• Title/Summary/Keyword: Si(111)

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Development of Land Suitability Classification System for Rational Agricultural Land Use Planning (농지이용계획의 합리적 책정을 위한 농지적성 평가기법의 개발)

  • 황한철;최수명
    • Journal of Korean Society of Rural Planning
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    • v.3 no.2
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    • pp.102-111
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    • 1997
  • For rational agricultural land use planning, it is quite necessary to get hold of land suitability precisely and to make decision on land use patterns accordingly. In the methodological viewpoint, objective and scientific evaluation techniques for land suitability classification should be supported for the systematic land use planning. As one of technical development approaches to rational land use planning, this study tried to frame a land suitability evaluation system for agricultural purposes. Evaluation unit is defined as a tract of land bounded by road, other land units and topographical features. And quantification theory was applied in the determination works of evaluation criteria. The administrative area of Namsa-myon(district), Yongin-si(city), Kyunggi-do(province) was selected for the case study. In order to check the feasibility of the evaluation system developed in the study, field check team, consisting of 2 government officers and 2 representative farmers, carried out evaluation works by observation on 148 sample land units, 10% of total 1,480 ones. Between estimated and observed results, there showed very good relationship of its multiple correlation coefficient, R=0.9467.

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UV-LASER INDUCED SURFACE REACTION - DESORppTION AND ETCHING

  • Murata, Yoshitada
    • Proceedings of the Korean Vacuum Society Conference
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    • 1992.02a
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    • pp.3-10
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    • 1992
  • pphotostimulated desorpption of NO chemisorbed on ppt(001) at 80K has been studied by the (1+1)-resonance-enhanced multipphoton ionization((1+1)-REMppI) technique. A linearly ppolarized ArF excimer laser ( =193 nm, 6.41eV) is used as the ppumpp laser. A high adsorpption rate selectivity was found in the expposure deppendence of the NO desorpption yield. The NO desorpption yield increases drastically when the amount of NO expposure exceeds ~1.8 L. This result shows that the amount of NO sppecies with a large cross section for pphotostimulated desorpption increases drastically at higher NO coverages. Using scanning tunneling microscoppy, we have observed structural modifications of the chlorinated Si(111)-7$\times$7 surface induced by 266nm laser irradiation. At very low laser fluence of 0.7mJ/$\textrm{cm}^2$, at which thermal desorpption can be ignored, a pperiodic stripped ppattern of a single domain is imaged. This ppattern consists of flat terraces and narrow grooves of ~60 and ~10A in width, resppectively.

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Fabrication of Three-Dimensional Magnetophotonic Crystals:Opal Thin Films Filled with Bi:YIG

  • Fujikawa, R.;Baryshev, A.V.;Uchida, H.;Lim, P.B.;Inoue, M.
    • Journal of Magnetics
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    • v.11 no.3
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    • pp.147-150
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    • 2006
  • We have fabricated three-dimensional magnetophotonic crystals based on $\alpha$-$SiO_2$ opal films. Opal thin films grown on glass substrates were filled with bismuth substituted iron garnet (Bi:YIG). Scanning electron microscopy data, optical and magnetic properties of the synthesized samples confirm the presence of the Bi:YIG contentin the opal lattice. It is shown that the samples exhibit the (111) stop band, and transmissivity of the threedimensional magnetophotonic crystals is defined by both the film lattice and the Bi:YIG content.

Selective Band Engineering of an Isolated Subnanometer Wire

  • Song, In-Gyeong;Park, Jong-Yun;An, Jong-Ryeol
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.267-267
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    • 2013
  • Band engineering of a nanowire is related to the question what is the minimum size of a nanowire-based device. At the subnanometer scale, there has been a long standing problem whether it is possible to both control an energy band of an isolated nanowire by a dopant and measure it using angle-resolved photoemission spectroscopy (ARPES). This is because an extra atom in the subnanometer wire plays as a defect rather than a dopant and it is challenging to assemble isolated subnanometer wires into an array for an ARPES measurement. We demonstrate that only one of multiple metallic subnanometer wires canbe controlled electronically by a dopant maintaining the whole metallic bands of other wires, which was observed directly by ARPES. Here,the multiple metallic subnanometer wires were produced on a stepped Si(111) surface by a self-assembly method. The selective band engineering proves that the selectively-controlled metallic wire is nearly isolated electronically from other metallic wires and an electronic structure controlcan be realized down to subnanometer scale.

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A study on the fabrication and its electrical characteristics of the schottky diodes on the laser anneled poly-si substrate (레이저 열처리된 다결정 실리콘 기판을 이용한 소트키 다이오드의 제작 및 그 전기적 특성에 관한 연구)

  • Kim, Jae-Yeong;Kang, Moon-Sang;Koo, Yong-Seo;An, Chul
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.33A no.4
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    • pp.106-111
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    • 1996
  • Schottky diodes are fabricated on laser annealed and unannealed polysilicon substrate and their electrical characteristics are studied and analyzed. Current of laser annealed devices are larger than that of unannealed devices because of grain growth, decrease of grain boundary and trap density, lowering of grain boundary barrier height, decrease of dopant segregation. At low forward bias (<0.7V), currents of unanealed devices are larger. Soft breakdown voltages of laser annealed devices are larger than that of unannealed devices.

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Analysis of Physical Characteristics on Compound Semiconductor $B_{13}P_2$ using APCVD

  • Hong, K.K.;Jung, Y.C.;Kim, C.J.
    • Proceedings of the IEEK Conference
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    • 2006.06a
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    • pp.473-474
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    • 2006
  • Boron Phosphide films were deposited on (111) Si substrate at $650^{\circ}C$, by the reaction of B2H6 with PH3 using APCVD. N2 was carried out as carrier gas. The optimal gas rates were $20\;m{\ell}/min$ for B2H6, $60\;m{\ell}/min$ for PH3 and $1\;{\ell}/min$ for N2. After as grown the films were insitu annealed for 1hour in N2 ambient at $550^{\circ}C$ and measured. The measurement of AFM shows that the RMS is $29.626{\AA}$ for the reaction temperature at $650^{\circ}C$. The measurement of XRD shows that the films have the orientation of (101). Also, the measurement of AES is shown that the films have B13P2 stoichiometry.

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An a-D film for flat panel displays prepared by FAD

  • Liu, Xianghuai;Mao, Dongsheng
    • Journal of the Korean Vacuum Society
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    • v.7 no.s1
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    • pp.7-14
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    • 1998
  • Details are given of an study of the characteristics of field-induced electron emission from hydrogen-free high $sp^3$ content(>90%) amorphous diamond (a-D) film deposited on heavily doped ($\rho$<0.01 $\Omega\cdot\textrm{cm}$) n-type monocrystalline Si(111) substrate. It is demonstrated that a-D film has excellent electron field emission properties. Emission current can reach 0.9 $\mu$A at applied field as low as 1 V/$\mu\textrm{m}$, and emission current density can be obtained about several mA/$\textrm{cm}^2$. The emission current is stable when the beginning current is at 50 $\mu$A within 72 hours. Uniform fluorescence display of electron emission from whole face of the a-D film under the electric field of 10~20 V/$\mu\textrm{m}$ was also observed. It can be considered that the contribution of excellent electron emission property results from its smooth, uniform, amorphous surface and high $sp^3$ content of the a-D films.

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Growing Behavior of Nanocrystalline TiN Films by Asymmetric Pulsed DC Reactive Magnetron Sputtering (비대칭 펄스 DC 반응성 마그네트론 스퍼터링으로 증착된 나노결정질 TiN 박막의 성장거동)

  • Han, Man-Geun;Chun, Sung-Yong
    • Journal of the Korean Ceramic Society
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    • v.48 no.5
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    • pp.342-347
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    • 2011
  • Nanocrystalline TiN films were deposited on Si(100) substrate using asymmetric pulsed DC reactive magnetron sputtering. We investigated the growing behavior and the structural properties of TiN films with change of duty cycle and pulsed frequency. Grain size of TiN films were decreased from 87.2 nm to 9.8 nm with decrease of duty cycle. The $2{\theta}$ values for (111) and (200) crystallographic planes of the TiN films were also decreased with decrease of duty cycle. This shift in $2{\theta}$ could be attributed to compressive stress in the TiN coatings. Thus, the change of plasma parameter has a strong influence not only on the microstructure but also on the residual stresses of TiN films.

Structural study of indium oxide thin films by metal organic chemical vapor deposition (저온화학기상증착에 의한 인듐산화막 구조에 관한 연구)

  • Pammi, S.Venkat.N.;Seong, Nak-Jin;Yoon, Soon-Gil
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.47-47
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    • 2007
  • Indium oxide conducting films were dep9sited on Si(100) substrates at various temperatures by liquid delivery metal organic chemical vapor deposition using Indium (III) tris (2,2,6,6-tetramethyl-3.5-heptanedionato) $(dpm)_3$ precursors. The films deposited at $200{\sim}400^{\circ}C$ were grown with a (111) preferred orientation and exhibit an increase of grain size from 21 to 33nm with increasing deposition temperature. In the range of deposition temperature, there is no metallic indium phase in deposited films.

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