• Title/Summary/Keyword: Semiconductor Equipment Industry

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Research Trends of Scheduling Techniques for Domestic Major Industries (국내 주요 산업별 스케줄링 기법의 연구동향)

  • Lee, Jae-yong;Shin, Moonsoo
    • Journal of Korean Society of Industrial and Systems Engineering
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    • v.41 no.1
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    • pp.59-69
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    • 2018
  • The up-to-date business environment for Korean manufacturers is very complex and rapidly changing. Especially, the companies have faced with various changes derived from small quantity batch production, diversification of customer demands, and short life cycles of products. Consequently, the Korean manufacturing companies are in need of more efficient production planning and scheduling techniques. In this paper, the research trend of scheduling techniques is investigated to provide relevant information to researchers in this field. Furthermore, some implications for future researches are presented regarding literatures published in Korea over the last 10 years. This paper presents an entire investigation into Korean research works on scheduling (2,569 papers) that are published from 2007 to 2016. Especially, detailed analysis was carried out in the following three industry : 1) semiconductor, 2) shipbuilding and 3) automobile. In this paper, approaches to scheduling presented in the literature are categorized into the following three categories : 1) application, 2) algorithm, and 3) simulation modeling. First, in the semiconductor industry, scheduling techniques related to semiconductor cleaning processes, photolithography processes, chemical processes, transport and transport equipment have been found to be dominant. Second, the shipbuilding industry is focused on assembly processes, transporter, crane and various existing production management system. On the other hand, the scheduling research of the automobile industry is mainly focused on the vehicle movement routing and procurement supply-chain planning algorithm in terms of logistics. The conclusion of this study are expected to provide many implications for various types of academic and practical follow-up studies related to scheduling in consideration of main characteristics of semiconductor, shipbuilding and automobile industries.

Monitoring of the Carbon Emission and Energy Consumption of CVD and Etcher for Semiconductor Manufacturing (반도체 제조용 CVD 및 Etcher 장비의 탄소배출량과 에너지 소비량 모니터링)

  • Ko, Dong Guk;Bae, Sung Woo;Kim, Kwang Sun;Im, Ik-Tae
    • Journal of the Semiconductor & Display Technology
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    • v.12 no.3
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    • pp.19-22
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    • 2013
  • The purpose of this study is to develop a system that can monitor the amounts of energy consumption during CVD and etching process for semiconductor manufacturing. Specifically, this system is designed to measure the $CO_2$ emission amounts quantitatively by measuring the flow rate of gas used and amount of power consumed during the processes. The processes of CVD equipment can be classified generally into processing step and cleaning step and all the two steps were monitored. In CVD and etcher equipments, various gases including Ar and $O_2$ are used, but Ar, $O_2$ and He were monitored with the use of the LCI data of Korea Environmental Industry & Technology Institute and carbon emission coefficients of EcoInvent. As a result, it was found that the carbon emission amounts of CVD equipment for Ar, $O_2$ and He were $0.030kgCO_2/min$, $4.580{\times}10^{-3}kgCO_2/min$ and $6.817{\times}10^{-4}kgCO_2/min$, respectively and those of etcher equipment for Ar and $O_2$ are $5.111{\times}10^{-3}kgCO_2/min$ and $7.172kgCO_2/min$, respectively.

CCP and ICP Combination Impedance Matching Device for Uniformity Improvement of Semiconductor Plasma Etching System (반도체 플라즈마 식각 시스템의 균일도 향상을 위한 CCP와 ICP 결합 임피던스정합 장치)

  • Jung, Doo-Yong;Nam, Chang-Woo;Lee, Jong-Ho;Choi, Dae-Kyu;Won, Chung-Yuen
    • The Transactions of the Korean Institute of Power Electronics
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    • v.15 no.4
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    • pp.274-281
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    • 2010
  • This paper proposes a DFPS (Dual Frequency Power Source) impedance matching device for uniformity improvement of a semiconductor plasma etching system. The DFPS consists of two parts for safe plasma processing on large-area substrates. The first part is an ICP (Inductively Coupled Plasma) for high integration by using ferrite core. The second part is a CCP (Capacitive Coupled Plasma) to control uniformity of whole cells. Proposed DFPS can achieve high productivity improvement required for semiconductor equipment industry. The proposed plasma system is analyzed, simulated and experimentally verified with a matching equipment at 27.12MHz and 400kHz.

A case study on the application of process abnormal detection process using big data in smart factory (Smart Factory Big Data를 활용한 공정 이상 탐지 프로세스 적용 사례 연구)

  • Nam, Hyunwoo
    • The Korean Journal of Applied Statistics
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    • v.34 no.1
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    • pp.99-114
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    • 2021
  • With the Fourth Industrial Revolution based on new technology, the semiconductor manufacturing industry researches various analysis methods such as detecting process abnormalities and predicting yield based on equipment sensor data generated in the manufacturing process. The semiconductor manufacturing process consists of hundreds of processes and thousands of measurement processes associated with them, each of which has properties that cannot be defined by chemical or physical equations. In the individual measurement process, the actual measurement ratio does not exceed 0.1% to 5% of the target product, and it cannot be kept constant for each measurement point. For this reason, efforts are being made to determine whether to manage by using equipment sensor data that can indirectly determine the normal state of each step of the process. In this study, the Functional Data Analysis (FDA) was proposed to define a process abnormality detection process based on equipment sensor data and compensate for the disadvantages of the currently applied statistics-based diagnosis method. Anomaly detection accuracy was compared using machine learning on actual field case data, and its effectiveness was verified.

Technological Assesment on Public R&D Activities (정보통신 공공 R&D 기술성 평가)

  • 여인갑
    • Proceedings of the Korea Society for Industrial Systems Conference
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    • 2002.11a
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    • pp.433-439
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    • 2002
  • In this paper, we implemented technology assessment on the public R&D activities in IT field in order to select the promising technologies, so called "star technology," making for national industry development. Technology assessment frame in this study included qualitative factors. IT technologies are classified five sector - network, wireless/broadcasting, SW/application/computer/terminal equipment, semiconductor/component. Expert opinion interviews on each field are carried out. Assessment factors consist of technology usefulness and technology competitiveness. In the final analysis, 23 technology items selected as a promising technologies and the results can be used public R&D planning and If industry policy.

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Framework for Reconstructing 2D Data Imported from Mobile Devices into 3D Models

  • Shin, WooSung;Min, JaeEun;Han, WooRi;Kim, YoungSeop
    • Journal of the Semiconductor & Display Technology
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    • v.20 no.4
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    • pp.6-9
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    • 2021
  • The 3D industry is drawing attention for its applications in various markets, including architecture, media, VR/AR, metaverse, imperial broadcast, and etc.. The current feature of the architecture we are introducing is to make 3D models more easily created and modified than conventional ones. Existing methods for generating 3D models mainly obtain values using specialized equipment such as RGB-D cameras and Lidar cameras, through which 3D models are constructed and used. This requires the purchase of equipment and allows the generated 3D model to be verified by the computer. However, our framework allows users to collect data in an easier and cheaper manner using cell phone cameras instead of specialized equipment, and uses 2D data to proceed with 3D modeling on the server and output it to cell phone application screens. This gives users a more accessible environment. In addition, in the 3D modeling process, object classification is attempted through deep learning without user intervention, and mesh and texture suitable for the object can be applied to obtain a lively 3D model. It also allows users to modify mesh and texture through requests, allowing them to obtain sophisticated 3D models.

Experimental Investigation of the Electrostatic Discharge(ESD) Damage in Packaged Semiconductor Devices (패키지 반도체소자의 ESD 손상에 대한 실험적 연구)

  • Kim, Sang-Ryull;Kim, Doo-Hyun;Kang, Dong-Kyu
    • Journal of the Korean Society of Safety
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    • v.17 no.4
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    • pp.94-100
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    • 2002
  • As the use of automatic handling equipment for sensitive semiconductor devices is rapidly increased, manufacturers of electronic components and equipments need to be more alert to the problem of electrostatic discharges(ESD). In order to analyze damage characteristics of semiconductor device damaged by ESD, this study adopts a new charged-device model(CDM), field-induced charged model(FCDM) simulator that is suitable for rapid, routine testing of semiconductor devices and provides a fast and inexpensive test that faithfully represents ESD hazards in plants. High voltage applied to the device under test is raised by the field of non-contacting electrodes in the FCDM simulator, which avoids premature device stressing and permits a faster test cycle. Discharge current and time are measured and calculated. The characteristics of electrostatic attenuation of domestic semiconductor devices are investigated to evaluate the ESD phenomena in the semiconductors. Also, the field charging mechanism, the device thresholds and failure modes are investigated and analyzed. The damaged devices obtained in the simulator are analyzed and evaluated by SEM. The results obtained in this paper can be used to prevent semiconductor devices form ESD hazards and be a foundation of research area and industry relevant to ESD phenomena.

Research Progress on NF3 Substitute Gas of PECVD Chamber Cleaning Process for Carbon Neutrality (반도체·디스플레이 탄소중립을 위한 PECVD 챔버세정용 NF3대체가스 개발연구)

  • Seyun Jo;Sang Jeen Hong
    • Journal of the Semiconductor & Display Technology
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    • v.22 no.4
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    • pp.72-75
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    • 2023
  • Carbon neutrality has been emerged as important mission for all the manufacturing industry to reduce energy usage and carbon emission equivalent. Korean semiconductor and display manufacturing industries are also in huge interest by minimize the energy usage as well as to find a less global warming product gases in both etch and cleaning. In addition, Korean government is also investing long term research and development plan for the safe environment in various ways. In this paper, we revisit previous research activities on carbon emission equivalent and current research activities performed in semiconductor process diagnosis research center at Myongji University with respect to the reduction of NF3 usage for the PECVD chamber cleaning, and we present the analytical result of the exhaust gas with residual gas analysis in both 6 inches and 12 inches PECVD equipment. The presented result can be a reference study of the development of new substitution gas in near future to compare the cleaning rate of the silicon oxide deposition chamber.

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Development of Smart ICT-Type Electronic External Short Circuit Tester for Secondary Batteries for Electric Vehicles (전기자동차용 2차전지를 위한 스마트 ICT형 전자식 외부 단락시험기 개발)

  • Jung, Tae-Uk;Shin, Byung-Chul
    • Journal of the Korean Society of Industry Convergence
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    • v.25 no.3
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    • pp.333-340
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    • 2022
  • Recently, the use of large-capacity secondary batteries for electric vehicles is rapidly increasing, and accordingly, the demand for technologies and equipment for battery reliability evaluation is increasing significantly. The existing short circuit test equipment for evaluating the stability of the existing secondary battery consists of relays, MCs, and switches, so when a large current is energized during a short circuit, contact fusion failures occur frequently, resulting in high equipment maintenance and repair costs. There was a disadvantage that repeated testing was impossible. In this paper, we developed an electronic short circuit test device that realizes stable switching operation when a large-capacity power semiconductor switch is energized with a large current, and applied smart ICT technology to this electronic short circuit stability test system to achieve high speed and high precision through communication with the master. It is expected that the inspection history management system based on data measurement, database format and user interface will be utilized as essential inspection process equipment.

A Study on Constructing Approach of Enterprise Document Management Architecture in Semiconductor Business (반도체 산업에서의 Enterprise Document Management Architecture 구현에 관한 연구)

  • 장현성;이영중;송하석;한영준;안정삼
    • Proceedings of the Korean Operations and Management Science Society Conference
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    • 2001.10a
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    • pp.11-14
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    • 2001
  • A systematic construction and re-use of technology related to the product development and production has been the most important for the semiconductor industry dependent on process and equipment. Therefore, numerous outputs in the form of paper has been produced in the process of information management ranging from the creation to recycling and disposal of technologies. In this research, the technology and documents necessary for the business management in the field of semiconductor manufacturing were classified in an effort to solve problems while the modeling of document management architecture at the enterprise level was performed by properly setting up the security system to prevent the unauthorized disclosure of the product development technology to the third parties. Especially, the product and process specification are designed in such a way as to ensure a real-time response in interface with the production system in order to shorten the development lead-time and improve the productivity. This paper is to discuss the modeling approach, the strategy to construct the system and its results.

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