• Title/Summary/Keyword: Si(111)

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Characteristics of Poly-Oxide of New Sacrificial Layer for Micromachining (마이크로머시닝을 위한 새로운 희생층인 다결정-산화막의 특성)

  • Hong, Soon-Kwan;Kim, Chul-Ju
    • Journal of Sensor Science and Technology
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    • v.5 no.1
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    • pp.71-77
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    • 1996
  • Considering that polycrystalline silicon, a structural material of the micromachining, is affected by a sacrificial oxide layer, the poly-oxide obtained by the thermal oxidation of polycrystalline silicon is newly proposed and estimated as the sacrificial oxide layer. The grain size of the polycrystalline silicon grown on the poly-oxide is larger than that of poly crystalline silicon grown on the conventional sacrificial oxide layer. As a result of XRD, increase of (111) textures and formation of additional (220) textures are observed on the polycrystaIline silicon deposited on the poly-oxide. Also, the polycrystalline silicon grown on the poly-oxide represents small and uniform stress.

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Free-standing graphene intercalated nanosheets on Si(111)

  • Pham, Trung T.;Sporken, Robert
    • Journal of IKEEE
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    • v.21 no.3
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    • pp.297-308
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    • 2017
  • By using electron beam evaporation under appropriate conditions, we obtained graphene intercalated sheets on Si(111) with an average crystallite size less than 11nm. The formation of such nanocrystalline graphene was found as a time-dependent function of carbon deposition at a substrate temperature of $1000^{\circ}C$. The structural and electronic properties as well as the surface morphology of such produced materials have been confirmed by reflection high energy electron diffraction, Auger electron spectroscopy, X-ray photoemission spectroscopy, Raman spectroscopy, scanning electron microscopy, atomic force microscopy and scanning tunneling microscopy.

<100>, <110>, <111>방향 Si, InAs Nanowire nMOSFETs 의 성능 연구

  • Jeong, Seong-U;Park, Sang-Cheon
    • Proceeding of EDISON Challenge
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    • 2016.03a
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    • pp.357-361
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    • 2016
  • Si와 InAs 두 가지 채널 물질을 가지고 3가지 수송 방향 <100>, <110>, <111>으로 변화시키며 각각의 Nanowire nMOSFETs을 가지고 ballistic quantum transport simulation을 진행하였다. 각각의 경우에 대해 E-k curve를 구한 다음에 band curvature로 캐리어의 유효질량을 계산하고, 이를 통해 MOSFET의 전류 세기를 결정짓는 DOS와 carrier injection velocity를 구하여 어떤 경우에 가장 높은 ON-current를 흐르게 하는지 확인해 보았다. 하지만 예상과 달리 나노와이어의 직경이 1.4nm으로 매우 작기 때문에 valley-splitting이 일어나 Si<110>의 경우에 가장 작은 캐리어 유효 질량을 갖고 있는 사실을 확인할 수 있었다. 결론적으로 Si<100>의 경우에 trade-off 관계에 있는 DOS와 carrier injection velocity가 6가지 경우 중 최적의 조합을 가짐으로써 가장 높은 ON-current를 흐르게 하였다.

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Characterization of SiC nanowire synthesize by Thermal CVD

  • Jeong, Min-Uk;Kim, Min-Guk;Song, U-Seok;Jeong, Dae-Seong;Choe, Won-Cheol;Park, Jong-Yun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.74-74
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    • 2010
  • One-dimensional nanosturctures such as nanowires and nanotube have been mainly proposed as important components of nano-electronic devices and are expected to play an integral part in design and construction of these devices. Silicon carbide(SiC) is one of a promising wide bandgap semiconductor that exhibits extraordinary properties, such as higher thermal conductivity, mechanical and chemical stability than silicon. Therefore, the synthesis of SiC-based nanowires(NWs) open a possibility for developing a potential application in nano-electronic devices which have to work under harsh environment. In this study, one-dimensional nanowires(NWs) of cubic phase silicon carbide($\beta$-SiC) were efficiently produced by thermal chemical vapor deposition(T-CVD) synthesis of mixtures containing Si powders and hydrocarbon in a alumina boat about $T\;=\;1400^{\circ}C$ SEM images are shown that the temperature below $1300^{\circ}C$ is not enough to synthesis the SiC NWs due to insufficient thermal energy for melting of Si Powder and decomposition of methane gas. However, the SiC NWs are produced over $1300^{\circ}C$ and the most efficient temperature for growth of SiC NWs is about $1400^{\circ}C$ with an average diameter range between 50 ~ 150 nm. Raman spectra revealed the crystal form of the synthesized SiC NWs is a cubic phase. Two distinct peaks at 795 and $970\;cm^{-1}$ over $1400^{\circ}C$ represent the TO and LO mode of the bulk $\beta$-SiC, respectively. In XRD spectra, this result was also verified with the strongest (111) peaks at $2{\theta}=35.7^{\circ}$, which is very close to (111) plane peak position of 3C-SiC over $1400 ^{\circ}C$ TEM images are represented to two typical $\beta$-SiC NWs structures. One is shown the defect-free $\beta$-SiC nanowire with a (111) interplane distance with 0.25 nm, and the other is the stacking-faulted $\beta$-SiC nanowire. Two SiC nanowires are covered with $SiO_2$ layer with a thickness of less 2 nm. Moreover, by changing the flow rate of methane gas, the 300 sccm is the optimal condition for synthesis of a large amount of $\beta$-SiC NWs.

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Metallurgical Refinement of Multicrystalline Silicon by Directional Solidification (일방향 응고법에 의한 다결정 실리콘의 야금학적 정련)

  • Jang, Eunsu;Park, Dongho;Yu, Tae U;Moon, Byung Moon
    • 한국신재생에너지학회:학술대회논문집
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    • 2011.05a
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    • pp.111.1-111.1
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    • 2011
  • The solar energy is dramatically increasing as the alternative energy source and the silicon(Si) solar cell are used the most. In this study, the improved process and equipment for the metallurgical refinement of multicrystalline Si were evaluated for the inexpensive solar cell. The planar plane and columnar dendrite aheadof the liquid-solid interface position caused the superior segregation of impurities from the Si. The solidification rate and thermal gradient determined the shape of dendrite in solidified Si matrix solidified by the directional solidification(DS) method. To simulate this equipment, the commercial software, PROCAST, was used to solve the solidification rate and thermal gradient. Si was vertically solidified by the DS system with Stober process and up-graded metallurgical grade or metallurgical grade Si was used as the feedstock. The inductively coupled plasma mass spectrometry (ICP) was used to measure the concentration of impurities in the refined Si ingot. According to the result of ICP and simulation, the high thermal gradient between the two phases wasable to increase the solidification rate under the identical level of refinement. Also, the separating heating zone equipped with the melting and solidification zone was effective to maintain the high thermal gradient during the solidification.

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Effect of Casting Speed on Microstructure and Mechanical Properties of Al-Mg-Si/Al Hybrid Material by Duo-Casting

  • Park, Sung Jin;Suh, Jun-Young;Lee, Hee-Kwon;Chang, Si Young
    • Korean Journal of Materials Research
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    • v.30 no.3
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    • pp.111-116
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    • 2020
  • Two different casting speeds of 60 and 80mm/min are adopted to determine the effect of casting speed on the microstructure and mechanical properties of Al-Mg-Si/Al hybrid material prepared by duo-casting. The obtained hybrid material has a uniform and straight macro-interface between the pure Al side and the Al-Mg-Si alloy side at both casting speeds. When the casting speed is increased to 80mm/min, the size of primary α phases in Al-Mg-Si alloy decreases, without change of shape. Although the Al-Mg-Si alloy produced at higher casting speed of 80mm/min shows much higher ultimate tensile strength (UTS) and 0.2 % proof stress and lower elongation, along with higher bending strength compared to the case of the 60mm/min in casting speed, the tensile properties and bending strength of the hybrid material, which are similar to those of pure Al, are the same regardless of the increase of casting speed. Despite the different casting speeds, deformation and fracturing in hybrid materials are observed only on the pure Al side. This indicates that the macro-interface is well-bonded, allowing it to endure tensile and bending deformation in all hybrid materials.

Si 기판상에 도금된 구리 박막의 이방성 에칭 특성

  • Kim, Sang-Hyeok;Park, Chae-Min;Mun, Seong-Jae;Lee, Hyo-Jong
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2017.05a
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    • pp.67.1-67.1
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    • 2017
  • 구리는 탄성이방성이 큰 재료로 Si 박막상에 성장시키면 (111) 방향으로 우선 배향된 박막을 얻을 수 있다. 본 연구는 이러한 (111) 우선 방위를 갖는 Cu 박막의 전기도금층의 재결정 후의 매우 평탄한 표면을 갖는 박막에서 에칭에 따른 박막의 단차와 표면형상을 통해 결정방위별 에칭 특성을 비교 분석한 결과이다. 10 vol% 질산용액에서 에칭한 결과는 구리의 용해에 따라 각 결정면에 대한 고유의 facetted surface morphology를 나타내며, 대표적인 결정 방위인 (111), (110), (100)에 대해 triangular flake, ridge and rectangular pyramidal shapes을 나타내는 것을 알 수 있었다. 에칭속도의 정량적 측정을 위해 120초간 2.2M 농도의 질산용액으로 에칭을 실시하였고, nanosize의 as-plated initial region, (111), (110), (100) oriented regions의 각각에서 383, 270, 276, 317 nm/min의 에칭속도를 갖는 것을 확인하였다. Facet surface의 관찰을 통해 에칭반응이 (111) front surface를 갖는 열역학적 평형상태에서 일어나며, 이러한 결정방위별 에칭속도 차이는 각 결정S면이 갖는 Kink or ledge의 밀도의 차이에 기인할 것으로 판단된다. 즉, 에칭이 평형상태에서 step flow mechanism에 의해 열역학적 평형상태를 유지하면서 진행이 된다. 본 연구는 향후 다양한 에칭관련 용액 효과, 구리 박막의 응력 및 불순물에 의한 효과를 볼 수 있는 기본 방법을 제공해 줄 것으로 기대한다.

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