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Design and Kinematic Analysis of the Reticle Stage for Lithography Using VCM  

Oh, Min-Taek (서울산업대학교 산업대학원 메카트로닉스학과)
Kim, Mun-Su (서울산업대학교 산업대학원 메카트로닉스학과)
Kim, Jung-Han (서울산업대학교 기계설계자동화공학부, 정밀기계기술연구소)
Publication Information
Transactions of the Korean Society of Machine Tool Engineers / v.17, no.3, 2008 , pp. 86-93 More about this Journal
Abstract
This paper presents a design of the reticle stage for lithography using VCM(Voice Coil Motor) and kinematic analysis. The stage has three axes for X,Y,${\theta}_z$, those actuated by three VCM's individually. The reticle stage has cross coupled relations between X,Y,${\theta}_z$ axes, and the closed solution of the forward/inverse kinematics were solved to get an accurate reference position. The reticle stage for lithography was designed for reaching both high accuracy and long stroke, which was $0.1{\mu}m$ (X,Y)/ $1{\mu}rad({\theta}_z)$ accuracies and relatively long strokes about 2mm (X,Y) and 2 degrees(${\theta}_z$). Also this research presents a rotational compensation algorithm for the precision gap sensor for the stage. Simulation results show the overall performance of the whole algorithm and the improvement quantity of the rotational compensation algorithm.
Keywords
Reticle stage; Kinematics; Voice coil motor; Gap sensor;
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