• Title/Summary/Keyword: S-doping

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Effect of $Bi_2O_3$ on Dielectric Properties and Temperature Characteristics of $[BaTiO_3]_{0.9}+[BaZrO_3, SnO_2, La_2O_3, ZrO_2]_{0.1}$ ($[BaTiO_3]_{0.9}+[BaZrO_3, SnO_2, La_2O_3, ZrO_2]_{0.1}$의 Dielectric Properties 및 Temperature Characteristics에 미치는 $Bi_2O_3$의 영향)

  • 이병하;이경희;윤영호;손상철;유광수
    • Journal of the Korean Ceramic Society
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    • v.30 no.5
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    • pp.397-403
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    • 1993
  • Widely used dielectrics, barium titanate was promising material for ceramic capacitor. It was produced by specific formulation with various dopants-La2O3, ZrO2, SnO2, CaZrO3, CaTiO3, CaSnO3, Bi2O3, and etc.-according to demanded properties of capacitor. In this study, we would examinate the study of dielectric properties and temperatuer characteristics (T.C.) with the amount of Bi2O3. The sample was prepared with [BaTiO3]10+[BaZrO3, SnO2, La2O3, ZrO2]10 and Bi2O3 varied from 1.0, 1.5, 2.0, 2.5 to 3.0wt%. After milling and mixing for 15hrs, each sample was dried and then pressed at 700kg/$\textrm{cm}^2$ into pellets. Pellets were fired at 131$0^{\circ}C$, for 3hrs in air. As the result of measurements, dielectric constant, break down voltage, and insulation resistance were increased with the amount of Bi2O3, and the resonant frequency was shifted from high frequency to low frequency range. In the case of temperature characteristics, capacitance change rate was symmetrically changed at -$25^{\circ}C$ and +85$^{\circ}C$ respectively. Therefore, it is recognized that the temperature characteristics can be moderated with doping Bi2O3 in our study.

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Reduced graphene oxide field-effect transistor for biomolecule detection and study of sensing mechanism

  • Kim, D.J.;Sohn, I.Y.;Kim, D.I.;Yoon, O.J.;Yang, C.W.;Lee, N.E.;Park, J.S.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.431-431
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    • 2011
  • Graphene, two dimensional sheet of sp2-hybridized carbon, has attracted an enormous amount of interest due to excellent electrical, chemical and mechanical properties for the application of transparent conducting films, clean energy devices, field-effect transistors, optoelectronic devices and chemical sensors. Especially, graphene is promising candidate to detect the gas molecules and biomolecules due to the large specific surface area and signal-to-noise ratios. Despite of importance to the disease diagnosis, there are a few reports to demonstrate the graphene- and rGO-FET for biological sensors and the sensing mechanism are not fully understood. Here we describe scalable and facile fabrication of rGO-FET with the capability of label-free, ultrasensitive electrical detection of a cancer biomarker, prostate specific antigen/${\alpha}1$-antichymotrypsin (PSA-ACT) complex, in which the ultrathin rGO sensing channel was simply formed by a uniform self-assembly of two-dimensional rGO nanosheets on aminated pattern generated by inkjet printing. Sensing characteristics of rGO-FET immunosensor showed the highly precise, reliable, and linear shift in the Dirac point with the analyte concentration of PSA-ACT complex and extremely low detection limit as low as 1 fg/ml. We further analyzed the charge doping mechanism, which is the change in the charge carrier in the rGO channel varying by the concentration of biomolecules. Amenability of solution-based scalable fabrication and extremely high performance may enable rGO-FET device as a versatile multiplexed diagnostic biosensor for disease biomarkers.

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Visible-Light-Driven Catalytic Disinfection of Staphylococcus aureus Using Sandwich Structure g-C3N4/ZnO/Stellerite Hybrid Photocatalyst

  • Zhang, Wanzhong;Yu, Caihong;Sun, Zhiming;Zheng, Shuilin
    • Journal of Microbiology and Biotechnology
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    • v.28 no.6
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    • pp.957-967
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    • 2018
  • A novel $g-C_3N_4$/ZnO/stellerite (CNZOS) hybrid photocatalyst, which was synthesized by coupled hydro thermal-thermal polymerization processing, was applied as an efficient visible-light-driven photocatalyst against Staphylococcus aureus. The optimum synthesized hybrid photocatalyst showed a sandwich structure morphology with layered $g-C_3N_4$ (doping amount: 40 wt%) deposited onto micron-sized ZnO/stellerite particles (ZnO average diameter: ~18 nm). It had a narrowing band gap (2.48 eV) and enlarged specific surface area ($23.05m^2/g$). The semiconductor heterojunction effect from ZnO to $g-C_3N_4$ leads to intensive absorption of the visible region and rapid separation of the photogenerated electron-hole pairs. In this study, CNZOS showed better photocatalytic disinfection efficiency than $g-C_3N_4/ZnO$ powders. The disinfection mechanism was systematically investigated by scavenger-quenching methods, indicating the important role of $H_2O_2$ in both systems. Furthermore, $h^+$ was demonstrated as another important radical in oxidative inactivation of the CNZOS system. In respect of the great disinfection efficiency and practicability, the CNZOS heterojunction photocatalyst may offer many disinfection applications.

Fabrication and Characterization of MFIS-FET using Au/SBT/LZO/Si structure

  • Im, Jong-Hyun;Lee, Gwang-Geun;Kang, Hang-Sik;Jeon, Ho-Seung;Park, Byung-Eun;Kim, Chul-Ju
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.174-174
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    • 2008
  • Non-volatile memories using ferroelectric-gate field-effect transistors (Fe-FETs) with a metal/ferroelectric/semiconductor gate stack (MFS-FETs) make non-destructive read operation possible. In addition, they also have features such as high switching speed, non-volatility, radiation tolerance, and high density. However, the interface reaction between ferroelectric materials and Si substrates, i.e. generation of mobile ions and short retention, make it difficult to obtain a good ferroelectric/Si interface in an MFS-FET's gate. To overcome these difficulties, Fe-FETs with a metal/ferroelectric/insulator/semiconductor gate stack (MFIS-FETs) have been proposed, where insulator as a buffer layer is inserted between ferroelectric materials and Si substrates. We prepared $SrBi_2Ta_2O_9$ (SBT) film as a ferroelectric layer and $LaZrO_x$ (LZO) film as a buffer layer on p-type (100) silicon wafer for making the MFIS-FET devices. For definition of source and drain region, phosphosilicate glass (PSG) thin film was used as a doping source of phosphorus (P). Ultimately, the n-channel ferroelectric-gate FET using the SBT/LZO/Si Structure is fabricated. To examine the ferroelectric effect of the fabricated Fe-FETs, drain current ($I_d$) versus gate voltage ($V_g$) characteristics in logarithmic scale was measured. Also, drain current ($I_d$) versus drain voltage ($V_d$) characteristics of the fabricated SBT/LZO/Si MFIS-FETs was measured according to the gate voltage variation.

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Fluorene-Based Conjugated Copolymers Containing Hexyl-Thiophene Derivatives for Organic Thin Film Transistors

  • Kong, Ho-Youl;Chung, Dae-Sung;Kang, In-Nam;Lim, Eun-Hee;Jung, Young-Kwan;Park, Jong-Hwa;Park, Chan-Eon;Shim, Hong-Ku
    • Bulletin of the Korean Chemical Society
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    • v.28 no.11
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    • pp.1945-1950
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    • 2007
  • Two fluorene-based conjugated copolymers containing hexyl-thiophene derivatives, PF-1T and PF-4T, were synthesized via the palladium-catalyzed Suzuki coupling reaction. The number-average molecular weights (Mn) of PF-1T and PF-4T were found to be 19,100 and 13,200, respectively. These polymers were soluble in common organic solvents such as chloroform, chlorobenzene, toluene, etc. The UV-vis absorption maximum peaks of PF-1T and PF-4T in the film state were found to be 410 nm and 431 nm, respectively. Electrochemical characterization revealed that these polymers have low highest occupied molecular orbital (HOMO) levels, indicating good resistance against oxidative doping. Thin film transistor devices were fabricated using the top contact geometry. PF-1T showed much better thin-film transistor performance than PF-4T. A thin film of PF- 1T gave a saturation mobility of 0.001-0.003 cm2 V?1 s?1, an on/off ratio of 1.0 × 105, and a small threshold voltage of ?8.3 V. To support TFT performance, we carried out DSC, AFM, and XRD measurements.

Effects of La2O3 on the Piezoelectric Properties of Lead-Free (Bi0.5Na0.5)0.94Ba0.06TiO3 Piezoelectric Ceramics (무연 BNBT 세라믹스의 압전특성에 미치는 La2O3의 영향)

  • Son Young-Jin;Yoon Man-Soon;Ur Soon-Chul
    • Korean Journal of Materials Research
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    • v.15 no.12
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    • pp.756-759
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    • 2005
  • A lead free piezoelectric material, bismuth sodium barium titanate $(Bi_{0.5}Na_{0.5})_{0.94}Ba_{0.06}TiO_3$ (BNBT), was considered as an environment-friendly alternatives for the current PZT system. A perovskite BNBT was synthesized by conventional bulk ceramic processing technique. In order to improve piezoelectric properties, $La_2O_3$ as a dopant was incorporated into the BNBT system up to 0.025 moi, ana the effects on subsequent the piezoelectric ana dielectric properties were systematically investigated. With increasing $La_2O_3$ contents, the equilibrium grain shape was remarkably evidenced and sintered density was increased. Piezoelectric and dielectric properties were s]town to have maximum values at the $La_2O_3$ contents of 0.02 mol. $La^{3+}$ ions seemed to act as a softener in the BNBT system and to enhance dielectric and piezoelectric properties in this study.

Anatase TiO2-doped activated carbon fibers prepared by ultrasonication and their capacitive deionization characteristics

  • Kang, Da Hee;Jo, Hanjoo;Jung, Min-Jung;Kim, Kyoung Hoon;Lee, Young-Seak
    • Carbon letters
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    • v.27
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    • pp.64-71
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    • 2018
  • $TiO_2$-doped activated carbon fibers (ACFs) were successfully prepared as capacitive deionization (CDI) electrode materials by facile ultrasonication-assisted process. ACFs were treated with titanium isopropoxide (TTIP) and isopropyl alcohol solutions of different concentrations and then calcinated by ultrasonication without heat-treatment. The results show that a certain amount of anatase $TiO_2$ was present on the ACF surface. The specific capacitance of the $TiO_2$-doped ACF electrode was remarkably improved (by 93.8% at scan rate of $50mV\;s^{-1}$) over that of the untreated ACF electrode, despite decreases in the specific surface area and total pore volume upon $TiO_2$ doping. From the CDI experiments, the salt adsorption capacity and charge efficiency of the sample with TTIP percent concentration of 15% were found to considerably increase by 71.9 and 57.1%, respectively. These increases are attributed to the improved wettability of the electrode, which increases the number of surface active sites and facilitates salt ion diffusion in the ACF pores. Additionally, the Ti-OH groups of $TiO_2$ act as electrosorption sites, which increases the electrosorption capacity.

An Effect of Fe2O3 Additive on a Seebeck Coefficient and a Power Factor for SmCoO3 Perovskite System (SmCoO3 페롭스카이트 계 열전소재에서 Fe2O3 첨가제가 출력인자에 미치는 영향)

  • Jung, Kwang-Hee;Choi, Soon-Mok;Seo, Won-Seon;Park, Hyung-Ho
    • Journal of the Korean Ceramic Society
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    • v.47 no.5
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    • pp.457-460
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    • 2010
  • $SmCoO_3$ system was investigated for their application to themoelectric materials. All specimens showed p-type semiconducting behavior and their electrical conductivity ($\sigma$), Seebeck coefficient (S) and power factor were measured at high temperature. And the effect of dopant ions on their thermoelectrical properties were also investigated. $Fe^{3+}$ ion doped into $Co^{3+}$ site enhanced the Seebeck coefficient and decreased the electrical conductivity simultaneously. The maximum Seebeck coefficient value for 60% doping case reached to 780 ${\mu}V$/K at $240^{\circ}C$. However $Fe^{3+}$ doped system cause an negative effect on power factor value. In case of the pure phase, the maximum Seebeck coefficient value reached to 290 ${\mu}V$/K at $240^{\circ}C$ and the maximum electrical conductivity was obtained 748 1/(ohm$\times$cm) at $960^{\circ}C$. As a result, the maximum power factor was obtained $1.49\times10^{-4}$ W/$mK^2$ at $550^{\circ}C$.

Implant Anneal Process for Activating Ion Implanted Regions in SiC Epitaxial Layers

  • Saddow, S.E.;Kumer, V.;Isaacs-Smith, T.;Williams, J.;Hsieh, A.J.;Graves, M.;Wolan, J.T.
    • Transactions on Electrical and Electronic Materials
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    • v.1 no.4
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    • pp.1-6
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    • 2000
  • The mechanical strength of silicon carbide dose nor permit the use of diffusion as a means to achieve selective doping as required by most electronic devices. While epitaxial layers may be doped during growth, ion implantation is needed to define such regions as drain and source wells, junction isolation regions, and so on. Ion activation without an annealing cap results in serious crystal damage as these activation processes must be carried out at temperatures on the order of 1600$^{\circ}C$. Ion implanted silicon carbide that is annealed in either a vacuum or argon environment usually results in a surface morphology that is highly irregular due to the out diffusion of Si atoms. We have developed and report a successful process of using silicon overpressure, provided by silane in a CAD reactor during the anneal, to prevent the destruction of the silicon carbide surface, This process has proved to be robust and has resulted in ion activation at a annealing temperature of 1600$^{\circ}C$ without degradation of the crystal surface as determined by AFM and RBS. In addition XPS was used to look at the surface and near surface chemical states for annealing temperatures of up to 1700$^{\circ}C$. The surface and near surface regions to approximately 6 nm in depth was observed to contain no free silicon or other impurities thus indicating that the process developed results in an atomically clean SiC surface and near surface region within the detection limits of the instrument(${\pm}$1 at %).

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Analysis of Subthreshold Swing Mechanism by Device Parameter of Asymmetric Double Gate MOSFET (소자 파라미터에 따른 비대칭 DGMOSFET의 문턱전압이하 스윙 분석)

  • Jung, Hakkee
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.19 no.1
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    • pp.156-162
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    • 2015
  • This paper has analyzed how conduction path and electron concentration for the device parameters such as oxide thickness, channel doping, and top and bottom gate voltage influence on subthreshold swing of asymmetric double gate MOSFET. Compared with symmetric and asymmetric double gate MOSFET, asymmetric double gate MOSFET has the advantage that the factors to be able to control the short channel effects increase since top and bottom gate oxide thickness and voltages can be set differently. Therefore the conduction path and electron concentration for top and bottom gate oxide thickness and voltages are investigated, and it is found the optimum conditions that the degradation of subthreshold swing, severe short channel effects, can reduce. To obtain the analytical subthreshold swing, the analytical potential distribution is derived from Possion's equation. As a result, conduction path and electron concentration are greatly changed for device parameters, and subthreshold swing is influenced by conduction path and electron concentration of top and bottom.