• 대한기계학회논문집A
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• 제33권10호
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• pp.1132-1138
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• 2009

The spring constants of primary suspensions for a railway vehicle are optimized by a robust design process, in which the response surface models(RSMs) of their dynamic responses are constructed via the design of experiment(DOE). The robust design process requires an intensive computation to evaluate exactly a probabilistic feasibility for the robustness of dynamic responses with their probabilistic variances for the railway vehicle. In order to overcome the computational process, the process capability index $C_{pk}$ is introduced which enables not only to show the mean value and the scattering of the product quality to a certain extent, but also to normalize the objective functions irrespective of various different dimensions. This robust design, consequently, becomes to optimize the $C_{pk}$ subjected to constraints, i.e. 2, satisfying six sigma. The proposed method shows not only an improvement of some $C_{pk}$ violating the constraints obtained by the conventional optimization, but also a significant decrease of the variance of the $C_{pk}$.

• 한국분말재료학회지
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• 제19권6호
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• pp.405-411
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• 2012

Recovery of copper powder from copper chloride solution used in $MoO_3$ leaching process was carried out using a cementation method. Cementation is a simple and economical process, necessitating less energy compared with other recovery methods. Cementation utilizes significant difference in standard reduction potential between copper and iron under standard condition. In the present research, Cementation process variables of temperature, time, and added amount of iron scraps were optimized by using design of experiment method and individual effects on yield and efficiency of copper powder recovery were investigated using bench-scale cementation reaction system. Copper powders thus obtained from cementation process were further characterized using various analytical tools such as XRF, SEM-EDS and laser diffraction and scattering methods. Cementation process necessitated further purification of recovered copper powders and centrifugal separation method was employed, which successfully yielded copper powders of more than 99.65% purity and average $1{\mu}m$ in size.

• 한국융합학회논문지
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• 제12권1호
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• pp.185-191
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• 2021

과립 분말 야금법은 기존 분말 야금법보다 치밀도가 높은 소결 부품을 얻을 수 있는 제조 기술이다. 하지만 추가 과립화 공정에 따른 생산 비용 증가가 상당하다는 단점이 있다. 과립 분말 야금법의 생산성 향상을 위해서는 과립 분말 제조 시 높은 회수율이 보장되어야 한다. 본 논문에서는 분체 동역학 전산 해석법인 이산요소법을 이용하여 과립 분말의 수율에 영향을 미치는 과립화 공정의 특성에 대해 살펴보았다. 분무 과립 공정 중 과립화 분말의 비산, 충돌 및 소착 현상을 시뮬레이션함으로써 분무 건조기의 운전 조건에 따른 과립화 분말의 파손 및 회수 가능 여부를 예측하였다. 본 논문의 가상 공정 시뮬레이션 융합 연구 결과는 실제 금속 분말의 분무 과립화 공정의 생산성 향상에 이바지할 것으로 기대한다.

• 한국고분자학회:학술대회논문집
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• 한국고분자학회 2006년도 IUPAC International Symposium on Advanced Polymers for Emerging Technologies
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• pp.120-120
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• 2006

In our study grazing incidence X-ray scattering (GIXS) measurements with synchrotron radiation sources were conducted statically and in-situ for a series of nanoscale thin films prepared from nanoporous dielectrics, block copolymers, brush polymers, and molecular assemblies. All GIXS measurements were performed at the Pohang Accelerator Laboratory. The measured scattering data were analyzed in detail by using newly developed GIXS scattering theory. All GIXS results will be discussed in details with considering the materials chemistry and nanostructure formation process parameters.

• 대한기계학회논문집B
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• 제27권12호
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• pp.1744-1749
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• 2003

The purpose of this study is to obtain the information about the development process of GDI spray. To acquire the characteristics of GDI spray, the computational study of hollow cone spray for high-pressure swirl injectors was performed. Several hybrid models using the modified KIVA code have been introduced and compared. WB model and LISA model were used for the primary breakup, and DDB and APTAB models were used for secondary breakup. To compare with the calculated results, the experimental results such as cross-sectional images and SMD distribution were acquired by laser Mie scattering technique and Phase Doppler Analyzer respectively. The results show that LISA+APTAB hybrid model has the best prediction for spray formation process.

• Transactions on Electrical and Electronic Materials
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• 제5권4호
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• pp.143-147
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• 2004

Surface defects and bulk defects on SOI wafers are studied. Two new metrologies have been proposed to characterize surface and bulk defects in epitaxial layer transfer (ELTRAN) wafers. They included the following: i) laser scattering particle counter and coordinated atomic force microscopy (AFM) and Cu-decoration for defect isolation and ii) cross-sectional transmission electron microscope (TEM) foil preparation using focused ion beam (FIB) and TEM investigation for defect morphology observation. The size of defect is 7.29 urn by AFM analysis, the density of defect is 0.36 /cm$^2$ at as-direct surface oxide defect (DSOD), 2.52 /cm$^2$ at ox-DSOD. A hole was formed locally without either the silicon or the buried oxide layer (Square Defect) in surface defect. Most of surface defects in ELTRAN wafers originate from particle on the porous silicon.

• 천문학회보
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• 제35권1호
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• pp.83.2-83.2
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• 2010

During the formation of cosmic web, collisionless shock waves are produced around and inside the substructures. In these shock waves electrons and ions are accelerated to such high energies that they can produce gamma rays in several ways. Many authors have studied the contribution of shock-induced radiation to the cosmic gamma-ray background. However not all the important physical processes are included in their calculation. By considering more complete physical process, we re-investigate the problem. In our model, the energy distribution of the cosmic rays (CRs) are calculated by widely accepted diffusive shock acceleration model, both primary and secondary CR electrons are included, both inverse Compton scattering and bremsstrahlung process are considered. The difference of the results are discussed.

• 한국전기전자재료학회논문지
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• 제17권5호
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• pp.476-480
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• 2004

The characteristics of antimony implants are relatively well-known. Antimony has lower diffusion coefficient, shorter implantation range, and smaller scattering as compared with conventional dopants such as phosphorous and arsenic. It has been commonly used in the doping of buried layer in Bi-CMOS process. In this paper, characteristics and appropriate condition of monitoring in antimony implant beam tuning using Sb$_2$O$_3$were investigated to get a reliable process. TW(Thema Wave) and R$_{s}$(Sheet Resistance) test were carried out to set up condition of monitoring for stable operation through the periodic inspection of instruction condition. The monitoring was progressed at the point that the slant of R$_{s}$ varied significantly to Investigate the variation of instruction accurately.

• 한국정밀공학회지
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• 제16권6호
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• pp.160-165
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• 1999

In surface grinding, the conditions of the grinding wheel give a significant effect on the ground workpieces comparing with other metal removal provesses. In this paper, to assist the development, a non-contacting optical method by the laser beam is introduced. The in-process measurement of scattering intensities has been made during surface grinding processes and the surface textures of wheel working surfaces are captured. Also, in order to determine the dressing time monitoring method of a grinding wheel, a three-dimensional computer simulation of the grinding operation has been attempted based on the contact mechanism and the surface-shaping system between the grinding wheel and the workpiece. The optimal dressing time is determined by the amount of the grain wear and work surface roughness.

• 반도체디스플레이기술학회지
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• 제6권3호
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• pp.25-33
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• 2007

A computationally efficient and accurate Monte Carlo (MC) simulator of electron beam lithography process, which is named SCNU-EBL, has been developed for semiconductor nanometer pattern design and fabrication. The simulator is composed of a MC simulation model of electron trajectory into solid targets, an Gaussian-beam exposure simulation model, and a development simulation model of photoresist using a string model. Especially for the trajectories of incident electrons into the solid targets, the inner-shell electron scattering of an target atom and its discrete energy loss with an incident electron is efficiently modeled for multi-layer resists and heterogeneous multi-layer targets. The simulator was newly applied to the development profile simulation of ZEP520 positive photoresist for NGL(Next-Generation Lithography). The simulation of ZEP520 for electron-beam nanolithography gave a reasonable agreement with the SEM experiments of ZEP520 photoresist.