• Title/Summary/Keyword: Silicon photonics

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A Study of the Quantitative Relationship of Charge-Density Changes and the Design Area of a Fabricated Solar Cell

  • Jeon, Kyeong-Nam;Kim, Seon-Hun;Kim, Hoy-Jin;Kim, In-Sung;Kim, Sang-Hyun
    • Transactions on Electrical and Electronic Materials
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    • v.12 no.5
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    • pp.204-208
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    • 2011
  • In this paper, the design area of a fabricated solar cell has been analyzed with respect to its charge density. The mathematical calculation used for charge-density derivation was obtained from the 2001 version of a MATHCAD program. The parameter range for the calculations was ${\pm}1{\times}10^{17}cm^{-3}$, which is in the normal parameter range for n-type doping impurities ($7.0{\times}10^{17}cm^{-3}$) and also for p-type impurities ($4.0{\times}10^{17}cm^{-3}$). Therefore, it can be said that the fabricated solar-cell design area has a direct effect on charge-density changes.

Infrared Response Characterization on the Microbolometer Device Design (마이크로볼로미터 소자설계에 따른 적외선 검출특성)

  • Han, Myung-Soo;Ahn, Su-Chang;Kang, Tai-Young;Lim, Sung-Soo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.343-344
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    • 2008
  • A surface micromachined uncooled microbolometer based on the amorphous silicon was designed, fabricated, and characterized. We designed the microbolometer with a pixel size of $44\times44{\mu}m^2$ and a fill factor of about 50 % ~ 70% by considering such important factors as the thermal conductance, thermal time constant, the temperature coefficient of resistance, and device resistance. Also, we successfully fabricated the microbolometer by using surface MEMS technology. Finally, we investigated responsivity and detectivity properties depends on the active area size.

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Surface Emitting Terahertz Transistor Based on Charge Plasma Oscillation

  • Kumar, Mirgender;Park, Si-Hyun
    • Current Optics and Photonics
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    • v.1 no.5
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    • pp.544-550
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    • 2017
  • This simulation based study reports a novel tunable, compact, room temperature terahertz (THz) transistor source, operated on the concept of charge plasma oscillation with the capability of radiating within a terahertz gap. A vertical cavity with a quasi-periodic distributed-Bragg-reflector has been attached to a THz plasma wave transistor to achieve a monochromatic coherent surface emission for single as well as multi-color operation. The resonance frequency has been tuned from 0.5 to 1.5 THz with the variable quality factor of the optical cavity from 5 to 290 and slope efficiency maximized to 11. The proposed surface emitting terahertz transistor is able to satisfy the demand for compact solid state terahertz sources in the field of teratronics. The proposed device can be integrated with Si CMOS technology and has opened the way towards the development of silicon photonics.

Measurement and Analysis of the Dynamics of Peptide-Antibody Interactions Using an Ellipsometric Biosensor Based on a Silicon Substrate (실리콘 기판을 사용한 바이오센서와 회전 타원분광계를 이용한 펩타이드-항체 접합의 동특성 측정과 분석)

  • Lee, Geun-Jae;Cho, Hyun Mo;Jo, Jae Heung
    • Korean Journal of Optics and Photonics
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    • v.28 no.1
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    • pp.9-15
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    • 2017
  • We precisely measured and analyzed the dynamics of peptide-antibody interactions, using an ellipsometric biosensor based on a silicon substrate. To reduce the signal error due to the imperfect flatness of the substrate for extremely low concentrations of peptide, we fabricated the biosensor with a silicon substrate coated with Dextran SAM, instead of a glass prism coated with a thin metallic thin film. At an injection speed of $100{\mu}l/min$ of buffer liquid, we detected the dynamics of antibody-Dextran SAM or peptide-antibody fixed on biosensor, respectively. We detected the dynamics of antibody-Dextran SAM interactions down to a low concentration of 5 ng per liter, and we precisely measured the dynamics of association and dissociation of peptide and antibody down to 100 nM of peptide. We obtained the rate constants for association and dissociation from fitting the data by using deduced dynamical equation. As a result, we obtained an equilibrium constant for dissociation of 97 nM of peptide-antibody complex, which belongs to Class I.

A Study on Ultra Precision Grinding of Silicon Carbide Molding Core for High Pixel Camera Phone Module (고화소 카메라폰 모듈을 위한 Glass 렌즈 성형용 Silicon Carbide 코어의 초정밀 가공에 관한 연구)

  • Kim, Hyun-Uk;Kim, Jeong-Ho;Ohmori, Hitoshi;Kwak, Tae-Soo;Jeong, Shang-Hwa
    • Journal of the Korean Society for Precision Engineering
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    • v.27 no.7
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    • pp.117-122
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    • 2010
  • Recently, aspheric glass lens molding core is fabricated with tungsten carbide(WC). If molding core is fabricated with silicon carbide(SiC), SiC coating process, which must be carried out before the Diamond-Like Carbon(DLC) coating can be eliminated and thus, manufacturing time and cost can be reduced. Diamond Like Carbon(DLC) is being researched in various fields because of its high hardness, high elasticity, high durability, and chemical stability and is used extensively in several industrial fields. Especially, the DLC coating of the molding core surface used in the fabrication of a glass lens is an important technical field, which affects the improvement of the demolding performance between the lens and molding core during the molding process and the molding core lifetime. Because SiC is a material of high hardness and high brittleness, it can crack or chip during grinding. It is, however, widely used in many fields because of its superior mechanical properties. In this paper, the grinding condition for silicon carbide(SiC) was developed under the grinding condition of tungsten carbide. A silicon carbide molding core was fabricated under this grinding condition. The measurement results of the SiC molding core were as follows: PV of 0.155 ${\mu}m$(apheric surface) and 0.094 ${\mu}m$(plane surface), Ra of 5.3 nm(aspheric surface) and 5.5 nm(plane surface).

Micro-patterning of light guide panel in a LCD-BLU by using on silicon crystals (실리콘 결정면을 이용한 LCD-BLU용 도광판의 미세산란구조 형성)

  • lChoi Kau;Lee, Joon-Seob;Song, Seok-Ho;Oh Cha-Hwan;Kim, Pill-Soo
    • Korean Journal of Optics and Photonics
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    • v.16 no.2
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    • pp.113-120
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    • 2005
  • Luminous efficiency and uniformity in a LCD-BLU are mainly determined by fine scattering patterns formed on the light guide panel. We propose a novel fabrication method of 3-dimensional scattered patterns based on anisotropic etching of silicon wafers. Micro-pyramid patterns with 70.5 degree apex-angle and micro-prism patterns with 109.4 degree apex-angle can be self-constructed by the wet, anisotropic etching of (100) and (110) silicon wafers, respectively, and those patterns are easily duplicated by the PDMS replica process. Experimental results on spatial and angular distributions of irradiation from the light guide panel with the micro-pyramid patterns were very consistent with the calculation results. Surface roughness of the silicon-based micro-patterns is free from any artificial defects since the micro-patterns are inherently formed with silicon crystal surfaces. Therefore, we expect that the silicon based micro-patterning process makes it possible to fabricate perfect 3-dimensional micro-structures with crystal surface and apex angles, which may guarantee mass-reproduction of the light guide panels in LCD-BLU.

Expressions for Ellipsometric Constants of Samples Covered with Two Thick Incoherent Films (결맞음길이보다 두꺼운 두 개의 막에 덮여있는 시료의 타원식)

  • Kim, Sang Youl
    • Korean Journal of Optics and Photonics
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    • v.24 no.2
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    • pp.92-98
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    • 2013
  • The expressions for ellipsometric constants of a sample covered with two thick films are derived, where incoherent superposition of multiply reflected lights inside thick films is properly considered in the frame of the rotating analyzer ellipsometry. The derived expressions are successfully applied to the analysis of a silicon wafer with a thin silicon dioxide film on it, which is placed beneath a cover glass and an air gap.

Optical-Loss Measurement of a Silicon-Slab Waveguide

  • Tresna, Wildan Panji;Putra, Alexander William Setiawan;Maruyama, Takeo
    • Current Optics and Photonics
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    • v.4 no.6
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    • pp.551-557
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    • 2020
  • A mirror-in-slab waveguide is fabricated on a slab waveguide by using the refractive-index contrast between two materials, with the reflection performance depending on the slab waveguide's design. In this research, a slab waveguide design consisting of silicon (Si) as the core and SiO2 as the substrate was designed and developed to determine the coupling, waveguide, and mirror losses. Based on experimental results, coupling loss is dominant and is affected by the design of the slab waveguide. Furthermore, the mirror loss is affected by the design of the mirror, such as the curvature radius and the size of the mirror. TE and TM polarizations of light are used in the measurements. The experimental results show that mirror losses due to reflection by mirrors are 0.011 dB/mirror and 0.007 dB/mirror for TE and TM polarizations respectively. A simulation was performed to confirm whether the size of mirror is sufficient to reflect the input light, and to check the quality of the surfaces of fabricated mirrors.

Design of All-SiC Lightweight Secondary and Tertiary Mirrors for Use in Spaceborne Telescopes

  • Bae, Jong-In;Lee, Haeng-Bok;Kim, Jeong-Won;Kim, Myung-Whun
    • Current Optics and Photonics
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    • v.6 no.1
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    • pp.60-68
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    • 2022
  • We report on the design of the secondary and the tertiary mirrors used in lightweight assemblies made entirely of silicon carbide (SiC). The essential design points are weight reduction within the acceptable deformation of the mirror surface by gravity release, temperature change, and vibration during or after space launch. To find a design that achieves the target requirements, we established finite element models for various candidate designs and subjected each one to wave front error analyses along gravity directions and in operation temperatures. We also calculated the natural frequencies of the candidate assemblies. Our study suggested that a triangular cell with bipod flexure support can satisfy the target weight within the requirements.

Silicon Photonics Technology-The optical I/O platform for future computing and data communication (실리콘 포토닉스 테크놀로지-미래컴퓨팅, 데이터 통신을 위한 광I/O 플랫폼)

  • Kim, G.
    • Electronics and Telecommunications Trends
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    • v.31 no.6
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    • pp.13-20
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    • 2016
  • 실리콘 포토닉스 기술은 컴퓨터를 비롯한 여러 전자, 통신 기기들이 광 정보를 송수신하는 데 표준 실리콘을 이용하는 기술로, 기존 실리콘 반도체 기술과 호환될 수 있는 기술이다. 전자와 광의 융합기술로 실리콘 칩 사이, 또는 칩 내에서 빛으로 데이터를 주고받아, 데이터 전송속도를 획기적으로 올리면서도 전력 소모량을 크게 줄일 수 있는 것이 가능하다. 고성능, 저 생산비용과 낮은 소비전력 등의 장점 때문에, 전 세계적으로 실리콘 포토닉스 핵심기술/실용적 플랫폼 연구개발 및 상용화 경쟁이 이루어지고 있다. 본지에서는 실리콘 포토닉스 기술의 간략한 개요, 현재 동향 및 기술 이슈, 그리고 ETRI에서 연구개발된 실리콘 포토닉스 기술과 더불어 그 발전 전망에 대해 기술한다.

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