• Title/Summary/Keyword: Silicon Dioxide

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Process Optimization of PECVD SiO2 Thin Film Using SiH4/O2 Gas Mixture

  • Ha, Tae-Min;Son, Seung-Nam;Lee, Jun-Yong;Hong, Sang-Jeen
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.434-435
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    • 2012
  • Plasma enhanced chemical vapor deposition (PECVD) silicon dioxide thin films have many applications in semiconductor manufacturing such as inter-level dielectric and gate dielectric metal oxide semiconductor field effect transistors (MOSFETs). Fundamental chemical reaction for the formation of SiO2 includes SiH4 and O2, but mixture of SiH4 and N2O is preferable because of lower hydrogen concentration in the deposited film [1]. It is also known that binding energy of N-N is higher than that of N-O, so the particle generation by molecular reaction can be reduced by reducing reactive nitrogen during the deposition process. However, nitrous oxide (N2O) gives rise to nitric oxide (NO) on reaction with oxygen atoms, which in turn reacts with ozone. NO became a greenhouse gas which is naturally occurred regulating of stratospheric ozone. In fact, it takes global warming effect about 300 times higher than carbon dioxide (CO2). Industries regard that N2O is inevitable for their device fabrication; however, it is worthwhile to develop a marginable nitrous oxide free process for university lab classes considering educational and environmental purpose. In this paper, we developed environmental friendly and material cost efficient SiO2 deposition process by substituting N2O with O2 targeting university hands-on laboratory course. Experiment was performed by two level statistical design of experiment (DOE) with three process parameters including RF power, susceptor temperature, and oxygen gas flow. Responses of interests to optimize the process were deposition rate, film uniformity, surface roughness, and electrical dielectric property. We observed some power like particle formation on wafer in some experiment, and we postulate that the thermal and electrical energy to dissociate gas molecule was relatively lower than other runs. However, we were able to find a marginable process region with less than 3% uniformity requirement in our process optimization goal. Surface roughness measured by atomic force microscopy (AFM) presented some evidence of the agglomeration of silane related particles, and the result was still satisfactory for the purpose of this research. This newly developed SiO2 deposition process is currently under verification with repeated experimental run on 4 inches wafer, and it will be adopted to Semiconductor Material and Process course offered in the Department of Electronic Engineering at Myongji University from spring semester in 2012.

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Quantitative analysis of formation of oxide phases between SiO2 and InSb

  • Lee, Jae-Yel;Park, Se-Hun;Kim, Jung-Sub;Yang, Chang-Jae;Kim, Su-Jin;Seok, Chul-Kyun;Park, Jin-Sub;Yoon, Eui-Joon
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.162-162
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    • 2010
  • InSb has received great attentions as a promising candidate for the active layer of infrared photodetectors due to the well matched band gap for the detection of $3{\sim}5\;{\mu}m$ infrared (IR) wavelength and high electron mobility (106 cm2/Vs at 77 K). In the fabrication of InSb photodetectors, passivation step to suppress dark currents is the key process and intensive studies were conducted to deposit the high quality passivation layers on InSb. Silicon dioxide (SiO2), silicon nitride (Si3N4) and anodic oxide have been investigated as passivation layers and SiO2 is generally used in recent InSb detector fabrication technology due to its better interface properties than other candidates. However, even in SiO2, indium oxide and antimony oxide formation at SiO2/InSb interface has been a critical problem and these oxides prevent the further improvement of interface properties. Also, the mechanisms for the formation of interface phases are still not fully understood. In this study, we report the quantitative analysis of indium and antimony oxide formation at SiO2/InSb interface during plasma enhanced chemical vapor deposition at various growth temperatures and subsequent heat treatments. 30 nm-thick SiO2 layers were deposited on InSb at 120, 160, 200, 240 and $300^{\circ}C$, and analyzed by X-ray photoelectron spectroscopy (XPS). With increasing deposition temperature, contents of indium and antimony oxides were also increased due to the enhanced diffusion. In addition, the sample deposited at $120^{\circ}C$ was annealed at $300^{\circ}C$ for 10 and 30 min and the contents of interfacial oxides were analyzed. Compared to as-grown samples, annealed sample showed lower contents of antimony oxide. This result implies that reduction process of antimony oxide to elemental antimony occurred at the interface more actively than as-grown samples.

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Bond Characteristics of Scale According to the Drainage Pipe's Material in Tunnel (터널 배수공의 재질에 따른 스케일 부착 특성에 관한 연구)

  • Chu, Ickchan;Nam, Seunghyuk;Baek, Seungin;Jung, Hyuksang;Chun, Byungsik
    • Journal of the Korean GEO-environmental Society
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    • v.12 no.11
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    • pp.51-57
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    • 2011
  • The calcium hydroxide($Ca(OH)_{2}$) which is flowed into the deteriorated tunnel by groundwater is reacted with carbon dioxide($CO_{2}$) and the vehicle's exhaust gas ($SO_{3}$). So its by-products are precipitated at the drainage pipe and these cause the drainage clogging. Most by-products are composed of $CaCO_{3}$ with calcite from a chemical experiment. The purpose of this study is mainly focused on comparison of attachment on each material of drainage pipe (teflon-coated steel pipe, silicon-Oil coated pipe, acrylic pipe and PVC pipe). The test was progressed to disembogue the CaO aqueous solution and tunnel outflow into each of the pipes. The experimental results show that the most produced scale pipe is PVC material and the followings are Acrylic pipe, Silicon-Oil coating pipe and Teflon coating pipe. But the long-term test results showed that teflon-coated steel pipe had a problem with durability because soil which was contained in the tunnel outflow occurred detachment of coating and corrosion of the steel pipe.

Homologue Patterns of Polychlorinated Naphthalenes (PCNs) formed via Chlorination in Thermal Process

  • Ryu, Jae-Yong;Kim, Do-Hyong;Mulholland, James A.;Jang, Seong-Ho;Choi, Chang-Yong;Kim, Jong-Bum
    • Journal of Environmental Science International
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    • v.21 no.8
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    • pp.891-899
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    • 2012
  • The chlorination pattern of naphthalene vapor when passed through a 1 cm particle bed of 0.5% (mass) copper (II) chloride ($CuCl_2$) mixed with silicon dioxide ($SiO_2$) was studied. Gas streams consisting of 92% (molar) $N_2$, 8% $O_2$ and 0.1% naphthalene vapor were introduced to an isothermal flow reactor containing the $CuCl_2/SiO_2$ particle bed. Chlorination of naphthalene was studied from 100 to $400^{\circ}C$ at a gas velocity of 2.7 cm/s. Mono through hexachlorinated naphthalene congeners were observed at $250^{\circ}C$ whereas a broader distribution of polychlorinated naphthalenes (PCNs) including hepta and octachlorinated naphthalenes was observed at $300^{\circ}C$. PCN production was peak at $250^{\circ}C$ with 3.07% (molar) yield, and monochloronaphthalene (MCN) congeners were the major products at two different temperatures. In order to assess the effect of a residence time on naphthalene chlorination, an experiment was also conducted at $300^{\circ}C$ with a gas velocity of 0.32 cm/s. The degree of naphthalene chlorination increased as a gas velocity decreased.

Multiple-inputs Dual-outputs Process Characterization and Optimization of HDP-CVD SiO2 Deposition

  • Hong, Sang-Jeen;Hwang, Jong-Ha;Chun, Sang-Hyun;Han, Seung-Soo
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.11 no.3
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    • pp.135-145
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    • 2011
  • Accurate process characterization and optimization are the first step for a successful advanced process control (APC), and they should be followed by continuous monitoring and control in order to run manufacturing processes most efficiently. In this paper, process characterization and recipe optimization methods with multiple outputs are presented in high density plasma-chemical vapor deposition (HDP-CVD) silicon dioxide deposition process. Five controllable process variables of Top $SiH_4$, Bottom $SiH_4$, $O_2$, Top RF Power, and Bottom RF Power, and two responses of interest, such as deposition rate and uniformity, are simultaneously considered employing both statistical response surface methodology (RSM) and neural networks (NNs) based genetic algorithm (GA). Statistically, two phases of experimental design was performed, and the established statistical models were optimized using performance index (PI). Artificial intelligently, NN process model with two outputs were established, and recipe synthesis was performed employing GA. Statistical RSM offers minimum numbers of experiment to build regression models and response surface models, but the analysis of the data need to satisfy underlying assumption and statistical data analysis capability. NN based-GA does not require any underlying assumption for data modeling; however, the selection of the input data for the model establishment is important for accurate model construction. Both statistical and artificial intelligent methods suggest competitive characterization and optimization results in HDP-CVD $SiO_2$ deposition process, and the NN based-GA method showed 26% uniformity improvement with 36% less $SiH_4$ gas usage yielding 20.8 ${\AA}/sec$ deposition rate.

Removal of Polymer residue on Graphene by Plasma treatment

  • Yun, Hye-Ju;Jeong, Dae-Seong;Lee, Geon-Hui;Sim, Ji-Ni;Lee, Jeong-O;Park, Jong-Yun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.375.2-375.2
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    • 2016
  • 그래핀(Graphene)은 원자 한 층 두께의 얇은 특성에 기인하여 우수한 투과도(~97.3%)를 나타내며, 높은 전자 이동도($200,000cm^2V^{-1}s^{-1}$)로 인하여 전기 전도도가 우수한 2차원 전자소재이다. 또한 유연하고 우수한 기계적 물성을 가지고 있어 실제로 다양한 소자에서 활용되고 있다. 그래핀을 이용하여 다양한 소자로 응용하기 위한 과정 중 하나인 포토리소그래피 공정(Photolithography process)은 원하는 패턴을 만들기 위해 제작하고자 하는 기판 위에 포토레지스트(Photoresist)를 코팅하는 과정을 거치게 된다. 하지만 이러한 과정은 소자 제작에 있어서 포토레지스트 잔여물을 남기게 된다. 그래핀 위에 남은 포토레지스트 잔여물은 그래핀의 우수한 전기적 특성을 저하시켜 소자특성에 불이익을 주게 된다. 본 연구에서는 수소 플라즈마를 이용하여 그래핀 위에 남은 중합체(Polymer) 잔여물을 제거한다. 사용한 그래핀은 화학 기상 증착법(Chemical vapor deposition)을 이용하여 성장시켰으며, PMMA(Poly(methyl methacrylate))를 이용하여 이산화규소(silicon dioxide) 기판에 전사하였다. 그래핀의 손상 없이 중합체 잔여물을 제거하기 위해 플라즈마 처리시간을 15초부터 1분까지 늘려가며 연구를 진행하였으며, 플라즈마 처리 시간에 따른 중합체 잔여물의 제거 정도와 그래핀의 보존 여부를 확인하기 위해 라만 분광법(Raman spectroscopy)과 원자간력현미경(Atomic force microscopy)을 사용하였다. 본 연구 결과를 통해 간단한 플라즈마 처리로 보다 나은 특성의 그래핀 소자를 얻게 됨으로써, 향상된 특성을 가진 그래핀 소자로 산업적 응용 가능성을 높일 수 있을 것이라 생각된다.

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Effects of Various Formulations on Bioavailability of Acetaminophen Soft Gelatin Capsules in Rabbits (토끼에서 아세트아미노펜 연집캅셀제의 생체이용율에 미치는 제제처방들의 영향)

  • Park, Gee-Bae;Lee, Yong-Suk;Choi, Myung-Ho;Lee, Do-Ik;Lee, Kwang-Pyo
    • YAKHAK HOEJI
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    • v.36 no.6
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    • pp.598-603
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    • 1992
  • The purpose of this study was to assess the effect of three formulations; product A (polyethylene glycol was used as a main dispersing agent), product B (wax mixture was used as a main dispersing agent) and product C(silicon dioxide was used as a main dispersing agent) on bioavailability of acetaminophen soft gelatin capsules(softgels) and to develop an effective acetaminophen softgel which exhibits an excellent bioavailability. Acetaminophen softgels of various formulations were prepared as 4 minim round type by rotary die method. Four softgels of the three formulation (A, B, C), each of which contained 50 mg acetaminophen, were administered orally to 12 normal healthy rabbits using a three-way cross over design. Plasma acetaminophen concentrations were measured by HPLC. The results obtained in this study were as follows: 1. The Tmax rank order of acetaminophen softgel was C$(63.75{\pm}10.62\;min)$>A$(36.25{\pm}5.37\;min)$>B$(35{\pm}6.74\;min)$. 2. The decreasing Cmax order of softgel product was A$(93.51{\pm}0.55\;{\mu}g/ml)$>B$(3.16{\pm}0.37\;{\mu}g/ml)$>C$(2.6{\pm}0.55\;{\mu}g/ml)$. 3. The $[AUC]^{\infty}_0$ rank order for three acetaminophen softgel formulations was A $(14.89{\pm}1.56\;{\mu}g/ml{\cdot}min)$ >B$(14.39{\pm}1.43\;{\mu}g/ml{\cdot}min)$>C$(11.45{\pm}1.49\;{\mu}g/ml{\cdot}min)$. 4. Pharmacokinetic parameters such as Tmax, Cmax and $[AUC]^{\infty}_0$ of product A and B did not differ significantly(p>0.05). On the other hand, those of product C were significantly different(p>0.05).

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Analysis of Produced By-products Due to Oil/Paper Degradation on Power Transformers (전력용 변압기의 열화에 의해 생성된 부산물의 분석)

  • Kim, Jae-Hoon;Han, Sang-Ok
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.56 no.9
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    • pp.1561-1565
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    • 2007
  • According to thermal degradation on power transformers, it is known that electrical, mechanical and chemical characteristics for power transformer's oil-paper are changed. In the chemical property, especially, when the kraft paper is aged, the cellulose polymer chains break down into shorter lengths. It causes decrease in both tensile strength and degree of polymerization of paper insulation. Also the paper breakdown is accompanied by an increase in the content of various furanic compounds within the dielectric liquid. It is known that furanic components in transformer oil come only from the decomposition of insulating paper rather than from the oil itself. Therefore the analysis of furanic degradation products provides a complementary technique to dissolved gas analysis for monitoring transformers when we evaluate the aging of insulating paper by the total concentration of carbon monoxide and carbon dioxide dissolved in oil only. Recently, the analysis of furanic compounds by high performance liquid chromatography(HPLC) using IEC 61198 method for estimating degradation of paper insulation in power transformers has been used more conveniently for assessment of oil-paper. It is know that the main products which is produced by aging are 2-furfuryl alcohol, 2-furaldehyde(furfural), 2-furoic acid, 2-acetylfuran, 5-methyl-2-furaldehyde, and 5-hydroxymethyl-2-furaldehyde. For investigating the accelerated aging process of oil-paper samples we manufactured accelerating aging equipment and we estimated variation of insulations at $140^{\circ}C$ temp. during 500 hours. Typical transformer proportions of copper, silicon steel and iron have been added to oil-paper insulation during the aging process. The oil-paper insulation samples have been measured at intervals of 100 hours. Finally we have analyzed that 2-furoic acid and 2-acetylfuran products of furanic compounds were detected by HPLC, and their concentrations were increased with accelerated aging time.

Effects of silanation time on shear bond strength between a gold alloy surface and metal bracket

  • Jung, Min-Ho;Shon, Won-Jun;Park, Young-Seok;Chung, Shin-Hye
    • The korean journal of orthodontics
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    • v.43 no.3
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    • pp.127-133
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    • 2013
  • Objective: We aimed to investigate the effects of silanation time on the shear bond strength (SBS) of metal brackets on gold alloy in a silicoating procedure and compare the SBS of metal brackets on gold alloy and enamel. Methods: Type III gold alloy plates were sandblasted with 30-${\mu}m$ silicon dioxide. Excess particles were removed with gentle air after silica coating, and silane was applied. Maxillary central-incisor metal brackets were bonded to each conditioned alloy surface with a light curing resin adhesive for 1 s, 30 s, 60 s, or 120 s after applying silane. The brackets were also bonded to 36 upper central incisors with the same adhesive. All samples were cured for 40 s with a light emitting diode curing light. The SBS was tested after 1 h and after 24 h. The adhesive remnant index (ARI) of the samples was also compared. Results: The 60-s and 120-s silanation time groups showed a higher SBS than the other groups (p < 0.05). Samples tested after 24 h showed a significantly higher SBS than did the samples tested after 1 h (p < 0.05). The 1-s group showed higher ARI scores. The one-way analysis of variance and Student-Newman-Keuls test showed that the SBS values of the 60-s and 120-s silanation time groups were not significantly different from the SBS values of enamel. Conclusions: Adequate silanation time is required to produce sufficient bond strength during silicoating.

A Study on Microorganisms Decontamination Using a Vapor-Phase Hydrogen Peroxide System (과산화수소 증기 시스템을 이용한 미생물 제독에 관한 연구)

  • Kim, Yun Ki;Kim, Min Cheol;Yoon, Sung Nyo;Hwang, Hyun Chul;Ryu, Sam Gon
    • Journal of Environmental Health Sciences
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    • v.39 no.3
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    • pp.279-288
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    • 2013
  • Objectives: Effectiveness and conditions of vapor-phase hydrogen peroxide (VPHP) system on decontamination of Geobacillus stearothermophilus(GS) spores, Escherichia coli (E.coli) and Enterobacteria phage felix01 (felix01) were determined. Methods: The VPHP system was designed to vaporize 35% (w/w) solution of hydrogen peroxide, continuously to inject and withdraw VPHP. The system and VHP 1000ED (Steris) were operated such that dehumidification and conditioning were initiated without samples in the chamber. Then the samples were loaded into and removed. Coupons (glass, anodizing, silicon, viton) with GS spores ($1{\times}10^6$ colony forming unit/mL [CFU/mL]), E.coli ($1{\times}10^7$ CFU/mL) and felix01 ($1{\times}10^7$ plaque forming unit/mL[PFU/mL]), and Biological Indicator (BI) with GS spores ($1{\times}10^6$ CFU/mL) on stainless steel coupons were used. The tested samples were sonicated and vortexed, and then were plated for enumeration, followed by incubation at $55^{\circ}C$, 24 hr for GS spores, and at $37^{\circ}C$, 24 hr for E.coli and felix01. BI analysis in broth culture was only qualitative. Results: The efficacy of the VPHP system on decontamination was almost equivalent to that of VHP 1000ED. The conditions for complete decontamination with the VPHP system was as follows: concentration; 700~450 ppm, relative humidity; approximately 55%, and temperature; $34{\sim}32^{\circ}C$. When comparing the decontamination efficiency among different kinds of coupons, glass was the most effective, however, all kinds of coupons were decontaminated completely after 60 min exposure in both systems. Conclusion: The VPHP system can be recommended as an alternative system for traditional system using ethylene oxide, formaldehyde or chlorine dioxide.