• 한국공작기계학회논문집
• /
• 제17권3호
• /
• pp.86-93
• /
• 2008

This paper presents a design of the reticle stage for lithography using VCM(Voice Coil Motor) and kinematic analysis. The stage has three axes for X,Y,${\theta}_z$, those actuated by three VCM's individually. The reticle stage has cross coupled relations between X,Y,${\theta}_z$ axes, and the closed solution of the forward/inverse kinematics were solved to get an accurate reference position. The reticle stage for lithography was designed for reaching both high accuracy and long stroke, which was $0.1{\mu}m$ (X,Y)/ $1{\mu}rad({\theta}_z)$ accuracies and relatively long strokes about 2mm (X,Y) and 2 degrees(${\theta}_z$). Also this research presents a rotational compensation algorithm for the precision gap sensor for the stage. Simulation results show the overall performance of the whole algorithm and the improvement quantity of the rotational compensation algorithm.

• 한국공작기계학회논문집
• /
• 제17권4호
• /
• pp.51-58
• /
• 2008

This paper presents a new design of the precision stage for the reticle in lithography process and a low hunting control method for the stage. The stage has three axes for X, Y, ${\theta}_z$ those actuated by three voice coil motors individually. The designed reticle stage system has three gap sensors and voice coil motors, and supported by four air bearings and the forward/inverse kinematics of the stage were solved to get an accurate reference position. When a stage is in regulating control mode, there always exist small fluctuations(stage hunting) in the stage movement. Because the low stage hunting characteristic is very important in recent lithography and nano-level applications, a special regulating controller for ultra low hunting is proposed in this paper. Also this research proposed the 2-step transmission system for preventing the noise infection from environmental devices. The experimental results showed the proposed regulating control system reduced hunting noise as 35nm(rms) when a conventional PID generates 77nm(rms) in the same mechanical system. Besides the reticle stage has 100nm linear accuracy and $1{\mu}rad$ rotation accuracy at the control frequency of 8kHz.

• 한국정밀공학회:학술대회논문집
• /
• 한국정밀공학회 1993년도 추계학술대회 논문집
• /
• pp.243-248
• /
• 1993

New methodology for fiducial alignment is proposed to improve the alignment accuracy in wafer steppers. The positioning error is detected by PSD(Position Sensitive Detector)when 2-dimensional vernier patterns on a reticle on a reticle are projected on the fiducial marks of wafer stage. The width and period of vernier patterns are deter mined to get the highest S/N ratio for the exposure wavelength 248.4nm of KrF excimer laser. This new method has an advantage of higher accuracy and faster alignment over the conventional one.

• 한국광학회지
• /
• 제4권1호
• /
• pp.15-21
• /
• 1993

본 연구에서는 설계제작된 KrF 엑시머 레이저 스텝퍼는 광원인 KrF엑시머 레이저, 조명광학계, 축소트영광학계, 정밀구동 웨이퍼 스테이지, 정렬시스템 및 이들을 제어하기 위한 제어계로 구성되어 있다. 본 실험에서 사용한 KrFdprtlaj 레이저는 밴드폭 3pm, 반복주파수 200Hz, 평균축력 3W이고, 5:1 투영렌즈는 N.A. 0.42, 전체 필드영역 $\varphi$21.2mm, 왜곡수차 최대 60nm 이하이다. 또한 정밀구동 웨이퍼 스테이지의 재현성과 해상도는 각각 $\pm$0.08$\mu\textrm{m}$/200mm(3 sigma), 100mm 반경에서 0.05 $\mu\textrm{m}$이다. 자동 초점 시스템은 $\pm$50$\mu\textrm{m}$범위에서 0.1$\mu\textrm{m}$의 해상도를 나타냈으며, 자동수평시스템은 120 arcsec 범위에서 larcsec의 해상도를 나타냈다. OFF-AXIS 정렬방식에서는 0.2$\mu\textrm{m}$의 해상도를 가지며, 두빔의 간섭을 이용한 새로운 TTL 정렬은 0.1$\mu\textrm{m}$의 해상도를 나타냈다. 스텝퍼 패턴 실험결과 SAL603레지스트를 사용하였을 때 웨이퍼의 노광후 열처리 $105^{\circ}C$, 60초에서 0.3$\mu\textrm{m}$ Lines and Spaces(L/S)까지 해상되었으며, 0.34$\mu\textrm{m}$ L/S에서 1$\mu\textrm{m}$의 초점심도를 얻을 수 있었다. 마스크 패턴과 레지스트 패턴의 선형성은 0.4$\mu\textrm{m}$ L/S가지 유지 되었다. 또한 XP-89131레지스트의 경우 노광후 열처리 $110^{\circ}C$, 60초에서 0.34$\mu\textrm{m}$ L/S까지 해상됨을 알수 있었다.