• 제목/요약/키워드: S-doping

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Epitaxial growth of in-situ doped polycrystalline 3C-SiC for M/NEMS application (M/NEMS용 in-situ 도핑된 다결정 3C-SiC 박막 성장)

  • Kim, Kang-San;Chung, Gwiy-Sang
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.18-19
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    • 2008
  • Polycrystalline(poly) 3C-SiC film is a promising structural material for M/NEMS used in harsh environments, bio and fields. In order to realize poly 3C-SiC based M/NEMS devices, the electrical properties of poly 3C-SiC film have to be optimized. The n-type poly 3C-SiC thin film is deposited by APCVD using HMDS$(Si_2(CH_3)_6)$ as single precursor and are in-situ doped using N2. Resistivity values as low as 0.014 $\Omega$cm were achieved. The carrier concentration increased with doping from $3.0819\times10^{17}$ to $2.2994\times10^{19}cm^{-3}$ and electronicmobility increased from 2.433 to 29.299 $cm^2/V{\cdot}s$.

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Electrical sensing of SOI nano-wire BioFET by using back-gate bias (Back-gate bias를 이용한 SOI nano-wire BioFET의 electrical sensing)

  • Jung, Myung-Ho;Ahn, Chang-Geun;Cho, Won-Ju
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.354-355
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    • 2008
  • The sensitivity and sensing margin of SOI(silicon on insulator) nano-wire BioFET(field effect transistor) were investigated by using back-gate bias. The channel conductance modulation was affected by doping concentration, channel length and channel width. In order to obtain high sensitivity and large sensing margin, low doping concentration, long channel and narrow width are required. We confirmed that the electrical sensing by back-gate bias is effective method for evaluation and optimization of bio-sensor.

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Biracial Silicon Solar Cells with Spin-on Doping and Electroless Plating

  • U. Gangopadhyay;Kim, Kyung-Hae;S.K. Dhungel;D. Mangalaraj;Park, J.H.;J. Yi
    • Transactions on Electrical and Electronic Materials
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    • v.5 no.1
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    • pp.7-10
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    • 2004
  • A new method for fabrication of transistor like structure of the bifacial solar cell using spin-on doping and electroless plating has been proposed and the basic characteristics of the bifacial cell have been investigated. It is found that 9% increase in short circuit current is achieved with bifacial connection than the unifacial connection. Some unwanted effect of the series resistance on collection efficiency under different mode of illumination has been pointed out. Loss mechanisms inherent in the transistor like bifacial structure have also been discussed.

On resistance and breakdown voltage of LDMOS with Multi RESURF structure (Multi RESURF구조를 갖는 LDMOS의 on 저항과 항복전압)

  • Choi, E-Kwon;Choi, Yearn-Ik;Chung, Sang-Koo
    • Proceedings of the KIEE Conference
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    • 2002.11a
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    • pp.156-158
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    • 2002
  • Reduction of on-resistance($R_{on}$) in high voltage devices is of critical importance for the power consumption of the device. $R_{on}$ decreases with increase of the doping concentration of the drift region. However, breakdown voltage(BV) decreaes also with increase of doping concentration. In this report, a multi-resurf LDMOS[1] strcuture is proposed to reduce the $R_{on}$ which allows no degradation in BV. The on-and off-state characteristics of the proposed structure are simulated using the two-dimensional devices simulator ATLAS and compared with those from the conventional structure.

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Sub-90nm 급 Logic 소자에 대한 기생 저항 성분 추출의 연구

  • 이준하;이흥주;이주율
    • Proceedings of the Korean Society Of Semiconductor Equipment Technology
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    • 2003.05a
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    • pp.112-115
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    • 2003
  • Sub-90nm급 high speed 소자를 위해서는 extension영역의 shallow junction과 sheet 저항의 감소가 필수적이다. 일반적으로 기생저항은 channel저항의 약 10-20%정도를 차지하도록 제작되므로, 이를 최소화하여 optimize하기 위해서는 기생저항에 대한 성분 분리와 이들이 가지는 저항값에 대한 정량적 계산이 이루어져야 한다. 이에 본 논문은 calibration된 TCAD simulation을 통해 90nm급 Tr. 에서 각 영역의 저항성분을 계산, 평가하는 방법을 제시한다. 이 결과, 특히, extension영역의 표면-accumulation부분이 가장 개선이 있어야 할 부분으로 분석되었으며, 이 저항은 gate하부에 존재하는 extension으로부터 발if되는 측면 doping의 tail영역으로 인해 형성되는 것으로,doping의 abruptness가 가장 중요한 factor인 것으로 판단된다.

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Synthesis, Characterization, and Application of Zr,S Co-doped TiO2 as Visible-light Active Photocatalyst

  • Kim, Sun-Woo;Khan, Romana;Kim, Tae-Jeong;Kim, Wha-Jung
    • Bulletin of the Korean Chemical Society
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    • v.29 no.6
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    • pp.1217-1223
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    • 2008
  • A series of Zr,S co-doped $TiO_2$ were synthesized by a modified sol-gel method and characterized by various spectroscopic and analytical techniques. The presence of sulfur caused a red-shift in the absorption band of $TiO_2$. Co-doping of sulfur and zirconium (Zr-$TiO_2$-S) improves the surface properties such as surface area, pore volume, and pore diameter and also enhances the thermal stability of the anatase phase. The Zr-$TiO_2$-S systems are very effective visible-light active catalysts for the degradation of toluene. All reactions follow pseudo firstorder kinetics with the decomposition rate reaching as high as 77% within 4 h. The catalytic activity decreases in the following order: Zr-$TiO_2$-S >$TiO_2$-S >Zr-$TiO_2$>$TiO_2$$\approx$ P-25, demonstrating the synergic effect of codoping with zirconium and sulfur. When the comparison is made within the series of Zr-$TiO_2$-S, the catalytic performance is found to be a function of Zr-contents as follows: 3 wt % Zr-TiO2-S >0.5 wt % Zr-$TiO_2$-S> 5 wt % Zr-$TiO_2$-S >1 wt % Zr-$TiO_2$-S. Higher calcination temperature decreases the reactivity of Zr-$TiO_2$-S.

Discharge Characteristics of Plasma Jet Doping Device with the Atmospheric and Ambient Gas Pressure (플라즈마 제트 도핑 장치의 대기 및 기체의 압력 변화에 대한 방전 특성)

  • Kim, J.G.;Lee, W.Y.;Kim, Y.J.;Han, G.H.;Kim, D.J.;Kim, H.C.;Koo, J.H.;Kwon, G.C.;Cho, G.S.
    • Journal of the Korean Vacuum Society
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    • v.21 no.6
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    • pp.301-311
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    • 2012
  • Discharge property of plasma jet devices is investigated for the application to the doping processes of crystalline solar cells and others. Current-voltage characteristics are shown as the typical normal-glow discharge in the various gas pressure of plasma jets, such as in the atmospheric plasma jets of Ar-discharge, in the ambient pressure of atmospheric discharge, and in the ambient Ar-pressure of Ar-discharge. The discharge voltage of atmospheric plasma jet is required as low as about 2.5 kV while the operation voltage of low pressure below 200 Torr is low as about 1 kV in the discharge of atmospheric and Ar plasma jets. With a single channel plasma jet, the irradiated plasma current on the doped silicon wafer is obtained high as the range of 10~50 mA. The temperature increasement of wafer is normally about $200^{\circ}C$. In the result of silicon wafers doped by phosphoric acid with irradiating the plasma jets, the doping profiles of phosphorus atoms shows the possibility of plasma jet doping on solar cells.

The Effect of Boron Doped CdS Film on CdS/CdTe Solar Cell (CdS 박막의 boron doping에 따른 CdS/CdTe 태양전지 특성)

  • Lee, H.Y.;Lee, J.H.;Kim, J.H.;Park, Y.K.;Shin, J.H.;Shin, S.H.;Park, K.J.
    • Proceedings of the KIEE Conference
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    • 1998.07d
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    • pp.1370-1372
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    • 1998
  • Boron doped CdS films were prepared by CBD(Chemical Bath Deposition) method using boric acid ($B_3HO_3$) as donor dopant source, and their properties were investigated. As-grown CdS films were highly adherent and specularly reflective. Boron doped CdS film which was fabricated under the condition of 0.01 $B_3HO_3/Cd(Ac)_2$ mole ratio, exhibited the lowest resistivity of $2{\Omega}cm$ and the highest optical bandgap of 2.41eV. Also, CdS/CdTe solar cells were fabricated with various doping concentration of CdS films. Using optimized CdS film as the window layer of CdS/CdTe solar cell, the characteristics of the cell were improved. ( $V_{oc}$=610mV, $J_{sc}$=37.5mA/cm, FF=0.4, $\eta$=9.1% )

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