• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2006년도 춘계학술대회 논문집
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• pp.475-476
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• 2006

Self-assembled monolayers (SAMs) formed by the adsorption of alkanethiols, HS(CH2)nX, where X is an organic functional group, onto gold surfaces have attracted widespread interest as templates for the fabrication of molecular and biomolecular microstructures. Previously photopatterning has been thought of as being restricted to the micron scale, because of the well-known diffraction limit. So, we have explored a novel approach to nanofabrication by utilizing a femtosecond laser.

• 생태와환경
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• 제39권1호통권115호
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• pp.52-61
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• 2006

본 연구는 지난 10여년간의 (1994 ${\sim}$ 2003) 주간격의 자료를 이용한 자가조직화 지도 (SOM) 방법으로 낙동강 하류역 (물금: 낙동강 하구언으로부터 27 km 상류지점)에서 동물플랑크톤 군집 동태에 대한 계절별 유형화 분석을 하는데 목적이 있다. 담수생태계내의 먹이망에서 동물플랑크톤 군집의 역할은 매우 중요하나, 다른 군집 구성원들과의 비교 연구는 다소 미진하게 진행되었다. 비선형 모형 알고리즘인 SOM을 동물플랑크톤 군집 역동성과 강 환경 인자들과의 상관관계 파악을 위하여 적용하였다. 육수학적 환경 인자 (수온, 용존산소, pH, 세키투명도, 탁도, 클로로필 a 농도, 유량 등) 들을 동물플랑크톤 군집 구조(윤충류, 지각류 및 요각류)의 계절적 변화 유형파악을 위하여 사용하였다. 학습된 SOM 모형은 육수학적 환경인자와 연관 지어 지도상에 동물플랑크톤을 배치되었다. 동물플랑크톤의 주요 세 군집들은 계절별 변화 유형에 있어서 높은 유사성을 가지고 있었다. 다양한 육수학적 환경인자 중, 수온은 동물플랑크톤 군집 역동성과 매우 높은 연관관계를 나타내었다(특히, 지각류). SOM 모형은 여름기간 증가된 강 유량에 의해서 동물플랑크톤을 매우 저해하는 요인으로 표현되었다. 클로로필 a 농도는 우점한 초식성 동물플랑크톤 활성도에 의해 지도상에서 구획되었다. 본 연구는 비선형 방법을 이용한 육수학적 환경요인과 동물플랑크톤 역동성을 연관 지어 소개하였으며, 이러한 정보는 먹이망이라는 관점에서 볼 때, 강 생태계 관리에 유용한 정보로 활용될 것으로 사료된다.

• 한국응용곤충학회:학술대회논문집
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• 한국응용곤충학회 2002년도 합동 춘계 학술발표회
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• pp.156-156
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• 2002

• 한국광학회:학술대회논문집
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• 한국광학회 2003년도 하계학술발표회
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• pp.288-289
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• 2003

금속 박막 위의 알칸티올분자의 흡착에 의한 자기조립단분자막(SAMs)은 접착 방지, 마찰 저하 등의 기능을 가진 코팅층으로서의 응용과 분자 또는 생분자의 미세 구조물 형성을 위한 방법으로 널리 연구되어지고 있다. 이러한 연구 중에서 자기조림단분자막(SAMs)의 매우 얇은 두께(수 nm)의 특성을 활용하여 AFM tip Scratching Lithography 또는 알칸티올 포토패터닝(alkanethiol Photopatterning) 방법을 사용함으로써 microscale의 패턴을 형성하는 연구 결과가 많은 이들의 관심을 받아왔다. (중략)

• 한국세라믹학회지
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• 제40권4호
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• pp.385-392
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• 2003

Sol-gel preparation technique using a chemical reaction of metal alkoxides has been widely used for the fabrication of various materials including ceramics. However, its mechanism has been studied till now because a number of chemical ways are possible from various alkoxides and additives. In this study, the mechanism of hydrolysis, condensation, and polymerization of alkoxides were investigated from the fabrication of lead-zirconate-titanate (PbZr$\_$x/Ti$\_$l-x/O$_3$; PZT) thin film that is used as various micro-actuator, transducer, and sensor because of its high electro-mechanical coupling factors and thermal stability. Furthermore, the fabrication process and characteristics of self-patternable PZT film using photosensitive stabilizer were studied in order to resolve the problem of physical damage and properties degradation during dry etching for device fabrication. Using an optimum condition to prepare the self-patternable PZT film, more than 5000 ${\AA}$ thick self-patternable PZT film could be fabricated by three times coating. The PZT film showed 28.4 ${\mu}$c/cm$^2$ of remnant polarization (Pr) and 37.0 kV/cm of coercive field (E$\_$c/).

• Macromolecular Research
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• 제13권5호
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• pp.435-440
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• 2005

This study describes a method where the match of two different length scales, i.e., the patterns from self-assembled block copolymer (<50 nm) and electron beam writing (>50 nm), allow the nanometer scale pattern mask. The method is based on using block copolymers containing a poly(methyl methacrylate) (PMMA) block, which is subject to be decomposed under an electron beam, as a pattern resist for electron beam lithography. Electron beam on self assembled block copolymer thin film selectively etches PMMA microdomains, giving rise to a polymeric nano-pattern mask on which subsequent evaporation of chromium produces the arrays of Cr nanoparticles followed by lifting off the mask. Furthermore, electron beam lithography was performed on the micropatterned block copolymer film fabricated by micro-imprinting, leading to a hierarchical self assembled pattern where a broad range of length scales was effectively assembled, ranging from several tens of nanometers, through submicrons, to a few microns.

• 한국전기전자재료학회논문지
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• 제33권1호
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• pp.16-20
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• 2020

In this study, a patterning method using self-aligned nanostructures was introduced to fabricate GaN-based fin-gate HEMTs with normally-off operation, as opposed to high-cost, low-productivity e-beam lithography. The honeycomb-shaped fin-gate channel width is approximately 40~50 nm, which is manufactured with a fine width using a proposed method to obtain sufficient fringing field effect. As a result, the threshold voltage of the fabricated device is 0.6 V, and the maximum normalized drain current and transconductance of Gm are 136.4 mA/mm and 99.4 mS/mm, respectively. The fabricated devices exhibit a smaller sub-threshold swing and higher Gm peak compared to conventional planar devices, due to the fin structure of the honeycomb channel.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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• pp.834-836
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• 2008

We demonstrated micro-scale conducting polymer patterning based on a selective surface treatment. A substrate with a patterned photoresist was immersed into OTS (Octadecyltrichlosilnae) solution. The protected substrate areas were hydrophilic after removing the PR resist, where a conducting polymer solution was coated selectively by spin-coating method.

• 한국전기전자재료학회논문지
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• 제34권4호
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• pp.262-268
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• 2021

For the past several decades, various next-generation patterning methods have been developed to obtain well-designed nano-to-micro structures, such as imprint lithography, nanotransfer printing (nTP), directed self-assembly (DSA), E-beam lithography, and so on. Especially, nTP process has much attention due to its low processing cost, short processing time, and good compatibility with other patterning techniques in achieving the formation of high-resolution functional patterns. To transfer functional patterns onto desirable substrates, the use of soft materials is required for precise replication of master mold. Here, we introduce a simple and practical nTP method to create highly ordered structures using various polymeric replica materials. We found that polymethyl methacrylate (PMMA), polystyrene (PS), and polyvinylpyridine (PVP) are possible candidates for replica materials for reliable duplication of Si master mold based on systematic analysis of pattern visualization. Furthermore, we successfully obtained well-defined metal and oxide nanostructures with functionality on target substrates by using replica patterns, through deposition and transfer process. We expect that the several candidates of replica materials can be exploited for effective nanofabrication of complex electronic devices.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2009년도 추계학술발표대회
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• pp.33.2-33.2
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• 2009

Block copolymer lithography has attracted great attention for emerging nanolithography since nanoscaleperiodic patterns can be easily obtained through self-assembly process without conventional top-down patterning process. Since the morphologies of self-assembled block copolymer patterns are strongly dependent on surface energy of a substrate, suitable surface modification is required. Until now, the surface modification has been studied by using random copolymer or self-assembled mono layers (SAMs). However, the research on surface modifications has been limited within several substrates such as Si-based materials. In present study, we investigated the formation of block copolymer on Au substrate by $O_2$ plasma treatment with the SAM of 3-(p-methoxy-phenyl)propyltrichloro-silane [MPTS, $CH_3OPh(CH_2)_3SiCl_3$]. After $O_2$ plasma treatment, the chemical bonding states of the surface were analyzed by X-ray photoelectron spectroscopy (XPS). The static contact angle measurement was performed to study the effects of $O_2$ plasma treatment on the formation of MPTS monolayer. The block copolymer nanotemplates formed on Au surface were analyzed by scanning electron microscopy. The results showed that the ordering of self-assembled block copolymer pattern and the formation of cylindrical nano hole arrays were enhanced dramatically by oxygen plasma treatment. Thus, the oxidation of gold surface by $O_2$ plasma treatment enables the MPTS to form the monolayer assembly leading to surface neutralization of gold substrates.