• Journal of the Korean Institute of Telematics and Electronics A
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• v.33A no.7
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• pp.198-204
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• 1996

Electron beam lithography is one of the importnat technologies which can delineate deep submicron patterns. REcently, electron beam lithography is being applied in delineating the critical layers of semiconductor device fabrication. In this paper, we present a development simulation program for electron beam lithography and study the development profiles of resist when resist is exposed by the electron beam. Experimentally, the development parameter of positive and negative resists are measured and the data is applied to input parameter of the simulation program. Also simulation results are compared of the process results in the view of resist profiles. As a result, for PMMA and SAL 601 resist, the trend of simulation to the values of process parameters agree with real process results very well, so that the process results can be predicted by the simulation.

• East Asian mathematical journal
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• v.22 no.2
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• pp.131-149
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• 2006

In this paper we introduce the concept of $\gamma$-preopen sets in a topological space together with its corresponding $\gamma$-preclosure and $\gamma$-preinterior operators and a new class of topology $\tau_{{\gamma}p}$ which is generated by the class of $\gamma$-preopen sets. Also we introduce $\gamma$-pre $T_i$ spaces(i=0, $\frac{1}{2}$, 1, 2) and study some of its properties and we proved that if $\gamma$ is a regular operation, then$(X,\;{\tau}_{{\gamma}p})$ is a $\gamma$-pre $T\frac{1}{2}$ space. Finally we introduce $(\gamma,\;\beta)$-precontinuous mappings and study some of its properties.

• Preventive Nutrition and Food Science
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• v.17 no.3
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• pp.228-233
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• 2012

Trifoliate orange seed extracts (TSEs) were prepared from different solvents, water (TW), ethanol (TE), and n-hexane (TH), and assessed for their antimicrobial activities against six gram-negative food-borne pathogens (Escherichia coli KCTC 1039, Escherichia coli O157:H7 ATCC 43895, Salmonella Enteritidis ATCC 3311, Salmonella Typhimurium KCCM 11862, Shigella sonnei KCTC 2518, and Vibrio parahaemolyticus ATCC 17802). Among the tested TSEs, TE and TH showed a slight inhibition activity on V. parahaemolyticus ATCC 17802, but a good growth inhibition activity on Sal. Typhimurium KCCM 11862. TH and TE showed steady growth inhibition activity with increasing growth time after 6 hr when compared to the control (p<0.05). From these results, we confirmed the possibility of TH and TE as antimicrobial materials.

• Food Science of Animal Resources
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• v.20 no.3
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• pp.231-235
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• 2000

원유에 존재하는 Ps. fluorescens의 균수를 신속하게 측정하기 위한 Inhibition Enzyme Linked Immunosorbant Assay (ELSIA)를 개발하기 위해 Ps, fluorescens(KCTC 2344)을 산란계에 접종하여 Ps.fluorescens에 대한 anti-Ps. fluorescens IgY 항체를 생산하고 그 항체의 역기를 ELISA로 측정한 결과 32일까지 항체 역가가 증가하였으며, 분리된 IgY 항체의 titer는 1:128,000으로 나타났다. Anti-Ps.fluorescens IgY 항체에대한 교차반응을 조사한 결과 그람양성균 Lactococcus faecalis, Staphylococcus aureus 뿐만 아니라 그람음성 균인 Achrombacter sal-monisida, Escherichia coil와도 교차반응을 거의 하지 않는 것으로 나타났다. Anti-Ps. fluo-rescens IgY 항체를 가지고 Inhibition ELISA 방법으로 Ps. fluorescens 균수를 신속한 측정할 수 있는 표준곡선을 작성한 결과 Ps. fluorescens균을 5.0$\times$$10^4$cfu/ml부터 5.0$\times$$10^{8}$cfu/ml 측정할 수 있는 것으로 나타났다.

• Korean journal of applied entomology
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• v.19 no.4 s.45
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• pp.240-242
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• 1980

Recently, a powdery mildew on the leaves of Capsium spp., Pimento and pepper, occurred greatly in the vinyl-house at Seungchon area, Chonnam province. According to the field survey, the disease is severe at high temperature and high humidity conditions in the vinyl house. Diseased loaves were severely fallen and remained only several top leaves, thus the setting and thickening of fruits were greatly depressed. The pathogenic fungus was identified as Oidiopsis taurica(Lev.) Arn., imperfect stage of Leveillula taurica (Lev.) Arn., The perfect stage of fungus was not observed. Optimum temperatures for conidial germination ranged at $25-30^{\circ}C$ with high humidity.

• YAKHAK HOEJI
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• v.36 no.3
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• pp.255-258
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• 1992

The clinical isolate Staphylococcus aureus SA8 was resistant to tetracycline(Tc) and harboured a plasmid pKH1(24.82 kb). pKH1 was shown by curing and by transformation to specify resistance to Tc. The cleavage map of a pKH1 was determined by restricction enzyme mapping techniques. Cleavage map is given for BglII, EcoRI, HpaII, PvuII and SalI. Restriction endonuclease BamHI, BglI, BstEII, HpaI, PstI, and XhoI have no sites on this plasmid. HaeIII, XbaI, and HindIII have 5, 6, 14 sites, respectively.

• Journal of the Korean Society of Industry Convergence
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• v.6 no.4
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• pp.347-353
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• 2003

Fe(II)하에서 분자산소에 의한 기질의 산화는 헴에 의해 나타난 가역산화반응에 의해서 대단한 생물학적 흥미가 있다. 적당한 조건하에서 산화되어진 리간드로서 염인 피리딘이나 아마이드, 그리고 두 가지 종류의 Fe(II)-acac나 Fe(II)-sal의 complex와 산화되는 기질의 성질이 비라디칼 조건하에서 안정하다는 것을 알았다.

• Proceedings of the KSME Conference
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• 2008.11a
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• pp.1727-1732
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• 2008

We present a facile, yet versatile carbon nanofabrication method using electron beam lithography and resist pyrolysis. Various resist nanopatterns were fabricated using a negative electron beam resist, SAL-601, and were then subjected to heat treatment in an inert atmosphere to obtain carbon nanopatterns. Suspended carbon nanostructures were fabricated by wet-etching of an underlying sacrificial oxide layer. Free-standing carbon nanostructures, which contain 122 nm-wide, 15 nm-thick, and 2 ${\mu}m$-long nanobridges, were fabricated by resist pyrolysis and nanomachining processes. Electron beam exposure dose effects on resist thickness and pattern widening were studied. The thickness of the carbon nanostructures was thinned down by etching with oxygen plasma. An electrical biosensor utilizing carbon nanostructures as a conducting channel was studied. Conductance modulations of the carbon device due to streptavidin-biotin binding and pH variations were observed.

• Kyungpook Mathematical Journal
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• v.47 no.1
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• pp.69-76
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• 2007

Let $f$ denote a mapping from an orthogonality space ($\mathcal{X}$, ${\bot}$) into a real Banach space $\mathcal{Y}$. In this paper, we prove the Hyers-Ulam-Rassias stability of the orthogonally cubic functional equations $f(2x+y)+f(2x-y)=2f(x+y)+2f(x-y)+12f(x)$ and $f(x+y+2z)+f(x+y-2z)+f(2x)+f(2y)=2f(x+y)+4f(x+z)+4f(x-z)+4f(y+z)+4f(y-z)$, where $x{\bot}y$, $y{\bot}z$, $x{\bot}z$.

• Journal of the Korean institute of surface engineering
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• v.29 no.6
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• pp.869-875
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• 1996

In this article the effects of process parameters of inductively coupled plasma etching with $SF_6$ /$N_2$/Ar mixture gas and mask materials on the etched profile of W were investigated. While the etched profile was improved by $N_2$-addition, low working presure, and reduced $SF_6$ flow rate, the etching selectity (W against SAL resist) was decreased. Due to the difficulty of W etching with single layer resist, sputter deposited $Al_2O_3$ film was used as a hardmask. Reduction of required EB resist thickness through $Al_2O_3$ mask application could reduce proximity effect during e-beam patterning, but the etch anisotropy was degraded by decreased sidewall passiviation effect.