• 제목/요약/키워드: Self-Assembled Monolayer

검색결과 260건 처리시간 0.038초

Fabrication of Micro/Nano-patterns using MC-SPL(Mechano-Chemical Scanning Probe Lithography) Process

  • Sung, In-Ha;Kim, Dae-Eun
    • International Journal of Precision Engineering and Manufacturing
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    • 제4권5호
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    • pp.22-26
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    • 2003
  • In this work, a new non-photolithographic micro-fabrication technique is presented. The motivation of this work is to overcome the demerits of the most commonly used photolithographic techniques. The micro-fabrication technique presented in this work is a two-step process which consists of mechanical scribing followed by chemical etching. This method has many advantages over other micro-fabrication techniques since it is simple, cost-effective, rapid, and flexible. Also, the technique can be used to obtain a metal structure which has sub-micrometer width patterns. In this paper, the concept of this method and its application to microsystem technology are described.

Fabrication ofMicro/Nano-patterns using MC-SPL (Mechano-Chemical Scanning Probe Lithography) Process (미세탐침기반 기계-화학적 리소그래피공정에 의한 마이크로/나노패턴 제작)

  • 성인하;김대은
    • Journal of the Korean Society for Precision Engineering
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    • 제19권11호
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    • pp.228-233
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    • 2002
  • In this work, a new non-photolithographic micro-fabrication technique is presented. The motivation of this work is to overcome the demerits of the most commonly used photolithographic techniques. The micro-fabrication technique presented in this work is a two-step process which consists of mechanical scribing followed by chemical etching. This method has many advantages over other micro-fabrication techniques since it is simple, cost-effective, rapid, and flexible. Also, the technique can be used to obtain a metal structure which has sub-micrometer width patterns. In this paper, the concept of this method and its application to microsystem technology are described.

Effect of Self-Assembled Monolayer (SAM) on the Oxide Semiconductor Thin Film Transistor (자가조립단분자막이 산화물반도체에 미치는 영향)

  • Cho, Seung-Hwan;Lee, Yong-Uk;Lee, Jeong-Soo;Han, Min-Koo
    • Proceedings of the KIEE Conference
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    • 대한전기학회 2011년도 제42회 하계학술대회
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    • pp.1422-1423
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    • 2011
  • Passivation 막이 증착될 때 산화물 반도체의 백 인터페이스에 주는 플라즈마 데미지와 화학적으로 유도된 데미지를 최소화하기 위하여 산화물 반도체의 보호막으로서 자가조립단분자막(SAM) 적용을 제안한다. TFT가 PECVD나 용액을 기반으로 한 재료로 passivation 될 때 산화물 반도체의 back interface는 플라즈마 데미지와 화학적으로 유도되는 데미지를 피할 수 없다. 자가조립단분자막을 적용함으로써 플라즈마 데미지를 막아줌으로써 이동도와 문턱전압 이하에서의 기울기(SS)의 열화와 용액을 기반으로 한 passivation으로 인한 특성변화(Von)를 최소화 하였다.

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Study on Electron Transfer of Self-assembled Viologen Monolayer using Electrochemical Methods (전기화학법을 이용한 Viologen 자기조립 박막의 전하 이동 특성 연구)

  • Ock, Jin-Young;Shin, Hoon-Kyu;Kwon, Young-Soo
    • Proceedings of the KIEE Conference
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    • 대한전기학회 2003년도 추계학술대회 논문집 전기물성,응용부문
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    • pp.319-321
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    • 2003
  • 본 연구에서는 electron acceptor로서 널리 이용되는 viologen의 전하 이동에 대하여 연구하였다. 자기조립법을 이용하여 단분자막을 형성하였으며, 그 형성과정은 수정진동자의 공진주파수와 공진저항을 이용하여 실시간으로 분석하였다. 두 단계의 가역적인 산화환원 반응시의 전하 이동을 정량적, 정성적으로 분석하기 위하여 전기화학 분석 방법 중 cyclic voltammetry법을 행하였으며, 단분자막이 형성된 수정진동자를 작업전극으로 사용하였다.

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Evaluation of Antiwear Performance of Mono/multilayer LB Molecular Films (단층/다층 LB 분자막의 내마멸 성능 평가)

  • ;;G.K. Zhavnerko
    • Tribology and Lubricants
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    • 제19권6호
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    • pp.329-334
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    • 2003
  • The antiwear properties of amphiphilic monolayers and composite multilayer on silicon surface were investigated using micro­tribometer and Auger Electron Spectroscopy. Langmuir­Blodgett (LB) monolayers from behenic acid, 2,4­heneicosanedione(HD) and its lopper complex((HD)$_2$Cu) were fabricated on silicon surface and the composite multilayer of 5­bilayer of (HD)$_2$Cu was fabricated on the surface of octadecyltrichlorosilane (OTS) self­assembled monolayer (SAM). We observed that LB monolayers and the composite multilayer exhibited a steady and excellent friction response when compared with the OTS SAM. These LB mono and multilayer also showed much higher wear­resistance than the OTS SAM.

Fabrication of Micropattern by Microcontact Printing (미세접촉인쇄기법을 이용한 미세패턴 제작)

  • 조정대;이응숙;최대근;양승만
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 한국정밀공학회 2003년도 춘계학술대회 논문집
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    • pp.1224-1226
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    • 2003
  • In this work, we developed a high resolution printing technique based on transferring a pattern from a PDMS stamp to a Pd and Au substrate by microcontact printing Also, we fabricated various 2D metallic and polymeric nano patterns with the feature resolution of sub-micrometer scale by using the method of microcontact printing (${\mu}$CP) based on soft lithography. Silicon masters for the micro molding were made by e-beam lithography. Composite poly(dimethylsiloxane) (PDMS) molds were composed of a thin, hard layer supported by soft PDMS layer. From this work, it is certificated that composite PDMS mold and undercutting technique play an important role in the generation of a clear SAM nanopattern on Pd and Au substrate.

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Tribological properties of mono/multilayer LB molecular films (단층/다층 LB 분자막의 트라이볼로지 특성)

  • ;;G.K. Zhavnerko
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 한국정밀공학회 2003년도 춘계학술대회 논문집
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    • pp.211-214
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    • 2003
  • The tribological properties of amphiphilic monolayers and composite multilayer on silicon surface were investigated using micro-tribometer and Auger Electron Spectroscopy. Langmuir-Blodgett (LB) monolayers from behenic acid. 2.4-heneicosanedione(HD) and its copper complex((HD)$_2$Cu) were fabricated on silicon surface and the composite multilayer of 5-bilayer of (HD)$_2$Cu was fabricated on the surface of octadecyltrichlorsilane (OTS) self-assembled monolayer(SAM). We observed that LB monolayers and the composite multilayer exhibited a steady and excellent friction response when compared with the OTS SAM. These LB mono and multilayer also showed much higher wear-resistance than the OTS SAM.

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Fabrication of High Ordered Nano-sphere Array on Curved Substrate by Nanoimprint Lithography (나노임프린트 리소그래피를 이용한 곡면 기판 위에 정렬된 나노 볼 패턴 형성에 관한 연구)

  • Hong, S.H.;Bae, B.J.;Kwak, S.U.;Lee, H.
    • Journal of Surface Science and Engineering
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    • 제41권6호
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    • pp.331-334
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    • 2008
  • The replica of highly ordered nano-sphere array patterns were fabricated using hot embossing method. First, silica nano-sphere array on Si substrate was transferred to PVC film at $130^{\circ}C$ and 7 bar using hot embossing process. Then, silica nano-sphere array on PVC template was removed by soaking the PVC film in buffered oxide etcher. In order to form anti-stiction layer, the PVC template was coated with silicon dioxide layer and self-assembled monolayer. Through UV nanoimprint lithography with the fabricated flexible PVC template, highly ordered nano-sphere array pattern was imprinted on curved substrates with high fidelity.

Preparation of Iron Catalytic Layer onto Functionalized Silicon Substrate for Synthesis of Carbon Nanotubes

  • Adhikari, Prashanta Dhoj;Cho, Jumi;Park, Chong-Yun
    • Proceedings of the Korean Vacuum Society Conference
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.611-611
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    • 2013
  • In this study, iron oxide nanoclusters layer (Nc) was prepared onto functionalized silicon substrate by wet method. The amine-terminated SAM fabricated on silicon substrate (APTMS/Si) was carried out by UV-treatment and immersed into the FeCl3/HCl aqueous solution. Then, Nc were immobilized onto oxidized SAM silicon substrate (SAMs/Si) through electrostatic interaction between cationic Nc and anionic SAMs/Si. This catalytic layer (Nc/SAMs/Si) was used to grow carbon nanotubes (CNTs). The characterization results clearly show that the well-graphitized CNTs were synthesized by using functionalized silicon substrate as a template having appropriate density of catalyst. These consequences show that SAM containing template is important to achieve the effective layer of catalyst to synthesize CNTs.

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Electrical properties of Organic TFT patterned by shadow-mask with all layer

  • Lee, Joo-Won;Kim, Jai-Kyeong;Jang, Jin;Ju, Byeong-Kwon
    • Proceedings of the IEEK Conference
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    • 대한전자공학회 2006년도 하계종합학술대회
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    • pp.543-544
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    • 2006
  • Pentacene thin film transistors fabricated without photolithographic patterning were fabricated on the plastic substrates. Both the organic/inorganic thin films and metallic electrode were patterned by shifting the position of the shadow mask which accompanies the substrate throughout the deposition process. By using an optically transparent zirconium oxide ($ZrO_2$) as a gate insulator and octadecyltrimethoxysilane (OTMS) as an organic molecule for self-assembled monolayer (SAM) to increase the adhesion between the plastic substrate and gate insulator and the mobility with surface treatment, high-performance transistor with field effect mobility $.66\;cm^2$/V s and $I_{on}/I_{off}$>$10^5$ was formed on the plastic substrate. This technique will be applicable to all structure deposited at low temperature and suitable for an easy process for flexible display.

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