• Title/Summary/Keyword: Silicon surfaces

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Global analysis of heat transfer in Si CZ furnace with specular and diffuse surfaces

  • Hahn, S.H.;Tsukada, T.;Hozawa, M.;Maruyama, S.;Imaishi, N.
    • Proceedings of the Korea Association of Crystal Growth Conference
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    • 1998.06a
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    • pp.45-48
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    • 1998
  • For the single crystal growth of silicon, a global analysis of heat transfer in a CZ furnace was carried out using the finite element method, where the radiative heat transfer between the surfaces that possess both specular and/or diffuse reflectance components was taken into account, and then the effect of the specular reflection of the crystal and/or melt on the CZ crystal growth was numerically investigated.

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Zirconia Coating of SiC Whiskers Using the Aqueous Solutions of Zr(SO4)2 ($Zr(SO_4)_2$ 수용액을 이용한 SiC 휘스커의 지르코니아 코팅)

  • Kim, Duk-Jun;Kim, Hwan
    • Journal of the Korean Ceramic Society
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    • v.33 no.12
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    • pp.1380-1386
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    • 1996
  • The effects of urea addition and reaction conditions were examined in the prepareation of zirconia coated SiC whiskers through surface precipitation taking place during high-temperature aging of Zr(SO4)2 solutions containing the whiskers. More dense zirconia-hydrate was precipitated on the surfaces of the whiskers in the presence of urea. The ratio of the concentration of Zr(SO4)2 to the amount of added whiskers was the most important factor to confine the precipitation of zirconia-hydrate only at the surfaces of the whiskers The from of the coating layers was unchanged after heat-treatment leading to the dehydration and crystallization of the layers.

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Prediction of Frictional behavior according to geometrical contact condition using FFT-based analysis (FFT해석을 이용한 기하학적 접촉조건에 따른 마찰거동예측)

  • 성인하;이형석;김대은
    • Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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    • 2001.11a
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    • pp.13-18
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    • 2001
  • In this paper, FFT(Fast Fourier Transform) analysis of friction was suggested as a method to interpret the contact conditions. Micro-grooves with various dimensions were fabricated on the silicon surface to investigate the frictional behavior with respect to the change in geometrical contact condition. Frictional forces between micro-grooved surfaces and spheres modeled as surface asperities were measured using a micro-tribotester which was built inside a SEM(Scanning Electron Microscope). The experimental results show that the relative dimensions and distributions of contact asperities between two surfaces can be predicted by the power spectrum and the main frequency in FFT-based analysis of friction coefficient. Also, it was shown that the friction coefficient for multi-asperities was the result of the superposition of that for each asperity.

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Anisotropic Etching of Silicon in Aqueous TMAH/IPA Solutions (수용성 TMAH/IPA 용액의 실리콘 이방성 식각)

  • 박진성;송승환;정귀상
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1996.11a
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    • pp.334-337
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    • 1996
  • Si anisotropic etching is a key technology for micromachining. The main advantages of tetramethyl ammonium hydroxide (TMAH)-based solution are their full compatibility with IC process. In this work the anisotropic etching of single crystal Si in a TMAH (($CH_3$)$_4$NOH) based solution was studied. The influence of the addition of IPA to TMAH solution on their etching characteristics was also presented. The crystal planes bounding the etch front and their etch rates were determined as a function of temperature, crystal orientation, and etchant concentration. The etch rates of (100) oriented Si crystal planes decreased linearly with increasing the IPA concentration, The etched (100) planes were covered by Pyramidal-shaped hillocks below 15 wt.%, but very smooth surfaces were obtained above 20 wt.%. The addition of IPA to TMAH solution leads to smoother surfaces of sidewalls etched planes.

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THE EFFECT OF MICRO/NANOSCALE STRUCTURES ON CHF ENHANCEMENT

  • Ahn, Ho-Seon;Kim, Moo-Hwan
    • Nuclear Engineering and Technology
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    • v.43 no.3
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    • pp.205-216
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    • 2011
  • Recently, many research studies have investigated the enormous critical heat flux (CHF) enhancement caused by nanofluids during pool boiling and flow boiling. One of the main reasons for this enhancement is nanoparticle deposition on the heated surface. However, in real applications, nanofluids create many problems when used as working fluids because of sedimentation and aggregation. Therefore, artificial surfaces on silicon and metal have been developed to create an effect similar to that of nanoparticle deposition. These modified surfaces have proved capable of greatly increasing the CHF during pool boiling, and good results have also been observed during flow boiling. In this study, we demonstrate that the wetting ability of a surface, i.e., wettability, and the liquid spreading ability (hydrophilic surface property), are key parameters for increasing the CHF during both pool and flow boiling. We also demonstrate that when the fuel surface in nuclear power plants is modified in a similar manner, it has the same effect, producing a large CHF enhancement.

Electrical Characterization of MOS (metal-oxide-semiconductor) Capacitors on Plasma Etch-damaged 4H-Silicon Carbide (플라즈마 에칭으로 손상된 4H-실리콘 카바이드 기판위에 제작된 MOS 커패시터의 전기적 특성)

  • 조남규;구상모;우용득;이상권
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.17 no.4
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    • pp.373-377
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    • 2004
  • We have investigated the electrical characterization of metal-oxide-semiconductor (MOS) capacitors formed on the inductively coupled plasma (ICP) etch-damaged both n- and p-type 4H-SiC. We found that there was an effect of a sacrificial oxidation treatment on the etch-damaged surfaces. Current-voltage and capacitance-voltage measurements of these MOS capacitors were used and referenced to those of prepared control samples without etch damage. It has been found that a sacrificial oxidation treatment can improve the electrical characteristics of MOS capacitors on etch-damaged 4H-SiC since the effective interface density and fixed oxide charges of etch-damaged samples have been found to increase while the breakdown field strength of the oxide decreased and the barrier height at the SiC-SiO$_2$ interface decreased for MOS capacitors on etch-damaged surfaces.

THIN FILM GROWTH AND SURFACE REACTION ON H-TERMINATED SILICON SURFACE

  • Yasuda, Yukio;Zaima, Shigeaki
    • Journal of the Korean institute of surface engineering
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    • v.29 no.5
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    • pp.407-414
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    • 1996
  • We have investigated the effects of H atoms on thin film growth processes and surface reactions. In the oxidation of Si, Si surfaces are passivated against the $O_2$ adsorption by terminating dangling bonds with H atoms. Moreover, the existence of Si-H bonds on Si(100) surfaces enhances the structural relaxation of Si-O-Si bonds due to a charge transfer from Si-Si back bonds. In the heteroepitaxial growth of a Si/Ge/Si(100) system, H atoms suppress the segregation of Ge atoms into Si overlayers since the exchange of Ge atoms with Si atoms bound with H must be accompanied with breaking of Si-H bonds. However, 3-dimensional island growth is also promoted by atomic H irradiation, which is considered to result from the suppression of surface migration of adsorbed reaction species and from the lowering of step energies by the H termination of dangling bonds.

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Nanotribological characteristics of silicon surfaces modified by IBAD (IBAD로 표면개질된 실리콘표면의 나노 트라이볼로지적 특성)

  • 윤의성;박지현;양승호;공호성;장경영
    • Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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    • 2001.06a
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    • pp.127-134
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    • 2001
  • Nano adhesion and friction between a Sj$_3$N$_4$ AFM tip and thin silver films were experimentally studied. Tests were performed to measure the nano adhesion and friction in both AFM(atomic force microscope) and LFM(lateral force microscope) modes in various ranges of normal load. Thin silver films deposited by IBAD (ion beam assisted deposition) on Si-wafer (100) and Si-wafer of different surface roughness were used. Results showed that nano adhesion and friction decreased as the surface roughness increased. When the Si surfaces were coated by pure silver, the adhesion and friction decreased. But the adhesion and friction were not affected by the thickness of IBAD silver coating. As the normal force increased, the adhesion forces of bare Si-wafer and IBAD silver coating film remained constant, but the friction forces increased linearly. Test results suggested that the friction was mainly governed by the adhesion as long as the normal load was low.

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Synthesis and Electrochemical Characteristics of Silicon/Carbon Anode Composite with Binders and Additives (Silicon/Carbon 음극소재 제조 및 바인더와 첨가제에 따른 전기화학적 특성)

  • Park, Ji Yong;Lee, Jong Dae
    • Korean Chemical Engineering Research
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    • v.56 no.3
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    • pp.303-308
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    • 2018
  • Silicon/Carbon (Si/C) composite as anode materials for lithium-ion batteries was synthesized to find the effect of binders and an electrolyte additive. Si/C composites were prepared by two step method, including magnesiothermic reduction of SBA-15 (Santa Barbara Amorphous material No. 15) and carbonization of phenol resin. The electrochemical performances of Si/C composites were investigated by charge/discharge, cyclic voltammetry and impedance tests. The anode electrode of Si/C composite with PAA binder appeared better capacity (1,899 mAh/g) and the capacity retention ratio (92%) than that of other composition coin cells during 40 cycles. Then, Vinylene carbonate (VC) was tested as an electrolyte additive. The influence of this additive on the behavior of Si/C anodes was very positive (3,049 mAh/g), since the VC additive is formed passivation films on Si/C surfaces and suppresses irreversible changes.

Improvement of Commercial Silicon Solar Cells with N+-P-N+ Structure using Halogenic Oxide Passivation

  • K. Chakrabarty;D. Mangalaraj;Kim, Kyung-Hae;Park, J.H.;J. Yi
    • Transactions on Electrical and Electronic Materials
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    • v.4 no.6
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    • pp.17-20
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    • 2003
  • This paper describes the effect of halogenic gettering during oxide passivation of commercial solar cell with the $N^{+}$-P-$N^{+}$ structure. In order to study the effect of halogenic gettering on $N^{+}$-P-$N^{+}$ structure mono-crystalline silicon solar cell, we performed conventional POCl$_3$ diffusion for emitter formation and oxide passivation in the presence of HCl vapors. The $N^{+}$-P-$N^{+}$ structure based silicon solar cells were found to have higher short circuit current and minority carrier lifetime. Their performance was also found to be superior than the conventional $N^{+}$-P-$N^{+}$ structure based mono-crystalline silicon solar cell. The cell parameters of the $n^{+}$-p-$p^{+}$ and $n^{+}$-p-$n^{+}$ structure based cells, passivated by HCl assisted oxidation were measured. The improvement in $I_{sc}$ was attributed to the effect of the increased diffusion length of minority carriers, which came from the halogenic gettering effect during the growth of passivating oxide. The presence of chlorine caused gettering of the cells by removing the heavy metals, if any. The other advantage of the presence of chlorine was the removal of the diffusion induced (in oxygen environment) stacking faults and line defects from the surfaces of the silicon wafers. All these effects caused the improvement of the minority carrier lifetime, which in-turn helped to improve the quality of the solar cells.