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    • 제29권2호
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    • pp.140-145
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    • 1996
  • Silver deposits formed on copper substrates by replacement reactions show poor adhesion, and a silver film plated on such a deposit does not adhere. Silver ion makes a highly stable complex with cyanide ion, so that in a silver cyanide solution, the activity of silver ion is very small. This is one of the reasons for the universal use of cyanide baths in the industrial silver plating. However, the consideration of the difference between the values of the stability constants for bath the silver-iodide complex and the copper-iodide complex suggest that the rate of replacement deposition of silver on the copper substrate in si]ver-potassium iodide solution, could be comparatively low. To confirm this, the rate of replacement deposition of silver in both a silver-potassium iodide solution ($AgNO_3$0.10 mol/L, KI 2.00 mol/L ) and a strike silver plating bath (AgCN 0.028 mol/L, KCN 1.15 mol/L ) was estimated from the current density corresponding to the point of intersection of the anodic and the cathodic polarization curves. These estimated values were almost the same, and it is suggested that the silver-potassium iodide solution is not only a cyanide free silver plating bath capable of employing a copper substrate but a silver plating bath which requires no strike plating.

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Dendrite 형상 구리 입자의 무전해 은 도금에 의한 열적 안정성 향상에 관한 연구 (Study on Improvement of Thermal Stability of Dendrite-shape Copper Particles by Electroless Silver Plating)

  • 황인성;남광현;정대원
    • 공업화학
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    • 제33권6호
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    • pp.574-580
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    • 2022
  • Dendrite 형태의 구리 입자 표면을 은으로 무전해 도금을 하는 과정에서, 치환도금(displacement plating)과 화학 환원도금(reducing electroless plating)을 병용하여 다양한 silver-coated copper (Ag@Cu) 입자들을 제조하였다. Ag@Cu 입자들의 물리화학적 특성은 SEM-EDS, TGA, XPS, XRD 및 BET 등으로 분석하였으며, 환원반응에 의하여 코팅되는 은은 구리 입자 표면에 나노 입자 형태로 형성되는 것을 확인할 수 있었다. Ag@Cu 입자들을 에폭시 수지와 복합화하여 도전성 필름을 제조하고 그의 열적 안정성을 평가하였다. 치환 반응과 환원 반응의 차이가 Ag@Cu 필름의 초기 저항 및 열적 안정성에 미치는 영향에 관하여 연구하였다.

포도당 환원제와 PdCl2 촉매를 사용한 무전해 은도금 PET 직물의 제조 (Preparation of Electromagnetic Wave Shielding Fabrics by Electroless Silver Plating using PdCl2 and Dextrose)

  • 김수미;송화순
    • 한국의류학회지
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    • 제32권2호
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    • pp.319-327
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    • 2008
  • The purpose of this study is to propose the development of high quality electromagnetic wave shielding fabrics. Silver nitrate is used for polyester fabric as an electromagnetic wave shielding material. The effects of activators and electroless silver plating condition on the evenness and adhesion of silver to fabrics, are observed through the SEM micrographs. Surface morphology and wash-ability are measured using SEM. The results are as follows: The optimum weight loss by alkaline hydrolysis of polyester fabrics is about 20%. The optimum concentration of $SnCl_2$ and $PdCl_2$in catalyst reaction using $PdCl_2$ as an activator is 2.5g/L and 0.5g/L, respectively. The optimum concentration of dextrose to improve adhesion between the silver plating and fabrics is 45g/L. The optimum concentration of silver nitrate in the catalyst reaction, using $PdCl_2$ as an activator is 56g/L, respectively. The optimum plating temperature and time are $15^{\circ}C$ and 30minutes, respectively.

은도금 중공미세구를 이용한 경량 전파흡수체의 제조 (Fabrication of Light Weighted Microwave Absorbers Using Silver-Coated Hollow Microspheres)

  • 김욱중;김선태;김성수;권순길;안준모;김근홍;천창환
    • 한국재료학회지
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    • 제11권11호
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    • pp.941-946
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    • 2001
  • Conductive microspheres with a density of 0.2 g/cc were fabricated by electroless silver plating for application to the light-weighted microwave absorbers. The silver plating was conducted with the variation of plating conditions (sensitizing condition, $AgNO_3$, concentration, amount of reducing agent). Specimens have very low electro-resistivity. Under an optimum processing condition, conductive microspheres with uniform silver plating layer can be produced. Rubber-sphere composites were fabricated and their microwave absorbing properties were measured by HP8722D Network Analyzer. It was found that the lower the electrical resistance of microsphere, the better the microwave absorbing properties. Feasibility of microwave absorbers using this microspheres can be demonstrated with the result of microwave reflection loss of -15 dB and thickness of 1.44 mm.

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무전해 도금 코팅 공정을 이용한 은 박막의 두께 변화에 따른 트라이볼로지 특성 (Tribological Characteristics of Silver Electroless-Plating Process According to Thicknesses Variation)

  • 이현대;김대은
    • 대한기계학회논문집A
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    • 제37권2호
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    • pp.219-225
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    • 2013
  • 본 연구에서는 무전해 도금 코팅방법을 이용하여 생성한 Ag 박막의 기계적 특성을 고찰하였다. 이 코팅방법은 화학적 반응을 통해 금속박막을 기판 위에 형성할 수 있는 공정으로써 비교적 간단하고 경제적이며 전기도금과 비교했을 때 도체뿐만 아니라 부도체에도 적용할 수 있다는 유리한 장점이 있다. 따라서 반도체에서부터 기계부품에 이르기까지 산업전반에 걸쳐 다양하게 적용되고 있는 코팅방법이다. 본 연구에서는 무전해 도금 공정의 변수에 따라 형성되는 Ag 박막의 기계적 특성을 파악하는데 중점을 두었다. 특히, 무전해 도금방법을 이용해 제작한 코팅 시편에 대해 도금시간에 따른 거칠기 및 두께에 대한 분석을 실시하였으며 AFM, SEM, Tribotester 와 같은 장비를 이용하여 트라이볼로지적 특성을 규명하였다.

국산동판을 사용한 리드프레임 도금기술에 관한 연구 (Electroplating on the Lead Frames Fabricated from Domestic Copper Plate)

  • 장현구;이대승
    • 한국표면공학회지
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    • 제19권3호
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    • pp.92-108
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    • 1986
  • An electroplating on the lead frame fabricated from domestic copper plate was studied experimentally. In this study, nickel was plated on the thin copper lead frame and silver layer was coated on the nickel film in the cyanide electrolyte. The effect of process variables such as current density, plating time, coating thickness and flow rate of electrolytic solution on the properties of coating was investigated. Some samples on each step were fabricated during electroplating. The results obtained from polarization measurement, observation of SEM photograph, adhesion test of coating and microhardness test are as follows. On silver plating, polarization resistance of potentiostatic cathodic polarization curve is reduced as the flow rate of Ag electrolytic solution increases. And above resistance is also reduced when the minor chemicals of sodium cyanide and sodium carbonate are added in potassium silver cyanide bath. The reduced polarization resistance makes silver deposition on the cathode easy. An increase in the current density and the coating thickness causes the particle size of deposit to coarsen, and consequently the Knoop microhardness of the coating decreases. On selective plating an increase in the flow rate of plating solution lead to do high speed plating with high current density. In this case, the surface morphology of deposit is of fine microstructure with high Knoop hardness. An increasing trend of the adhesion of coating was shown with increasing the current density and flow rate of electrolytic solution.

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무전해 도금법을 이용한 코어 셸 구조의 Cu-Ag분말 제조 (Preparation of Cu-Ag Powder having Core-Shell Structure by Electroless Plating Method)

  • 김종완;이혁희;원창환
    • 한국표면공학회지
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    • 제42권1호
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    • pp.47-52
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    • 2009
  • Cu-Ag powder having Core-Shell structure was prepared from by electroless plating method using agents such as $AgNO_3$, $NH_{4}OH$, Hydroquinone. Ag coated copper powders were analyzed using scanning electron microscopy(SEM) and energy dispersive X-ray spectrometer(EDX). The silver coating layer of copper powder was affected from various reaction conditions such as molar ratio of $NH_{4}OH$, $AgNO_3$, and pulp density. Free silver was generated below 0.1M or 0.3M and above of $NH_{4}OH$ mole ratio. Silver coating layer thickened as addition of $AgNO_3$. When the pulp density reached 12% with 0.2M $NH_{4}OH$, and 0.15M $AgNO_3$ at $4^{\circ}C$, silver was homogeneously distributed around the copper particles and free silver particles were not generated.

광유도도금을 이용한 스크린 프린팅 결정질 실리콘 태양전지의 효율 향상 (Efficiency Improvement in Screen-printed Crystalline Silicon Solar Cell with Light Induced Plating)

  • 정명상;강민구;장효식;송희은
    • 한국전기전자재료학회논문지
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    • 제26권3호
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    • pp.246-251
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    • 2013
  • Screen printing is commonly used to form the front/back electrodes in silicon solar cell. But it has caused high resistance and low aspect ratio, resulting in decreased conversion efficiency in solar cell. Recently the plating method has been combined with screen-printed c-Si solar cell to reduce the resistance and improve the aspect ratio. In this paper, we investigated the effect of light induced silver plating with screen-printed c-Si solar cells and compared their electrical properties. All wafers were textured, doped, and coated with anti-reflection layer. The metallization process was carried out with screen-printing, followed by co-fired. Then we performed light induced Ag plating by changing the plating time in the range of 20 sec~5min with/without external light. For comparison, we measured the light I-V characteristics and electrode width by optical microscope. During plating, silver ions fill the porous structure established in rapid silver particle sintering during co-firing step, which results in resistance decrease and efficiency improvement. The plating rate was increased in presence of light lamp, resulting in widening the electrode with and reducing the short-circuit current by shadowing loss. With the optimized plating condition, the conversion efficiency of solar cells was increased by 0.4% due to decreased series resistance. Finally we obtained the short-circuit current of 8.66 A, open-circuit voltage of 0.632 V, fill factor of 78.2%, and efficiency of 17.8% on a silicon solar cell.

결정질 실리콘 태양전지에 적용될 Light-induced plating을 이용한 Ni/Cu 전극에 관한 연구 (The Research of Ni/Cu Contact Using Light-induced Plating for Cryatalline Silicom Solar Cells)

  • 김민정;이수홍
    • 한국태양에너지학회:학술대회논문집
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    • 한국태양에너지학회 2009년도 추계학술발표대회 논문집
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    • pp.350-355
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    • 2009
  • The crysralline silicon solar cell where the solar cell market grows rapidly is occupying of about 85% or more high efficiency and low cost endeavors many crystalline solar cells. The fabricaion process of high efficiency crystalline silicon solar cells necessitate complicated fabrication processes and Ti/Pd/AG contact, This metal contacts have only been used in limited areas in spite of their good srability and low contact resistance because of expensive materials and process. Commercial solar cells with screen-printed solar cells formed by using Ag paste suffer from loe fill factor and high contact resistance and low aspect ratio. Ni and Cu metal contacts have been formed by using electroless plating and light-induced electro plating techniques to replace the Ti/Pd/Ag and screen-printed Ag contacts. Copper and Silver can be plated by electro & light-induced plating method. Light-induced plating makes use the photovoltaic effect of solar cell to deposit the metal on the front contact. The cell is immersed into the electrolytic plating bath and irradiated at the front side by light source, which leads to a current density in the front side grid. Electroless plated Ni/ Electro&light-induced plated Cu/ Light-induced plated Ag contact solar cells result in an energy conversion efficiency of 16.446 % on 0.2~0.6${\Omega}$ cm, $20{\times}20mm^2$, CZ(Czochralski) wafer.

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정밀 다층 박막 도금을 이용한 빠른 동작 퓨즈 특성 설계 (Design of Fast Acting Fuse Characteristics Using a Precision Multi-layer Thin Film Plating)

  • 김은민;강창룡
    • 전기학회논문지
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    • 제65권3호
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    • pp.445-451
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    • 2016
  • General fuse elements of solution for fast acting operation characteristics made using silver or silver alloy, those are not able to dominate cost competition to the advanced global leaders that have not only high technology but competitive price. In this study, the method that compose the fuse elements manufactured solution of fast acting operation characteristics by using precision multi-layer thin film plating and helical cutting process from low-priced copper metal. Furthermore, in order to move rated current line of fuse due to the heat loses, the manufacture construction method of fixed resistor is introduced, and then Ni-P plating layer and Sn plating layer are introduced multiply for controling fine opening time characteristics. So this study can establish the high productive and low-priced production method.