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http://dx.doi.org/10.4191/KCERS.2003.40.4.385

Sol-gel Mechanism of Self-patternable PZT Film Starting from Alkoxides Precursors  

Hwang, Jae-Seob (Department of Ceramic Engineering, Yonsei University)
Kim, Woo-Sik (Department of Ceramic Engineering, Yonsei University)
Park, Hyung-Ho (Department of Ceramic Engineering, Yonsei University)
Kim, Tae-Song (Microsystem Center, Korea Institute of Science and Technology)
Publication Information
Abstract
Sol-gel preparation technique using a chemical reaction of metal alkoxides has been widely used for the fabrication of various materials including ceramics. However, its mechanism has been studied till now because a number of chemical ways are possible from various alkoxides and additives. In this study, the mechanism of hydrolysis, condensation, and polymerization of alkoxides were investigated from the fabrication of lead-zirconate-titanate (PbZr$\_$x/Ti$\_$l-x/O$_3$; PZT) thin film that is used as various micro-actuator, transducer, and sensor because of its high electro-mechanical coupling factors and thermal stability. Furthermore, the fabrication process and characteristics of self-patternable PZT film using photosensitive stabilizer were studied in order to resolve the problem of physical damage and properties degradation during dry etching for device fabrication. Using an optimum condition to prepare the self-patternable PZT film, more than 5000 ${\AA}$ thick self-patternable PZT film could be fabricated by three times coating. The PZT film showed 28.4 ${\mu}$c/cm$^2$ of remnant polarization (Pr) and 37.0 kV/cm of coercive field (E$\_$c/).
Keywords
Sol-gel; Self-patterning; PZT; Photosensitizer; UV exposure;
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