• Electronics and Telecommunications Trends
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• v.36 no.3
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• pp.23-33
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• 2021

Two main technologies of III-V/Si laser diode for optical communication, direct epitaxial growth, and wafer bonding were studied. Until now, the wafer bonding has been vigorously studied and seems promising for the ideal III-V/Si laser. However, the wafer bonding process is still complicated and has a limit of mass production. The development of a concise and innovative integration method for silicon photonics is urgent. In the future, the demand for high-speed data processing and energy saving, as well as ultra-high density integration, will increase. Therefore, the study for the hetero-junction, which is that the III-V compound semiconductor is directly grown on Si semiconductor can overcome the current limitations and may be the goal for the ideal III-V/Si laser diode.

• Journal of the Optical Society of Korea
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• v.5 no.1
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• pp.1-4
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• 2001

The results of investigating $SiL_{2,3}$/ X-ray emission valence spectra of amorphous silicon films irradiated by excimer laser are presented. It is found that laser annealing leads to crystallization of amorphous silicon films and the crystallinity increases with the laser energy density from 250 to 400 mJ/$\textrm{cm}^2$. The vertical structure of the film is investigated by changing the accelerating voltage on the X-ray tube, and the chemical and structural state of Si$_3$N$_4$ buffer layer is found not to be changed by the excimer laser treatment.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.364-364
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• 2010

Defects existing on the clean Si(5 5 12)-$2{\times}1$, composed of one-dimensional(1-D) structures such as honeycomb (H) chain, $\pi$-bonded ($\pi$) chains, dimer-adatom (D-A) row, and tetramer (T) row, have been investigated by scanning tunneling microscopy (STM). It is found that the defects can be classified to two categories: One is originated from phase boundaries in D-A and T rows having $2{\times}$ periodicities, by which buckling directions are reversed, and the other is caused by missing atoms on $\pi$ chains, D-A rows, and T rows. All these defects are symmetric with respect to the [6 6 $\bar{5}$] direction, which is due to one-dimensional symmetry along the [1 $\bar{1}$ 0] direction. Especially it is worth noticing that on H chains none of such defects exist, which implies that the H chain is energetically the most stable among 1-D structures existing on Si(5 5 12)-$2{\times}1$.

• Korean Journal of Materials Research
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• v.21 no.5
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• pp.273-276
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• 2011

Ultraviolet (UV) light emitting diodes (LEDs) were grown on a patterned n-type GaN substrate (PNS) with 200 nm silicon-di-oxide (SiO2) nano pattern diameter to improve the light output efficiency of the diodes. Wet etched self assembled indium tin oxide (ITO) nano clusters serve as a dry etching mask for converting the SiO2 layer grown on the n-GaN template into SiO2 nano patterns by inductively coupled plasma etching. PNS is obtained by n-GaN regrowth on the SiO2 nano patterns and UV-LEDs were fabricated using PNS as a template. Two UV-LEDs, a reference LED without PNS and a 200 nm PNS UV-LEDs were fabricated. Scanning Electron microscopy (SEM), Transmission Electron Microscopy (TEM), X-Ray Diffraction (XRD), Photoluminescence (PL) and Light output intensity- Input current- Voltage (L-I-V) characteristics were used to evaluate the ITO-$SiO_2$ nanopattern surface morphology, threading dislocation propagation, PNS crystalline property, PNS optical property and UVLED device performance respectively. The light out put intensity was enhanced by 1.6times@100mA for the LED grown on PNS compared to the reference LED with out PNS.

• 한국정보디스플레이학회:학술대회논문집
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• 2007.08b
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• pp.1216-1219
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• 2007

We have been developing printed organic TFTs for flexible displays. In this study, we have pay attention to the operation stability improvement of the organic TFTs, and studied several factors especially depending on the dielectric layers. From the detailed analysis of the effects of dielectric layers, we have proposed a new printed dielectric layer which is mainly consisting of metal oxide and gives high operation stability

• Journal of Photoscience
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• v.9 no.2
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• pp.515-517
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• 2002

Photodynamic therapy (PDT) is a cancer treatment modality which utilizes the cytotoxicity of the active singlet oxygen derived from irradiation of a tumor accumulated photosensitizer. As the oxygen in the singlet state radiates an emission of 1270nm wavelength when it decays to the triplet state, detection of the emission helps us to understand the mechanism of PDT or to evaluate photosensitizers. We detected the 1270nm emission from photosensitizers Photofrin and ATX-SI0 in vitro and in vivo by means of high sensitive NIR detectors. We obtained the maximum amount of singlet oxygen at irradiation wavelength of 665-670nm from a HeLa tumor in a nude mouse which is injected with ATX-S10.

• Korean Journal of Optics and Photonics
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• v.25 no.2
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• pp.72-77
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• 2014

We have demonstrated a terahertz (THz) time-domain spectroscopy and imaging system using compact fiber-coupled THz modules. Using this THz spectroscopy system we have measured the absorption spectrum of water vapor in free space over 3 THz, as well as the refractive indices of various substrates such as Si, $Al_2O_3$, and GaAs using the transfer-function method. Through the THz imaging system we have observed a high-quality THz image of a medical knife and metal clip sample, with a resolution of $192{\times}89$ pixels using a step size of 250 ${\mu}m$.

• Laser Solutions
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• v.12 no.2
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• pp.7-10
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• 2009

In this paper, we study experimentally the local polishing of $SiO_2$ surface using the $CO_2$ laser. For laser local polishing, we polished to remove the grooves or to be reformed the surface of grooves after forming the grooves on the material surface. We measured the reflectance, transmittance, and beam profile in order to measure the roughness of polished surface. The Atom Force Microscope (AFM) is used to measure roughness of local polishing surface. We can predict that the laser polishing contribute to the removal of generated debris and surface roughness on the micro processing.

• Proceedings of the Materials Research Society of Korea Conference
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• 2003.11a
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• pp.20-20
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• 2003

We developed 30 ㎽-AlInGaN based violet laser diodes. The fabrication procedures of the laser diodes are described as follows. Firstly, GaN layers having very low defect density were grown on sapphire substrates by lateral epitaxial overgrowth method. The typical dislocation density was about 1-3$\times$10$^{6}$ /$\textrm{cm}^2$ at the wing region. Secondly, AlInGaN laser structures were grown on LEO-GaN/sapphire substrates by MOCVD. UV activation method, instead of conventional annealing, was conducted to achieve good p-type conduction. Thirdly, ridge stripe laser structures were fabricated. The cavity mirrors were formed by cleaving method. Three pairs of SiO$_2$ and TiO$_2$ layers were deposited on the rear facet for mirror coating. Lastly, laser diode chips were mounted on AlN submount wafers by epi-down bonding method. The lifetime of the laser diodes was over 10,000 hrs at room temperature under automatic power controlled condition. We expect the performance of the LDs to be improved by the optimization of the growth and fabrication process. The detailed characteristics and important issues of the laser diodes will be discussed at the conference.

• Current Optics and Photonics
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• v.1 no.5
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• pp.544-550
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• 2017

This simulation based study reports a novel tunable, compact, room temperature terahertz (THz) transistor source, operated on the concept of charge plasma oscillation with the capability of radiating within a terahertz gap. A vertical cavity with a quasi-periodic distributed-Bragg-reflector has been attached to a THz plasma wave transistor to achieve a monochromatic coherent surface emission for single as well as multi-color operation. The resonance frequency has been tuned from 0.5 to 1.5 THz with the variable quality factor of the optical cavity from 5 to 290 and slope efficiency maximized to 11. The proposed surface emitting terahertz transistor is able to satisfy the demand for compact solid state terahertz sources in the field of teratronics. The proposed device can be integrated with Si CMOS technology and has opened the way towards the development of silicon photonics.