• 제목/요약/키워드: S-doping

검색결과 692건 처리시간 0.03초

M/NEMS용 in-situ 도핑된 다결정 3C-SiC 박막 성장 (Epitaxial growth of in-situ doped polycrystalline 3C-SiC for M/NEMS application)

  • 김강산;정귀상
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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    • pp.18-19
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    • 2008
  • Polycrystalline(poly) 3C-SiC film is a promising structural material for M/NEMS used in harsh environments, bio and fields. In order to realize poly 3C-SiC based M/NEMS devices, the electrical properties of poly 3C-SiC film have to be optimized. The n-type poly 3C-SiC thin film is deposited by APCVD using HMDS$(Si_2(CH_3)_6)$ as single precursor and are in-situ doped using N2. Resistivity values as low as 0.014 $\Omega$cm were achieved. The carrier concentration increased with doping from $3.0819\times10^{17}$ to $2.2994\times10^{19}cm^{-3}$ and electronicmobility increased from 2.433 to 29.299 $cm^2/V{\cdot}s$.

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Back-gate bias를 이용한 SOI nano-wire BioFET의 electrical sensing (Electrical sensing of SOI nano-wire BioFET by using back-gate bias)

  • 정명호;안창근;조원주
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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    • pp.354-355
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    • 2008
  • The sensitivity and sensing margin of SOI(silicon on insulator) nano-wire BioFET(field effect transistor) were investigated by using back-gate bias. The channel conductance modulation was affected by doping concentration, channel length and channel width. In order to obtain high sensitivity and large sensing margin, low doping concentration, long channel and narrow width are required. We confirmed that the electrical sensing by back-gate bias is effective method for evaluation and optimization of bio-sensor.

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Biracial Silicon Solar Cells with Spin-on Doping and Electroless Plating

  • U. Gangopadhyay;Kim, Kyung-Hae;S.K. Dhungel;D. Mangalaraj;Park, J.H.;J. Yi
    • Transactions on Electrical and Electronic Materials
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    • 제5권1호
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    • pp.7-10
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    • 2004
  • A new method for fabrication of transistor like structure of the bifacial solar cell using spin-on doping and electroless plating has been proposed and the basic characteristics of the bifacial cell have been investigated. It is found that 9% increase in short circuit current is achieved with bifacial connection than the unifacial connection. Some unwanted effect of the series resistance on collection efficiency under different mode of illumination has been pointed out. Loss mechanisms inherent in the transistor like bifacial structure have also been discussed.

Multi RESURF구조를 갖는 LDMOS의 on 저항과 항복전압 (On resistance and breakdown voltage of LDMOS with Multi RESURF structure)

  • 최이권;최연익;정상구
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2002년도 추계학술대회 논문집 전기물성,응용부문
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    • pp.156-158
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    • 2002
  • Reduction of on-resistance($R_{on}$) in high voltage devices is of critical importance for the power consumption of the device. $R_{on}$ decreases with increase of the doping concentration of the drift region. However, breakdown voltage(BV) decreaes also with increase of doping concentration. In this report, a multi-resurf LDMOS[1] strcuture is proposed to reduce the $R_{on}$ which allows no degradation in BV. The on-and off-state characteristics of the proposed structure are simulated using the two-dimensional devices simulator ATLAS and compared with those from the conventional structure.

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Sub-90nm 급 Logic 소자에 대한 기생 저항 성분 추출의 연구

  • 이준하;이흥주;이주율
    • 한국반도체및디스플레이장비학회:학술대회논문집
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    • 한국반도체및디스플레이장비학회 2003년도 춘계학술대회 발표 논문집
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    • pp.112-115
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    • 2003
  • Sub-90nm급 high speed 소자를 위해서는 extension영역의 shallow junction과 sheet 저항의 감소가 필수적이다. 일반적으로 기생저항은 channel저항의 약 10-20%정도를 차지하도록 제작되므로, 이를 최소화하여 optimize하기 위해서는 기생저항에 대한 성분 분리와 이들이 가지는 저항값에 대한 정량적 계산이 이루어져야 한다. 이에 본 논문은 calibration된 TCAD simulation을 통해 90nm급 Tr. 에서 각 영역의 저항성분을 계산, 평가하는 방법을 제시한다. 이 결과, 특히, extension영역의 표면-accumulation부분이 가장 개선이 있어야 할 부분으로 분석되었으며, 이 저항은 gate하부에 존재하는 extension으로부터 발if되는 측면 doping의 tail영역으로 인해 형성되는 것으로,doping의 abruptness가 가장 중요한 factor인 것으로 판단된다.

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Synthesis, Characterization, and Application of Zr,S Co-doped TiO2 as Visible-light Active Photocatalyst

  • Kim, Sun-Woo;Khan, Romana;Kim, Tae-Jeong;Kim, Wha-Jung
    • Bulletin of the Korean Chemical Society
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    • 제29권6호
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    • pp.1217-1223
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    • 2008
  • A series of Zr,S co-doped $TiO_2$ were synthesized by a modified sol-gel method and characterized by various spectroscopic and analytical techniques. The presence of sulfur caused a red-shift in the absorption band of $TiO_2$. Co-doping of sulfur and zirconium (Zr-$TiO_2$-S) improves the surface properties such as surface area, pore volume, and pore diameter and also enhances the thermal stability of the anatase phase. The Zr-$TiO_2$-S systems are very effective visible-light active catalysts for the degradation of toluene. All reactions follow pseudo firstorder kinetics with the decomposition rate reaching as high as 77% within 4 h. The catalytic activity decreases in the following order: Zr-$TiO_2$-S >$TiO_2$-S >Zr-$TiO_2$>$TiO_2$$\approx$ P-25, demonstrating the synergic effect of codoping with zirconium and sulfur. When the comparison is made within the series of Zr-$TiO_2$-S, the catalytic performance is found to be a function of Zr-contents as follows: 3 wt % Zr-TiO2-S >0.5 wt % Zr-$TiO_2$-S> 5 wt % Zr-$TiO_2$-S >1 wt % Zr-$TiO_2$-S. Higher calcination temperature decreases the reactivity of Zr-$TiO_2$-S.

플라즈마 제트 도핑 장치의 대기 및 기체의 압력 변화에 대한 방전 특성 (Discharge Characteristics of Plasma Jet Doping Device with the Atmospheric and Ambient Gas Pressure)

  • 김중길;이원영;김윤중;한국희;김동준;김현철;구제환;권기청;조광섭
    • 한국진공학회지
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    • 제21권6호
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    • pp.301-311
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    • 2012
  • 결정질 태양전지 등의 도핑 공정에 적용하기 위한 플라즈마 제트 장치의 기초 방전 특성을 조사한다. 대기압에서의 아르곤 플라즈마 제트와 대기 압력변화에 대한 대기 플라즈마 제트, 그리고 아르곤 분위기 압력 변화에 대한 플라즈마 제트의 전류-전압은 전형적인 정상 글로우 방전의 특성을 갖는다. 대기압 플라즈마 제트의 방전 전압은 약 2.5 kV의 높은 전압이 요구되며, 대기 및 아르곤 플라즈마 제트는 200 Torr 이하의 낮은 압력에 대한 방전 전압은 약 1 kV가 된다. 도핑용 실리콘 웨이퍼에 조사되는 단일 채널 플라즈마 제트의 전류는 인가전압의 조정에 의하여 수 10~50 mA의 고 전류를 용이하게 얻는다. 플라즈마 제트를 웨이퍼에 조사하는 경우에 웨이퍼의 온도 상승은 정상상태에서 약 $200^{\circ}C$가 된다. 실리콘 웨이퍼에 도핑 용재인 액상의 인산을 도포하여 플라즈마를 조사한 결과 얻어진 인 원자의 도핑 분포는 플라즈마 제트 도핑의 가능성을 보여준다.

CdS 박막의 boron doping에 따른 CdS/CdTe 태양전지 특성 (The Effect of Boron Doped CdS Film on CdS/CdTe Solar Cell)

  • 이호열;이재형;김정호;박용관;신재혁;신성호;박광자
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1998년도 하계학술대회 논문집 D
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    • pp.1370-1372
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    • 1998
  • Boron doped CdS films were prepared by CBD(Chemical Bath Deposition) method using boric acid ($B_3HO_3$) as donor dopant source, and their properties were investigated. As-grown CdS films were highly adherent and specularly reflective. Boron doped CdS film which was fabricated under the condition of 0.01 $B_3HO_3/Cd(Ac)_2$ mole ratio, exhibited the lowest resistivity of $2{\Omega}cm$ and the highest optical bandgap of 2.41eV. Also, CdS/CdTe solar cells were fabricated with various doping concentration of CdS films. Using optimized CdS film as the window layer of CdS/CdTe solar cell, the characteristics of the cell were improved. ( $V_{oc}$=610mV, $J_{sc}$=37.5mA/cm, FF=0.4, $\eta$=9.1% )

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